DE60123199D1 - Vorrichtung und Verfahren zur Herstellung einer optischen Apertur - Google Patents

Vorrichtung und Verfahren zur Herstellung einer optischen Apertur

Info

Publication number
DE60123199D1
DE60123199D1 DE60123199T DE60123199T DE60123199D1 DE 60123199 D1 DE60123199 D1 DE 60123199D1 DE 60123199 T DE60123199 T DE 60123199T DE 60123199 T DE60123199 T DE 60123199T DE 60123199 D1 DE60123199 D1 DE 60123199D1
Authority
DE
Germany
Prior art keywords
tip
aperture
producing
optical aperture
point
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE60123199T
Other languages
English (en)
Other versions
DE60123199T2 (de
Inventor
Manabu Oumi
Susumu Ichihara
Takashi Niwa
Kenji Kato
Yoko Shinohara
Hidetaka Maeda
Nobuyuki Kasama
Yasuyuki Mitsuoka
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Seiko Instruments Inc
Original Assignee
Seiko Instruments Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP2000367561A external-priority patent/JP4450975B2/ja
Priority claimed from JP2000367563A external-priority patent/JP4446297B2/ja
Priority claimed from JP2000370186A external-priority patent/JP2002168763A/ja
Priority claimed from JP2000373308A external-priority patent/JP4450978B2/ja
Priority claimed from JP2000379265A external-priority patent/JP4450981B2/ja
Priority claimed from JP2000379264A external-priority patent/JP2002181685A/ja
Application filed by Seiko Instruments Inc filed Critical Seiko Instruments Inc
Publication of DE60123199D1 publication Critical patent/DE60123199D1/de
Application granted granted Critical
Publication of DE60123199T2 publication Critical patent/DE60123199T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01Q—SCANNING-PROBE TECHNIQUES OR APPARATUS; APPLICATIONS OF SCANNING-PROBE TECHNIQUES, e.g. SCANNING PROBE MICROSCOPY [SPM]
    • G01Q60/00—Particular types of SPM [Scanning Probe Microscopy] or microscopes; Essential components thereof
    • G01Q60/18—SNOM [Scanning Near-Field Optical Microscopy] or apparatus therefor, e.g. SNOM probes
    • G01Q60/22—Probes, their manufacture, or their related instrumentation, e.g. holders
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01Q—SCANNING-PROBE TECHNIQUES OR APPARATUS; APPLICATIONS OF SCANNING-PROBE TECHNIQUES, e.g. SCANNING PROBE MICROSCOPY [SPM]
    • G01Q70/00—General aspects of SPM probes, their manufacture or their related instrumentation, insofar as they are not specially adapted to a single SPM technique covered by group G01Q60/00
    • G01Q70/06—Probe tip arrays
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T29/00—Metal working
    • Y10T29/49—Method of mechanical manufacture
    • Y10T29/49002—Electrical device making
    • Y10T29/49016—Antenna or wave energy "plumbing" making

Landscapes

  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • General Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Nuclear Medicine, Radiotherapy & Molecular Imaging (AREA)
  • Radiology & Medical Imaging (AREA)
  • Micromachines (AREA)
  • Diaphragms For Cameras (AREA)
  • Eyeglasses (AREA)
  • Optical Elements Other Than Lenses (AREA)
  • Optical Couplings Of Light Guides (AREA)
DE60123199T 2000-12-01 2001-11-30 Vorrichtung und Verfahren zur Herstellung einer optischen Apertur Expired - Lifetime DE60123199T2 (de)

Applications Claiming Priority (12)

Application Number Priority Date Filing Date Title
JP2000367561A JP4450975B2 (ja) 2000-12-01 2000-12-01 光学的な開口の作製方法
JP2000367563A JP4446297B2 (ja) 2000-12-01 2000-12-01 開口形成装置
JP2000367563 2000-12-01
JP2000367561 2000-12-01
JP2000370186 2000-12-05
JP2000370186A JP2002168763A (ja) 2000-12-05 2000-12-05 光学的な開口の作製方法
JP2000373308 2000-12-07
JP2000373308A JP4450978B2 (ja) 2000-12-07 2000-12-07 光学的な開口の作製方法及び光学的な開口の作製装置
JP2000379265A JP4450981B2 (ja) 2000-12-13 2000-12-13 光学的な開口の作製方法及び作製装置
JP2000379264A JP2002181685A (ja) 2000-12-13 2000-12-13 光学的な開口の形成装置
JP2000379264 2000-12-13
JP2000379265 2000-12-13

Publications (2)

Publication Number Publication Date
DE60123199D1 true DE60123199D1 (de) 2006-11-02
DE60123199T2 DE60123199T2 (de) 2007-10-31

Family

ID=27554875

Family Applications (1)

Application Number Title Priority Date Filing Date
DE60123199T Expired - Lifetime DE60123199T2 (de) 2000-12-01 2001-11-30 Vorrichtung und Verfahren zur Herstellung einer optischen Apertur

Country Status (4)

