DE60118843D1 - Stempel für ein lithographisches verfahren, methode zur stempelherstellung und methode zur herstellung einer gemusterten schicht auf einem substrat - Google Patents

Stempel für ein lithographisches verfahren, methode zur stempelherstellung und methode zur herstellung einer gemusterten schicht auf einem substrat

Info

Publication number
DE60118843D1
DE60118843D1 DE60118843T DE60118843T DE60118843D1 DE 60118843 D1 DE60118843 D1 DE 60118843D1 DE 60118843 T DE60118843 T DE 60118843T DE 60118843 T DE60118843 T DE 60118843T DE 60118843 D1 DE60118843 D1 DE 60118843D1
Authority
DE
Germany
Prior art keywords
stamp
producing
substrate
patterned layer
lithographic process
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE60118843T
Other languages
English (en)
Other versions
DE60118843T2 (de
Inventor
H Blees
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Koninklijke Philips NV
Original Assignee
Koninklijke Philips Electronics NV
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Koninklijke Philips Electronics NV filed Critical Koninklijke Philips Electronics NV
Application granted granted Critical
Publication of DE60118843D1 publication Critical patent/DE60118843D1/de
Publication of DE60118843T2 publication Critical patent/DE60118843T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41K—STAMPS; STAMPING OR NUMBERING APPARATUS OR DEVICES
    • B41K1/00—Portable hand-operated devices without means for supporting or locating the articles to be stamped, i.e. hand stamps; Inking devices or other accessories therefor
    • B41K1/02—Portable hand-operated devices without means for supporting or locating the articles to be stamped, i.e. hand stamps; Inking devices or other accessories therefor with one or more flat stamping surfaces having fixed images
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y40/00—Manufacture or treatment of nanostructures
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0015—Production of aperture devices, microporous systems or stamps
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/48—Manufacture or treatment of parts, e.g. containers, prior to assembly of the devices, using processes not provided for in a single one of the subgroups H01L21/06 - H01L21/326
    • H01L21/4803—Insulating or insulated parts, e.g. mountings, containers, diamond heatsinks

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Nanotechnology (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Manufacturing & Machinery (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Mathematical Physics (AREA)
  • Theoretical Computer Science (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
DE60118843T 2000-02-07 2001-01-10 Stempel für ein lithographisches verfahren, methode zur stempelherstellung und methode zur herstellung einer gemusterten schicht auf einem substrat Expired - Fee Related DE60118843T2 (de)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
EP00200398 2000-02-07
EP00200398 2000-02-07
PCT/EP2001/000198 WO2001059523A1 (en) 2000-02-07 2001-01-10 Stamp for use in a lithographic process, method of manufacturing a stamp, and method of manufacturing a patterned layer on a substrate

Publications (2)

Publication Number Publication Date
DE60118843D1 true DE60118843D1 (de) 2006-05-24
DE60118843T2 DE60118843T2 (de) 2006-11-30

Family

ID=8170986

Family Applications (1)

Application Number Title Priority Date Filing Date
DE60118843T Expired - Fee Related DE60118843T2 (de) 2000-02-07 2001-01-10 Stempel für ein lithographisches verfahren, methode zur stempelherstellung und methode zur herstellung einer gemusterten schicht auf einem substrat

Country Status (6)

Country Link
US (1) US7410592B2 (de)
EP (1) EP1171800B1 (de)
JP (1) JP2003522653A (de)
DE (1) DE60118843T2 (de)
TW (1) TW562754B (de)
WO (1) WO2001059523A1 (de)

Families Citing this family (22)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20040195202A1 (en) * 2000-04-28 2004-10-07 Alexander Pechenik Method for making a nano-stamp and for forming, with the stamp, nano-size elements on a substrate
SE516414C2 (sv) * 2000-05-24 2002-01-15 Obducat Ab Metod vid tillverkning av en mall, samt mallen tillverkad därav
CA2485177C (en) * 2002-05-20 2012-03-06 Dow Corning Corporation Synthesis of inorganic structures using templation and catalysis by self assembled repeat protein polymers
US7361731B2 (en) 2002-05-20 2008-04-22 Genencor International, Inc. Peptide derivatives, and their use for the synthesis of silicon-based composite materials
WO2003099463A2 (en) * 2002-05-27 2003-12-04 Koninklijke Philips Electronics N.V. Method and device for transferring a pattern from a stamp to a substrate
JP2006509870A (ja) * 2002-12-13 2006-03-23 コーニンクレッカ　フィリップス　エレクトロニクス　エヌ　ヴィ 反応性混合物のｕｖ光開始又は熱硬化処理を実行することによって得られるレプリカのみならず、レプリカを製造する方法
US7297678B2 (en) * 2003-03-12 2007-11-20 Genencor International, Inc. Use of repeat sequence protein polymers in personal care compositions
US20050142094A1 (en) * 2003-03-12 2005-06-30 Manoj Kumar Use of repeat sequence protein polymers in personal care compositions
US20040234609A1 (en) * 2003-05-14 2004-11-25 Collier Katherine D. Repeat sequence protein polymer active agent congjugates, methods and uses
US7456147B2 (en) * 2003-05-14 2008-11-25 Dow Corning, Corporation Controlled release of active agents utilizing repeat sequence protein polymers
FI20030919A (fi) * 2003-06-19 2004-12-20 Avantone Oy Menetelmä ja laitteisto elektronisen ohutkalvokomponentin valmistamiseksi sekä elektroninen ohutkalvokomponentti
JP2007505747A (ja) * 2003-09-17 2007-03-15 ナノコムス・パテンツ・リミテッド マイクロ構造デバイス及びその製造方法
GB0323903D0 (en) * 2003-10-11 2003-11-12 Koninkl Philips Electronics Nv Elastomeric stamp,patterning method using such a stamp and method for producing such a stamp
CN100395121C (zh) * 2004-11-19 2008-06-18 鸿富锦精密工业（深圳）有限公司 热压印方法
CN100468814C (zh) * 2004-12-15 2009-03-11 鸿富锦精密工业（深圳）有限公司 有机发光显示器
US7363854B2 (en) 2004-12-16 2008-04-29 Asml Holding N.V. System and method for patterning both sides of a substrate utilizing imprint lithography
US7331283B2 (en) 2004-12-16 2008-02-19 Asml Holding N.V. Method and apparatus for imprint pattern replication
US7410591B2 (en) 2004-12-16 2008-08-12 Asml Holding N.V. Method and system for making a nano-plate for imprint lithography
US7399422B2 (en) 2005-11-29 2008-07-15 Asml Holding N.V. System and method for forming nanodisks used in imprint lithography and nanodisk and memory disk formed thereby
US7409759B2 (en) 2004-12-16 2008-08-12 Asml Holding N.V. Method for making a computer hard drive platen using a nano-plate
US9122148B2 (en) * 2008-11-03 2015-09-01 Canon Nanotechnologies, Inc. Master template replication
DE102012112030A1 (de) 2012-12-10 2014-06-12 Ev Group E. Thallner Gmbh Verfahren zum Mikrokontaktprägen

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4041114A (en) * 1975-07-03 1977-08-09 Personal Communications, Inc. Indent duplicating process
US5201987A (en) * 1990-06-04 1993-04-13 Xerox Corporation Fabricating method for silicon structures
WO1992001973A2 (en) * 1990-07-20 1992-02-06 Mcgrew Stephen P Embossing tool
US5512131A (en) * 1993-10-04 1996-04-30 President And Fellows Of Harvard College Formation of microstamped patterns on surfaces and derivative articles
US5900160A (en) * 1993-10-04 1999-05-04 President And Fellows Of Harvard College Methods of etching articles via microcontact printing
US5855755A (en) * 1995-06-19 1999-01-05 Lynntech, Inc. Method of manufacturing passive elements using conductive polypyrrole formulations
WO1997006013A1 (en) * 1995-08-04 1997-02-20 International Business Machines Corporation Lithographic surface or thin layer modification
JP3372258B2 (ja) * 1995-08-04 2003-01-27 インターナシヨナル・ビジネス・マシーンズ・コーポレーシヨン リソグラフィ・プロセス用のスタンプ
US5772905A (en) * 1995-11-15 1998-06-30 Regents Of The University Of Minnesota Nanoimprint lithography
WO1997018944A1 (en) * 1995-11-22 1997-05-29 The Government Of The United States Of America, Represented By The Secretary Of The Navy Patterned conducting polymer surfaces and process for preparing the same and devices containing the same
US5861113A (en) * 1996-08-01 1999-01-19 The United States Of America As Represented By The Secretary Of Commerce Fabrication of embossed diffractive optics with reusable release agent
US6020047A (en) * 1996-09-04 2000-02-01 Kimberly-Clark Worldwide, Inc. Polymer films having a printed self-assembling monolayer
US5937758A (en) * 1997-11-26 1999-08-17 Motorola, Inc. Micro-contact printing stamp
US6413587B1 (en) * 1999-03-02 2002-07-02 International Business Machines Corporation Method for forming polymer brush pattern on a substrate surface

Also Published As

Publication number Publication date
US20010027570A1 (en) 2001-10-04
EP1171800B1 (de) 2006-04-19
DE60118843T2 (de) 2006-11-30
EP1171800A1 (de) 2002-01-16
US7410592B2 (en) 2008-08-12
TW562754B (en) 2003-11-21
WO2001059523A1 (en) 2001-08-16
JP2003522653A (ja) 2003-07-29

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee