DE3786648D1 - Optisches uebertragungssystem mit vergroesserung. - Google Patents

Optisches uebertragungssystem mit vergroesserung.

Info

Publication number
DE3786648D1
DE3786648D1 DE8787117111T DE3786648T DE3786648D1 DE 3786648 D1 DE3786648 D1 DE 3786648D1 DE 8787117111 T DE8787117111 T DE 8787117111T DE 3786648 T DE3786648 T DE 3786648T DE 3786648 D1 DE3786648 D1 DE 3786648D1
Authority
DE
Germany
Prior art keywords
magnification
transmission system
optical transmission
optical
transmission
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE8787117111T
Other languages
English (en)
Other versions
DE3786648T2 (de
Inventor
David Ross Shafer
Abe Offner
Rama Singh
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
SVG Lithography Systems Inc
Original Assignee
SVG Lithography Systems Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by SVG Lithography Systems Inc filed Critical SVG Lithography Systems Inc
Publication of DE3786648D1 publication Critical patent/DE3786648D1/de
Application granted granted Critical
Publication of DE3786648T2 publication Critical patent/DE3786648T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B17/00—Systems with reflecting surfaces, with or without refracting elements
    • G02B17/08—Catadioptric systems
    • G02B17/0836—Catadioptric systems using more than three curved mirrors
    • G02B17/0844—Catadioptric systems using more than three curved mirrors off-axis or unobscured systems in which all of the mirrors share a common axis of rotational symmetry
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B13/00—Optical objectives specially designed for the purposes specified below
    • G02B13/22—Telecentric objectives or lens systems
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B17/00—Systems with reflecting surfaces, with or without refracting elements
    • G02B17/02—Catoptric systems, e.g. image erecting and reversing system
    • G02B17/06—Catoptric systems, e.g. image erecting and reversing system using mirrors only, i.e. having only one curved mirror
    • G02B17/0647—Catoptric systems, e.g. image erecting and reversing system using mirrors only, i.e. having only one curved mirror using more than three curved mirrors
    • G02B17/0657—Catoptric systems, e.g. image erecting and reversing system using mirrors only, i.e. having only one curved mirror using more than three curved mirrors off-axis or unobscured systems in which all of the mirrors share a common axis of rotational symmetry
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B17/00—Systems with reflecting surfaces, with or without refracting elements
    • G02B17/08—Catadioptric systems
    • G02B17/0892—Catadioptric systems specially adapted for the UV
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70225—Optical aspects of catadioptric systems, i.e. comprising reflective and refractive elements
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70233—Optical aspects of catoptric systems, i.e. comprising only reflective elements, e.g. extreme ultraviolet [EUV] projection systems

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Lenses (AREA)
DE87117111T 1986-12-17 1987-11-19 Optisches uebertragungssystem mit vergroesserung. Expired - Fee Related DE3786648T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US06/942,899 US4747678A (en) 1986-12-17 1986-12-17 Optical relay system with magnification

Publications (2)

Publication Number Publication Date
DE3786648D1 true DE3786648D1 (de) 1993-08-26
DE3786648T2 DE3786648T2 (de) 1993-11-04

Family

ID=25478792

Family Applications (1)

Application Number Title Priority Date Filing Date
DE87117111T Expired - Fee Related DE3786648T2 (de) 1986-12-17 1987-11-19 Optisches uebertragungssystem mit vergroesserung.

Country Status (6)

Country Link
US (1) US4747678A (de)
EP (1) EP0271737B1 (de)
JP (1) JPS63163319A (de)
KR (1) KR960013806B1 (de)
CA (1) CA1304613C (de)
DE (1) DE3786648T2 (de)

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US5473410A (en) * 1990-11-28 1995-12-05 Nikon Corporation Projection exposure apparatus
JP2830492B2 (ja) 1991-03-06 1998-12-02 株式会社ニコン 投影露光装置及び投影露光方法
US5153772A (en) * 1991-04-09 1992-10-06 Toledyne Industries, Inc. Binary optic-corrected multistage imaging system
JPH04333011A (ja) * 1991-05-09 1992-11-20 Nikon Corp 反射縮小投影光学装置
DE69216940T2 (de) * 1991-08-05 1997-09-04 Nippon Kogaku Kk Verkleinerndes katadioptrisches Projektionssystem
US5251070A (en) * 1991-09-28 1993-10-05 Nikon Corporation Catadioptric reduction projection optical system
JP3235077B2 (ja) * 1991-09-28 2001-12-04 株式会社ニコン 露光装置、該装置を用いた露光方法、及び該装置を用いた半導体素子製造方法
JP3085481B2 (ja) * 1991-09-28 2000-09-11 株式会社ニコン 反射屈折縮小投影光学系、及び該光学系を備えた露光装置
US6249335B1 (en) * 1992-01-17 2001-06-19 Nikon Corporation Photo-mask and method of exposing and projection-exposing apparatus
DE69314567T2 (de) * 1992-07-29 1998-02-26 Nippon Kogaku Kk Verkleinerndes katadioptrisches Projektionssystem
US5477304A (en) * 1992-10-22 1995-12-19 Nikon Corporation Projection exposure apparatus
JP2750062B2 (ja) * 1992-12-14 1998-05-13 キヤノン株式会社 反射屈折型光学系及び該光学系を備える投影露光装置
DE69315314T2 (de) * 1992-12-24 1998-03-19 Nippon Kogaku Kk Verkleinerndes katadioptrisches Projektionssystem
KR100300618B1 (ko) 1992-12-25 2001-11-22 오노 시게오 노광방법,노광장치,및그장치를사용하는디바이스제조방법
US5591958A (en) * 1993-06-14 1997-01-07 Nikon Corporation Scanning exposure method and apparatus
US5323263A (en) * 1993-02-01 1994-06-21 Nikon Precision Inc. Off-axis catadioptric projection system
US6078381A (en) 1993-02-01 2000-06-20 Nikon Corporation Exposure method and apparatus
US5592329A (en) * 1993-02-03 1997-01-07 Nikon Corporation Catadioptric optical system
JPH09311278A (ja) * 1996-05-20 1997-12-02 Nikon Corp 反射屈折光学系
US5636066A (en) * 1993-03-12 1997-06-03 Nikon Corporation Optical apparatus
US5815248A (en) * 1993-04-22 1998-09-29 Nikon Corporation Illumination optical apparatus and method having a wavefront splitter and an optical integrator
US5854671A (en) * 1993-05-28 1998-12-29 Nikon Corporation Scanning exposure method and apparatus therefor and a projection exposure apparatus and method which selectively chooses between static exposure and scanning exposure
US5534970A (en) * 1993-06-11 1996-07-09 Nikon Corporation Scanning exposure apparatus
DE69434080T2 (de) 1993-06-11 2005-10-20 Nikon Corp. Abtastbelichtungsvorrichtung
US5699145A (en) 1993-07-14 1997-12-16 Nikon Corporation Scanning type exposure apparatus
US5515207A (en) * 1993-11-03 1996-05-07 Nikon Precision Inc. Multiple mirror catadioptric optical system
US5617182A (en) * 1993-11-22 1997-04-01 Nikon Corporation Scanning exposure method
JP3395801B2 (ja) 1994-04-28 2003-04-14 株式会社ニコン 反射屈折投影光学系、走査型投影露光装置、及び走査投影露光方法
IL113789A (en) * 1994-05-23 1999-01-26 Hughes Aircraft Co A non-focusing device with three hinged mirrors and a corrective mirror
US5559629A (en) * 1994-08-19 1996-09-24 Tamarack Scientific Co., Inc. Unit magnification projection system and method
USRE38438E1 (en) 1994-08-23 2004-02-24 Nikon Corporation Catadioptric reduction projection optical system and exposure apparatus having the same
US5488229A (en) * 1994-10-04 1996-01-30 Excimer Laser Systems, Inc. Deep ultraviolet microlithography system
US5559338A (en) * 1994-10-04 1996-09-24 Excimer Laser Systems, Inc. Deep ultraviolet optical imaging system for microlithography and/or microfabrication
JPH08179204A (ja) 1994-11-10 1996-07-12 Nikon Corp 投影光学系及び投影露光装置
JP3454390B2 (ja) 1995-01-06 2003-10-06 株式会社ニコン 投影光学系、投影露光装置及び投影露光方法
