DE4123052C2 - - Google Patents
Info
- Publication number
- DE4123052C2 DE4123052C2 DE19914123052 DE4123052A DE4123052C2 DE 4123052 C2 DE4123052 C2 DE 4123052C2 DE 19914123052 DE19914123052 DE 19914123052 DE 4123052 A DE4123052 A DE 4123052A DE 4123052 C2 DE4123052 C2 DE 4123052C2
- Authority
- DE
- Germany
- Prior art keywords
- sensor
- plate
- mirror plate
- element according
- control
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 238000012937 correction Methods 0.000 claims description 11
- 230000005855 radiation Effects 0.000 claims description 8
- 238000001816 cooling Methods 0.000 claims description 6
- 238000005452 bending Methods 0.000 claims description 4
- 239000000463 material Substances 0.000 claims description 4
- 238000012545 processing Methods 0.000 claims description 4
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims description 3
- 239000011248 coating agent Substances 0.000 claims description 3
- 238000000576 coating method Methods 0.000 claims description 3
- 230000003287 optical effect Effects 0.000 claims description 3
- 229910052710 silicon Inorganic materials 0.000 claims description 3
- 239000010703 silicon Substances 0.000 claims description 3
- 201000009310 astigmatism Diseases 0.000 claims description 2
- 238000011144 upstream manufacturing Methods 0.000 claims description 2
- 238000000034 method Methods 0.000 description 2
- 230000001419 dependent effect Effects 0.000 description 1
- 238000001514 detection method Methods 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 230000018109 developmental process Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 230000010354 integration Effects 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 230000001105 regulatory effect Effects 0.000 description 1
- 239000002210 silicon-based material Substances 0.000 description 1
- 230000006641 stabilisation Effects 0.000 description 1
- 238000011105 stabilization Methods 0.000 description 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/02—Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
- B23K26/04—Automatically aligning, aiming or focusing the laser beam, e.g. using the back-scattered light
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/02—Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
- B23K26/04—Automatically aligning, aiming or focusing the laser beam, e.g. using the back-scattered light
- B23K26/042—Automatically aligning the laser beam
- B23K26/043—Automatically aligning the laser beam along the beam path, i.e. alignment of laser beam axis relative to laser beam apparatus
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
- G02B26/08—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light
- G02B26/0816—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J1/00—Photometry, e.g. photographic exposure meter
- G01J1/42—Photometry, e.g. photographic exposure meter using electric radiation detectors
- G01J1/4257—Photometry, e.g. photographic exposure meter using electric radiation detectors applied to monitoring the characteristics of a beam, e.g. laser beam, headlamp beam
Landscapes
- Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Mechanical Engineering (AREA)
- General Physics & Mathematics (AREA)
- Lasers (AREA)
- Mechanical Light Control Or Optical Switches (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE4123052A DE4123052A1 (de) | 1990-09-13 | 1991-07-12 | Integriertes sensor- und stellelement fuer die brennpunktlageregelung von hochleistungslasern |
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE4029074 | 1990-09-13 | ||
| DE4123052A DE4123052A1 (de) | 1990-09-13 | 1991-07-12 | Integriertes sensor- und stellelement fuer die brennpunktlageregelung von hochleistungslasern |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| DE4123052A1 DE4123052A1 (de) | 1992-03-19 |
| DE4123052C2 true DE4123052C2 (enExample) | 1993-07-22 |
Family
ID=25896836
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| DE4123052A Granted DE4123052A1 (de) | 1990-09-13 | 1991-07-12 | Integriertes sensor- und stellelement fuer die brennpunktlageregelung von hochleistungslasern |
Country Status (1)
| Country | Link |
|---|---|
| DE (1) | DE4123052A1 (enExample) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE4424492A1 (de) * | 1994-07-12 | 1996-01-25 | Diehl Gmbh & Co | Anordnung zur Werkstückbearbeitung mittels eines auf einen Brennfleck fokussierbaren Lasers |
Families Citing this family (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE59402170D1 (de) * | 1994-08-24 | 1997-04-24 | Schablonentechnik Kufstein Ag | Vorrichtung zur Herstellung einer Druckschablone |
| NL1001752C2 (nl) * | 1995-11-27 | 1997-05-30 | Tno | Deflector. |
| DE10029306C2 (de) * | 2000-06-14 | 2003-07-31 | Physik Instr Pi Gmbh & Co | Anordnung zur temperaturkompensierten, mehrdimensionalen Mikropositionierung von zueinander lagedefinierten optischen Komponenten |
| US6943968B2 (en) | 2002-04-26 | 2005-09-13 | Massachusetts Institute Of Technology | Adjustable focusing composite for use in an optical profilometer system and method |
| DE102012209837A1 (de) * | 2012-06-12 | 2013-12-12 | Trumpf Laser- Und Systemtechnik Gmbh | EUV-Anregungslichtquelle mit einer Laserstrahlquelle und einer Strahlführungsvorrichtung zum Manipulieren des Laserstrahls |
| CN111864524B (zh) * | 2020-08-14 | 2024-05-28 | 江苏博创翰林光电高科技有限公司 | 一种激光输出稳定性的监测与反馈控制系统 |
Family Cites Families (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4091274A (en) * | 1976-12-22 | 1978-05-23 | United Technologies Corporation | Active laser mirror system |
| DE3133823C1 (de) * | 1981-08-27 | 1983-03-10 | Messerschmitt-Bölkow-Blohm GmbH, 8000 München | Reflektor für einen Hochenergielaser |
| DE3202432C2 (de) * | 1982-01-26 | 1987-04-23 | Messerschmitt-Bölkow-Blohm GmbH, 8000 München | Hochenergielaser-Feintracker |
| DE3406677A1 (de) * | 1984-02-24 | 1985-09-05 | Fa. Carl Zeiss, 7920 Heidenheim | Einrichtung zur kompensation der auswanderung eines laserstrahls |
| DE3408263C1 (de) * | 1984-03-07 | 1985-12-05 | Messerschmitt-Bölkow-Blohm GmbH, 8012 Ottobrunn | Verfahren zur Herstellung von Hochenergielaserspiegeln |
| FR2584824B1 (fr) * | 1985-07-10 | 1987-09-25 | Commissariat Energie Atomique | Miroir deformable |
| US4657358A (en) * | 1985-08-23 | 1987-04-14 | Itek Corporation | Cooled deformable mirror |
| GB8800894D0 (en) * | 1988-01-15 | 1988-06-02 | Atomic Energy Authority Uk | Optical alignment system |
| DE4012927C2 (de) * | 1990-04-24 | 1995-10-12 | Daimler Benz Aerospace Ag | Meß-Verfahren und -Vorrichtung zur dreidimensionalen Lageregelung des Brennpunktes eines Hochenergie-Laserstrahls |
-
1991
- 1991-07-12 DE DE4123052A patent/DE4123052A1/de active Granted
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE4424492A1 (de) * | 1994-07-12 | 1996-01-25 | Diehl Gmbh & Co | Anordnung zur Werkstückbearbeitung mittels eines auf einen Brennfleck fokussierbaren Lasers |
Also Published As
| Publication number | Publication date |
|---|---|
| DE4123052A1 (de) | 1992-03-19 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| OP8 | Request for examination as to paragraph 44 patent law | ||
| 8127 | New person/name/address of the applicant |
Owner name: DEUTSCHE AEROSPACE AG, 8000 MUENCHEN, DE |
|
| D2 | Grant after examination | ||
| 8364 | No opposition during term of opposition | ||
| 8327 | Change in the person/name/address of the patent owner |
Owner name: DAIMLER-BENZ AEROSPACE AKTIENGESELLSCHAFT, 80804 M |
|
| 8339 | Ceased/non-payment of the annual fee |