DE60015788D1 - Kompaktes schieberventil - Google Patents

Kompaktes schieberventil

Info

Publication number
DE60015788D1
DE60015788D1 DE60015788T DE60015788T DE60015788D1 DE 60015788 D1 DE60015788 D1 DE 60015788D1 DE 60015788 T DE60015788 T DE 60015788T DE 60015788 T DE60015788 T DE 60015788T DE 60015788 D1 DE60015788 D1 DE 60015788D1
Authority
DE
Germany
Prior art keywords
compact valve
compact
valve
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE60015788T
Other languages
English (en)
Other versions
DE60015788T2 (de
Inventor
Sik Yoo
Hiromitsu Kuribayashi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Tokyo Electron Ltd
WaferMasters Inc
Original Assignee
Tokyo Electron Ltd
WaferMasters Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Electron Ltd, WaferMasters Inc filed Critical Tokyo Electron Ltd
Application granted granted Critical
Publication of DE60015788D1 publication Critical patent/DE60015788D1/de
Publication of DE60015788T2 publication Critical patent/DE60015788T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
    • H01L21/324—Thermal treatment for modifying the properties of semiconductor bodies, e.g. annealing, sintering
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
    • F16K—VALVES; TAPS; COCKS; ACTUATING-FLOATS; DEVICES FOR VENTING OR AERATING
    • F16K3/00—Gate valves or sliding valves, i.e. cut-off apparatus with closing members having a sliding movement along the seat for opening and closing
    • F16K3/02—Gate valves or sliding valves, i.e. cut-off apparatus with closing members having a sliding movement along the seat for opening and closing with flat sealing faces; Packings therefor
    • F16K3/12—Gate valves or sliding valves, i.e. cut-off apparatus with closing members having a sliding movement along the seat for opening and closing with flat sealing faces; Packings therefor with wedge-shaped arrangements of sealing faces
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
    • F16K—VALVES; TAPS; COCKS; ACTUATING-FLOATS; DEVICES FOR VENTING OR AERATING
    • F16K51/00—Other details not peculiar to particular types of valves or cut-off apparatus
    • F16K51/02—Other details not peculiar to particular types of valves or cut-off apparatus specially adapted for high-vacuum installations

Landscapes

  • Engineering & Computer Science (AREA)
  • General Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Manufacturing & Machinery (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Chemical Vapour Deposition (AREA)
  • Sliding Valves (AREA)
  • Details Of Valves (AREA)
DE60015788T 1999-11-30 2000-11-29 Kompaktes schieberventil Expired - Fee Related DE60015788T2 (de)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US451664 1989-12-18
US09/451,664 US20010040230A1 (en) 1999-11-30 1999-11-30 Compact gate valve
PCT/US2000/032563 WO2001040692A1 (en) 1999-11-30 2000-11-29 Compact gate valve

Publications (2)

Publication Number Publication Date
DE60015788D1 true DE60015788D1 (de) 2004-12-16
DE60015788T2 DE60015788T2 (de) 2005-11-10

Family

ID=23793191

Family Applications (1)

Application Number Title Priority Date Filing Date
DE60015788T Expired - Fee Related DE60015788T2 (de) 1999-11-30 2000-11-29 Kompaktes schieberventil

Country Status (7)

Country Link
US (1) US20010040230A1 (de)
EP (1) EP1234133B1 (de)
JP (1) JP2003532842A (de)
KR (1) KR20010079718A (de)
DE (1) DE60015788T2 (de)
TW (1) TW455661B (de)
WO (1) WO2001040692A1 (de)

Families Citing this family (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20050052405A1 (en) * 2000-04-25 2005-03-10 Sunil Maulik Computer-based educational system
US6703623B1 (en) * 2000-09-27 2004-03-09 Leepl Corporation Electron beam proximity exposure apparatus
JP4394303B2 (ja) * 2001-04-11 2010-01-06 新明和工業株式会社 真空ゲート弁
US20050268857A1 (en) * 2004-06-02 2005-12-08 Applied Materials, Inc. Uniformly compressed process chamber gate seal for semiconductor processing chamber
US7841582B2 (en) * 2004-06-02 2010-11-30 Applied Materials, Inc. Variable seal pressure slit valve doors for semiconductor manufacturing equipment
WO2007001162A1 (en) * 2005-06-29 2007-01-04 Innovation For Creative Devices Co., Ltd. Door assembly adapted to the reversed atmospheric pressure
JP5415781B2 (ja) * 2008-03-14 2014-02-12 キヤノンアネルバ株式会社 真空処理装置および真空処理装置の制御方法
US20090236554A1 (en) * 2008-03-18 2009-09-24 Itt Manufacturing Enterprises, Inc. Knife gate valve with skewed gate seat interface
JP5419260B2 (ja) * 2009-02-24 2014-02-19 住友重機械工業株式会社 真空ゲートバルブ保護装置
CN103206552A (zh) * 2012-01-16 2013-07-17 中国科学院微电子研究所 真空隔离阀装置
KR20140048752A (ko) * 2012-10-16 2014-04-24 삼성전자주식회사 슬릿 밸브 유닛 및 이를 구비하는 성막 장치
WO2014143167A1 (en) * 2013-03-15 2014-09-18 Koenig Mark E Method for processing material for a gasifier
CN107407427B (zh) * 2015-03-27 2019-11-08 Vat控股公司 阀、特别是真空阀
CN106704600B (zh) * 2015-11-13 2019-03-12 北京北方华创微电子装备有限公司 阀门机构及半导体加工设备
JP6719960B2 (ja) * 2016-04-27 2020-07-08 サーパス工業株式会社 流量調整装置
KR102278461B1 (ko) * 2019-12-04 2021-07-16 주식회사 케이씨텍 경사면을 갖는 도어부를 포함하는 기판 처리 장치
CN112268141A (zh) * 2020-10-23 2021-01-26 中国科学院上海高等研究院 用于真空封合之密封碟盘
KR102681954B1 (ko) * 2021-03-10 2024-07-08 주식회사 케이씨텍 기판 처리 장치
CN114062401A (zh) * 2021-12-20 2022-02-18 北京中科科仪股份有限公司 一种密封结构及扫描电镜

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2634885C2 (de) * 1976-08-03 1985-10-31 Leybold-Heraeus GmbH, 5000 Köln Pendelschieber
CH643469A5 (fr) * 1981-12-22 1984-06-15 Siv Soc Italiana Vetro Installation pour deposer en continu, sur la surface d'un substrat porte a haute temperature, une couche d'une matiere solide.
FR2557253B1 (fr) * 1983-12-22 1986-04-11 Cit Alcatel Vanne dont l'ouverture fonctionne a la depression
JPS61164220A (ja) * 1985-01-16 1986-07-24 Fujitsu Ltd 熱処理炉
JPH01167587A (ja) * 1987-12-21 1989-07-03 Toyoji Okabe 輻射加熱炉等の炉壁構造
DE3831249A1 (de) * 1988-09-14 1990-03-22 Schertler Siegfried Ventilschieber
US5013009A (en) * 1989-08-04 1991-05-07 Goddard Valve Corporation Top entry valve
US5363872A (en) * 1993-03-16 1994-11-15 Applied Materials, Inc. Low particulate slit valve system and method for controlling same
JP2806770B2 (ja) * 1993-12-17 1998-09-30 山形日本電気株式会社 真空バルブ
KR100327716B1 (ko) * 1994-01-11 2002-06-27 노만 에이취. 폰드 진공처리시스템및진공처리시스템내에서의기판조작방법
DE19601541A1 (de) * 1995-01-27 1996-08-01 Seiko Seiki Kk In einer Vakuumumgebung einsetzbares Vertikaltransfersystem sowie dazugehöriges Absperrventilsystem
JP2631356B2 (ja) * 1995-01-27 1997-07-16 セイコー精機株式会社 ゲートバルブ装置
JP3785650B2 (ja) * 1995-03-17 2006-06-14 東京エレクトロン株式会社 枚葉式熱処理装置
JPH10252943A (ja) * 1997-03-14 1998-09-22 Anelva Corp 真空バルブ

Also Published As

Publication number Publication date
EP1234133B1 (de) 2004-11-10
WO2001040692A1 (en) 2001-06-07
KR20010079718A (ko) 2001-08-22
DE60015788T2 (de) 2005-11-10
US20010040230A1 (en) 2001-11-15
JP2003532842A (ja) 2003-11-05
TW455661B (en) 2001-09-21
EP1234133A1 (de) 2002-08-28
WO2001040692A9 (en) 2002-08-15

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee