DE60141550D1 - Chemisch verstärkte Resistzusammensetzung mit niedermolekularen Zusatzstoffen - Google Patents

Chemisch verstärkte Resistzusammensetzung mit niedermolekularen Zusatzstoffen

Info

Publication number
DE60141550D1
DE60141550D1 DE60141550T DE60141550T DE60141550D1 DE 60141550 D1 DE60141550 D1 DE 60141550D1 DE 60141550 T DE60141550 T DE 60141550T DE 60141550 T DE60141550 T DE 60141550T DE 60141550 D1 DE60141550 D1 DE 60141550D1
Authority
DE
Germany
Prior art keywords
molecular weight
low molecular
resist composition
chemically reinforced
weight additives
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE60141550T
Other languages
English (en)
Inventor
Jae Young Kim
Joo Hyeon Park
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Kumho Petrochemical Co Ltd
Original Assignee
Korea Kumho Petrochemical Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Korea Kumho Petrochemical Co Ltd filed Critical Korea Kumho Petrochemical Co Ltd
Application granted granted Critical
Publication of DE60141550D1 publication Critical patent/DE60141550D1/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/106—Binder containing

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Materials For Photolithography (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
DE60141550T 2000-02-16 2001-01-05 Chemisch verstärkte Resistzusammensetzung mit niedermolekularen Zusatzstoffen Expired - Lifetime DE60141550D1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR10-2000-0007272A KR100384810B1 (ko) 2000-02-16 2000-02-16 저분자 화합물 첨가제를 포함하는 화학증폭형 레지스트조성물

Publications (1)

Publication Number Publication Date
DE60141550D1 true DE60141550D1 (de) 2010-04-29

Family

ID=19646891

Family Applications (1)

Application Number Title Priority Date Filing Date
DE60141550T Expired - Lifetime DE60141550D1 (de) 2000-02-16 2001-01-05 Chemisch verstärkte Resistzusammensetzung mit niedermolekularen Zusatzstoffen

Country Status (6)

Country Link
US (1) US6641974B2 (de)
EP (1) EP1126320B1 (de)
JP (1) JP3477163B2 (de)
KR (1) KR100384810B1 (de)
DE (1) DE60141550D1 (de)
TW (1) TWI224717B (de)

Families Citing this family (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1132774B1 (de) * 2000-03-06 2009-01-07 Shin-Etsu Chemical Co., Ltd. Polymer, Resistzusammensetzung und Musterübertragungsverfahren
JP4831274B2 (ja) * 2000-04-28 2011-12-07 信越化学工業株式会社 高分子化合物、レジスト材料及びパターン形成方法
TWI284782B (en) * 2000-04-28 2007-08-01 Shinetsu Chemical Co Polymers, resist compositions and patterning process
JP3458096B2 (ja) * 2000-08-11 2003-10-20 株式会社半導体先端テクノロジーズ レジスト組成物、及び半導体装置の製造方法
JP2002343860A (ja) * 2001-05-17 2002-11-29 Tokyo Ohka Kogyo Co Ltd 保護膜形成用材料
GR1004163B (el) * 2001-11-01 2003-02-21 Πολυκυκλικα παραγωγα τροποποιησης των οπτικων ιδιοτητων και των ιδιοτητων αντοχης στο πλασμα των πολυμερων λιθογραφιας
KR20030090213A (ko) * 2002-05-21 2003-11-28 삼성전자주식회사 감광성 폴리머 및 이를 포함하는 레지스트 조성물
KR100562205B1 (ko) * 2004-09-13 2006-03-22 금호석유화학 주식회사 2차 히드록실기를 갖는 알킬 환상 올레핀과 아크릴화합물의 중합체 및 이를 포함하는 화학증폭형 레지스트조성물
EP1662320A1 (de) * 2004-11-24 2006-05-31 Rohm and Haas Electronic Materials, L.L.C. Fotolackzusammensetzungen
CN101072813B (zh) * 2004-12-17 2011-06-08 陶氏康宁公司 硅氧烷树脂涂料
JP4959171B2 (ja) 2005-04-15 2012-06-20 東京応化工業株式会社 化合物、溶解抑制剤、ポジ型レジスト組成物、レジストパターン形成方法
JP4667945B2 (ja) * 2005-04-20 2011-04-13 東京応化工業株式会社 ポジ型レジスト組成物およびレジストパターン形成方法
JP2007316508A (ja) * 2006-05-29 2007-12-06 Tokyo Ohka Kogyo Co Ltd 分解性組成物およびその使用方法
JP6174420B2 (ja) * 2013-08-23 2017-08-02 東京応化工業株式会社 化学増幅型ポジ型感光性樹脂組成物及びそれを用いたレジストパターンの製造方法

Family Cites Families (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5532106A (en) * 1994-08-31 1996-07-02 Cornell Research Foundation, Inc. Positive-tone photoresist containing diester dissolution inhibitors
DE4444669A1 (de) * 1994-12-15 1996-06-20 Hoechst Ag Strahlungsempfindliches Gemisch
US5879857A (en) * 1997-02-21 1999-03-09 Lucent Technologies Inc. Energy-sensitive resist material and a process for device fabrication using an energy-sensitive resist material
KR0185318B1 (ko) * 1996-12-28 1999-04-01 김흥기 양성 포토레지스트 제조용 공중합체 및 이를 함유하는 화학증폭형 양성 포토레지스트 조성물
KR0183950B1 (ko) * 1997-01-17 1999-04-01 삼성전자주식회사 화학증폭형 레지스트 조성물
JP3994486B2 (ja) * 1997-04-14 2007-10-17 住友化学株式会社 化学増幅型ポジ型レジスト組成物およびそのための共重合体
US6286106B1 (en) * 1997-07-30 2001-09-04 Gateway, Inc. Computer power down upon emergency network notification
JP4060922B2 (ja) * 1997-12-25 2008-03-12 ローム・アンド・ハース・エレクトロニック・マテリアルズ，エル．エル．シー． 感放射線性組成物
KR100265940B1 (ko) * 1998-05-19 2000-09-15 박찬구 포토레지스트 제조용 스티렌-아크릴계 공중합체 및 이를 함유하는 화학증폭형 양성 포토레지스트 조성물
KR100292406B1 (ko) * 1998-06-11 2001-07-12 윤종용 감광성중합체,용해억제제및이들을포함하는화학증폭형포토레지스트조성물
KR20000010320A (ko) * 1998-07-31 2000-02-15 윤종용 레지스트 조성물 및 이를 이용한 패턴 형성 방법
KR100301053B1 (ko) * 1998-09-21 2001-09-22 윤종용 화학증폭형 포토레지스트용 감광성 중합체 및 이를 포함하는 화학 증폭형 포토레지스트 조성물
KR100271419B1 (ko) * 1998-09-23 2001-03-02 박찬구 화학증폭형 레지스트 제조용 중합체 및 이를 함유하는 레지스트조성물
KR20000065815A (ko) * 1999-04-09 2000-11-15 윤종용 화학증폭형 레지스트 조성물
KR100557599B1 (ko) * 1999-08-31 2006-03-10 주식회사 하이닉스반도체 광조사에 의해 라디칼을 발생하는 그룹을 포함하는 포토레지스트단량체, 그의 공중합체 및 이를 이용한 포토레지스트 조성물
KR100332463B1 (ko) * 1999-12-20 2002-04-13 박찬구 노보난계 저분자 화합물 첨가제를 포함하는 화학증폭형레지스트 조성물

Also Published As

Publication number Publication date
EP1126320B1 (de) 2010-03-17
JP2001228613A (ja) 2001-08-24
KR20010083547A (ko) 2001-09-01
EP1126320A3 (de) 2001-08-29
TWI224717B (en) 2004-12-01
EP1126320A2 (de) 2001-08-22
US20010041302A1 (en) 2001-11-15
KR100384810B1 (ko) 2003-05-22
US6641974B2 (en) 2003-11-04
JP3477163B2 (ja) 2003-12-10

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