ATE266602T1 - Pyrogen hergestelltes siliciumdioxid - Google Patents

Pyrogen hergestelltes siliciumdioxid

Info

Publication number
ATE266602T1
ATE266602T1 AT01710041T AT01710041T ATE266602T1 AT E266602 T1 ATE266602 T1 AT E266602T1 AT 01710041 T AT01710041 T AT 01710041T AT 01710041 T AT01710041 T AT 01710041T AT E266602 T1 ATE266602 T1 AT E266602T1
Authority
AT
Austria
Prior art keywords
sub
silicon dioxide
eta
rpm
pyrogenely
Prior art date
Application number
AT01710041T
Other languages
English (en)
Inventor
Monika Oswald
Gerrit Schneider
Klaus Deller
Original Assignee
Degussa
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from EP00117922.5A external-priority patent/EP1182167A1/de
Application filed by Degussa filed Critical Degussa
Application granted granted Critical
Publication of ATE266602T1 publication Critical patent/ATE266602T1/de

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C3/00—Glass compositions
    • C03C3/04—Glass compositions containing silica
    • C03C3/06—Glass compositions containing silica with more than 90% silica by weight, e.g. quartz
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C1/00—Ingredients generally applicable to manufacture of glasses, glazes, or vitreous enamels
    • C03C1/02—Pretreated ingredients
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S65/00—Glass manufacturing
    • Y10S65/901—Liquid phase reaction process
AT01710041T 2000-08-21 2001-08-20 Pyrogen hergestelltes siliciumdioxid ATE266602T1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
EP00117922.5A EP1182167A1 (de) 2000-08-21 Pyrogen hergestelltes Siliciumdioxid
EP01115613.0A EP1186573A1 (de) 2000-08-23 2001-07-03 Pyrogen hergestelltes Siliciumdioxid

Publications (1)

Publication Number Publication Date
ATE266602T1 true ATE266602T1 (de) 2004-05-15

Family

ID=26071309

Family Applications (1)

Application Number Title Priority Date Filing Date
AT01710041T ATE266602T1 (de) 2000-08-21 2001-08-20 Pyrogen hergestelltes siliciumdioxid

Country Status (4)

Country Link
US (2) US6679945B2 (de)
JP (1) JP3919482B2 (de)
AT (1) ATE266602T1 (de)
DE (1) DE50102242D1 (de)

Families Citing this family (25)

* Cited by examiner, † Cited by third party
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DE19936478A1 (de) * 1999-08-03 2001-02-15 Degussa Sinterwerkstoffe
DE10258857A1 (de) * 2002-12-17 2004-07-08 Degussa Ag Pyrogen hergestelltes Siliciumdioxid und Dispersion hiervon
DE10312970A1 (de) * 2003-03-24 2004-10-14 Degussa Ag Pyrogenes Siliciumdioxidpulver und Dispersion hiervon
DE10337198A1 (de) * 2003-08-13 2005-03-17 Degussa Ag Träger auf Basis von Granulaten, die aus pyrogen hergestelltem Siliciumdioxiden hergestellt sind
DE102004010755A1 (de) * 2004-03-05 2005-09-22 Degussa Ag Silikonkautschuk
JP5460961B2 (ja) * 2004-09-30 2014-04-02 キャボット コーポレイション シリカの製造方法
EP1700824A1 (de) * 2005-03-09 2006-09-13 Degussa AG Granulate basierend auf pyrogen hergestelles silicon dioxid, sowie Verfahren zu deren Herstellung und Verwendung dergleichen
US7811846B2 (en) * 2005-03-21 2010-10-12 Agency For Science, Technology And Research Semiconductor devices grown in spherical cavity arrays and its preparation method
DE102006046619A1 (de) * 2006-09-29 2008-04-03 Heraeus Quarzglas Gmbh & Co. Kg Streichfähiger SiO2-Schlicker für die Herstellung von Quarzglas, Verfahren zur Herstellung von Quarzglas unter Einsatz des Schlickers
EP2014622B1 (de) * 2007-07-06 2017-01-18 Evonik Degussa GmbH Verfahren zur Herstellung eines Kieselglasgranulats
CN102947218B (zh) 2010-04-23 2016-05-11 皮瑟莱根特科技有限责任公司 纳米晶体的合成、盖帽和分散
JP2014503446A (ja) 2010-10-27 2014-02-13 ピクセリジェント・テクノロジーズ，エルエルシー ナノ結晶の合成、キャップ形成および分散
US9359689B2 (en) 2011-10-26 2016-06-07 Pixelligent Technologies, Llc Synthesis, capping and dispersion of nanocrystals
TWI788278B (zh) 2015-12-18 2023-01-01 德商何瑞斯廓格拉斯公司 由均質石英玻璃製得之玻璃纖維及預成型品
WO2017103166A2 (de) 2015-12-18 2017-06-22 Heraeus Quarzglas Gmbh & Co. Kg Herstellung eines quarzglaskörpers in einem mehrkammerofen
CN108698880B (zh) 2015-12-18 2023-05-02 贺利氏石英玻璃有限两合公司 不透明石英玻璃体的制备
CN108698893A (zh) 2015-12-18 2018-10-23 贺利氏石英玻璃有限两合公司 于耐火金属熔融坩埚中制备石英玻璃体
KR20180094087A (ko) 2015-12-18 2018-08-22 헤래우스 크바르츠글라스 게엠베하 ＆ 컴파니 케이지 실리카 과립으로부터 실리카 유리 제품의 제조
CN108698888A (zh) 2015-12-18 2018-10-23 贺利氏石英玻璃有限两合公司 在石英玻璃制备中作为中间物的经碳掺杂的二氧化硅颗粒的制备
CN108698883A (zh) 2015-12-18 2018-10-23 贺利氏石英玻璃有限两合公司 石英玻璃制备中的二氧化硅的喷雾造粒
US11952303B2 (en) 2015-12-18 2024-04-09 Heraeus Quarzglas Gmbh & Co. Kg Increase in silicon content in the preparation of quartz glass
EP3390292B1 (de) 2015-12-18 2023-03-15 Heraeus Quarzglas GmbH & Co. KG Herstellung einer synthetischen quarzglaskörnung
US11492282B2 (en) 2015-12-18 2022-11-08 Heraeus Quarzglas Gmbh & Co. Kg Preparation of quartz glass bodies with dew point monitoring in the melting oven
CN107416849A (zh) * 2017-09-06 2017-12-01 青岛科技大学 一种制备单分散纳米二氧化硅粒子的方法
CN110698224A (zh) * 2019-11-11 2020-01-17 浙江大学台州研究院 一种用于海洋工程钢筋混凝土结构表面的渗透型防护剂

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US4248600A (en) * 1978-05-30 1981-02-03 J. M. Huber Corporation High solids aqueous silica dispersion
DE2844052A1 (de) * 1978-10-10 1980-04-30 Degussa Waessrige dispersion einer hydrophoben kieselsaeure
DE3390375T1 (de) 1982-12-23 1985-02-07 Suwa Seikosha Co. Ltd., Tokio/Tokyo Verfahren zur Herstellung von Siliciumdioxidglas
DE3803895C1 (de) * 1988-02-09 1989-04-13 Degussa Ag, 6000 Frankfurt, De
US5207814A (en) * 1989-02-10 1993-05-04 Enichem S.P.A. Process for preparing monoliths of aerogels of metal oxides
US5116535A (en) 1989-03-21 1992-05-26 Cabot Corporation Aqueous colloidal dispersion of fumed silica without a stabilizer
US5063179A (en) * 1990-03-02 1991-11-05 Cabot Corporation Process for making non-porous micron-sized high purity silica
US5240488A (en) * 1992-08-14 1993-08-31 At&T Bell Laboratories Manufacture of vitreous silica product via a sol-gel process using a polymer additive
IT1256359B (it) 1992-09-01 1995-12-01 Enichem Spa Procedimento per la preparazione di componenti e dispositivi ottici indimensioni finali o quasi finali, e prodotti cosi' ottenuti
KR960701155A (ko) * 1993-02-12 1996-02-24 마르타 앤 피니건 실리카 발연 계면활성제(surfactant modified silica)
US6193795B1 (en) * 1993-08-02 2001-02-27 Degussa Corporation Low structure pyrogenic hydrophilic and hydrophobic metallic oxides, production and use
IT1270628B (it) 1994-10-06 1997-05-07 Enichem Spa Manufatti in ossido di silicio e/o altri ossidi metallici misti e procedimento per la loro preparazione in dimensioni finali o quasi finali
EP0725037B2 (de) * 1995-02-04 2012-04-25 Evonik Degussa GmbH Granulate auf Basis von pyrogen hergestelltem Siliciumdioxid, Verfahren zu ihrer Herstellung und ihre Verwendung
US5827363A (en) * 1995-12-19 1998-10-27 Degussa Corporation Structure precipitated silicates and silicas, production and use in ink jet printing
US6207610B1 (en) * 1996-05-17 2001-03-27 Degussa-Huls Ag Compacts based on pyrogenically produced silicon dioxide
DE19756840A1 (de) 1997-01-23 1998-07-30 Degussa Pyrogene Oxide und Verfahren zu ihrer Herstellung
KR100238191B1 (ko) * 1998-02-16 2000-02-01 윤종용 실리카 글래스의 제조방법
DE19943103A1 (de) * 1999-09-09 2001-03-15 Wacker Chemie Gmbh Hochgefüllte SiO2-Dispersion, Verfahren zu ihrer Herstellung und Verwendung
IT1318617B1 (it) * 2000-07-10 2003-08-27 Novara Technology Srl Processo sol-gel per la produzione di geli secchi di grandidimensioni e vetri derivati.

Also Published As

Publication number Publication date
DE50102242D1 (de) 2004-06-17
US6679945B2 (en) 2004-01-20
US20040116270A1 (en) 2004-06-17
US6890873B2 (en) 2005-05-10
US20020044903A1 (en) 2002-04-18
JP3919482B2 (ja) 2007-05-23
JP2002145610A (ja) 2002-05-22

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