DE60103178T2 - Vorrichtung zur plasma-gasbehandlung - Google Patents

Vorrichtung zur plasma-gasbehandlung Download PDF

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Publication number
DE60103178T2
DE60103178T2 DE60103178T DE60103178T DE60103178T2 DE 60103178 T2 DE60103178 T2 DE 60103178T2 DE 60103178 T DE60103178 T DE 60103178T DE 60103178 T DE60103178 T DE 60103178T DE 60103178 T2 DE60103178 T2 DE 60103178T2
Authority
DE
Germany
Prior art keywords
large face
gas
plasma
making
injector
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE60103178T
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English (en)
Other versions
DE60103178D1 (de
Inventor
Michel Moisan
Zenon Zakrzewski
Danielle Keroack
Jean-Christophe Rostaing
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Air Liquide SA
LAir Liquide SA pour lEtude et lExploitation des Procedes Georges Claude
Original Assignee
Air Liquide SA
LAir Liquide SA a Directoire et Conseil de Surveillance pour lEtude et lExploitation des Procedes Georges Claude
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Air Liquide SA, LAir Liquide SA a Directoire et Conseil de Surveillance pour lEtude et lExploitation des Procedes Georges Claude filed Critical Air Liquide SA
Application granted granted Critical
Publication of DE60103178D1 publication Critical patent/DE60103178D1/de
Publication of DE60103178T2 publication Critical patent/DE60103178T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J19/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J19/08—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor
    • B01J19/12—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor employing electromagnetic waves
    • B01J19/122—Incoherent waves
    • B01J19/126—Microwaves
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
    • B01D53/32—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols by electrical effects other than those provided for in group B01D61/00
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J19/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J19/08—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor
    • B01J19/087—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor employing electric or magnetic energy
    • B01J19/088—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor employing electric or magnetic energy giving rise to electric discharges
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32192—Microwave generated discharge
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/26—Plasma torches
    • H05H1/30—Plasma torches using applied electromagnetic fields, e.g. high frequency or microwave energy
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D2259/00—Type of treatment
    • B01D2259/80—Employing electric, magnetic, electromagnetic or wave energy, or particle radiation
    • B01D2259/806—Microwaves
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D2259/00—Type of treatment
    • B01D2259/80—Employing electric, magnetic, electromagnetic or wave energy, or particle radiation
    • B01D2259/818—Employing electrical discharges or the generation of a plasma
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J2219/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J2219/08—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor
    • B01J2219/0871—Heating or cooling of the reactor
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J2219/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J2219/08—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor
    • B01J2219/0894—Processes carried out in the presence of a plasma
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J2219/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J2219/08—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor
    • B01J2219/12—Processes employing electromagnetic waves
    • B01J2219/1203—Incoherent waves
    • B01J2219/1206—Microwaves
    • B01J2219/1209—Features relating to the reactor or vessel
    • B01J2219/1212—Arrangements of the reactor or the reactors
    • B01J2219/1215—Single reactor
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J2219/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J2219/08—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor
    • B01J2219/12—Processes employing electromagnetic waves
    • B01J2219/1203—Incoherent waves
    • B01J2219/1206—Microwaves
    • B01J2219/1209—Features relating to the reactor or vessel
    • B01J2219/1221—Features relating to the reactor or vessel the reactor per se
    • B01J2219/1224—Form of the reactor
    • B01J2219/123—Vessels in the form of a cup
    • B01J2219/1233—Closure means, such as lids, caps, seals
    • B01J2219/1236—Frames for holding the lid in place
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J2219/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J2219/08—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor
    • B01J2219/12—Processes employing electromagnetic waves
    • B01J2219/1203—Incoherent waves
    • B01J2219/1206—Microwaves
    • B01J2219/1248—Features relating to the microwave cavity
    • B01J2219/1269—Microwave guides
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J2219/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J2219/08—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor
    • B01J2219/12—Processes employing electromagnetic waves
    • B01J2219/1203—Incoherent waves
    • B01J2219/1206—Microwaves
    • B01J2219/1275—Controlling the microwave irradiation variables
    • B01J2219/1281—Frequency
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J2219/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J2219/08—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor
    • B01J2219/12—Processes employing electromagnetic waves
    • B01J2219/1203—Incoherent waves
    • B01J2219/1206—Microwaves
    • B01J2219/1275—Controlling the microwave irradiation variables
    • B01J2219/1284—Intensity
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J2219/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J2219/08—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor
    • B01J2219/12—Processes employing electromagnetic waves
    • B01J2219/1203—Incoherent waves
    • B01J2219/1206—Microwaves
    • B01J2219/1287—Features relating to the microwave source
    • B01J2219/129—Arrangements thereof
    • B01J2219/1293—Single source

Landscapes

  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Analytical Chemistry (AREA)
  • Electromagnetism (AREA)
  • Health & Medical Sciences (AREA)
  • General Health & Medical Sciences (AREA)
  • Toxicology (AREA)
  • Organic Chemistry (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Chemical & Material Sciences (AREA)
  • Oil, Petroleum & Natural Gas (AREA)
  • Plasma Technology (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
  • Incineration Of Waste (AREA)
  • Drying Of Semiconductors (AREA)
DE60103178T 2000-10-27 2001-10-23 Vorrichtung zur plasma-gasbehandlung Expired - Lifetime DE60103178T2 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
FR0013840A FR2815888B1 (fr) 2000-10-27 2000-10-27 Dispositif de traitement de gaz par plasma
PCT/FR2001/003293 WO2002035575A1 (fr) 2000-10-27 2001-10-23 Dispositif de traitement de gaz par plasma

Publications (2)

Publication Number Publication Date
DE60103178D1 DE60103178D1 (de) 2004-06-09
DE60103178T2 true DE60103178T2 (de) 2005-04-21

Family

ID=8855829

Family Applications (1)

Application Number Title Priority Date Filing Date
DE60103178T Expired - Lifetime DE60103178T2 (de) 2000-10-27 2001-10-23 Vorrichtung zur plasma-gasbehandlung

Country Status (12)

Country Link
US (1) US6916400B2 (de)
EP (1) EP1332511B1 (de)
JP (1) JP4339588B2 (de)
KR (1) KR100858396B1 (de)
AT (1) ATE266257T1 (de)
AU (1) AU2002214089A1 (de)
DE (1) DE60103178T2 (de)
ES (1) ES2219573T3 (de)
FR (1) FR2815888B1 (de)
PT (1) PT1332511E (de)
TW (1) TW519856B (de)
WO (1) WO2002035575A1 (de)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9265138B2 (en) 2012-08-28 2016-02-16 Agilent Technologies, Inc. Electromagnetic waveguide and plasma source

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GB0309932D0 (en) * 2003-04-30 2003-06-04 Boc Group Plc Apparatus and method for forming a plasma
US7282244B2 (en) * 2003-09-05 2007-10-16 General Electric Company Replaceable plate expanded thermal plasma apparatus and method
US20050163696A1 (en) * 2004-01-28 2005-07-28 Uhm Han S. Synthesis of carbon nanotubes by making use of microwave plasma torch
US7164095B2 (en) * 2004-07-07 2007-01-16 Noritsu Koki Co., Ltd. Microwave plasma nozzle with enhanced plume stability and heating efficiency
US20060052883A1 (en) * 2004-09-08 2006-03-09 Lee Sang H System and method for optimizing data acquisition of plasma using a feedback control module
US20070228008A1 (en) * 2004-12-06 2007-10-04 University Of Houston Medium pressure plasma system for removal of surface layers without substrate loss
ATE383063T1 (de) * 2005-04-29 2008-01-15 Alter Srl Plasmaerzeuger
GB0521830D0 (en) * 2005-10-26 2005-12-07 Boc Group Plc Plasma reactor
US7679024B2 (en) * 2005-12-23 2010-03-16 Lam Research Corporation Highly efficient gas distribution arrangement for plasma tube of a plasma processing chamber
US7562638B2 (en) * 2005-12-23 2009-07-21 Lam Research Corporation Methods and arrangement for implementing highly efficient plasma traps
US7554053B2 (en) * 2005-12-23 2009-06-30 Lam Research Corporation Corrugated plasma trap arrangement for creating a highly efficient downstream microwave plasma system
US7369320B2 (en) * 2005-12-30 2008-05-06 3M Innovative Properties Company Projection system with beam homogenizer
TW200742506A (en) * 2006-02-17 2007-11-01 Noritsu Koki Co Ltd Plasma generation apparatus and work process apparatus
US20100074810A1 (en) * 2008-09-23 2010-03-25 Sang Hun Lee Plasma generating system having tunable plasma nozzle
US7921804B2 (en) * 2008-12-08 2011-04-12 Amarante Technologies, Inc. Plasma generating nozzle having impedance control mechanism
US20100201272A1 (en) * 2009-02-09 2010-08-12 Sang Hun Lee Plasma generating system having nozzle with electrical biasing
US20100254853A1 (en) * 2009-04-06 2010-10-07 Sang Hun Lee Method of sterilization using plasma generated sterilant gas
US10658161B2 (en) * 2010-10-15 2020-05-19 Applied Materials, Inc. Method and apparatus for reducing particle defects in plasma etch chambers
TWI603913B (zh) * 2012-12-13 2017-11-01 財團法人工業技術研究院 石墨烯片的形成裝置與形成方法
US9247629B2 (en) * 2013-03-15 2016-01-26 Agilent Technologies, Inc. Waveguide-based apparatus for exciting and sustaining a plasma
US9427821B2 (en) * 2013-03-15 2016-08-30 Agilent Technologies, Inc. Integrated magnetron plasma torch, and related methods
US11939477B2 (en) 2014-01-30 2024-03-26 Monolith Materials, Inc. High temperature heat integration method of making carbon black
US10138378B2 (en) 2014-01-30 2018-11-27 Monolith Materials, Inc. Plasma gas throat assembly and method
US10370539B2 (en) 2014-01-30 2019-08-06 Monolith Materials, Inc. System for high temperature chemical processing
US10100200B2 (en) 2014-01-30 2018-10-16 Monolith Materials, Inc. Use of feedstock in carbon black plasma process
PL3100597T3 (pl) * 2014-01-31 2023-10-23 Monolith Materials, Inc. Palnik plazmowy z elektrodami grafitowymi
MX2017009982A (es) 2015-02-03 2018-01-25 Monolith Mat Inc Metodo y dispositivo de enfriamiento regenerativo.
TWI539043B (zh) * 2015-07-21 2016-06-21 財團法人工業技術研究院 石墨烯花的形成方法
CA3032246C (en) 2015-07-29 2023-12-12 Monolith Materials, Inc. Dc plasma torch electrical power design method and apparatus
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CA3060482C (en) 2016-04-29 2023-04-11 Monolith Materials, Inc. Secondary heat addition to particle production process and apparatus
CN109642090A (zh) 2016-04-29 2019-04-16 巨石材料公司 炬针方法和设备
WO2018067814A1 (en) 2016-10-06 2018-04-12 Lyten, Inc. Microwave reactor system with gas-solids separation
US9812295B1 (en) 2016-11-15 2017-11-07 Lyten, Inc. Microwave chemical processing
US9997334B1 (en) 2017-02-09 2018-06-12 Lyten, Inc. Seedless particles with carbon allotropes
US9767992B1 (en) * 2017-02-09 2017-09-19 Lyten, Inc. Microwave chemical processing reactor
CA3055830A1 (en) 2017-03-08 2018-09-13 Monolith Materials, Inc. Systems and methods of making carbon particles with thermal transfer gas
US10920035B2 (en) 2017-03-16 2021-02-16 Lyten, Inc. Tuning deformation hysteresis in tires using graphene
CN110418816B (zh) 2017-03-16 2022-05-31 利腾股份有限公司 碳和弹性体整合
US9862606B1 (en) 2017-03-27 2018-01-09 Lyten, Inc. Carbon allotropes
CN115637064A (zh) 2017-04-20 2023-01-24 巨石材料公司 颗粒系统和方法
US10465128B2 (en) 2017-09-20 2019-11-05 Lyten, Inc. Cracking of a process gas
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WO2019126196A1 (en) 2017-12-22 2019-06-27 Lyten, Inc. Structured composite materials
KR20200103788A (ko) 2018-01-04 2020-09-02 라이텐, 인코포레이티드 공진 가스 센서
WO2019143559A1 (en) 2018-01-16 2019-07-25 Lyten, Inc. Microwave transparent pressure barrier
CN112867702A (zh) 2018-08-23 2021-05-28 转化材料有限公司 处理气体的系统和方法
US11633710B2 (en) 2018-08-23 2023-04-25 Transform Materials Llc Systems and methods for processing gases
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CN111465161B (zh) * 2020-03-18 2023-06-02 苏州迈微能等离子科技有限公司 一种常压自点火式微波等离子炬及微波等离子发生系统
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FR2533397A2 (fr) * 1982-09-16 1984-03-23 Anvar Perfectionnements aux torches a plasma
FR2751565B1 (fr) * 1996-07-26 1998-09-04 Air Liquide Procede et installation de traitement de gaz perfluores et hydrofluorocarbones en vue de leur destruction
FR2757082B1 (fr) * 1996-12-13 1999-01-15 Air Liquide Procede d'epuration d'un gaz plasmagene et installation pour la mise en oeuvre d'un tel procede
FR2762748B1 (fr) * 1997-04-25 1999-06-11 Air Liquide Dispositif d'excitation d'un gaz par plasma d'onde de surface
FR2766321B1 (fr) 1997-07-16 1999-09-03 Air Liquide Dispositif d'excitation d'un gaz par plasma d'onde de surface
FR2787677B1 (fr) * 1998-12-22 2001-01-19 Air Liquide Element de canalisation pour dispositif de traitement de gaz et dispositif incorporant un tel element de canalisation

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9265138B2 (en) 2012-08-28 2016-02-16 Agilent Technologies, Inc. Electromagnetic waveguide and plasma source

Also Published As

Publication number Publication date
AU2002214089A1 (en) 2002-05-06
EP1332511B1 (de) 2004-05-06
JP2004512648A (ja) 2004-04-22
PT1332511E (pt) 2004-09-30
TW519856B (en) 2003-02-01
DE60103178D1 (de) 2004-06-09
EP1332511A1 (de) 2003-08-06
ATE266257T1 (de) 2004-05-15
WO2002035575A1 (fr) 2002-05-02
KR20040005851A (ko) 2004-01-16
FR2815888B1 (fr) 2003-05-30
ES2219573T3 (es) 2004-12-01
JP4339588B2 (ja) 2009-10-07
US20020050323A1 (en) 2002-05-02
US6916400B2 (en) 2005-07-12
FR2815888A1 (fr) 2002-05-03
KR100858396B1 (ko) 2008-09-11

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