DE3888372D1 - Verfahren zur Reinigung von Hexamethyldisiloxan. - Google Patents

Verfahren zur Reinigung von Hexamethyldisiloxan.

Info

Publication number
DE3888372D1
DE3888372D1 DE88300907T DE3888372T DE3888372D1 DE 3888372 D1 DE3888372 D1 DE 3888372D1 DE 88300907 T DE88300907 T DE 88300907T DE 3888372 T DE3888372 T DE 3888372T DE 3888372 D1 DE3888372 D1 DE 3888372D1
Authority
DE
Germany
Prior art keywords
hexamethyldisiloxane
purification
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE88300907T
Other languages
English (en)
Other versions
DE3888372T2 (de
Inventor
Takeshi Imai
Masahiko Suzuki
Ikuzo Takahashi
Shuzo Toida
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
DuPont Toray Specialty Materials KK
Original Assignee
Toray Silicone Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toray Silicone Co Ltd filed Critical Toray Silicone Co Ltd
Publication of DE3888372D1 publication Critical patent/DE3888372D1/de
Application granted granted Critical
Publication of DE3888372T2 publication Critical patent/DE3888372T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
    • C07F7/02—Silicon compounds
    • C07F7/08—Compounds having one or more C—Si linkages
    • C07F7/20—Purification, separation

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
DE3888372T 1987-02-03 1988-02-03 Verfahren zur Reinigung von Hexamethyldisiloxan. Expired - Fee Related DE3888372T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP62023325A JPS63190891A (ja) 1987-02-03 1987-02-03 ヘキサメチルジシロキサンの精製方法

Publications (2)

Publication Number Publication Date
DE3888372D1 true DE3888372D1 (de) 1994-04-21
DE3888372T2 DE3888372T2 (de) 1994-10-06

Family

ID=12107432

Family Applications (1)

Application Number Title Priority Date Filing Date
DE3888372T Expired - Fee Related DE3888372T2 (de) 1987-02-03 1988-02-03 Verfahren zur Reinigung von Hexamethyldisiloxan.

Country Status (5)

Country Link
US (1) US4774346A (de)
EP (1) EP0277825B1 (de)
JP (1) JPS63190891A (de)
CA (1) CA1316543C (de)
DE (1) DE3888372T2 (de)

Families Citing this family (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE69330664T2 (de) * 1992-01-21 2002-07-04 Olympus Optical Co., Ltd. Lösungsmittel zum reinigen und trocknen
JP2730427B2 (ja) * 1992-09-24 1998-03-25 信越化学工業株式会社 シロキサン類の精製方法
US5660690A (en) * 1996-06-03 1997-08-26 Dow Corning Corporation Method for distilling hexamethylcyclotrisiloxane
US6312476B1 (en) 1999-11-10 2001-11-06 General Electric Company Process for removal of odors from silicones
US6368359B1 (en) 1999-12-17 2002-04-09 General Electric Company Process for stabilization of dry cleaning solutions
DE60039069D1 (de) * 1999-12-17 2008-07-10 Gen Electric Verfahren zur Trockenreinigung
US7210182B2 (en) * 2002-04-22 2007-05-01 General Electric Company System and method for solvent recovery and purification in a low water or waterless wash
US7308808B2 (en) * 2002-04-22 2007-12-18 General Electric Company Apparatus and method for article cleaning
US20040045096A1 (en) * 2002-04-22 2004-03-11 General Electric Company Chemical-specific sensor for monitoring amounts of volatile solvent during a drying cycle of a dry cleaning process
US20040117920A1 (en) * 2002-04-22 2004-06-24 General Electric Company Detector for monitoring contaminants in solvent used for dry cleaning articles
US6867264B2 (en) 2002-08-28 2005-03-15 Kraton Polymers U.S. Llc Process for removing residual silicon species from hydrocarbon solvents
US20050019580A1 (en) * 2003-06-10 2005-01-27 Mori Yasuhiro Method for modifying surface of solid substrate, surface modified solid substrate and apparatus for modifying surface of solid substrate
JP4720072B2 (ja) * 2003-07-01 2011-07-13 東レ株式会社 シリコーン剤の精製方法およびシリコーン剤
US7356865B2 (en) * 2003-07-29 2008-04-15 General Electric Company Apparatus and method for removing contaminants from dry cleaning solvent
RU2447078C1 (ru) * 2010-11-08 2012-04-10 Российская Федерация, От Имени Которой Выступает Министерство Образования И Науки Российской Федерации Способ очистки жидких, летучих алкилсилоксанов и алкилсилазанов
CN102617625B (zh) * 2012-03-09 2015-02-18 山东东岳有机硅材料有限公司 高品质六甲基二硅氧烷的制备方法
CN108129509A (zh) * 2017-12-25 2018-06-08 湖北泓肽生物科技有限公司 一种回收利用硅烷保护反应过程中产生的废弃物的方法
CN114805422B (zh) * 2022-05-17 2024-08-27 山东博苑医药化学股份有限公司 一种烷胺釜残回收硅醚的方法
CN115433360B (zh) * 2022-09-30 2023-08-11 镇江江南化工有限公司 一种低沸硅油的净化方法
US12084466B1 (en) * 2023-09-20 2024-09-10 Honeywell Federal Manufacturing & Technologies, Llc Purification of trimethylsilanol

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE1645671A1 (de) * 1951-01-28 1970-09-24 Wacker Chemie Gmbh Verfahren zur Reinigung von Organopolysiloxanoelen
US4127598A (en) * 1977-02-22 1978-11-28 Mcentee Harry R Process for removing biphenyls from chlorosilanes
US4156689A (en) * 1978-02-13 1979-05-29 General Electric Company Purification of hydrosilanes and siloxanes
US4210496A (en) * 1978-06-07 1980-07-01 Arthur G. Mckee & Company Distillation process for recovery of hexamethyl disiloxane
DE3108235A1 (de) * 1981-03-05 1982-09-30 Dynamit Nobel Ag, 5210 Troisdorf "verfahren zur reinigung von hexamethyldisiloxan und die dabei anfallenden azeotropen gemische"
JPS59209565A (ja) * 1983-05-07 1984-11-28 東洋製罐株式会社 容器の内容物取出し部構造
DE3534218A1 (de) * 1984-11-13 1987-03-26 Licentia Gmbh Verfahren zur reinigung von siliconoel
JPS62114992A (ja) * 1985-11-14 1987-05-26 Toray Silicone Co Ltd アルコキシシランの精製方法

Also Published As

Publication number Publication date
CA1316543C (en) 1993-04-20
US4774346A (en) 1988-09-27
EP0277825A3 (en) 1990-07-25
EP0277825B1 (de) 1994-03-16
JPH0312073B2 (de) 1991-02-19
EP0277825A2 (de) 1988-08-10
JPS63190891A (ja) 1988-08-08
DE3888372T2 (de) 1994-10-06

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee