DE60118216D1 - Verfahren zur thermischen behandlung von synthetischem quarzglas für optische verwendung - Google Patents

Verfahren zur thermischen behandlung von synthetischem quarzglas für optische verwendung

Info

Publication number
DE60118216D1
DE60118216D1 DE60118216T DE60118216T DE60118216D1 DE 60118216 D1 DE60118216 D1 DE 60118216D1 DE 60118216 T DE60118216 T DE 60118216T DE 60118216 T DE60118216 T DE 60118216T DE 60118216 D1 DE60118216 D1 DE 60118216D1
Authority
DE
Germany
Prior art keywords
quartz glass
thermal treatment
synthetic quartz
optical use
optical
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE60118216T
Other languages
English (en)
Other versions
DE60118216T2 (de
Inventor
Tetsuji Ueda
Hiroyuki Nishimura
Akira Fujinoki
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Heraeus Quarzglas GmbH and Co KG
Shin Etsu Quartz Products Co Ltd
Original Assignee
Heraeus Quarzglas GmbH and Co KG
Shin Etsu Quartz Products Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Heraeus Quarzglas GmbH and Co KG, Shin Etsu Quartz Products Co Ltd filed Critical Heraeus Quarzglas GmbH and Co KG
Publication of DE60118216D1 publication Critical patent/DE60118216D1/de
Application granted granted Critical
Publication of DE60118216T2 publication Critical patent/DE60118216T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C23/00—Other surface treatment of glass not in the form of fibres or filaments
    • C03C23/007—Other surface treatment of glass not in the form of fibres or filaments by thermal treatment
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B19/00—Other methods of shaping glass
    • C03B19/14—Other methods of shaping glass by gas- or vapour- phase reaction processes
    • C03B19/1453—Thermal after-treatment of the shaped article, e.g. dehydrating, consolidating, sintering
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B32/00—Thermal after-treatment of glass products not provided for in groups C03B19/00, C03B25/00 - C03B31/00 or C03B37/00, e.g. crystallisation, eliminating gas inclusions or other impurities; Hot-pressing vitrified, non-porous, shaped glass products
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2201/00—Type of glass produced
    • C03B2201/02—Pure silica glass, e.g. pure fused quartz
    • C03B2201/03—Impurity concentration specified
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S65/00—Glass manufacturing
    • Y10S65/90—Drying, dehydration, minimizing oh groups

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Organic Chemistry (AREA)
  • Thermal Sciences (AREA)
  • Materials Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Manufacturing & Machinery (AREA)
  • Glass Compositions (AREA)
  • Glass Melting And Manufacturing (AREA)
DE60118216T 2000-06-06 2001-05-31 Verfahren zur thermischen behandlung von synthetischem quarzglas für optische verwendung Expired - Lifetime DE60118216T2 (de)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2000168982A JP4462720B2 (ja) 2000-06-06 2000-06-06 光学用合成石英ガラスの熱処理方法
JP2000168982 2000-06-06
PCT/EP2001/006179 WO2001094267A2 (en) 2000-06-06 2001-05-31 Method for heat treating synthetic quartz glass for optical use, heat treatment apparatus for the same, and synthetic quartz glass for optical use

Publications (2)

Publication Number Publication Date
DE60118216D1 true DE60118216D1 (de) 2006-05-11
DE60118216T2 DE60118216T2 (de) 2006-08-31

Family

ID=18671915

Family Applications (1)

Application Number Title Priority Date Filing Date
DE60118216T Expired - Lifetime DE60118216T2 (de) 2000-06-06 2001-05-31 Verfahren zur thermischen behandlung von synthetischem quarzglas für optische verwendung

Country Status (5)

Country Link
US (1) US7093465B2 (de)
EP (1) EP1289896B1 (de)
JP (1) JP4462720B2 (de)
DE (1) DE60118216T2 (de)
WO (1) WO2001094267A2 (de)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4549008B2 (ja) * 2002-05-17 2010-09-22 信越石英株式会社 水素ドープシリカ粉及びそれを用いたシリコン単結晶引上げ用石英ガラスルツボ
JP5627077B2 (ja) * 2010-04-01 2014-11-19 信越石英株式会社 合成シリカガラス体の熱処理方法及び合成シリカガラス製光学部材
CN102627393A (zh) * 2012-04-28 2012-08-08 张家港市云雾实业有限公司 香水玻璃瓶保温炉

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0776098B2 (ja) * 1985-10-29 1995-08-16 旭硝子株式会社 高純度石英ガラスの製造方法
JPS63218522A (ja) * 1987-03-06 1988-09-12 Tosoh Corp 石英ガラス中の歪の除去方法
JP3336761B2 (ja) * 1994-09-09 2002-10-21 住友金属工業株式会社 光透過用合成石英ガラスの製造方法
JP3972374B2 (ja) * 1994-09-26 2007-09-05 東ソー株式会社 シリカガラスのアニール方法
JP3674793B2 (ja) * 1995-10-31 2005-07-20 信越石英株式会社 紫外線レーザ用石英ガラス光学部材の製造方法
JPH10279322A (ja) * 1997-04-03 1998-10-20 Nikon Corp 石英ガラスの熱処理方法および熱処理装置
KR100554091B1 (ko) 1997-12-08 2006-05-16 가부시키가이샤 니콘 엑시머레이저내성을향상시킨석영글래스의제조방법및석영글래스부재
US6578382B2 (en) * 2000-03-29 2003-06-17 Heraeus Quarzglas Gmbh & Co. Kg Synthetic quartz glass for optical use, heat treatment method and heat treatment apparatus for the same

Also Published As

Publication number Publication date
WO2001094267A2 (en) 2001-12-13
US7093465B2 (en) 2006-08-22
US20030131631A1 (en) 2003-07-17
JP4462720B2 (ja) 2010-05-12
EP1289896B1 (de) 2006-03-22
JP2001348237A (ja) 2001-12-18
EP1289896A2 (de) 2003-03-12
WO2001094267A3 (en) 2002-06-13
DE60118216T2 (de) 2006-08-31

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