DE3890060C2 - Verdampfbare Zttriumoxid, Tinaoxid und Zirkoniumoxid enthaltende Zusammensetzung und deren Verwendung - Google Patents

Verdampfbare Zttriumoxid, Tinaoxid und Zirkoniumoxid enthaltende Zusammensetzung und deren Verwendung

Info

Publication number
DE3890060C2
DE3890060C2 DE19883890060 DE3890060A DE3890060C2 DE 3890060 C2 DE3890060 C2 DE 3890060C2 DE 19883890060 DE19883890060 DE 19883890060 DE 3890060 A DE3890060 A DE 3890060A DE 3890060 C2 DE3890060 C2 DE 3890060C2
Authority
DE
Germany
Prior art keywords
oxide
refractive index
layer
cttrium
tina
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE19883890060
Other languages
German (de)
English (en)
Other versions
DE3890060T (enrdf_load_stackoverflow
Inventor
Syungo Tsuboi
Yoshifumi Matsushita
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Electric Corp
Original Assignee
Mitsubishi Electric Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Electric Corp filed Critical Mitsubishi Electric Corp
Application granted granted Critical
Publication of DE3890060C2 publication Critical patent/DE3890060C2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C04CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
    • C04BLIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
    • C04B35/00Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
    • C04B35/622Forming processes; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
    • C04B35/62218Forming processes; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products obtaining ceramic films, e.g. by using temporary supports
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/08Oxides
    • C23C14/083Oxides of refractory metals or yttrium
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10FINORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F77/00Constructional details of devices covered by this subclass
    • H10F77/30Coatings
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10FINORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F77/00Constructional details of devices covered by this subclass
    • H10F77/30Coatings
    • H10F77/306Coatings for devices having potential barriers
    • H10F77/311Coatings for devices having potential barriers for photovoltaic cells
    • H10F77/315Coatings for devices having potential barriers for photovoltaic cells the coatings being antireflective or having enhancing optical properties
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10HINORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
    • H10H20/00Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
    • H10H20/80Constructional details
    • H10H20/84Coatings, e.g. passivation layers or antireflective coatings
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02EREDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E10/00Energy generation through renewable energy sources
    • Y02E10/50Photovoltaic [PV] energy

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Organic Chemistry (AREA)
  • Manufacturing & Machinery (AREA)
  • Ceramic Engineering (AREA)
  • Materials Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Structural Engineering (AREA)
  • Inorganic Chemistry (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Physical Vapour Deposition (AREA)
  • Surface Treatment Of Optical Elements (AREA)
  • Inorganic Compounds Of Heavy Metals (AREA)
  • Photovoltaic Devices (AREA)
  • Surface Treatment Of Glass (AREA)
DE19883890060 1987-02-04 1988-02-04 Verdampfbare Zttriumoxid, Tinaoxid und Zirkoniumoxid enthaltende Zusammensetzung und deren Verwendung Expired - Lifetime DE3890060C2 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP62023946A JPS63192856A (ja) 1987-02-04 1987-02-04 蒸着用酸化イツトリウム組成物及び反射防止膜の製造方法
PCT/JP1988/000103 WO1988005963A1 (en) 1987-02-04 1988-02-04 Yttrium oxide composition for use in evaporation and process for preparing anti-reflection film thereof

Publications (1)

Publication Number Publication Date
DE3890060C2 true DE3890060C2 (de) 1990-08-16

Family

ID=12124709

Family Applications (2)

Application Number Title Priority Date Filing Date
DE19883890060 Expired - Lifetime DE3890060C2 (de) 1987-02-04 1988-02-04 Verdampfbare Zttriumoxid, Tinaoxid und Zirkoniumoxid enthaltende Zusammensetzung und deren Verwendung
DE19883890060 Pending DE3890060T (enrdf_load_stackoverflow) 1987-02-04 1988-02-04

Family Applications After (1)

Application Number Title Priority Date Filing Date
DE19883890060 Pending DE3890060T (enrdf_load_stackoverflow) 1987-02-04 1988-02-04

Country Status (6)

