DE3854307T2 - Hohlkathodenkanone und Vorrichtung zur Materialablagerung durch Ionenbeschichtung. - Google Patents

Hohlkathodenkanone und Vorrichtung zur Materialablagerung durch Ionenbeschichtung.

Info

Publication number
DE3854307T2
DE3854307T2 DE3854307T DE3854307T DE3854307T2 DE 3854307 T2 DE3854307 T2 DE 3854307T2 DE 3854307 T DE3854307 T DE 3854307T DE 3854307 T DE3854307 T DE 3854307T DE 3854307 T2 DE3854307 T2 DE 3854307T2
Authority
DE
Germany
Prior art keywords
cannon
material deposition
hollow cathode
ion coating
ion
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE3854307T
Other languages
English (en)
Other versions
DE3854307D1 (de
Inventor
Yukio C O Technical Re Inokuti
Osamu Ohkubo
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
JFE Steel Corp
Ulvac Inc
Original Assignee
Ulvac Inc
Nihon Shinku Gijutsu KK
Kawasaki Steel Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ulvac Inc, Nihon Shinku Gijutsu KK, Kawasaki Steel Corp filed Critical Ulvac Inc
Application granted granted Critical
Publication of DE3854307D1 publication Critical patent/DE3854307D1/de
Publication of DE3854307T2 publication Critical patent/DE3854307T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/28—Vacuum evaporation by wave energy or particle radiation
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J1/00—Details of electrodes, of magnetic control means, of screens, or of the mounting or spacing thereof, common to two or more basic types of discharge tubes or lamps
    • H01J1/02—Main electrodes
    • H01J1/025—Hollow cathodes
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/305—Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating or etching
    • H01J37/3053—Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating or etching for evaporating or etching

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Toxicology (AREA)
  • Materials Engineering (AREA)
  • Health & Medical Sciences (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Analytical Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
DE3854307T 1987-02-12 1988-02-10 Hohlkathodenkanone und Vorrichtung zur Materialablagerung durch Ionenbeschichtung. Expired - Fee Related DE3854307T2 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2836987 1987-02-12
JP17477887 1987-07-15

Publications (2)

Publication Number Publication Date
DE3854307D1 DE3854307D1 (de) 1995-09-21
DE3854307T2 true DE3854307T2 (de) 1996-01-04

Family

ID=26366460

Family Applications (1)

Application Number Title Priority Date Filing Date
DE3854307T Expired - Fee Related DE3854307T2 (de) 1987-02-12 1988-02-10 Hohlkathodenkanone und Vorrichtung zur Materialablagerung durch Ionenbeschichtung.

Country Status (3)

Country Link
US (1) US4863581A (de)
EP (1) EP0278494B1 (de)
DE (1) DE3854307T2 (de)

Families Citing this family (23)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3832693A1 (de) * 1988-09-27 1990-03-29 Leybold Ag Vorrichtung zum aufbringen dielektrischer oder metallischer werkstoffe
DE3834402C1 (de) * 1988-10-10 1989-05-03 Kernforschungszentrum Karlsruhe Gmbh, 7500 Karlsruhe, De
US5601652A (en) * 1989-08-03 1997-02-11 United Technologies Corporation Apparatus for applying ceramic coatings
US5246885A (en) * 1989-12-13 1993-09-21 International Business Machines Corporation Deposition method for high aspect ratio features using photoablation
EP0435801A3 (en) * 1989-12-13 1992-11-19 International Business Machines Corporation Deposition method for high aspect ratio features
US5346554A (en) * 1990-04-12 1994-09-13 Seiko Instruments Inc. Apparatus for forming a thin film
DE4026367A1 (de) * 1990-06-25 1992-03-12 Leybold Ag Vorrichtung zum beschichten von substraten
DE4102554A1 (de) * 1991-01-29 1992-09-03 Dresden Vakuumtech Gmbh Schaltungsanordnung zum zuenden und betreiben einer hohlkatodenbogenentladung
IT1246682B (it) * 1991-03-04 1994-11-24 Proel Tecnologie Spa Dispositivo a catodo cavo non riscaldato per la generazione dinamica di plasma
GB9210889D0 (en) * 1992-05-21 1992-07-08 Superion Ltd Apparatus for and method of generating a plasma
DE4237849C1 (de) * 1992-11-10 1993-12-02 Dresden Vakuumtech Gmbh Drahtwendel-Hohlkatode und Verfahren zu ihrer Herstellung
US5891312A (en) * 1996-12-24 1999-04-06 The United States Of America As Represented By The Administrator Of The National Aeronautics And Space Administration Enhanced vacuum arc vapor deposition electrode
JPH11200017A (ja) * 1998-01-20 1999-07-27 Nikon Corp 光学薄膜成膜装置およびこの光学薄膜成膜装置により成膜された光学素子
US7250196B1 (en) 1999-10-26 2007-07-31 Basic Resources, Inc. System and method for plasma plating
US6444100B1 (en) 2000-02-11 2002-09-03 Seagate Technology Llc Hollow cathode sputter source
US6521104B1 (en) * 2000-05-22 2003-02-18 Basic Resources, Inc. Configurable vacuum system and method
US6503379B1 (en) 2000-05-22 2003-01-07 Basic Research, Inc. Mobile plating system and method
JP2002356751A (ja) * 2001-05-29 2002-12-13 Kawasaki Steel Corp 超低鉄損一方向性珪素鋼板およびその製造方法
US20030180450A1 (en) * 2002-03-22 2003-09-25 Kidd Jerry D. System and method for preventing breaker failure
US20050126497A1 (en) * 2003-09-30 2005-06-16 Kidd Jerry D. Platform assembly and method
DE102006027853B4 (de) * 2006-06-16 2012-06-14 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Verfahren und Vorrichtung zum Erzeugen eines Plasmas sowie Verwendung derselben
DE102007061418A1 (de) 2007-12-20 2009-07-02 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Verfahren zum Erzeugen eines Hohlkatoden-Bogenentladungsplasmas und zum Regeln der Aktivierung von Materialdampfpartikeln, die dem Hohlkatoden-Bogenentladungsplasma ausgesetzt werden
JP5700695B2 (ja) * 2012-04-12 2015-04-15 中外炉工業株式会社 プラズマ発生装置および蒸着装置並びにプラズマ発生方法

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1158986A (en) * 1965-11-03 1969-07-23 United Aircraft Corp Insulator Shielded Cathode.
US3437734A (en) * 1966-06-21 1969-04-08 Isofilm Intern Apparatus and method for effecting the restructuring of materials
US3491015A (en) * 1967-04-04 1970-01-20 Automatic Fire Control Inc Method of depositing elemental material from a low pressure electrical discharge
US3486064A (en) * 1968-03-20 1969-12-23 Gen Electric Hollow cathode,nonthermionic electron beam source with replaceable liner
US3984581A (en) * 1973-02-28 1976-10-05 Carl Zeiss-Stiftung Method for the production of anti-reflection coatings on optical elements made of transparent organic polymers
US4147916A (en) * 1976-04-05 1979-04-03 Sirius Corporation Split-flow nozzle for energy beam system
GB1601427A (en) * 1977-06-20 1981-10-28 Siemens Ag Deposition of a layer of electrically-conductive material on a graphite body
CH645137A5 (de) * 1981-03-13 1984-09-14 Balzers Hochvakuum Verfahren und vorrichtung zum verdampfen von material unter vakuum.
JPS58153776A (ja) * 1982-03-05 1983-09-12 Citizen Watch Co Ltd 装飾部品の製造方法およびそれに用いるイオンプレ−テイング装置
US4481636A (en) * 1982-05-05 1984-11-06 Council For Mineral Technology Electrode assemblies for thermal plasma generating devices
US4407712A (en) * 1982-06-01 1983-10-04 The United States Of America As Represented By The Secretary Of The Army Hollow cathode discharge source of metal vapor
DE3339131A1 (de) * 1983-10-28 1985-05-09 Leybold-Heraeus GmbH, 5000 Köln Elektronenstrahlverdampfer mit mindestens zwei magnetischen ablenksystemen
US4659899A (en) * 1984-10-24 1987-04-21 The Perkin-Elmer Corporation Vacuum-compatible air-cooled plasma device

Also Published As

Publication number Publication date
US4863581A (en) 1989-09-05
DE3854307D1 (de) 1995-09-21
EP0278494B1 (de) 1995-08-16
EP0278494A3 (en) 1990-05-02
EP0278494A2 (de) 1988-08-17

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee