DE60007023D1 - Positiv arbeitende lichtempfindliche Zusammensetzung - Google Patents

Positiv arbeitende lichtempfindliche Zusammensetzung

Info

Publication number
DE60007023D1
DE60007023D1 DE60007023T DE60007023T DE60007023D1 DE 60007023 D1 DE60007023 D1 DE 60007023D1 DE 60007023 T DE60007023 T DE 60007023T DE 60007023 T DE60007023 T DE 60007023T DE 60007023 D1 DE60007023 D1 DE 60007023D1
Authority
DE
Germany
Prior art keywords
photosensitive composition
positive
working photosensitive
positive photosensitive
present
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE60007023T
Other languages
English (en)
Other versions
DE60007023T2 (de
Inventor
Kazuto Kunita
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujifilm Corp
Original Assignee
Fuji Photo Film Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP13549399A external-priority patent/JP4105821B2/ja
Priority claimed from JP13534199A external-priority patent/JP3930199B2/ja
Application filed by Fuji Photo Film Co Ltd filed Critical Fuji Photo Film Co Ltd
Publication of DE60007023D1 publication Critical patent/DE60007023D1/de
Application granted granted Critical
Publication of DE60007023T2 publication Critical patent/DE60007023T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/022Quinonediazides
    • G03F7/0223Iminoquinonediazides; Para-quinonediazides
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07CACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C251/00Compounds containing nitrogen atoms doubly-bound to a carbon skeleton
    • C07C251/02Compounds containing nitrogen atoms doubly-bound to a carbon skeleton containing imino groups
    • C07C251/28Compounds containing nitrogen atoms doubly-bound to a carbon skeleton containing imino groups having nitrogen atoms of imino groups acylated
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07CACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C255/00Carboxylic acid nitriles
    • C07C255/49Carboxylic acid nitriles having cyano groups bound to carbon atoms of six-membered aromatic rings of a carbon skeleton
    • C07C255/57Carboxylic acid nitriles having cyano groups bound to carbon atoms of six-membered aromatic rings of a carbon skeleton containing cyano groups and carboxyl groups, other than cyano groups, bound to the carbon skeleton
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07CACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C311/00Amides of sulfonic acids, i.e. compounds having singly-bound oxygen atoms of sulfo groups replaced by nitrogen atoms, not being part of nitro or nitroso groups
    • C07C311/15Sulfonamides having sulfur atoms of sulfonamide groups bound to carbon atoms of six-membered aromatic rings
    • C07C311/20Sulfonamides having sulfur atoms of sulfonamide groups bound to carbon atoms of six-membered aromatic rings having the nitrogen atom of at least one of the sulfonamide groups bound to a carbon atom of a ring other than a six-membered aromatic ring
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41CPROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C1/00Forme preparation
    • B41C1/10Forme preparation for lithographic printing; Master sheets for transferring a lithographic image to the forme
    • B41C1/1008Forme preparation for lithographic printing; Master sheets for transferring a lithographic image to the forme by removal or destruction of lithographic material on the lithographic support, e.g. by laser or spark ablation; by the use of materials rendered soluble or insoluble by heat exposure, e.g. by heat produced from a light to heat transforming system; by on-the-press exposure or on-the-press development, e.g. by the fountain of photolithographic materials
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41CPROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C1/00Forme preparation
    • B41C1/10Forme preparation for lithographic printing; Master sheets for transferring a lithographic image to the forme
    • B41C1/1008Forme preparation for lithographic printing; Master sheets for transferring a lithographic image to the forme by removal or destruction of lithographic material on the lithographic support, e.g. by laser or spark ablation; by the use of materials rendered soluble or insoluble by heat exposure, e.g. by heat produced from a light to heat transforming system; by on-the-press exposure or on-the-press development, e.g. by the fountain of photolithographic materials
    • B41C1/1016Forme preparation for lithographic printing; Master sheets for transferring a lithographic image to the forme by removal or destruction of lithographic material on the lithographic support, e.g. by laser or spark ablation; by the use of materials rendered soluble or insoluble by heat exposure, e.g. by heat produced from a light to heat transforming system; by on-the-press exposure or on-the-press development, e.g. by the fountain of photolithographic materials characterised by structural details, e.g. protective layers, backcoat layers or several imaging layers
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41CPROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C2201/00Location, type or constituents of the non-imaging layers in lithographic printing formes
    • B41C2201/04Intermediate layers
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41CPROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C2201/00Location, type or constituents of the non-imaging layers in lithographic printing formes
    • B41C2201/14Location, type or constituents of the non-imaging layers in lithographic printing formes characterised by macromolecular organic compounds, e.g. binder, adhesives
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41CPROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C2210/00Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
    • B41C2210/02Positive working, i.e. the exposed (imaged) areas are removed
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41CPROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C2210/00Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
    • B41C2210/06Developable by an alkaline solution
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41CPROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C2210/00Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
    • B41C2210/22Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation characterised by organic non-macromolecular additives, e.g. dyes, UV-absorbers, plasticisers
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41CPROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C2210/00Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
    • B41C2210/24Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation characterised by a macromolecular compound or binder obtained by reactions involving carbon-to-carbon unsaturated bonds, e.g. acrylics, vinyl polymers
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41CPROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C2210/00Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
    • B41C2210/26Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation characterised by a macromolecular compound or binder obtained by reactions not involving carbon-to-carbon unsaturated bonds
    • B41C2210/262Phenolic condensation polymers, e.g. novolacs, resols
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07CACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C2601/00Systems containing only non-condensed rings
    • C07C2601/12Systems containing only non-condensed rings with a six-membered ring
    • C07C2601/14The ring being saturated
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07CACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C2602/00Systems containing two condensed rings
    • C07C2602/36Systems containing two condensed rings the rings having more than two atoms in common
    • C07C2602/42Systems containing two condensed rings the rings having more than two atoms in common the bicyclo ring system containing seven carbon atoms

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Materials For Photolithography (AREA)
  • Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
  • Acyclic And Carbocyclic Compounds In Medicinal Compositions (AREA)
  • Pyrane Compounds (AREA)
DE60007023T 1999-05-17 2000-05-17 Positiv arbeitende lichtempfindliche Zusammensetzung Expired - Lifetime DE60007023T2 (de)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
JP13549399 1999-05-17
JP13549399A JP4105821B2 (ja) 1999-05-17 1999-05-17 ジアゾ化合物
JP13534199 1999-05-17
JP13534199A JP3930199B2 (ja) 1999-05-17 1999-05-17 ポジ型感光性組成物

Publications (2)

Publication Number Publication Date
DE60007023D1 true DE60007023D1 (de) 2004-01-22
DE60007023T2 DE60007023T2 (de) 2004-09-09

Family

ID=26469200

Family Applications (1)

Application Number Title Priority Date Filing Date
DE60007023T Expired - Lifetime DE60007023T2 (de) 1999-05-17 2000-05-17 Positiv arbeitende lichtempfindliche Zusammensetzung

Country Status (4)

Country Link
US (1) US6451497B1 (de)
EP (1) EP1053999B1 (de)
AT (1) ATE256106T1 (de)
DE (1) DE60007023T2 (de)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI228538B (en) * 2000-10-23 2005-03-01 Kao Corp Polishing composition
CN100470365C (zh) 2001-01-12 2009-03-18 富士胶片株式会社 正型成像材料
JP2002244282A (ja) * 2001-02-20 2002-08-30 Fuji Photo Film Co Ltd ポジ型画像形成材料及びそれを用いた平版印刷版原版
KR100508699B1 (ko) * 2001-08-09 2005-08-17 학교법인 한양학원 Afm 리소그래피용 아조 화합물 레지스트

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CH307356A (de) 1951-08-08 1955-05-31 Kalle & Co Ag Lichtempfindliches Material für die photomechanische Reproduktion.
US5212042A (en) 1989-08-22 1993-05-18 Fuji Photo Film Co., Ltd. Positive type light-sensitive composition
EP0833204A1 (de) 1996-09-30 1998-04-01 Eastman Kodak Company Infrarotempfindliche, Diazonaphthochinon enthaltende Bildaufzeichnungszusammensetzung und Element

Also Published As

Publication number Publication date
US6451497B1 (en) 2002-09-17
ATE256106T1 (de) 2003-12-15
EP1053999A3 (de) 2000-12-13
DE60007023T2 (de) 2004-09-09
EP1053999B1 (de) 2003-12-10
EP1053999A2 (de) 2000-11-22

Similar Documents

Publication Publication Date Title
DE50206931D1 (de) Thermisch härtbare bindemittel
ATE271463T1 (de) Bildaufzeichnungsmaterial und flachdruckplatte, die dieses verwendet
EP0949539A3 (de) Lichtempfindliche Harzzusammensetzung
SE9902913L (sv) Ljusaktiverbar komposition
ATE555421T1 (de) Lichtempfindliche zusammensetzung und negativ arbeitende flachdruckplatte
ATE289081T1 (de) Photoempfindliche, lithographische druckplattenvorstufe
MY116074A (en) Oxime derivatives and the use thereof as latent acids
AU3599801A (en) Reagents for the quantitation of active oxygen
EP0914964A3 (de) Positiv-Typ photoempfindliche Zusammensetzung für infrarot Laser
ATE369832T1 (de) Topisches präparat enthaltend gallussäure derivaten
ATE412202T1 (de) Lichtempfindliche zusammensetzung und lithographischer druckplattenvorläufer
WO1999000373A8 (fr) Derives de benzimidazole
EP1279519A3 (de) Bilderzeugungsmaterial und Ammoniumverbindung
AU4455297A (en) Alkysulfonyloximes for high-resolution i-line photoresists of high sensitivity
DE60007023D1 (de) Positiv arbeitende lichtempfindliche Zusammensetzung
BR9813810A (pt) "surfactante baseado em um orto éster.a sua preparação e o seu uso"
NO995924L (no) Fremgangsmåte ved fremstillingen av 1,4,7,10- tetraazacyklododekan-1,4,7-trieddiksyre og derivater derav
EP1225041A3 (de) Thermische, bilderzeugende Zusammensetzungen, thermisches, bilderzeugendes Element und Verfahren zur Bilderzeugung und zum Drucken
DE69829157D1 (de) Urethanoligomere enthaltende lichtempfindliche Zusammensetzungen
JPS6432256A (en) Photosensitive composition
GB9906192D0 (en) Photoreleasable compounds
EP1176178A4 (de) Beschichtungszusammensetzung
DE60027667D1 (de) Feuchtwasserkonzentrat für Litho-Druck
EP1314726A4 (de) Neue ester- oder amid-derivate
ATE206125T1 (de) Furoindolizine

Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8327 Change in the person/name/address of the patent owner

Owner name: FUJIFILM CORP., TOKIO/TOKYO, JP