Country Link
JP (1) JPS63192856A (enrdf_load_stackoverflow)
KR (1) KR910008716B1 (enrdf_load_stackoverflow)
CN (1) CN1017164B (enrdf_load_stackoverflow)
DE (2) DE3890060C2 (enrdf_load_stackoverflow)
SE (1) SE8803506D0 (enrdf_load_stackoverflow)
WO (1) WO1988005963A1 (enrdf_load_stackoverflow)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2850371B2 (ja) * 1989-06-19 1999-01-27 松下電器産業株式会社 画像出力装置
CN102140621A (zh) * 2011-03-10 2011-08-03 苏州大学 一种致密复合二氧化钛薄膜的制备方法

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3613501A1 (de) * 1986-04-22 1987-10-29 Stefan Dipl Ing Donnerhack Verfahren zur antikatalytischen beschichtung von thermoelementen

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4246043A (en) * 1979-12-03 1981-01-20 Solarex Corporation Yttrium oxide antireflective coating for solar cells

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3613501A1 (de) * 1986-04-22 1987-10-29 Stefan Dipl Ing Donnerhack Verfahren zur antikatalytischen beschichtung von thermoelementen

Also Published As

Publication number Publication date
CN87107819A (zh) 1988-08-17
KR890700927A (ko) 1989-04-28
DE3890060T (enrdf_load_stackoverflow) 1989-03-23
WO1988005963A1 (en) 1988-08-11
CN1017164B (zh) 1992-06-24
JPS63192856A (ja) 1988-08-10
SE8803506L (sv) 1988-10-03
SE8803506D0 (sv) 1988-10-03
KR910008716B1 (ko) 1991-10-19

Similar Documents

Publication Publication Date Title
DE69611781T2 (de) Optisches beschichtungsmaterial aus mischoxiden mit hohem brechungsindex und verfahren
DE2759243C2 (enrdf_load_stackoverflow)
DE1646553C (enrdf_load_stackoverflow)
DE2336049A1 (de) Aus abwechselnd hoch- und niederbrechenden oxidschichten aufgebautes verlustarmes, hochreflektierendes vielschichtsystem
DE2751938C2 (de) Verfahren zur Herstellung von Dispersionskeramiken
DE2338019C3 (de) Verfahren zur Herstellung nur der aus einem zu Inhomogenitäten neigenden Material bestehenden Lambda-Halbe-Schicht eines Anticeflexionsfilms
CH625054A5 (enrdf_load_stackoverflow)
DE3616265A1 (de) Verbundstoff aus mit graphitfasern verstaerkter siliziumdioxid-matrix
DE3150525A1 (de) Polykristalline zinksulfid- und zinkselenid-erzeugnisse mit verbesserter optischer qualitaet sowie verfahren zur herstellung derartiger artikel
DE2457474C3 (de) Verfahren zur Herstellung von reflexmindernden Mehrfachschichten und durch das Verfahren hergestellter optischer Körper
DE3890060C2 (de) Verdampfbare Zttriumoxid, Tinaoxid und Zirkoniumoxid enthaltende Zusammensetzung und deren Verwendung
DE3909654A1 (de) Reflexionsverhindernder film fuer optische teile aus kunststoff
DE2339183A1 (de) Verfahren zum aufwachsen einer epitaxieschicht auf einem einkristallinen, in seiner zusammensetzung mit ihr nicht identischen substrat
DE10307095A1 (de) Aufdampfmaterial zur Herstellung hochbrechender optischer Schichten
DE3131742A1 (de) Fuer konvergierendes licht durchlaessiger hochqualitaetsglaskoerper und verfahren zu dessen herstellung
DE69312540T2 (de) Verdampfungsmaterial sowie dieses verwendendes Verfahren zur Herstellung optischer Dünnschichten
DE2050556C3 (de) Verfahren zur Herstellung einer hochbrechenden optisch homogenen und absorptionsfreien Oxidschicht
DE69217734T2 (de) Verfahren zur Herstellung eines supraleitenden Bi-Sr-Ca-Cu-O Films
DE69924095T2 (de) Optisch klare, dauerbeständige infrarot-fenster und herstellungsverfahren
CH680214A5 (enrdf_load_stackoverflow)
DE69025860T2 (de) Optische Elemente und Methode zu deren Erzeugung
DE3026703C2 (de) Verfahren zur Herstellung eines Antireflexbelages auf einem transparenten Material, wie einem optischen Glas
DD213514A1 (de) Verfahren zur herstellung von calciumfluorid-einkristallen fuer optische zwecke
DE69401198T2 (de) Zusammensetzungen für halogenidglas
EP0337329A2 (de) Verfahren zur Herstellung dünner Metallfilme durch Aufdampfen