Country Link
US (2) US6684676B2 (de)
EP (1) EP1211694B1 (de)
AT (1) ATE340359T1 (de)
DE (1) DE60123199T2 (de)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005512018A (ja) * 2001-03-29 2005-04-28 ジョージア テック リサーチ コーポレイション 性能が最適化されたマイクロ干渉計
US7116430B2 (en) 2002-03-29 2006-10-03 Georgia Technology Research Corporation Highly-sensitive displacement-measuring optical device
US7440117B2 (en) * 2002-03-29 2008-10-21 Georgia Tech Research Corp. Highly-sensitive displacement-measuring optical device
US7518737B2 (en) * 2002-03-29 2009-04-14 Georgia Tech Research Corp. Displacement-measuring optical device with orifice
US6824426B1 (en) * 2004-02-10 2004-11-30 Hon Hai Precision Ind. Co., Ltd. High speed electrical cable assembly
US7485847B2 (en) * 2004-12-08 2009-02-03 Georgia Tech Research Corporation Displacement sensor employing discrete light pulse detection
NZ537147A (en) 2004-12-13 2007-06-29 Australo Ltd Method and apparatus for particle analysis
US7773724B2 (en) 2006-07-11 2010-08-10 Morpho Detection, Inc. Systems and methods for generating an improved diffraction profile
US7881437B2 (en) * 2006-07-11 2011-02-01 Morpho Detection, Inc. Systems and methods for developing a primary collimator
US7835495B2 (en) * 2008-10-31 2010-11-16 Morpho Detection, Inc. System and method for X-ray diffraction imaging
US20110188632A1 (en) * 2010-02-03 2011-08-04 Geoffrey Harding Multiple plane multi-inverse fan-beam detection systems and method for using the same

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US1468549A (en) 1920-12-24 1923-09-18 David Bowers Die
CH176096A (fr) 1934-05-22 1935-03-31 Bodmer Ernest Dispositif pour le découpage, le percement, l'emboutissage, le ployage de pièces métalliques ou autres.
US2219385A (en) 1938-01-31 1940-10-29 Hydraulic Press Corp Inc Press with floating connection between auxiliary rams and press platen
DE849655C (de) 1946-03-13 1952-09-18 Svenska Flygmotor Aktiebolaget Vorrichtung an hydraulischen Pressen mit einer festen Pressplatte und einer beweglichen Pressplatte
US2966873A (en) 1955-01-11 1961-01-03 Lockheed Aircraft Corp Device for forming sheet material
DE3276917D1 (en) 1982-12-27 1987-09-10 Ibm Light waveguide with a submicron aperture, method for manufacturing the waveguide and application of the waveguide in an optical memory
DE69131528T2 (de) 1990-05-30 2000-05-04 Hitachi Ltd Verfahren und Vorrichtung zur Behandlung eines sehr kleinen Bereichs einer Probe
US5528001A (en) * 1992-02-14 1996-06-18 Research Organization For Circuit Knowledge Circuit of electrically conductive paths on a dielectric with a grid of isolated conductive features that are electrically insulated from the paths
US5581083A (en) * 1995-05-11 1996-12-03 The Regents Of The University Of California Method for fabricating a sensor on a probe tip used for atomic force microscopy and the like
JP3618896B2 (ja) * 1996-03-29 2005-02-09 キヤノン株式会社 微小開口を有するプローブの作製法とそれによるプローブ、並びに該プローブを用いた走査型近接場光顕微鏡と走査型トンネル顕微鏡との複合装置、および該プローブを用いた記録再生装置
JP3330016B2 (ja) 1996-04-11 2002-09-30 アイダエンジニアリング株式会社 スライドの下死点位置補正装置
JPH11265520A (ja) 1998-03-17 1999-09-28 Hitachi Ltd 近接場光ヘッド、近接場光ヘッドの加工方法および光記録再生装置
EP1816642B1 (de) * 1998-11-09 2009-10-21 Seiko Instruments Inc. Nahfeld Abtastkopf und Herstellungsverfahren dafür

Also Published As

Publication number Publication date
US6684676B2 (en) 2004-02-03
US20020066307A1 (en) 2002-06-06
US7010949B2 (en) 2006-03-14
EP1211694B1 (de) 2006-09-20
EP1211694A3 (de) 2003-04-02
DE60123199T2 (de) 2007-10-31
ATE340359T1 (de) 2006-10-15
US20040154367A1 (en) 2004-08-12
EP1211694A2 (de) 2002-06-05

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Legal Events

Date Code Title Description
8381 Inventor (new situation)

Inventor name: OUMI, MANABU, CHIBA-SHI, CHIBA, JP

Inventor name: ICHIHARA, SUSUMU, CHIBA-SHI, CHIBA, JP

Inventor name: NIWA, TAKASHI, CHIBA-SHI, CHIBA, JP

Inventor name: KATO, KENJI, CHIBA-SHI, CHIBA, JP

Inventor name: SHINOHARA, YOKO, CHIBA-SHI, CHIBA, JP

Inventor name: MAEDA, HIDETAKA, CHIBA-SHI, CHIBA, JP

Inventor name: KASAMA, NOBUYUKI, CHIBA-SHI, CHIBA, JP

Inventor name: MITSUOKA, YASUYUKI, CHIBA-SHI, CHIBA, JP

8364 No opposition during term of opposition