JP4588602B2 - 静電偏向器の製造方法 - Google Patents
静電偏向器の製造方法 Download PDFInfo
- Publication number
- JP4588602B2 JP4588602B2 JP2005286918A JP2005286918A JP4588602B2 JP 4588602 B2 JP4588602 B2 JP 4588602B2 JP 2005286918 A JP2005286918 A JP 2005286918A JP 2005286918 A JP2005286918 A JP 2005286918A JP 4588602 B2 JP4588602 B2 JP 4588602B2
- Authority
- JP
- Japan
- Prior art keywords
- electrostatic deflector
- electrode
- manufacturing
- insulator
- electrode material
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement
- H01J37/147—Arrangements for directing or deflecting the discharge along a desired path
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement
- H01J37/147—Arrangements for directing or deflecting the discharge along a desired path
- H01J37/1472—Deflecting along given lines
- H01J37/1474—Scanning means
- H01J37/1477—Scanning means electrostatic
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2209/00—Apparatus and processes for manufacture of discharge tubes
Description
従来型のように部品点数が増えたり、電極形状が複雑になったりすることも避けることができる。
11・・・電子線源
12・・・アライメントコイル
13・・・スティグコイル
14・・・対物レンズコイル
21・・・試料
30・・・検出器
40・・・静電偏向器
41・・・電子線
42・・・荷電粒子
50・・・偏向コイル
70・・・取付部材
80・・・電極
81〜88・・・電極部材
81a〜88a・・・取付フランジ部
81b〜88b・・・間隙
81c〜88c・・・電極部
81d〜88d・・・スリット
89・・・電子線透過孔
90・・・絶縁体
91・・・溝部
92・・・ボルト貫通孔
100・・・電極素材
110・・・円錐部
111・・・空間部
120・・・円筒部
Claims (5)
- 大径部に絶縁体への取付用のフランジ部を形成した略円錐状の電極素材に、その母線に沿った方向に複数のスリットを形成しておき、前記フランジ部を前記絶縁体に結合した後、前記スリットに連通するよう電極素材を切断加工して、電気的に分離した複数の電極部材からなる一体型の電極を製造することを特徴とする静電偏向器の製造方法。
- 前記電極素材のスリットは、前記フランジ部から円錐状の部分にかけて連続して形成されていることを特徴とする請求項1の静電偏向器の製造方法。
- 前記円錐状の電極素材の小径部から切断加工を行なうことを特徴とする請求項1または2の静電偏向器の製造方法。
- 前記切断加工は、放電加工でなされることを特徴とする請求項1ないし3のいずれかの静電偏向器の製造方法。
- 前記電極素材は、所定の厚さを備えた略円錐筒状部材であることを特徴とする請求項1ないし4のいずれかの静電偏向器の製造方法。
Priority Applications (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2005286918A JP4588602B2 (ja) | 2005-09-30 | 2005-09-30 | 静電偏向器の製造方法 |
US11/430,195 US7435969B2 (en) | 2005-09-30 | 2006-05-09 | Method of manufacturing electrostatic deflector, and electrostatic deflector |
US12/216,371 US7829865B2 (en) | 2005-09-30 | 2008-07-02 | Electrostatic deflector |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2005286918A JP4588602B2 (ja) | 2005-09-30 | 2005-09-30 | 静電偏向器の製造方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2007095634A JP2007095634A (ja) | 2007-04-12 |
JP4588602B2 true JP4588602B2 (ja) | 2010-12-01 |
Family
ID=37901006
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2005286918A Expired - Fee Related JP4588602B2 (ja) | 2005-09-30 | 2005-09-30 | 静電偏向器の製造方法 |
Country Status (2)
Country | Link |
---|---|
US (2) | US7435969B2 (ja) |
JP (1) | JP4588602B2 (ja) |
Families Citing this family (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP4588602B2 (ja) * | 2005-09-30 | 2010-12-01 | 株式会社トプコン | 静電偏向器の製造方法 |
DE602007007468D1 (de) * | 2007-07-27 | 2010-08-12 | Integrated Circuit Testing | Magnetische Linsenanordnung |
EP2019413B1 (en) * | 2007-07-27 | 2010-03-31 | ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH | Electrostatic lens assembly |
CN108292093B (zh) | 2015-08-31 | 2023-01-31 | 利赛奥谱特科技责任有限公司 | 用于使用针对膜或表面改性的扫描光束的装置和方法 |
US10840056B2 (en) * | 2017-02-03 | 2020-11-17 | Kla Corporation | Multi-column scanning electron microscopy system |
EP3876258A1 (en) * | 2020-03-06 | 2021-09-08 | ASML Netherlands B.V. | Beam manipulator in charged particle-beam exposure apparatus |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5569942A (en) * | 1978-11-08 | 1980-05-27 | Control Data Corp | Microlens array and microdeflector assembly |
JPH10261376A (ja) * | 1997-03-18 | 1998-09-29 | Toshiba Corp | 荷電ビーム描画装置用静電偏向電極の製造方法 |
JP2000260371A (ja) * | 1999-03-09 | 2000-09-22 | Toshiba Corp | 電子ビーム描画装置用電極及びその製造方法 |
Family Cites Families (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4542293A (en) * | 1983-04-20 | 1985-09-17 | Yale University | Process and apparatus for changing the energy of charged particles contained in a gaseous medium |
GB8527438D0 (en) * | 1985-11-07 | 1985-12-11 | Vg Instr Group | Charged particle energy analyser |
US5731586A (en) * | 1995-05-25 | 1998-03-24 | Jeol Ltd. | Magnetic-electrostatic compound objective lens |
DE59712097D1 (de) * | 1997-09-29 | 2004-12-30 | Advantest Corp | Elektronenstrahl-Linse |
GB2348048A (en) * | 1999-03-19 | 2000-09-20 | Shimadzu Research Lab | Magnetic immersion lenses |
US6380546B1 (en) * | 2000-01-01 | 2002-04-30 | Applied Materials, Inc. | Focusing assembly and method for a charged particle beam column |
US6891167B2 (en) * | 2000-06-15 | 2005-05-10 | Kla-Tencor Technologies | Apparatus and method for applying feedback control to a magnetic lens |
US7064491B2 (en) * | 2000-11-30 | 2006-06-20 | Semequip, Inc. | Ion implantation system and control method |
DE10233002B4 (de) * | 2002-07-19 | 2006-05-04 | Leo Elektronenmikroskopie Gmbh | Objektivlinse für ein Elektronenmikroskopiesystem und Elektronenmikroskopiesystem |
EP1557867B1 (en) * | 2004-01-21 | 2008-02-27 | ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH | Focussing lens for charged particle beams |
JP4588602B2 (ja) * | 2005-09-30 | 2010-12-01 | 株式会社トプコン | 静電偏向器の製造方法 |
US7700930B2 (en) * | 2007-09-14 | 2010-04-20 | Asml Netherlands B.V. | Lithographic apparatus with rotation filter device |
-
2005
- 2005-09-30 JP JP2005286918A patent/JP4588602B2/ja not_active Expired - Fee Related
-
2006
- 2006-05-09 US US11/430,195 patent/US7435969B2/en not_active Expired - Fee Related
-
2008
- 2008-07-02 US US12/216,371 patent/US7829865B2/en not_active Expired - Fee Related
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5569942A (en) * | 1978-11-08 | 1980-05-27 | Control Data Corp | Microlens array and microdeflector assembly |
JPH10261376A (ja) * | 1997-03-18 | 1998-09-29 | Toshiba Corp | 荷電ビーム描画装置用静電偏向電極の製造方法 |
JP2000260371A (ja) * | 1999-03-09 | 2000-09-22 | Toshiba Corp | 電子ビーム描画装置用電極及びその製造方法 |
Also Published As
Publication number | Publication date |
---|---|
US20070075257A1 (en) | 2007-04-05 |
US7829865B2 (en) | 2010-11-09 |
US20090140161A1 (en) | 2009-06-04 |
US7435969B2 (en) | 2008-10-14 |
JP2007095634A (ja) | 2007-04-12 |
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