DE3827893A1 - Verfahren zur stromlosen abscheidung von nickel - Google Patents
Verfahren zur stromlosen abscheidung von nickelInfo
- Publication number
- DE3827893A1 DE3827893A1 DE19883827893 DE3827893A DE3827893A1 DE 3827893 A1 DE3827893 A1 DE 3827893A1 DE 19883827893 DE19883827893 DE 19883827893 DE 3827893 A DE3827893 A DE 3827893A DE 3827893 A1 DE3827893 A1 DE 3827893A1
- Authority
- DE
- Germany
- Prior art keywords
- nickel
- palladium
- ceramic
- ceramic body
- germination
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical group [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 title claims abstract description 54
- 229910052759 nickel Inorganic materials 0.000 title claims abstract description 27
- 230000008021 deposition Effects 0.000 title claims abstract description 9
- 238000000034 method Methods 0.000 title claims description 19
- 239000000919 ceramic Substances 0.000 claims abstract description 36
- KDLHZDBZIXYQEI-UHFFFAOYSA-N palladium Substances [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 claims abstract description 20
- 238000007747 plating Methods 0.000 claims abstract description 16
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 claims abstract description 13
- 229910052750 molybdenum Inorganic materials 0.000 claims abstract description 13
- 239000011733 molybdenum Substances 0.000 claims abstract description 13
- 229910052763 palladium Inorganic materials 0.000 claims abstract description 13
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 claims abstract description 13
- 229910052721 tungsten Inorganic materials 0.000 claims abstract description 13
- 239000010937 tungsten Substances 0.000 claims abstract description 13
- 239000000243 solution Substances 0.000 claims abstract description 10
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 claims abstract description 6
- 239000008139 complexing agent Substances 0.000 claims abstract description 6
- -1 palladium ions Chemical class 0.000 claims abstract description 6
- XFXPMWWXUTWYJX-UHFFFAOYSA-N Cyanide Chemical compound N#[C-] XFXPMWWXUTWYJX-UHFFFAOYSA-N 0.000 claims abstract description 3
- 238000007598 dipping method Methods 0.000 claims abstract 2
- 230000035784 germination Effects 0.000 claims description 10
- 229910018072 Al 2 O 3 Inorganic materials 0.000 claims description 3
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 claims description 3
- 230000002378 acidificating effect Effects 0.000 claims description 2
- 150000001412 amines Chemical class 0.000 claims description 2
- 238000005238 degreasing Methods 0.000 claims description 2
- 239000011248 coating agent Substances 0.000 claims 1
- 238000000576 coating method Methods 0.000 claims 1
- MOWMLACGTDMJRV-UHFFFAOYSA-N nickel tungsten Chemical group [Ni].[W] MOWMLACGTDMJRV-UHFFFAOYSA-N 0.000 claims 1
- MUJIDPITZJWBSW-UHFFFAOYSA-N palladium(2+) Chemical class [Pd+2] MUJIDPITZJWBSW-UHFFFAOYSA-N 0.000 claims 1
- 238000005554 pickling Methods 0.000 claims 1
- 239000012266 salt solution Substances 0.000 claims 1
- 239000007864 aqueous solution Substances 0.000 abstract description 3
- 238000004140 cleaning Methods 0.000 abstract description 2
- 229910052751 metal Inorganic materials 0.000 description 12
- 239000002184 metal Substances 0.000 description 12
- 238000000151 deposition Methods 0.000 description 7
- 239000000758 substrate Substances 0.000 description 7
- 239000011521 glass Substances 0.000 description 4
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 3
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 3
- 150000002500 ions Chemical class 0.000 description 3
- 238000001465 metallisation Methods 0.000 description 3
- 150000002739 metals Chemical class 0.000 description 3
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- KRHYYFGTRYWZRS-UHFFFAOYSA-M Fluoride anion Chemical compound [F-] KRHYYFGTRYWZRS-UHFFFAOYSA-M 0.000 description 1
- BPQQTUXANYXVAA-UHFFFAOYSA-N Orthosilicate Chemical compound [O-][Si]([O-])([O-])[O-] BPQQTUXANYXVAA-UHFFFAOYSA-N 0.000 description 1
- 101150003085 Pdcl gene Proteins 0.000 description 1
- SLINHMUFWFWBMU-UHFFFAOYSA-N Triisopropanolamine Chemical compound CC(O)CN(CC(C)O)CC(C)O SLINHMUFWFWBMU-UHFFFAOYSA-N 0.000 description 1
- 239000003929 acidic solution Substances 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- 239000012298 atmosphere Substances 0.000 description 1
- 244000052616 bacterial pathogen Species 0.000 description 1
- KXZJHVJKXJLBKO-UHFFFAOYSA-N chembl1408157 Chemical compound N=1C2=CC=CC=C2C(C(=O)O)=CC=1C1=CC=C(O)C=C1 KXZJHVJKXJLBKO-UHFFFAOYSA-N 0.000 description 1
- 230000001427 coherent effect Effects 0.000 description 1
- 229910052593 corundum Inorganic materials 0.000 description 1
- 239000000645 desinfectant Substances 0.000 description 1
- 230000009189 diving Effects 0.000 description 1
- 230000005611 electricity Effects 0.000 description 1
- 238000007772 electroless plating Methods 0.000 description 1
- 238000010304 firing Methods 0.000 description 1
- 238000011010 flushing procedure Methods 0.000 description 1
- 229910052839 forsterite Inorganic materials 0.000 description 1
- 239000012212 insulator Substances 0.000 description 1
- HCWCAKKEBCNQJP-UHFFFAOYSA-N magnesium orthosilicate Chemical compound [Mg+2].[Mg+2].[O-][Si]([O-])([O-])[O-] HCWCAKKEBCNQJP-UHFFFAOYSA-N 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 230000006911 nucleation Effects 0.000 description 1
- 238000010899 nucleation Methods 0.000 description 1
- RVTZCBVAJQQJTK-UHFFFAOYSA-N oxygen(2-);zirconium(4+) Chemical compound [O-2].[O-2].[Zr+4] RVTZCBVAJQQJTK-UHFFFAOYSA-N 0.000 description 1
- 150000002940 palladium Chemical class 0.000 description 1
- OFNHPGDEEMZPFG-UHFFFAOYSA-N phosphanylidynenickel Chemical compound [P].[Ni] OFNHPGDEEMZPFG-UHFFFAOYSA-N 0.000 description 1
- 239000011148 porous material Substances 0.000 description 1
- 238000007650 screen-printing Methods 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 238000004659 sterilization and disinfection Methods 0.000 description 1
- 229910001845 yogo sapphire Inorganic materials 0.000 description 1
- 229910001928 zirconium oxide Inorganic materials 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/22—Secondary treatment of printed circuits
- H05K3/24—Reinforcing the conductive pattern
- H05K3/245—Reinforcing conductive patterns made by printing techniques or by other techniques for applying conductive pastes, inks or powders; Reinforcing other conductive patterns by such techniques
- H05K3/246—Reinforcing conductive paste, ink or powder patterns by other methods, e.g. by plating
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
- C23C18/18—Pretreatment of the material to be coated
- C23C18/1851—Pretreatment of the material to be coated of surfaces of non-metallic or semiconducting in organic material
- C23C18/1862—Pretreatment of the material to be coated of surfaces of non-metallic or semiconducting in organic material by radiant energy
- C23C18/1865—Heat
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
- C23C18/18—Pretreatment of the material to be coated
- C23C18/1851—Pretreatment of the material to be coated of surfaces of non-metallic or semiconducting in organic material
- C23C18/1872—Pretreatment of the material to be coated of surfaces of non-metallic or semiconducting in organic material by chemical pretreatment
- C23C18/1886—Multistep pretreatment
- C23C18/1893—Multistep pretreatment with use of organic or inorganic compounds other than metals, first
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K1/00—Printed circuits
- H05K1/02—Details
- H05K1/09—Use of materials for the conductive, e.g. metallic pattern
- H05K1/092—Dispersed materials, e.g. conductive pastes or inks
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Manufacturing & Machinery (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Inorganic Chemistry (AREA)
- Chemically Coating (AREA)
Priority Applications (4)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE19883827893 DE3827893A1 (de) | 1988-08-17 | 1988-08-17 | Verfahren zur stromlosen abscheidung von nickel |
| US07/393,893 US5079040A (en) | 1988-08-17 | 1989-08-15 | Process for electrolessly depositing nickel |
| JP21023089A JP3093219B2 (ja) | 1988-08-17 | 1989-08-16 | ニッケルの無電解めっき方法 |
| FR8910967A FR2635536B1 (fr) | 1988-08-17 | 1989-08-17 | Procede pour la deposition autocatalytique de nickel |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE19883827893 DE3827893A1 (de) | 1988-08-17 | 1988-08-17 | Verfahren zur stromlosen abscheidung von nickel |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| DE3827893A1 true DE3827893A1 (de) | 1990-03-01 |
| DE3827893C2 DE3827893C2 (enrdf_load_stackoverflow) | 1992-01-16 |
Family
ID=6361019
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| DE19883827893 Granted DE3827893A1 (de) | 1988-08-17 | 1988-08-17 | Verfahren zur stromlosen abscheidung von nickel |
Country Status (4)
| Country | Link |
|---|---|
| US (1) | US5079040A (enrdf_load_stackoverflow) |
| JP (1) | JP3093219B2 (enrdf_load_stackoverflow) |
| DE (1) | DE3827893A1 (enrdf_load_stackoverflow) |
| FR (1) | FR2635536B1 (enrdf_load_stackoverflow) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE4228442C1 (de) * | 1992-08-26 | 1994-02-03 | Hoechst Ceram Tec Ag | Verfahren zur außenstromlosen Vernickelung von Keramik |
| US5626715A (en) * | 1993-02-05 | 1997-05-06 | Lsi Logic Corporation | Methods of polishing semiconductor substrates |
| EP2387074A3 (de) * | 2006-03-23 | 2014-05-07 | CeramTec GmbH | Trägerkörper für Bauelemente oder Schaltungen |
Families Citing this family (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5147692A (en) * | 1990-05-08 | 1992-09-15 | Macdermid, Incorporated | Electroless plating of nickel onto surfaces such as copper or fused tungston |
| US5803957A (en) * | 1993-03-26 | 1998-09-08 | C. Uyemura & Co.,Ltd. | Electroless gold plating bath |
| US6187378B1 (en) * | 1998-10-01 | 2001-02-13 | Lucent Technologies Inc. | Automated system and method for electroless plating of optical fibers |
| AT409637B (de) * | 2001-03-16 | 2002-09-25 | Electrovac | Ein ccvd-verfahren zur herstellung von röhrenförmigen kohlenstoff-nanofasern |
| JP4069181B2 (ja) * | 2002-03-29 | 2008-04-02 | Ｄｏｗａメタルテック株式会社 | 無電解めっき法 |
| US7279407B2 (en) | 2004-09-02 | 2007-10-09 | Micron Technology, Inc. | Selective nickel plating of aluminum, copper, and tungsten structures |
| DE102007022337A1 (de) * | 2007-05-12 | 2008-11-20 | Semikron Elektronik Gmbh & Co. Kg | Gesintertes Leistungshalbleitersubstrat sowie Herstellungsverfahren hierzu |
| US9021912B2 (en) | 2011-07-27 | 2015-05-05 | Kongsberg Automotive Ab | Shifting apparatus |
| GB2531522B (en) * | 2014-10-20 | 2018-05-09 | Bae Systems Plc | Strain sensing in composite materials |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DD215588A1 (de) * | 1983-05-20 | 1984-11-14 | Volker Wadewitz | Verfahren zum chemischen vernickeln von wolfram- oder molybdaenkoerpern |
| US4695489A (en) * | 1986-07-28 | 1987-09-22 | General Electric Company | Electroless nickel plating composition and method |
| EP0176736B1 (en) * | 1984-09-04 | 1988-07-13 | Kollmorgen Technologies Corporation | Process for selective metallization |
Family Cites Families (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| GB1063092A (en) * | 1964-05-07 | 1967-03-30 | Sperry Gyroscope Co Ltd | Improvements in metal plating processes |
| US3690921A (en) * | 1970-12-07 | 1972-09-12 | Ibm | Method for strongly adhering a metal film on ceramic substrates |
| US3857733A (en) * | 1973-04-30 | 1974-12-31 | Rca Corp | Method of electroless metal deposition |
| US4440571A (en) * | 1981-07-10 | 1984-04-03 | Nippon Carbon Co., Ltd. | Process for the surface treatment of inorganic fibers for reinforcing titanium or nickel and product |
| US4604299A (en) * | 1983-06-09 | 1986-08-05 | Kollmorgen Technologies Corporation | Metallization of ceramics |
| US4647477A (en) * | 1984-12-07 | 1987-03-03 | Kollmorgen Technologies Corporation | Surface preparation of ceramic substrates for metallization |
| US4746375A (en) * | 1987-05-08 | 1988-05-24 | General Electric Company | Activation of refractory metal surfaces for electroless plating |
| JP5639394B2 (ja) | 2010-06-30 | 2014-12-10 | 株式会社ニューギン | 遊技機 |
-
1988
- 1988-08-17 DE DE19883827893 patent/DE3827893A1/de active Granted
-
1989
- 1989-08-15 US US07/393,893 patent/US5079040A/en not_active Expired - Lifetime
- 1989-08-16 JP JP21023089A patent/JP3093219B2/ja not_active Expired - Lifetime
- 1989-08-17 FR FR8910967A patent/FR2635536B1/fr not_active Expired - Lifetime
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DD215588A1 (de) * | 1983-05-20 | 1984-11-14 | Volker Wadewitz | Verfahren zum chemischen vernickeln von wolfram- oder molybdaenkoerpern |
| EP0176736B1 (en) * | 1984-09-04 | 1988-07-13 | Kollmorgen Technologies Corporation | Process for selective metallization |
| US4695489A (en) * | 1986-07-28 | 1987-09-22 | General Electric Company | Electroless nickel plating composition and method |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE4228442C1 (de) * | 1992-08-26 | 1994-02-03 | Hoechst Ceram Tec Ag | Verfahren zur außenstromlosen Vernickelung von Keramik |
| US5626715A (en) * | 1993-02-05 | 1997-05-06 | Lsi Logic Corporation | Methods of polishing semiconductor substrates |
| EP2387074A3 (de) * | 2006-03-23 | 2014-05-07 | CeramTec GmbH | Trägerkörper für Bauelemente oder Schaltungen |
Also Published As
| Publication number | Publication date |
|---|---|
| FR2635536B1 (fr) | 1992-01-17 |
| DE3827893C2 (enrdf_load_stackoverflow) | 1992-01-16 |
| JP3093219B2 (ja) | 2000-10-03 |
| JPH02101172A (ja) | 1990-04-12 |
| FR2635536A1 (fr) | 1990-02-23 |
| US5079040A (en) | 1992-01-07 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| 8110 | Request for examination paragraph 44 | ||
| D2 | Grant after examination | ||
| 8364 | No opposition during term of opposition | ||
| 8327 | Change in the person/name/address of the patent owner |
Owner name: CERAMTEC AG INNOVATIVE CERAMIC ENGINEERING, 73207 |