DE3850151T2 - Verfahren zur Herstellung von Mustern. - Google Patents

Verfahren zur Herstellung von Mustern.

Info

Publication number
DE3850151T2
DE3850151T2 DE3850151T DE3850151T DE3850151T2 DE 3850151 T2 DE3850151 T2 DE 3850151T2 DE 3850151 T DE3850151 T DE 3850151T DE 3850151 T DE3850151 T DE 3850151T DE 3850151 T2 DE3850151 T2 DE 3850151T2
Authority
DE
Germany
Prior art keywords
samples
production
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE3850151T
Other languages
English (en)
Other versions
DE3850151D1 (de
Inventor
Kazufumi Ogawa
Norihisa Mino
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP62053302A external-priority patent/JP2553545B2/ja
Priority claimed from JP62309055A external-priority patent/JP2653072B2/ja
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Publication of DE3850151D1 publication Critical patent/DE3850151D1/de
Application granted granted Critical
Publication of DE3850151T2 publication Critical patent/DE3850151T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2051—Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source
    • G03F7/2053—Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source using a laser
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/091—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers characterised by antireflection means or light filtering or absorbing means, e.g. anti-halation, contrast enhancement
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/105—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having substances, e.g. indicators, for forming visible images
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2022—Multi-step exposure, e.g. hybrid; backside exposure; blanket exposure, e.g. for image reversal; edge exposure, e.g. for edge bead removal; corrective exposure
DE3850151T 1987-03-09 1988-02-24 Verfahren zur Herstellung von Mustern. Expired - Fee Related DE3850151T2 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP62053302A JP2553545B2 (ja) 1987-03-09 1987-03-09 パタ−ン形成方法
JP62309055A JP2653072B2 (ja) 1987-12-07 1987-12-07 パターン形成方法

Publications (2)

Publication Number Publication Date
DE3850151D1 DE3850151D1 (de) 1994-07-21
DE3850151T2 true DE3850151T2 (de) 1995-01-12

Family

ID=26394017

Family Applications (1)

Application Number Title Priority Date Filing Date
DE3850151T Expired - Fee Related DE3850151T2 (de) 1987-03-09 1988-02-24 Verfahren zur Herstellung von Mustern.

Country Status (3)

Country Link
EP (1) EP0282201B1 (de)
KR (1) KR920003315B1 (de)
DE (1) DE3850151T2 (de)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0394738A3 (de) * 1989-04-24 1991-03-27 Siemens Aktiengesellschaft Vereinfachtes Mehrlagenphotoresistsystem
JP2544006B2 (ja) * 1990-06-14 1996-10-16 株式会社東芝 半導体装置の製造方法
EP0559934A1 (de) * 1992-03-11 1993-09-15 International Business Machines Corporation Verfahren und Vorrichtung zur Strukturerzeugung mit Bildumkehr für tiefes UV
KR0172237B1 (ko) * 1995-06-26 1999-03-30 김주용 반도체 소자의 미세패턴 형성방법
JP2004283065A (ja) * 2003-03-20 2004-10-14 Ushio Inc 化学走性機能制御膜の製造方法および人工材料並びに人工材料の製造方法
CN101312113B (zh) * 2007-05-23 2010-06-16 中芯国际集成电路制造(上海)有限公司 图形的形成方法

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3784378A (en) * 1971-10-18 1974-01-08 Du Pont Double-exposure method for producing reverse images in photopolymers
DE3248246A1 (de) * 1982-12-28 1984-06-28 Basf Ag, 6700 Ludwigshafen Positiv arbeitendes verfahren zur herstellung von relief- und druckformen
JPH0715870B2 (ja) * 1983-11-12 1995-02-22 富士通株式会社 パターン形成方法
JPH0769616B2 (ja) * 1984-08-13 1995-07-31 エイ・ティ・アンド・ティ グローバル インフォメーション ソルーションズ インターナショナル インコーポレイテッド ホトレジスト層の形成方法
US4810601A (en) * 1984-12-07 1989-03-07 International Business Machines Corporation Top imaged resists

Also Published As

Publication number Publication date
EP0282201B1 (de) 1994-06-15
KR880011900A (ko) 1988-10-31
EP0282201A2 (de) 1988-09-14
DE3850151D1 (de) 1994-07-21
KR920003315B1 (ko) 1992-04-27
EP0282201A3 (de) 1991-04-10

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8320 Willingness to grant licences declared (paragraph 23)
8339 Ceased/non-payment of the annual fee