DE3885682T2 - Verfahren zum Galvanisieren von Metallen. - Google Patents
Verfahren zum Galvanisieren von Metallen.Info
- Publication number
- DE3885682T2 DE3885682T2 DE88308221T DE3885682T DE3885682T2 DE 3885682 T2 DE3885682 T2 DE 3885682T2 DE 88308221 T DE88308221 T DE 88308221T DE 3885682 T DE3885682 T DE 3885682T DE 3885682 T2 DE3885682 T2 DE 3885682T2
- Authority
- DE
- Germany
- Prior art keywords
- anode
- bath
- anode material
- insoluble
- nickel
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 229910052751 metal Inorganic materials 0.000 title claims abstract description 41
- 239000002184 metal Substances 0.000 title claims abstract description 41
- 238000000034 method Methods 0.000 title claims abstract description 31
- 238000009713 electroplating Methods 0.000 title claims abstract description 26
- 230000008569 process Effects 0.000 title claims abstract description 12
- 150000002739 metals Chemical class 0.000 title claims abstract description 7
- 239000012266 salt solution Substances 0.000 claims abstract description 17
- 150000003839 salts Chemical class 0.000 claims abstract description 7
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 claims description 190
- 229910052759 nickel Inorganic materials 0.000 claims description 92
- 238000007747 plating Methods 0.000 claims description 89
- 239000000243 solution Substances 0.000 claims description 56
- 239000010405 anode material Substances 0.000 claims description 44
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims description 25
- 229910002804 graphite Inorganic materials 0.000 claims description 23
- 239000010439 graphite Substances 0.000 claims description 23
- QAOWNCQODCNURD-UHFFFAOYSA-N sulfuric acid group Chemical group S(O)(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 claims description 20
- -1 platinum group metal oxide Chemical class 0.000 claims description 16
- 239000000463 material Substances 0.000 claims description 14
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 claims description 12
- 239000012528 membrane Substances 0.000 claims description 12
- 239000010936 titanium Substances 0.000 claims description 11
- 229910052719 titanium Inorganic materials 0.000 claims description 11
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 11
- 239000011248 coating agent Substances 0.000 claims description 9
- 238000000576 coating method Methods 0.000 claims description 9
- 238000005342 ion exchange Methods 0.000 claims description 8
- 239000003014 ion exchange membrane Substances 0.000 claims description 7
- HTXDPTMKBJXEOW-UHFFFAOYSA-N dioxoiridium Chemical compound O=[Ir]=O HTXDPTMKBJXEOW-UHFFFAOYSA-N 0.000 claims description 6
- 229910000457 iridium oxide Inorganic materials 0.000 claims description 6
- 239000000758 substrate Substances 0.000 claims description 6
- 239000003792 electrolyte Substances 0.000 claims description 4
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 claims description 4
- 229910000978 Pb alloy Inorganic materials 0.000 claims description 2
- 239000011324 bead Substances 0.000 claims description 2
- 230000007935 neutral effect Effects 0.000 claims description 2
- 229910052697 platinum Inorganic materials 0.000 claims description 2
- 239000008237 rinsing water Substances 0.000 claims description 2
- 229910001925 ruthenium oxide Inorganic materials 0.000 claims description 2
- WOCIAKWEIIZHES-UHFFFAOYSA-N ruthenium(iv) oxide Chemical compound O=[Ru]=O WOCIAKWEIIZHES-UHFFFAOYSA-N 0.000 claims description 2
- 239000003153 chemical reaction reagent Substances 0.000 claims 4
- 230000001681 protective effect Effects 0.000 claims 3
- 229910052799 carbon Inorganic materials 0.000 claims 2
- YADSGOSSYOOKMP-UHFFFAOYSA-N dioxolead Chemical compound O=[Pb]=O YADSGOSSYOOKMP-UHFFFAOYSA-N 0.000 claims 2
- 238000005246 galvanizing Methods 0.000 claims 1
- 229910044991 metal oxide Inorganic materials 0.000 claims 1
- 229910000510 noble metal Inorganic materials 0.000 claims 1
- 239000002699 waste material Substances 0.000 abstract description 11
- 239000002195 soluble material Substances 0.000 abstract description 3
- 239000002198 insoluble material Substances 0.000 abstract description 2
- ZYGHJZDHTFUPRJ-UHFFFAOYSA-N coumarin Chemical compound C1=CC=C2OC(=O)C=CC2=C1 ZYGHJZDHTFUPRJ-UHFFFAOYSA-N 0.000 description 48
- 238000012360 testing method Methods 0.000 description 25
- 229960000956 coumarin Drugs 0.000 description 24
- 235000001671 coumarin Nutrition 0.000 description 24
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 11
- 239000004743 Polypropylene Substances 0.000 description 11
- 239000000460 chlorine Substances 0.000 description 11
- 229910052801 chlorine Inorganic materials 0.000 description 11
- 229920001155 polypropylene Polymers 0.000 description 11
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 10
- 229910052802 copper Inorganic materials 0.000 description 10
- 239000010949 copper Substances 0.000 description 10
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 description 9
- 150000002815 nickel Chemical class 0.000 description 9
- 239000002253 acid Substances 0.000 description 8
- QAOWNCQODCNURD-UHFFFAOYSA-L Sulfate Chemical compound [O-]S([O-])(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-L 0.000 description 7
- 238000006243 chemical reaction Methods 0.000 description 6
- 230000006378 damage Effects 0.000 description 5
- LGQLOGILCSXPEA-UHFFFAOYSA-L nickel sulfate Chemical compound [Ni+2].[O-]S([O-])(=O)=O LGQLOGILCSXPEA-UHFFFAOYSA-L 0.000 description 5
- 229910000363 nickel(II) sulfate Inorganic materials 0.000 description 5
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 4
- 230000002411 adverse Effects 0.000 description 4
- 230000000694 effects Effects 0.000 description 4
- 238000002474 experimental method Methods 0.000 description 4
- 239000004744 fabric Substances 0.000 description 4
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 3
- 239000000654 additive Substances 0.000 description 3
- 230000015556 catabolic process Effects 0.000 description 3
- 230000008859 change Effects 0.000 description 3
- 229910052804 chromium Inorganic materials 0.000 description 3
- 239000011651 chromium Substances 0.000 description 3
- 238000006731 degradation reaction Methods 0.000 description 3
- 239000007789 gas Substances 0.000 description 3
- 239000001257 hydrogen Substances 0.000 description 3
- 229910052739 hydrogen Inorganic materials 0.000 description 3
- CVHZOJJKTDOEJC-UHFFFAOYSA-N saccharin Chemical compound C1=CC=C2C(=O)NS(=O)(=O)C2=C1 CVHZOJJKTDOEJC-UHFFFAOYSA-N 0.000 description 3
- 229940081974 saccharin Drugs 0.000 description 3
- 235000019204 saccharin Nutrition 0.000 description 3
- 239000000901 saccharin and its Na,K and Ca salt Substances 0.000 description 3
- 238000009423 ventilation Methods 0.000 description 3
- KXGFMDJXCMQABM-UHFFFAOYSA-N 2-methoxy-6-methylphenol Chemical compound [CH]OC1=CC=CC([CH])=C1O KXGFMDJXCMQABM-UHFFFAOYSA-N 0.000 description 2
- KZBUYRJDOAKODT-UHFFFAOYSA-N Chlorine Chemical compound ClCl KZBUYRJDOAKODT-UHFFFAOYSA-N 0.000 description 2
- VEQPNABPJHWNSG-UHFFFAOYSA-N Nickel(2+) Chemical compound [Ni+2] VEQPNABPJHWNSG-UHFFFAOYSA-N 0.000 description 2
- 229910021586 Nickel(II) chloride Inorganic materials 0.000 description 2
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 2
- 238000013459 approach Methods 0.000 description 2
- 230000004888 barrier function Effects 0.000 description 2
- 238000005341 cation exchange Methods 0.000 description 2
- 239000003795 chemical substances by application Substances 0.000 description 2
- 235000008504 concentrate Nutrition 0.000 description 2
- 239000012141 concentrate Substances 0.000 description 2
- 238000005260 corrosion Methods 0.000 description 2
- 230000007797 corrosion Effects 0.000 description 2
- 230000002939 deleterious effect Effects 0.000 description 2
- 238000004090 dissolution Methods 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 238000001704 evaporation Methods 0.000 description 2
- 230000008020 evaporation Effects 0.000 description 2
- 230000004907 flux Effects 0.000 description 2
- 239000011888 foil Substances 0.000 description 2
- 150000002500 ions Chemical class 0.000 description 2
- 239000007788 liquid Substances 0.000 description 2
- 239000006259 organic additive Substances 0.000 description 2
- 239000005011 phenolic resin Substances 0.000 description 2
- 229920001568 phenolic resin Polymers 0.000 description 2
- 238000011084 recovery Methods 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- GOLORTLGFDVFDW-UHFFFAOYSA-N 3-(1h-benzimidazol-2-yl)-7-(diethylamino)chromen-2-one Chemical compound C1=CC=C2NC(C3=CC4=CC=C(C=C4OC3=O)N(CC)CC)=NC2=C1 GOLORTLGFDVFDW-UHFFFAOYSA-N 0.000 description 1
- 229910000640 Fe alloy Inorganic materials 0.000 description 1
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
- 229920000557 Nafion® Polymers 0.000 description 1
- 229910000990 Ni alloy Inorganic materials 0.000 description 1
- 206010067482 No adverse event Diseases 0.000 description 1
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 1
- 238000007792 addition Methods 0.000 description 1
- 230000000996 additive effect Effects 0.000 description 1
- 229910045601 alloy Inorganic materials 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- 238000004458 analytical method Methods 0.000 description 1
- 238000000429 assembly Methods 0.000 description 1
- 230000000712 assembly Effects 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 238000004364 calculation method Methods 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 150000003841 chloride salts Chemical class 0.000 description 1
- 239000002131 composite material Substances 0.000 description 1
- 239000000356 contaminant Substances 0.000 description 1
- 238000011109 contamination Methods 0.000 description 1
- ARUVKPQLZAKDPS-UHFFFAOYSA-L copper(II) sulfate Chemical compound [Cu+2].[O-][S+2]([O-])([O-])[O-] ARUVKPQLZAKDPS-UHFFFAOYSA-L 0.000 description 1
- 238000013461 design Methods 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 238000003411 electrode reaction Methods 0.000 description 1
- 238000000909 electrodialysis Methods 0.000 description 1
- 230000008030 elimination Effects 0.000 description 1
- 238000003379 elimination reaction Methods 0.000 description 1
- 230000003628 erosive effect Effects 0.000 description 1
- 239000012530 fluid Substances 0.000 description 1
- 238000009472 formulation Methods 0.000 description 1
- 239000013505 freshwater Substances 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 231100001261 hazardous Toxicity 0.000 description 1
- XLYOFNOQVPJJNP-ZSJDYOACSA-N heavy water Substances [2H]O[2H] XLYOFNOQVPJJNP-ZSJDYOACSA-N 0.000 description 1
- 230000003993 interaction Effects 0.000 description 1
- 229910052741 iridium Inorganic materials 0.000 description 1
- GKOZUEZYRPOHIO-UHFFFAOYSA-N iridium atom Chemical compound [Ir] GKOZUEZYRPOHIO-UHFFFAOYSA-N 0.000 description 1
- 230000001788 irregular Effects 0.000 description 1
- 238000002386 leaching Methods 0.000 description 1
- 235000014666 liquid concentrate Nutrition 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 229910001510 metal chloride Chemical class 0.000 description 1
- 229910000000 metal hydroxide Inorganic materials 0.000 description 1
- 150000004692 metal hydroxides Chemical class 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 229910001453 nickel ion Inorganic materials 0.000 description 1
- MUMZUERVLWJKNR-UHFFFAOYSA-N oxoplatinum Chemical compound [Pt]=O MUMZUERVLWJKNR-UHFFFAOYSA-N 0.000 description 1
- 238000002161 passivation Methods 0.000 description 1
- 230000000737 periodic effect Effects 0.000 description 1
- 229910003446 platinum oxide Inorganic materials 0.000 description 1
- 230000010287 polarization Effects 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 239000010970 precious metal Substances 0.000 description 1
- 238000005086 pumping Methods 0.000 description 1
- 238000000746 purification Methods 0.000 description 1
- 238000004064 recycling Methods 0.000 description 1
- 238000001223 reverse osmosis Methods 0.000 description 1
- 238000004088 simulation Methods 0.000 description 1
- 239000010802 sludge Substances 0.000 description 1
- MKWYFZFMAMBPQK-UHFFFAOYSA-J sodium feredetate Chemical compound [Na+].[Fe+3].[O-]C(=O)CN(CC([O-])=O)CCN(CC([O-])=O)CC([O-])=O MKWYFZFMAMBPQK-UHFFFAOYSA-J 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 150000003467 sulfuric acid derivatives Chemical class 0.000 description 1
- 229910021653 sulphate ion Inorganic materials 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- 238000012546 transfer Methods 0.000 description 1
- 230000004580 weight loss Effects 0.000 description 1
- 229910052725 zinc Inorganic materials 0.000 description 1
- 239000011701 zinc Substances 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D17/00—Constructional parts, or assemblies thereof, of cells for electrolytic coating
- C25D17/10—Electrodes, e.g. composition, counter electrode
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D17/00—Constructional parts, or assemblies thereof, of cells for electrolytic coating
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D21/00—Processes for servicing or operating cells for electrolytic coating
- C25D21/16—Regeneration of process solutions
- C25D21/18—Regeneration of process solutions of electrolytes
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Electrolytic Production Of Metals (AREA)
- Electroplating Methods And Accessories (AREA)
- Electroplating And Plating Baths Therefor (AREA)
- Manufacture And Refinement Of Metals (AREA)
- Electrical Discharge Machining, Electrochemical Machining, And Combined Machining (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US07/093,664 US4778572A (en) | 1987-09-08 | 1987-09-08 | Process for electroplating metals |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| DE3885682D1 DE3885682D1 (de) | 1993-12-23 |
| DE3885682T2 true DE3885682T2 (de) | 1994-04-28 |
Family
ID=22240108
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| DE88308221T Expired - Fee Related DE3885682T2 (de) | 1987-09-08 | 1988-09-06 | Verfahren zum Galvanisieren von Metallen. |
Country Status (12)
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE102010055143A1 (de) * | 2010-12-18 | 2012-06-21 | Umicore Galvanotechnik Gmbh | Direktkontakt-Membrananode für die Verwendung in Elektrolysezellen |
Families Citing this family (35)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| USRE34191E (en) * | 1989-05-31 | 1993-03-09 | Eco-Tec Limited | Process for electroplating metals |
| US4906340A (en) * | 1989-05-31 | 1990-03-06 | Eco-Tec Limited | Process for electroplating metals |
| US5108615A (en) * | 1989-11-28 | 1992-04-28 | Bio-Recovery Systems, Inc. | Method for recovery of a metal ion from electroless plating solutions |
| DE4032856A1 (de) * | 1990-10-13 | 1992-04-16 | Schering Ag | Membranelektrolysemodul |
| CA2053342A1 (en) * | 1990-10-22 | 1992-04-23 | Robert A. Tremmel | Nickel electroplating process with reduced nickel ion build up |
| US5162079A (en) * | 1991-01-28 | 1992-11-10 | Eco-Tec Limited | Process and apparatus for control of electroplating bath composition |
| DE4221970C2 (de) * | 1992-06-30 | 1996-01-18 | Atotech Deutschland Gmbh | Verfahren zur Vermeidung der Halogengasentwicklung in Metallabscheidungsbädern mit mindestens zwei Elektrolyträumen |
| DE4238956A1 (de) * | 1992-06-30 | 1994-05-19 | Schering Ag | Verwendung von wasserlöslichen organischen Verbindungen als Zusätze im Anolyten in galvanischen Metallabscheidungsbädern |
| US5401379A (en) * | 1993-03-19 | 1995-03-28 | Mazzochi; James L. | Chrome plating process |
| US6024856A (en) * | 1997-10-10 | 2000-02-15 | Enthone-Omi, Inc. | Copper metallization of silicon wafers using insoluble anodes |
| US8852417B2 (en) | 1999-04-13 | 2014-10-07 | Applied Materials, Inc. | Electrolytic process using anion permeable barrier |
| US7438788B2 (en) | 1999-04-13 | 2008-10-21 | Semitool, Inc. | Apparatus and methods for electrochemical processing of microelectronic workpieces |
| US20060157355A1 (en) * | 2000-03-21 | 2006-07-20 | Semitool, Inc. | Electrolytic process using anion permeable barrier |
| US7264698B2 (en) | 1999-04-13 | 2007-09-04 | Semitool, Inc. | Apparatus and methods for electrochemical processing of microelectronic workpieces |
| US8236159B2 (en) * | 1999-04-13 | 2012-08-07 | Applied Materials Inc. | Electrolytic process using cation permeable barrier |
| US6581984B1 (en) | 1999-09-27 | 2003-06-24 | Seongho Csp, Ltd. | Corrugated spiral pipe with a coupling device and method for installing the same |
| US20060189129A1 (en) * | 2000-03-21 | 2006-08-24 | Semitool, Inc. | Method for applying metal features onto barrier layers using ion permeable barriers |
| US7273535B2 (en) | 2003-09-17 | 2007-09-25 | Applied Materials, Inc. | Insoluble anode with an auxiliary electrode |
| DE60023190T3 (de) | 2000-06-15 | 2016-03-10 | Coventya, Inc. | Zink-nickel-elektroplattierung |
| US6755960B1 (en) | 2000-06-15 | 2004-06-29 | Taskem Inc. | Zinc-nickel electroplating |
| US6576110B2 (en) * | 2000-07-07 | 2003-06-10 | Applied Materials, Inc. | Coated anode apparatus and associated method |
| DE60038061T2 (de) * | 2000-08-18 | 2009-02-12 | Ti Group Automotive Systems Ltd. | Verfahren zur Plattierung eines Metallbandes zur Herstellung eines mehrwandigen Rohrs |
| US8377283B2 (en) * | 2002-11-25 | 2013-02-19 | Coventya, Inc. | Zinc and zinc-alloy electroplating |
| EP1884278A1 (en) * | 2006-07-24 | 2008-02-06 | ATOTECH Deutschland GmbH | Apparatus and method for rinsing of liquid from work pieces |
| US8262894B2 (en) * | 2009-04-30 | 2012-09-11 | Moses Lake Industries, Inc. | High speed copper plating bath |
| TW201137186A (en) * | 2010-04-28 | 2011-11-01 | Thingwell Entpr Co Ltd | Pull-plating apparatus |
| US9017528B2 (en) | 2011-04-14 | 2015-04-28 | Tel Nexx, Inc. | Electro chemical deposition and replenishment apparatus |
| US9005409B2 (en) | 2011-04-14 | 2015-04-14 | Tel Nexx, Inc. | Electro chemical deposition and replenishment apparatus |
| US20140106179A1 (en) * | 2012-10-17 | 2014-04-17 | Raytheon Company | Plating design and process for improved hermeticity and thermal conductivity of gold-germanium solder joints |
| US9359688B1 (en) * | 2012-12-05 | 2016-06-07 | Novellus Systems, Inc. | Apparatuses and methods for controlling PH in electroplating baths |
| US10190232B2 (en) | 2013-08-06 | 2019-01-29 | Lam Research Corporation | Apparatuses and methods for maintaining pH in nickel electroplating baths |
| US9303329B2 (en) | 2013-11-11 | 2016-04-05 | Tel Nexx, Inc. | Electrochemical deposition apparatus with remote catholyte fluid management |
| US9732434B2 (en) | 2014-04-18 | 2017-08-15 | Lam Research Corporation | Methods and apparatuses for electroplating nickel using sulfur-free nickel anodes |
| KR101862971B1 (ko) * | 2014-06-25 | 2018-05-30 | 신닛테츠스미킨 카부시키카이샤 | 바스켓형 애노드 |
| US10167561B2 (en) * | 2016-12-15 | 2019-01-01 | John Christopher Burtch | Method and apparatus for producing hydrogen having reversible electrodes |
Family Cites Families (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4328076A (en) * | 1980-09-02 | 1982-05-04 | The International Nickel Co., Inc. | Electrode and sludge collector support device and electroplating therewith |
| US4514266A (en) * | 1981-09-11 | 1985-04-30 | Republic Steel Corporation | Method and apparatus for electroplating |
| ES8801394A1 (es) * | 1984-07-02 | 1987-05-16 | Diaz Nogueira Eduardo | Procedimiento para la electrodeposicion catodica de metales con la generacion del acido correspondiente, a partir de disoluciones de sus sales |
-
1987
- 1987-09-08 US US07/093,664 patent/US4778572A/en not_active Expired - Lifetime
-
1988
- 1988-07-07 CA CA000571461A patent/CA1330963C/en not_active Expired - Fee Related
- 1988-08-29 IN IN246/BOM/88A patent/IN168603B/en unknown
- 1988-09-06 EP EP88308221A patent/EP0307161B1/en not_active Expired - Lifetime
- 1988-09-06 BR BR8804681A patent/BR8804681A/pt not_active Application Discontinuation
- 1988-09-06 DE DE88308221T patent/DE3885682T2/de not_active Expired - Fee Related
- 1988-09-06 ES ES88308221T patent/ES2049750T3/es not_active Expired - Lifetime
- 1988-09-06 AT AT88308221T patent/ATE97453T1/de not_active IP Right Cessation
- 1988-09-07 KR KR1019880011547A patent/KR890005305A/ko not_active Withdrawn
- 1988-09-07 CN CN88106501A patent/CN1033079A/zh active Pending
- 1988-09-08 AU AU21999/88A patent/AU600878B2/en not_active Ceased
- 1988-09-08 JP JP63225499A patent/JPH01159395A/ja active Granted
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE102010055143A1 (de) * | 2010-12-18 | 2012-06-21 | Umicore Galvanotechnik Gmbh | Direktkontakt-Membrananode für die Verwendung in Elektrolysezellen |
| DE102010055143B4 (de) | 2010-12-18 | 2022-12-01 | Umicore Galvanotechnik Gmbh | Direktkontakt-Membrananode für die Verwendung in Elektrolysezellen |
Also Published As
| Publication number | Publication date |
|---|---|
| EP0307161A3 (en) | 1989-04-26 |
| IN168603B (enrdf_load_stackoverflow) | 1991-05-04 |
| JPH01159395A (ja) | 1989-06-22 |
| US4778572A (en) | 1988-10-18 |
| AU2199988A (en) | 1989-03-23 |
| EP0307161B1 (en) | 1993-11-18 |
| CA1330963C (en) | 1994-07-26 |
| AU600878B2 (en) | 1990-08-23 |
| CN1033079A (zh) | 1989-05-24 |
| ATE97453T1 (de) | 1993-12-15 |
| ES2049750T3 (es) | 1994-05-01 |
| KR890005305A (ko) | 1989-05-13 |
| JPH0514799B2 (enrdf_load_stackoverflow) | 1993-02-25 |
| DE3885682D1 (de) | 1993-12-23 |
| EP0307161A2 (en) | 1989-03-15 |
| BR8804681A (pt) | 1989-04-18 |
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