DE60200300D1 - Diffraktives optisches Element - Google Patents

Diffraktives optisches Element

Info

Publication number
DE60200300D1
DE60200300D1 DE60200300T DE60200300T DE60200300D1 DE 60200300 D1 DE60200300 D1 DE 60200300D1 DE 60200300 T DE60200300 T DE 60200300T DE 60200300 T DE60200300 T DE 60200300T DE 60200300 D1 DE60200300 D1 DE 60200300D1
Authority
DE
Germany
Prior art keywords
optical element
diffractive optical
diffractive
optical
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE60200300T
Other languages
English (en)
Other versions
DE60200300T2 (de
Inventor
Kenichi Kurisu
Keiji Fuse
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sumitomo Electric Industries Ltd
Original Assignee
Sumitomo Electric Industries Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sumitomo Electric Industries Ltd filed Critical Sumitomo Electric Industries Ltd
Publication of DE60200300D1 publication Critical patent/DE60200300D1/de
Application granted granted Critical
Publication of DE60200300T2 publication Critical patent/DE60200300T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00Optical elements other than lenses
    • G02B5/18Diffraction gratings
    • G02B5/1847Manufacturing methods
    • G02B5/1857Manufacturing methods using exposure or etching means, e.g. holography, photolithography, exposure to electron or ion beams

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Diffracting Gratings Or Hologram Optical Elements (AREA)
  • Drying Of Semiconductors (AREA)
  • Micromachines (AREA)
  • Surface Treatment Of Optical Elements (AREA)
DE60200300T 2001-01-29 2002-01-24 Diffraktives optisches Element Expired - Lifetime DE60200300T2 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2001019432A JP3501127B2 (ja) 2001-01-29 2001-01-29 回折型光学部品
JP2001019432 2001-01-29

Publications (2)

Publication Number Publication Date
DE60200300D1 true DE60200300D1 (de) 2004-05-06
DE60200300T2 DE60200300T2 (de) 2004-08-05

Family

ID=18885308

Family Applications (1)

Application Number Title Priority Date Filing Date
DE60200300T Expired - Lifetime DE60200300T2 (de) 2001-01-29 2002-01-24 Diffraktives optisches Element

Country Status (5)

Country Link
US (1) US6775066B2 (de)
EP (1) EP1227345B1 (de)
JP (1) JP3501127B2 (de)
CA (1) CA2369063C (de)
DE (1) DE60200300T2 (de)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7286566B1 (en) 2001-05-08 2007-10-23 Cortina Systems, Inc. Multi-service segmentation and reassembly device that maintains reduced number of segmentation contexts
US7256938B2 (en) * 2004-03-17 2007-08-14 General Atomics Method for making large scale multilayer dielectric diffraction gratings on thick substrates using reactive ion etching
US7528073B2 (en) 2004-11-04 2009-05-05 Sumitomo Electric Industries, Ltd. Dry etching method and diffractive optical element
US7321467B2 (en) * 2005-05-26 2008-01-22 Macronix International Co., Ltd. Anti-reflection coating layer and design method thereof
US7821900B2 (en) * 2008-05-15 2010-10-26 Northrop Grumman Systems Corporation Diffractive optical element and method of designing the same
JP5249064B2 (ja) * 2009-01-19 2013-07-31 住友電気工業株式会社 回折型光学部品の製造方法
JP5424154B2 (ja) * 2010-04-28 2014-02-26 公立大学法人大阪府立大学 光学部品
JP2013186350A (ja) 2012-03-08 2013-09-19 Canon Inc 回折光学素子の構造データの算出方法、プログラムおよび製造方法

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE4338969C2 (de) 1993-06-18 1996-09-19 Schott Glaswerke Verfahren zur Herstellung anorganischer diffraktiver Elemente und Verwendung derselben
JPH10300912A (ja) 1997-04-30 1998-11-13 Shimadzu Corp 回折格子用基板
JP4148382B2 (ja) 1999-04-02 2008-09-10 株式会社村田製作所 セラミックグリーンシートの加工方法
JP2000280225A (ja) 1999-04-02 2000-10-10 Murata Mfg Co Ltd セラミックグリーンシートの加工方法及び加工装置

Also Published As

Publication number Publication date
JP3501127B2 (ja) 2004-03-02
DE60200300T2 (de) 2004-08-05
US6775066B2 (en) 2004-08-10
EP1227345A3 (de) 2002-10-02
CA2369063A1 (en) 2002-07-29
EP1227345A2 (de) 2002-07-31
JP2002221614A (ja) 2002-08-09
CA2369063C (en) 2005-04-05
US20020101663A1 (en) 2002-08-01
EP1227345B1 (de) 2004-03-31

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition