DE60103772D1 - Entferner von unerwünschtem randmaterial für photoresists - Google Patents

Entferner von unerwünschtem randmaterial für photoresists

Info

Publication number
DE60103772D1
DE60103772D1 DE60103772T DE60103772T DE60103772D1 DE 60103772 D1 DE60103772 D1 DE 60103772D1 DE 60103772 T DE60103772 T DE 60103772T DE 60103772 T DE60103772 T DE 60103772T DE 60103772 D1 DE60103772 D1 DE 60103772D1
Authority
DE
Germany
Prior art keywords
photoresists
remove unwanted
edge material
unwanted edge
remove
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE60103772T
Other languages
English (en)
Other versions
DE60103772T2 (de
Inventor
E Oberlander
Craig Traynor
S Sison
Jeff Griffin
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Clariant International Ltd
Original Assignee
Clariant International Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Clariant International Ltd filed Critical Clariant International Ltd
Application granted granted Critical
Publication of DE60103772D1 publication Critical patent/DE60103772D1/de
Publication of DE60103772T2 publication Critical patent/DE60103772T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/16—Coating processes; Apparatus therefor
    • G03F7/162—Coating on a rotating support, e.g. using a whirler or a spinner

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Materials For Photolithography (AREA)
DE60103772T 2000-10-20 2001-10-09 Entferner von unerwünschtem randmaterial für photoresists Expired - Lifetime DE60103772T2 (de)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US693215 1991-04-30
US09/693,215 US6524775B1 (en) 2000-10-20 2000-10-20 Edge bead remover for thick film photoresists
PCT/EP2001/011637 WO2002035287A2 (en) 2000-10-20 2001-10-09 Edge bead remover for thick film photoresists

Publications (2)

Publication Number Publication Date
DE60103772D1 true DE60103772D1 (de) 2004-07-15
DE60103772T2 DE60103772T2 (de) 2005-07-21

Family

ID=24783784

Family Applications (1)

Application Number Title Priority Date Filing Date
DE60103772T Expired - Lifetime DE60103772T2 (de) 2000-10-20 2001-10-09 Entferner von unerwünschtem randmaterial für photoresists

Country Status (6)

Country Link
US (1) US6524775B1 (de)
EP (1) EP1328846B1 (de)
DE (1) DE60103772T2 (de)
MY (1) MY118063A (de)
TW (1) TW554241B (de)
WO (1) WO2002035287A2 (de)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE10153496B4 (de) * 2001-10-31 2007-01-04 Infineon Technologies Ag Verfahren zur Aromatisierung und Cycloaliphatisierung von Fotoresists im UV-Bereich
US7105431B2 (en) * 2003-08-22 2006-09-12 Micron Technology, Inc. Masking methods
US7354631B2 (en) 2003-11-06 2008-04-08 Micron Technology, Inc. Chemical vapor deposition apparatus and methods
US7115524B2 (en) * 2004-05-17 2006-10-03 Micron Technology, Inc. Methods of processing a semiconductor substrate
US7371361B2 (en) * 2004-11-03 2008-05-13 Kellogg Brown & Root Llc Maximum reaction rate converter system for exothermic reactions
JP4236198B2 (ja) * 2004-12-28 2009-03-11 東京応化工業株式会社 リソグラフィー用洗浄液及びそれを用いた半導体基材形成方法
WO2022040236A1 (en) * 2020-08-19 2022-02-24 The Regents Of The University Of California Free-standing lithium phosphorus oxynitride thin films and methods of their manufacture

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5151219A (en) 1988-01-06 1992-09-29 Ocg Microelectronic Materials, Inc. Use of particular mixtures of ethyl lactate and methyl ethyl ketone to remove undesirable peripheral material (e.g. edge beads) from photoresist-coated substrates
US4886728A (en) 1988-01-06 1989-12-12 Olin Hunt Specialty Products Inc. Use of particular mixtures of ethyl lactate and methyl ethyl ketone to remove undesirable peripheral material (e.g. edge beads) from photoresist-coated substrates
US5122440A (en) * 1988-09-06 1992-06-16 Chien Chung Ping Ultraviolet curing of photosensitive polyimides
US5362608A (en) * 1992-08-24 1994-11-08 Brewer Science, Inc. Microlithographic substrate cleaning and compositions therefor
US5814433A (en) * 1996-05-17 1998-09-29 Clariant Finance (Bvi) Limited Use of mixtures of ethyl lactate and N-methyl pyrollidone as an edge bead remover for photoresists
JPH11202492A (ja) 1998-01-14 1999-07-30 Daicel Chem Ind Ltd ポジ型レジスト用塗布組成物、及びポジ型レジストパターンの形成方法
JPH11202479A (ja) 1998-01-14 1999-07-30 Daicel Chem Ind Ltd ポジ型ホトレジスト用塗布組成物、及びポジ型レジストパターンの形成方法
JP4017731B2 (ja) 1998-02-02 2007-12-05 ダイセル化学工業株式会社 レジストの洗浄除去用溶剤、及び電子部品用基材の製造法

Also Published As

Publication number Publication date
US6524775B1 (en) 2003-02-25
TW554241B (en) 2003-09-21
WO2002035287A2 (en) 2002-05-02
EP1328846B1 (de) 2004-06-09
MY118063A (en) 2004-08-30
DE60103772T2 (de) 2005-07-21
EP1328846A2 (de) 2003-07-23
WO2002035287A3 (en) 2002-08-22

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition