DE3879441D1 - Verfahren zur herstellung von koerpern mit einem kupferueberzug. - Google Patents

Verfahren zur herstellung von koerpern mit einem kupferueberzug.

Info

Publication number
DE3879441D1
DE3879441D1 DE8888121504T DE3879441T DE3879441D1 DE 3879441 D1 DE3879441 D1 DE 3879441D1 DE 8888121504 T DE8888121504 T DE 8888121504T DE 3879441 T DE3879441 T DE 3879441T DE 3879441 D1 DE3879441 D1 DE 3879441D1
Authority
DE
Germany
Prior art keywords
copper cover
producing bodies
bodies
producing
copper
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE8888121504T
Other languages
English (en)
Other versions
DE3879441T2 (de
Inventor
Takamasa C O Mitsubis Kawakami
Kazuhiro C O Mitsubishi G Ando
Ryuji C O Mitsubishi G Fujiura
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Gas Chemical Co Inc
Original Assignee
Mitsubishi Gas Chemical Co Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP62325567A external-priority patent/JPH01168865A/ja
Priority claimed from JP62325570A external-priority patent/JPH01168868A/ja
Priority claimed from JP62325568A external-priority patent/JPH01168866A/ja
Priority claimed from JP62325569A external-priority patent/JPH01168867A/ja
Application filed by Mitsubishi Gas Chemical Co Inc filed Critical Mitsubishi Gas Chemical Co Inc
Application granted granted Critical
Publication of DE3879441D1 publication Critical patent/DE3879441D1/de
Publication of DE3879441T2 publication Critical patent/DE3879441T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/02—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition
    • C23C18/08—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of metallic material
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/10—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern
    • H05K3/105—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern by conversion of non-conductive material on or in the support into conductive material, e.g. by using an energy beam

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • General Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Thermal Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Manufacturing & Machinery (AREA)
  • Laminated Bodies (AREA)
  • Chemically Coating (AREA)
DE8888121504T 1987-12-24 1988-12-22 Verfahren zur herstellung von koerpern mit einem kupferueberzug. Expired - Fee Related DE3879441T2 (de)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
JP62325567A JPH01168865A (ja) 1987-12-24 1987-12-24 銅膜形成物品の製造法
JP62325570A JPH01168868A (ja) 1987-12-24 1987-12-24 銅膜形成物品の製造法
JP62325568A JPH01168866A (ja) 1987-12-24 1987-12-24 銅膜形成物品の製造法
JP62325569A JPH01168867A (ja) 1987-12-24 1987-12-24 銅膜形成物品の製造法

Publications (2)

Publication Number Publication Date
DE3879441D1 true DE3879441D1 (de) 1993-04-22
DE3879441T2 DE3879441T2 (de) 1993-09-09

Family

ID=27480357

Family Applications (1)

Application Number Title Priority Date Filing Date
DE8888121504T Expired - Fee Related DE3879441T2 (de) 1987-12-24 1988-12-22 Verfahren zur herstellung von koerpern mit einem kupferueberzug.

Country Status (4)

Country Link
US (1) US4913938A (de)
EP (1) EP0322764B1 (de)
KR (1) KR960010822B1 (de)
DE (1) DE3879441T2 (de)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR0137370B1 (ko) * 1988-11-07 1998-04-27 니시가와 레이치 구리 도금된 수지 제품의 제조방법
US6060175A (en) * 1990-09-13 2000-05-09 Sheldahl, Inc. Metal-film laminate resistant to delamination
US5137791A (en) * 1990-09-13 1992-08-11 Sheldahl Inc. Metal-film laminate resistant to delamination
US5112462A (en) * 1990-09-13 1992-05-12 Sheldahl Inc. Method of making metal-film laminate resistant to delamination
US5552221A (en) * 1994-12-29 1996-09-03 The Dow Chemical Company Polybenzazole fibers having improved tensile strength retention
US5759230A (en) * 1995-11-30 1998-06-02 The United States Of America As Represented By The Secretary Of The Navy Nanostructured metallic powders and films via an alcoholic solvent process
US6165309A (en) * 1998-02-04 2000-12-26 General Electric Co. Method for improving the adhesion of metal films to polyphenylene ether resins
AU2002337822A1 (en) * 2001-10-05 2003-04-22 Superior Micropowders Llc Low viscosity precursor compositions and methods for the deposition of conductive electronic features
US7785397B2 (en) * 2005-03-11 2010-08-31 National Research Council Of Canada Highly microporous thermoplastic/bismaleimide semi-interpenetrating polymer network
JP5923351B2 (ja) 2012-03-16 2016-05-24 株式会社Adeka 銅膜形成用組成物及び該組成物を用いた銅膜の製造方法
TW201920515A (zh) 2017-08-01 2019-06-01 加拿大國家研究委員會 銅墨水

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
SU921124A1 (ru) * 1979-06-19 1982-04-15 Институт Физико-Химических Основ Переработки Минерального Сырья Со Ан Ссср Способ металлизации отверстий печатных плат
US4327131A (en) * 1980-12-05 1982-04-27 The United States Of America As Represented By The Secretary Of The Army Method of coating a ceramic substrate

Also Published As

Publication number Publication date
KR960010822B1 (ko) 1996-08-09
DE3879441T2 (de) 1993-09-09
EP0322764B1 (de) 1993-03-17
KR890009583A (ko) 1989-08-02
US4913938A (en) 1990-04-03
EP0322764A3 (en) 1989-11-02
EP0322764A2 (de) 1989-07-05

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee