DE60106972D1 - Verfahren zur herstellung von verstärkten waferpolierkissen und diese verfahren implementierende vorrichtungen - Google Patents
Verfahren zur herstellung von verstärkten waferpolierkissen und diese verfahren implementierende vorrichtungenInfo
- Publication number
- DE60106972D1 DE60106972D1 DE60106972T DE60106972T DE60106972D1 DE 60106972 D1 DE60106972 D1 DE 60106972D1 DE 60106972 T DE60106972 T DE 60106972T DE 60106972 T DE60106972 T DE 60106972T DE 60106972 D1 DE60106972 D1 DE 60106972D1
- Authority
- DE
- Germany
- Prior art keywords
- pillows
- wafer polishing
- devices implementing
- producing reinforced
- reinforced wafer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B37/00—Lapping machines or devices; Accessories
- B24B37/11—Lapping tools
- B24B37/20—Lapping pads for working plane surfaces
- B24B37/22—Lapping pads for working plane surfaces characterised by a multi-layered structure
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic System or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
- H01L21/304—Mechanical treatment, e.g. grinding, polishing, cutting
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B37/00—Lapping machines or devices; Accessories
- B24B37/11—Lapping tools
- B24B37/20—Lapping pads for working plane surfaces
- B24B37/26—Lapping pads for working plane surfaces characterised by the shape of the lapping pad surface, e.g. grooved
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24D—TOOLS FOR GRINDING, BUFFING OR SHARPENING
- B24D11/00—Constructional features of flexible abrasive materials; Special features in the manufacture of such materials
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24D—TOOLS FOR GRINDING, BUFFING OR SHARPENING
- B24D18/00—Manufacture of grinding tools or other grinding devices, e.g. wheels, not otherwise provided for
- B24D18/0009—Manufacture of grinding tools or other grinding devices, e.g. wheels, not otherwise provided for using moulds or presses
Landscapes
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Manufacturing & Machinery (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
- Mechanical Treatment Of Semiconductor (AREA)
Applications Claiming Priority (5)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US752509 | 1985-07-08 | ||
US752703 | 2000-12-27 | ||
US09/752,509 US6561889B1 (en) | 2000-12-27 | 2000-12-27 | Methods for making reinforced wafer polishing pads and apparatuses implementing the same |
US09/752,703 US6572463B1 (en) | 2000-12-27 | 2000-12-27 | Methods for making reinforced wafer polishing pads utilizing direct casting and apparatuses implementing the same |
PCT/US2001/047219 WO2002051587A1 (en) | 2000-12-27 | 2001-12-07 | Methods for making reinforced wafer polshing pads and apparatuses implementing the same |
Publications (2)
Publication Number | Publication Date |
---|---|
DE60106972D1 true DE60106972D1 (de) | 2004-12-09 |
DE60106972T2 DE60106972T2 (de) | 2005-11-03 |
Family
ID=27115606
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE60106972T Expired - Fee Related DE60106972T2 (de) | 2000-12-27 | 2001-12-07 | Verfahren zur herstellung von verstärkten waferpolierkissen und diese verfahren implementierende vorrichtungen |
Country Status (7)
Country | Link |
---|---|
EP (1) | EP1345733B1 (de) |
JP (1) | JP2004524676A (de) |
KR (1) | KR20040015043A (de) |
CN (1) | CN1209229C (de) |
DE (1) | DE60106972T2 (de) |
TW (1) | TW558481B (de) |
WO (1) | WO2002051587A1 (de) |
Families Citing this family (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP4884726B2 (ja) | 2005-08-30 | 2012-02-29 | 東洋ゴム工業株式会社 | 積層研磨パッドの製造方法 |
US8087975B2 (en) | 2007-04-30 | 2012-01-03 | San Fang Chemical Industry Co., Ltd. | Composite sheet for mounting a workpiece and the method for making the same |
JP4593643B2 (ja) | 2008-03-12 | 2010-12-08 | 東洋ゴム工業株式会社 | 研磨パッド |
WO2009139401A1 (ja) * | 2008-05-16 | 2009-11-19 | 東レ株式会社 | 研磨パッド |
TWI410299B (zh) | 2009-08-24 | 2013-10-01 | Bestac Advanced Material Co Ltd | 研磨墊與其應用及其製造方法 |
CN102990535A (zh) * | 2012-11-27 | 2013-03-27 | 无锡市彩云机械设备有限公司 | 一种抛光垫 |
CN103722500A (zh) * | 2013-11-27 | 2014-04-16 | 苏州道众机械制造有限公司 | 磨削砂带 |
US10946495B2 (en) * | 2015-01-30 | 2021-03-16 | Cmc Materials, Inc. | Low density polishing pad |
CN106245089B (zh) * | 2016-09-09 | 2017-11-17 | 广东欧珀移动通信有限公司 | 一种铝合金阳极氧化后的高光工艺和铝合金制品 |
KR102318482B1 (ko) * | 2017-03-24 | 2021-10-29 | 주식회사 케이씨텍 | 연마 패드 및 이를 구비하는 기판 연마 장치, 연마 패드의 제조 방법 |
CN113714928B (zh) * | 2021-08-23 | 2023-05-05 | 武汉华星光电半导体显示技术有限公司 | 一种研磨盘及基板清洁装置 |
Family Cites Families (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CA2036247A1 (en) * | 1990-03-29 | 1991-09-30 | Jeffrey L. Berger | Nonwoven surface finishing articles reinforced with a polymer backing layer and method of making same |
US5897424A (en) * | 1995-07-10 | 1999-04-27 | The United States Of America As Represented By The Secretary Of Commerce | Renewable polishing lap |
US5807161A (en) * | 1996-03-15 | 1998-09-15 | Minnesota Mining And Manufacturing Company | Reversible back-up pad |
US6328642B1 (en) * | 1997-02-14 | 2001-12-11 | Lam Research Corporation | Integrated pad and belt for chemical mechanical polishing |
US6146248A (en) * | 1997-05-28 | 2000-11-14 | Lam Research Corporation | Method and apparatus for in-situ end-point detection and optimization of a chemical-mechanical polishing process using a linear polisher |
US6290589B1 (en) * | 1998-12-09 | 2001-09-18 | Applied Materials, Inc. | Polishing pad with a partial adhesive coating |
-
2001
- 2001-12-07 CN CNB018215181A patent/CN1209229C/zh not_active Expired - Fee Related
- 2001-12-07 WO PCT/US2001/047219 patent/WO2002051587A1/en active IP Right Grant
- 2001-12-07 KR KR10-2003-7008573A patent/KR20040015043A/ko not_active Application Discontinuation
- 2001-12-07 DE DE60106972T patent/DE60106972T2/de not_active Expired - Fee Related
- 2001-12-07 EP EP01995441A patent/EP1345733B1/de not_active Expired - Lifetime
- 2001-12-07 JP JP2002552714A patent/JP2004524676A/ja active Pending
- 2001-12-25 TW TW090132475A patent/TW558481B/zh not_active IP Right Cessation
Also Published As
Publication number | Publication date |
---|---|
DE60106972T2 (de) | 2005-11-03 |
WO2002051587A1 (en) | 2002-07-04 |
EP1345733B1 (de) | 2004-11-03 |
CN1209229C (zh) | 2005-07-06 |
EP1345733A1 (de) | 2003-09-24 |
KR20040015043A (ko) | 2004-02-18 |
CN1482958A (zh) | 2004-03-17 |
JP2004524676A (ja) | 2004-08-12 |
TW558481B (en) | 2003-10-21 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8364 | No opposition during term of opposition | ||
8339 | Ceased/non-payment of the annual fee |