DE50102242D1 - Pyrogen hergestelltes Siliciumdioxid - Google Patents

Pyrogen hergestelltes Siliciumdioxid

Info

Publication number
DE50102242D1
DE50102242D1 DE50102242T DE50102242T DE50102242D1 DE 50102242 D1 DE50102242 D1 DE 50102242D1 DE 50102242 T DE50102242 T DE 50102242T DE 50102242 T DE50102242 T DE 50102242T DE 50102242 D1 DE50102242 D1 DE 50102242D1
Authority
DE
Germany
Prior art keywords
sub
eta
rpm
sup
fumed silica
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE50102242T
Other languages
English (en)
Inventor
Dr Monika Oswald
Dr Gerrit Schneider
Dr Klaus Deller
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Evonik Operations GmbH
Original Assignee
Degussa GmbH
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from EP00117922.5A external-priority patent/EP1182167A1/de
Application filed by Degussa GmbH filed Critical Degussa GmbH
Application granted granted Critical
Publication of DE50102242D1 publication Critical patent/DE50102242D1/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C3/00—Glass compositions
    • C03C3/04—Glass compositions containing silica
    • C03C3/06—Glass compositions containing silica with more than 90% silica by weight, e.g. quartz
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C1/00—Ingredients generally applicable to manufacture of glasses, glazes, or vitreous enamels
    • C03C1/02—Pretreated ingredients
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S65/00—Glass manufacturing
    • Y10S65/901—Liquid phase reaction process

Landscapes

  • Chemical & Material Sciences (AREA)
  • Materials Engineering (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Organic Chemistry (AREA)
  • Silicon Compounds (AREA)
  • Inks, Pencil-Leads, Or Crayons (AREA)
  • Glass Melting And Manufacturing (AREA)
  • Paints Or Removers (AREA)
  • Dental Preparations (AREA)
  • Medicines Containing Material From Animals Or Micro-Organisms (AREA)
  • Medicines That Contain Protein Lipid Enzymes And Other Medicines (AREA)
DE50102242T 2000-08-21 2001-08-20 Pyrogen hergestelltes Siliciumdioxid Expired - Lifetime DE50102242D1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
EP00117922.5A EP1182167A1 (de) 2000-08-21 Pyrogen hergestelltes Siliciumdioxid
EP01115613.0A EP1186573A1 (de) 2000-08-23 2001-07-03 Pyrogen hergestelltes Siliciumdioxid

Publications (1)

Publication Number Publication Date
DE50102242D1 true DE50102242D1 (de) 2004-06-17

Family

ID=26071309

Family Applications (1)

Application Number Title Priority Date Filing Date
DE50102242T Expired - Lifetime DE50102242D1 (de) 2000-08-21 2001-08-20 Pyrogen hergestelltes Siliciumdioxid

Country Status (4)

Country Link
US (2) US6679945B2 (de)
JP (1) JP3919482B2 (de)
AT (1) ATE266602T1 (de)
DE (1) DE50102242D1 (de)

Families Citing this family (25)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE19936478A1 (de) * 1999-08-03 2001-02-15 Degussa Sinterwerkstoffe
DE10258857A1 (de) * 2002-12-17 2004-07-08 Degussa Ag Pyrogen hergestelltes Siliciumdioxid und Dispersion hiervon
DE10312970A1 (de) * 2003-03-24 2004-10-14 Degussa Ag Pyrogenes Siliciumdioxidpulver und Dispersion hiervon
DE10337198A1 (de) * 2003-08-13 2005-03-17 Degussa Ag Träger auf Basis von Granulaten, die aus pyrogen hergestelltem Siliciumdioxiden hergestellt sind
DE102004010755A1 (de) * 2004-03-05 2005-09-22 Degussa Ag Silikonkautschuk
EP1812344B1 (de) * 2004-09-30 2018-01-24 Cabot Corporation Metall und oxide daraus sowie verfahren zu deren herstellung
EP1700824A1 (de) * 2005-03-09 2006-09-13 Degussa AG Granulate basierend auf pyrogen hergestelles silicon dioxid, sowie Verfahren zu deren Herstellung und Verwendung dergleichen
US7811846B2 (en) * 2005-03-21 2010-10-12 Agency For Science, Technology And Research Semiconductor devices grown in spherical cavity arrays and its preparation method
DE102006046619A1 (de) * 2006-09-29 2008-04-03 Heraeus Quarzglas Gmbh & Co. Kg Streichfähiger SiO2-Schlicker für die Herstellung von Quarzglas, Verfahren zur Herstellung von Quarzglas unter Einsatz des Schlickers
EP2014622B1 (de) * 2007-07-06 2017-01-18 Evonik Degussa GmbH Verfahren zur Herstellung eines Kieselglasgranulats
JP6178725B2 (ja) 2010-04-23 2017-08-09 ピクセリジェント・テクノロジーズ，エルエルシー ナノ結晶の合成、キャップ形成および分散
US8920675B2 (en) 2010-10-27 2014-12-30 Pixelligent Technologies, Llc Synthesis, capping and dispersion of nanocrystals
US9359689B2 (en) 2011-10-26 2016-06-07 Pixelligent Technologies, Llc Synthesis, capping and dispersion of nanocrystals
US11236002B2 (en) 2015-12-18 2022-02-01 Heraeus Quarzglas Gmbh & Co. Kg Preparation of an opaque quartz glass body
WO2017103124A2 (de) 2015-12-18 2017-06-22 Heraeus Quarzglas Gmbh & Co. Kg Erhöhen des siliziumgehalts bei der herstellung von quarzglas
JP6940236B2 (ja) 2015-12-18 2021-09-22 ヘレウス クワルツグラス ゲーエムベーハー ウント コンパニー カーゲー 溶融炉内での露点監視による石英ガラス体の調製
US11299417B2 (en) 2015-12-18 2022-04-12 Heraeus Quarzglas Gmbh & Co. Kg Preparation of a quartz glass body in a melting crucible of refractory metal
EP3390304B1 (de) 2015-12-18 2023-09-13 Heraeus Quarzglas GmbH & Co. KG Sprühgranulieren von siliziumdioxid bei der herstellung von quarzglas
KR20180095618A (ko) 2015-12-18 2018-08-27 헤래우스 크바르츠글라스 게엠베하 ＆ 컴파니 케이지 다중-챔버 가열로에서 실리카 유리체의 제조
TWI794150B (zh) 2015-12-18 2023-03-01 德商何瑞斯廓格拉斯公司 自二氧化矽顆粒製備石英玻璃體
EP3390308A1 (de) 2015-12-18 2018-10-24 Heraeus Quarzglas GmbH & Co. KG Glasfasern und vorformen aus quarzglas mit geringem oh-, cl- und al-gehalt
WO2017103120A1 (de) 2015-12-18 2017-06-22 Heraeus Quarzglas Gmbh & Co. Kg Herstellung einer synthetischen quarzglaskörnung
WO2017103131A1 (de) 2015-12-18 2017-06-22 Heraeus Quarzglas Gmbh & Co. Kg Verringern des erdalkalimetallgehalts von siliziumdioxidgranulat durch behandlung von kohlenstoffdotiertem siliziumdioxidgranulat bei hoher temperatur
CN107416849A (zh) * 2017-09-06 2017-12-01 青岛科技大学 一种制备单分散纳米二氧化硅粒子的方法
CN110698224A (zh) * 2019-11-11 2020-01-17 浙江大学台州研究院 一种用于海洋工程钢筋混凝土结构表面的渗透型防护剂

Family Cites Families (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4248600A (en) * 1978-05-30 1981-02-03 J. M. Huber Corporation High solids aqueous silica dispersion
DE2844052A1 (de) * 1978-10-10 1980-04-30 Degussa Waessrige dispersion einer hydrophoben kieselsaeure
DE3390375T1 (de) * 1982-12-23 1985-02-07 Suwa Seikosha Co. Ltd., Tokio/Tokyo Verfahren zur Herstellung von Siliciumdioxidglas
DE3803895C1 (de) * 1988-02-09 1989-04-13 Degussa Ag, 6000 Frankfurt, De
US5207814A (en) * 1989-02-10 1993-05-04 Enichem S.P.A. Process for preparing monoliths of aerogels of metal oxides
US5116535A (en) 1989-03-21 1992-05-26 Cabot Corporation Aqueous colloidal dispersion of fumed silica without a stabilizer
US5063179A (en) * 1990-03-02 1991-11-05 Cabot Corporation Process for making non-porous micron-sized high purity silica
US5240488A (en) * 1992-08-14 1993-08-31 At&T Bell Laboratories Manufacture of vitreous silica product via a sol-gel process using a polymer additive
IT1256359B (it) 1992-09-01 1995-12-01 Enichem Spa Procedimento per la preparazione di componenti e dispositivi ottici indimensioni finali o quasi finali, e prodotti cosi' ottenuti
ES2104359T3 (es) * 1993-02-12 1997-10-01 Cabot Corp Silice modificada superficialmente.
US6193795B1 (en) * 1993-08-02 2001-02-27 Degussa Corporation Low structure pyrogenic hydrophilic and hydrophobic metallic oxides, production and use
IT1270628B (it) 1994-10-06 1997-05-07 Enichem Spa Manufatti in ossido di silicio e/o altri ossidi metallici misti e procedimento per la loro preparazione in dimensioni finali o quasi finali
EP0725037B2 (de) * 1995-02-04 2012-04-25 Evonik Degussa GmbH Granulate auf Basis von pyrogen hergestelltem Siliciumdioxid, Verfahren zu ihrer Herstellung und ihre Verwendung
US5827363A (en) * 1995-12-19 1998-10-27 Degussa Corporation Structure precipitated silicates and silicas, production and use in ink jet printing
US6207610B1 (en) * 1996-05-17 2001-03-27 Degussa-Huls Ag Compacts based on pyrogenically produced silicon dioxide
DE19756840A1 (de) 1997-01-23 1998-07-30 Degussa Pyrogene Oxide und Verfahren zu ihrer Herstellung
KR100238191B1 (ko) * 1998-02-16 2000-02-01 윤종용 실리카 글래스의 제조방법
DE19943103A1 (de) * 1999-09-09 2001-03-15 Wacker Chemie Gmbh Hochgefüllte SiO2-Dispersion, Verfahren zu ihrer Herstellung und Verwendung
IT1318617B1 (it) * 2000-07-10 2003-08-27 Novara Technology Srl Processo sol-gel per la produzione di geli secchi di grandidimensioni e vetri derivati.

Also Published As

Publication number Publication date
JP2002145610A (ja) 2002-05-22
US20040116270A1 (en) 2004-06-17
US6679945B2 (en) 2004-01-20
US20020044903A1 (en) 2002-04-18
ATE266602T1 (de) 2004-05-15
US6890873B2 (en) 2005-05-10
JP3919482B2 (ja) 2007-05-23

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8327 Change in the person/name/address of the patent owner

Owner name: DEGUSSA GMBH, 40474 DUESSELDORF, DE

8327 Change in the person/name/address of the patent owner

Owner name: EVONIK DEGUSSA GMBH, 40474 DUESSELDORF, DE