DE60037248D1 - Laterale DMOS-Transistoranordnung - Google Patents

Laterale DMOS-Transistoranordnung

Info

Publication number
DE60037248D1
DE60037248D1 DE60037248T DE60037248T DE60037248D1 DE 60037248 D1 DE60037248 D1 DE 60037248D1 DE 60037248 T DE60037248 T DE 60037248T DE 60037248 T DE60037248 T DE 60037248T DE 60037248 D1 DE60037248 D1 DE 60037248D1
Authority
DE
Germany
Prior art keywords
transistor arrangement
dmos transistor
lateral dmos
lateral
arrangement
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE60037248T
Other languages
English (en)
Other versions
DE60037248T2 (de
Inventor
Nicola Zatelli
Massimo Atti
Elisabetta Palumbo
Cosimo Torelli
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
STMicroelectronics SRL
Original Assignee
STMicroelectronics SRL
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by STMicroelectronics SRL filed Critical STMicroelectronics SRL
Application granted granted Critical
Publication of DE60037248D1 publication Critical patent/DE60037248D1/de
Publication of DE60037248T2 publication Critical patent/DE60037248T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
    • H01L29/40Electrodes ; Multistep manufacturing processes therefor
    • H01L29/41Electrodes ; Multistep manufacturing processes therefor characterised by their shape, relative sizes or dispositions
    • H01L29/417Electrodes ; Multistep manufacturing processes therefor characterised by their shape, relative sizes or dispositions carrying the current to be rectified, amplified or switched
    • H01L29/41725Source or drain electrodes for field effect devices
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
    • H01L29/66Types of semiconductor device ; Multistep manufacturing processes therefor
    • H01L29/68Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
    • H01L29/76Unipolar devices, e.g. field effect transistors
    • H01L29/772Field effect transistors
    • H01L29/78Field effect transistors with field effect produced by an insulated gate
    • H01L29/7833Field effect transistors with field effect produced by an insulated gate with lightly doped drain or source extension, e.g. LDD MOSFET's; DDD MOSFET's
    • H01L29/7835Field effect transistors with field effect produced by an insulated gate with lightly doped drain or source extension, e.g. LDD MOSFET's; DDD MOSFET's with asymmetrical source and drain regions, e.g. lateral high-voltage MISFETs with drain offset region, extended drain MISFETs

Landscapes

  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Ceramic Engineering (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Insulated Gate Type Field-Effect Transistor (AREA)
  • Metal-Oxide And Bipolar Metal-Oxide Semiconductor Integrated Circuits (AREA)
DE60037248T 2000-09-21 2000-09-21 Laterale DMOS-Transistoranordnung Expired - Lifetime DE60037248T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
EP00830628A EP1191601B1 (de) 2000-09-21 2000-09-21 Laterale DMOS-Transistoranordnung

Publications (2)

Publication Number Publication Date
DE60037248D1 true DE60037248D1 (de) 2008-01-10
DE60037248T2 DE60037248T2 (de) 2008-10-09

Family

ID=8175486

Family Applications (1)

Application Number Title Priority Date Filing Date
DE60037248T Expired - Lifetime DE60037248T2 (de) 2000-09-21 2000-09-21 Laterale DMOS-Transistoranordnung

Country Status (3)

Country Link
US (1) US6624471B2 (de)
EP (1) EP1191601B1 (de)
DE (1) DE60037248T2 (de)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7602019B2 (en) * 2006-04-20 2009-10-13 Texas Instruments Incorporated Drive circuit and drain extended transistor for use therein
DE102006033692B4 (de) * 2006-07-20 2011-01-05 Austriamicrosystems Ag Verfahren zur Herstellung eines strukturierten Dielektrikums für einen LDMOS-Transistor
DE102011087845B4 (de) * 2011-12-06 2015-07-02 Infineon Technologies Ag Laterales transistorbauelement und verfahren zu dessen herstellung

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2457605A2 (fr) * 1979-05-21 1980-12-19 France Etat Perfectionnements aux portes logiques a transistors mos multidrains
FR2477778A1 (fr) * 1980-03-04 1981-09-11 Thomson Csf Structure de transistor a effet de champ a grille isolee et application a une realisation de portes logiques
EP0267768A1 (de) * 1986-11-10 1988-05-18 SILICONIX Incorporated Drifted-Drain-MOS-Transistor für hohe Spannungen
FR2618943B1 (fr) * 1987-07-31 1989-12-01 Thomson Hybrides Microondes Dispositif semi-conducteur a effet de champ comportant une electrode annexe
JP3346193B2 (ja) * 1996-11-18 2002-11-18 松下電器産業株式会社 電力増幅器
US6303961B1 (en) * 1998-04-29 2001-10-16 Aqere Systems Guardian Corp. Complementary semiconductor devices

Also Published As

Publication number Publication date
EP1191601A1 (de) 2002-03-27
DE60037248T2 (de) 2008-10-09
EP1191601B1 (de) 2007-11-28
US20020040995A1 (en) 2002-04-11
US6624471B2 (en) 2003-09-23

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition