DE4490252D2 - Leistungsgesteuertes fraktales Lasersystem - Google Patents

Leistungsgesteuertes fraktales Lasersystem

Info

Publication number
DE4490252D2
DE4490252D2 DE4490252T DE4490252T DE4490252D2 DE 4490252 D2 DE4490252 D2 DE 4490252D2 DE 4490252 T DE4490252 T DE 4490252T DE 4490252 T DE4490252 T DE 4490252T DE 4490252 D2 DE4490252 D2 DE 4490252D2
Authority
DE
Germany
Prior art keywords
semiconductor laser
fibers
radiation
laser
controller
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE4490252T
Other languages
English (en)
Other versions
DE4490252B4 (de
Inventor
Hans Opower
Helmut Huegel
Adolf Giesen
Friedrich Dausinger
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Deutsches Zentrum fuer Luft und Raumfahrt eV
Institut fuer Strahlwerkzeuge Universitaet Stuttgart
Original Assignee
Deutsches Zentrum fuer Luft und Raumfahrt eV
Institut fuer Strahlwerkzeuge Universitaet Stuttgart
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Deutsches Zentrum fuer Luft und Raumfahrt eV, Institut fuer Strahlwerkzeuge Universitaet Stuttgart filed Critical Deutsches Zentrum fuer Luft und Raumfahrt eV
Priority to DE4490252T priority Critical patent/DE4490252B4/de
Publication of DE4490252D2 publication Critical patent/DE4490252D2/de
Application granted granted Critical
Publication of DE4490252B4 publication Critical patent/DE4490252B4/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00—Semiconductor lasers
    • H01S5/40—Arrangement of two or more semiconductor lasers, not provided for in groups H01S5/02 - H01S5/30
    • H01S5/4025—Array arrangements, e.g. constituted by discrete laser diodes or laser bar
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00—Working by laser beam, e.g. welding, cutting or boring
    • B23K26/02—Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
    • B23K26/06—Shaping the laser beam, e.g. by masks or multi-focusing
    • B23K26/0604—Shaping the laser beam, e.g. by masks or multi-focusing by a combination of beams
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00—Working by laser beam, e.g. welding, cutting or boring
    • B23K26/02—Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
    • B23K26/06—Shaping the laser beam, e.g. by masks or multi-focusing
    • B23K26/0604—Shaping the laser beam, e.g. by masks or multi-focusing by a combination of beams
    • B23K26/0613—Shaping the laser beam, e.g. by masks or multi-focusing by a combination of beams having a common axis
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
    • G02B6/24—Coupling light guides
    • G02B6/42—Coupling light guides with opto-electronic elements
    • G02B6/4201—Packages, e.g. shape, construction, internal or external details
    • G02B6/4204—Packages, e.g. shape, construction, internal or external details the coupling comprising intermediate optical elements, e.g. lenses, holograms
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
    • G02B6/24—Coupling light guides
    • G02B6/42—Coupling light guides with opto-electronic elements
    • G02B6/4201—Packages, e.g. shape, construction, internal or external details
    • G02B6/4204—Packages, e.g. shape, construction, internal or external details the coupling comprising intermediate optical elements, e.g. lenses, holograms
    • G02B6/4214—Packages, e.g. shape, construction, internal or external details the coupling comprising intermediate optical elements, e.g. lenses, holograms the intermediate optical element having redirecting reflective means, e.g. mirrors, prisms for deflecting the radiation from horizontal to down- or upward direction toward a device
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
    • G02B6/24—Coupling light guides
    • G02B6/42—Coupling light guides with opto-electronic elements
    • G02B6/4201—Packages, e.g. shape, construction, internal or external details
    • G02B6/4249—Packages, e.g. shape, construction, internal or external details comprising arrays of active devices and fibres
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/09—Processes or apparatus for excitation, e.g. pumping
    • H01S3/091—Processes or apparatus for excitation, e.g. pumping using optical pumping
    • H01S3/094—Processes or apparatus for excitation, e.g. pumping using optical pumping by coherent light
    • H01S3/0941—Processes or apparatus for excitation, e.g. pumping using optical pumping by coherent light of a laser diode
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
    • G02B6/04—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings formed by bundles of fibres
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00—Semiconductor lasers
    • H01S5/40—Arrangement of two or more semiconductor lasers, not provided for in groups H01S5/02 - H01S5/30
    • H01S5/4012—Beam combining, e.g. by the use of fibres, gratings, polarisers, prisms
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00—Semiconductor lasers
    • H01S5/40—Arrangement of two or more semiconductor lasers, not provided for in groups H01S5/02 - H01S5/30
    • H01S5/42—Arrays of surface emitting lasers
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00—Semiconductor lasers
    • H01S5/40—Arrangement of two or more semiconductor lasers, not provided for in groups H01S5/02 - H01S5/30
    • H01S5/42—Arrays of surface emitting lasers
    • H01S5/423—Arrays of surface emitting lasers having a vertical cavity

Landscapes

  • Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Engineering & Computer Science (AREA)
  • General Physics & Mathematics (AREA)
  • Electromagnetism (AREA)
  • Plasma & Fusion (AREA)
  • Mechanical Engineering (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Optical Couplings Of Light Guides (AREA)
  • Semiconductor Lasers (AREA)

Abstract

Um ein Halbleiterlasersystem mit mehreren einen Laseroszillator umfassenden Halbleiterlasereinheiten, mit einem Kopplungselement, welches die aus der jeweiligen Halbleiterlasereinheit austretende Laserstrahlung in die jeweilige lichtleitende Faser einkoppelt, und mit einem die Fasern umfassenden Faserbündel, aus dem eine durch die Summe der jeweils von den Halbleiterlasereinheiten erzeugten kohärenten Laserstrahlung gebildete Gesamtlaserstrahlung austritt, und mit einer Steuerung, mit welcher die Leistung jeder einzelnen Halbleiterlasereinheit definiert steuerbar ist, wobei die Steuerung eine Bestrahlung unterschiedlicher Flächenelemente der Zielfläche mit einzeln für jedes Flächenelement definierbarer Intensität vorgebbar ist, derart zu verbessern, daß mit diesem komplexe Bestrahlungsaufgaben in einfacher und möglichst effektiver Art und Weise durchführbar sind, wird vorgeschlagen, daß die Fasern Monomodefasern sind, daß jede der Halbleiterlasereinheiten im transversalen Grundmode arbeitet und daß die Einkopplung der Laserstrahlung in jede Monomodefaser beugungsbegrenzt erfolgt.
DE4490252T 1993-01-22 1994-01-14 Leistungsgesteuertes fraktales Lasersystem Expired - Fee Related DE4490252B4 (de)

Priority Applications (1)

Application Number Priority Date Filing Date Title
DE4490252T DE4490252B4 (de) 1993-01-22 1994-01-14 Leistungsgesteuertes fraktales Lasersystem

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
DE4301689A DE4301689A1 (de) 1993-01-22 1993-01-22 Leistungsgesteuertes fraktales Lasersystem
DEP4301689.8 1993-01-22
PCT/DE1994/000037 WO1994017576A1 (de) 1993-01-22 1994-01-14 Leistungsgesteuertes fraktales lasersystem
DE4490252T DE4490252B4 (de) 1993-01-22 1994-01-14 Leistungsgesteuertes fraktales Lasersystem

Publications (2)

Publication Number Publication Date
DE4490252D2 true DE4490252D2 (de) 1997-07-31
DE4490252B4 DE4490252B4 (de) 2005-07-28

Family

ID=6478728

Family Applications (2)

Application Number Title Priority Date Filing Date
DE4301689A Withdrawn DE4301689A1 (de) 1993-01-22 1993-01-22 Leistungsgesteuertes fraktales Lasersystem
DE4490252T Expired - Fee Related DE4490252B4 (de) 1993-01-22 1994-01-14 Leistungsgesteuertes fraktales Lasersystem

Family Applications Before (1)

Application Number Title Priority Date Filing Date
DE4301689A Withdrawn DE4301689A1 (de) 1993-01-22 1993-01-22 Leistungsgesteuertes fraktales Lasersystem

Country Status (3)

Country Link
JP (1) JP2683158B2 (de)
DE (2) DE4301689A1 (de)
WO (1) WO1994017576A1 (de)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE4429913C1 (de) * 1994-08-23 1996-03-21 Fraunhofer Ges Forschung Vorrichtung und Verfahren zum Plattieren
FR2737814B1 (fr) * 1995-08-11 1997-09-12 Soc D Production Et De Rech Ap Procede et dispositif de commande d'une source laser a plusieurs modules laser pour optimiser le traitement de surface par laser
DE19603111C2 (de) * 1996-01-29 2002-08-14 Deutsch Zentr Luft & Raumfahrt Lasersystem
DE19843556A1 (de) * 1998-09-23 2000-04-13 Heinz Kleiber Verfahren und Vorrichtung zur temperaturgeregelten Wärmebehandlung von Werkstücken
DE19942250A1 (de) * 1999-09-04 2001-03-08 Hella Kg Hueck & Co Lichtwellenleitung für die Laser-Schweißung
US6856634B2 (en) 2001-02-19 2005-02-15 Toyota Jidoshi Kabushiki Kaisha Laser processing device and laser processing method
JP4182001B2 (ja) * 2002-03-12 2008-11-19 三星ダイヤモンド工業株式会社 脆性材料の加工方法及び加工装置
JP2004207349A (ja) * 2002-12-24 2004-07-22 Matsushita Electric Ind Co Ltd 半導体レーザ装置およびその製造方法
DE20308097U1 (de) * 2003-05-23 2004-09-23 Kuka Schweissanlagen Gmbh Lasereinrichtung
DE102011012511A1 (de) 2011-02-25 2012-08-30 Limo Patentverwaltung Gmbh & Co. Kg Vorrichtung zur Überlagerung von Laserstrahlen einer Mehrzahl von Laserlichtquellen in einer Arbeitsebene
EP3207602A4 (de) 2014-10-15 2018-06-20 Lumentum Operations LLC Lasersystem und verfahren zur einstellung der ausgangsleistung des lasersystems
CN118284490A (zh) * 2022-08-03 2024-07-02 Ire-Polus科学技术协会有限责任公司 用多光束激光系统照射部件表面的方法

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3590248A (en) * 1965-04-13 1971-06-29 Massachusetts Inst Technology Laser arrays
DE2153969A1 (de) * 1971-10-29 1973-05-03 Licentia Gmbh Anordnung zur erhoehung der strahlungsdichte von strahlungsquellen
US4637685A (en) * 1983-07-08 1987-01-20 At&T Bell Laboratories High power, broad area, monochromatic light source
US4849626A (en) * 1987-11-13 1989-07-18 The Babcock & Wilcox Company Fiber optic bore inspection probe
JPH02142695A (ja) * 1988-07-13 1990-05-31 Sony Corp レーザ加工装置
US4901329A (en) * 1988-10-31 1990-02-13 International Business Machines Corporation Integrated laser arrays and support circuits
WO1991001056A1 (en) * 1989-07-06 1991-01-24 Australian Electro Optics Pty. Ltd. Segmented, fibre coupled diode laser arrays
WO1991001057A1 (en) * 1989-07-06 1991-01-24 Australian Electro Optics Pty. Ltd. Grouped, phase-locked, diode arrays
US5025451A (en) * 1989-10-20 1991-06-18 Trw Inc. Two-dimensional integrated laser array
JPH03208630A (ja) 1990-01-12 1991-09-11 Nippon Petrochem Co Ltd 積層体・熱収縮性積層フィルム・発泡積層体
GB2240851A (en) 1990-01-17 1991-08-14 Courtaulds Plc Photochromic imaging process
EP0445488B1 (de) * 1990-03-08 1994-06-01 International Business Machines Corporation Halbleiterlaseranordnung
US5003550A (en) * 1990-03-09 1991-03-26 Spectra Diode Laboratories, Inc. Integrated laser-amplifier with steerable beam

Also Published As

Publication number Publication date
WO1994017576A1 (de) 1994-08-04
DE4301689A1 (de) 1994-07-28
JPH07504788A (ja) 1995-05-25
JP2683158B2 (ja) 1997-11-26
DE4490252B4 (de) 2005-07-28

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Legal Events

Date Code Title Description
OP8 Request for examination as to paragraph 44 patent law
8127 New person/name/address of the applicant

Owner name: DEUTSCHES ZENTRUM FUER LUFT- UND RAUMFAHRT E.V., 5

8364 No opposition during term of opposition
8327 Change in the person/name/address of the patent owner

Owner name: UNIV. STUTTGART INSTITUT F. STRAHLWERKZEUGE, DE

Owner name: DEUTSCHES ZENTRUM F. LUFT- UND RAUMFAHRT E.V., DE

8339 Ceased/non-payment of the annual fee