DE60041353D1 - SPUTTERTARGET, TRANSPARENT CONDUCTIVE OXID AND PREPARATION PROCESS FOR SPUTTERTARGET - Google Patents

SPUTTERTARGET, TRANSPARENT CONDUCTIVE OXID AND PREPARATION PROCESS FOR SPUTTERTARGET

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Publication number
DE60041353D1
DE60041353D1 DE60041353T DE60041353T DE60041353D1 DE 60041353 D1 DE60041353 D1 DE 60041353D1 DE 60041353 T DE60041353 T DE 60041353T DE 60041353 T DE60041353 T DE 60041353T DE 60041353 D1 DE60041353 D1 DE 60041353D1
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DE
Germany
Prior art keywords
sputtertarget
transparent conductive
preparation process
oxid
conductive oxid
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE60041353T
Other languages
German (de)
Inventor
Kazuyoshi Inoue
Tadao Shibuya
Akira Kaijo
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Idemitsu Kosan Co Ltd
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Idemitsu Kosan Co Ltd
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Filing date
Publication date
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Publication of DE60041353D1 publication Critical patent/DE60041353D1/en
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Expired - Lifetime legal-status Critical Current

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    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
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    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target
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    • C04B2235/00—Aspects relating to ceramic starting mixtures or sintered ceramic products
    • C04B2235/70—Aspects relating to sintered or melt-casted ceramic products
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    • C04B2235/00—Aspects relating to ceramic starting mixtures or sintered ceramic products
    • C04B2235/70—Aspects relating to sintered or melt-casted ceramic products
    • C04B2235/96—Properties of ceramic products, e.g. mechanical properties such as strength, toughness, wear resistance
    • C04B2235/9646—Optical properties
    • C—CHEMISTRY; METALLURGY
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    • C04B2235/00—Aspects relating to ceramic starting mixtures or sintered ceramic products
    • C04B2235/70—Aspects relating to sintered or melt-casted ceramic products
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    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
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    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
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DE60041353T 1999-11-25 2000-11-22 SPUTTERTARGET, TRANSPARENT CONDUCTIVE OXID AND PREPARATION PROCESS FOR SPUTTERTARGET Expired - Lifetime DE60041353D1 (en)

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US6669830B1 (en) 2003-12-30
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HK1050720A1 (en) 2003-07-04
JP2011068993A (en) 2011-04-07
JP5306308B2 (en) 2013-10-02
JP2011190542A (en) 2011-09-29
EP1233082B1 (en) 2009-01-07
EP1752430B1 (en) 2009-06-17
EP1233082A4 (en) 2006-01-25
KR100849258B1 (en) 2008-07-29
EP1777321A1 (en) 2007-04-25
CN1195886C (en) 2005-04-06
KR20080035025A (en) 2008-04-22
EP1752430A1 (en) 2007-02-14
JP4850378B2 (en) 2012-01-11
KR101139203B1 (en) 2012-04-26
DE60042431D1 (en) 2009-07-30
EP1233082A1 (en) 2002-08-21
KR20020069190A (en) 2002-08-29
WO2001038599A1 (en) 2001-05-31
KR20070089755A (en) 2007-08-31
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