JPH08203812A (ja) * 1995-01-30 1996-08-09 Nikon Corp 反射屈折縮小投影光学系及び露光装置
PT101696A (pt) * 1995-05-04 1996-12-31 Joaquim Antonio Abrantes Cande Objectiva de projeccao feita de espelhos corrigida
US5805365A (en) * 1995-10-12 1998-09-08 Sandia Corporation Ringfield lithographic camera
US5815310A (en) 1995-12-12 1998-09-29 Svg Lithography Systems, Inc. High numerical aperture ring field optical reduction system
US5717518A (en) 1996-07-22 1998-02-10 Kla Instruments Corporation Broad spectrum ultraviolet catadioptric imaging system
US5825043A (en) * 1996-10-07 1998-10-20 Nikon Precision Inc. Focusing and tilting adjustment system for lithography aligner, manufacturing apparatus or inspection apparatus
US6084706A (en) * 1997-07-09 2000-07-04 Etec Systems, Inc. High efficiency laser pattern generator
JPH1164734A (ja) * 1997-08-22 1999-03-05 Canon Inc 撮影光学系及びそれを用いた撮像装置
US5956192A (en) * 1997-09-18 1999-09-21 Svg Lithography Systems, Inc. Four mirror EUV projection optics
US6081578A (en) * 1997-11-07 2000-06-27 U.S. Philips Corporation Three-mirror system for lithographic projection, and projection apparatus comprising such a mirror system
GB2332533A (en) * 1997-12-19 1999-06-23 Image Automation Limited Optical system comprising beam splitter and Offner relay
WO1999052004A1 (fr) * 1998-04-07 1999-10-14 Nikon Corporation Appareil et procede d'exposition a projection, et systeme optique reflechissant a refraction
EP1293832A1 (de) 1998-06-08 2003-03-19 Nikon Corporation Verfahren und Vorrichtung zur Projektionsbelichtung
JP3985346B2 (ja) 1998-06-12 2007-10-03 株式会社ニコン 投影露光装置、投影露光装置の調整方法、及び投影露光方法
US6324016B1 (en) * 1998-11-18 2001-11-27 Spencer D. Luster Telecentric lens
JP2001108523A (ja) * 1999-10-14 2001-04-20 Matsushita Electric Ind Co Ltd 分光測定装置
TW538256B (en) * 2000-01-14 2003-06-21 Zeiss Stiftung Microlithographic reduction projection catadioptric objective
JP2001228401A (ja) * 2000-02-16 2001-08-24 Canon Inc 投影光学系、および該投影光学系による投影露光装置、デバイス製造方法
NZ511257A (en) * 2001-04-20 2003-05-30 Ind Res Ltd Imaging system having a dual cassegrain-like format
JP4510399B2 (ja) 2003-04-07 2010-07-21 キヤノン株式会社 反射光学系、及びそれを用いた投影装置
US7130020B2 (en) * 2003-04-30 2006-10-31 Whitney Theodore R Roll printer with decomposed raster scan and X-Y distortion correction
US7158215B2 (en) * 2003-06-30 2007-01-02 Asml Holding N.V. Large field of view protection optical system with aberration correctability for flat panel displays
IL162617A (en) * 2004-06-17 2010-04-15 Nova Measuring Instr Ltd Reflective optical system
US7365848B2 (en) * 2004-12-01 2008-04-29 Asml Holding N.V. System and method using visible and infrared light to align and measure alignment patterns on multiple layers
US7324185B2 (en) 2005-03-04 2008-01-29 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
KR100712289B1 (ko) * 2005-04-07 2007-04-27 삼성에스디아이 주식회사 평판표시장치 및 그의 제조방법
US8248577B2 (en) 2005-05-03 2012-08-21 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7330258B2 (en) * 2005-05-27 2008-02-12 Innovative Technical Solutions, Inc. Spectrometer designs
DE102008017645A1 (de) * 2008-04-04 2009-10-08 Carl Zeiss Smt Ag Vorrichtung zur mikrolithographischen Projektionsbelichtung sowie Vorrichtung zur Inspektion einer Oberfläche eines Substrats
DE102009044751B4 (de) * 2008-12-04 2014-07-31 Highyag Lasertechnologie Gmbh Spiegel-Objektiv für Laserstrahlung
US8570356B2 (en) * 2009-06-03 2013-10-29 John Michael Tamkin Optical system for direct imaging of light markable material
JP5008012B2 (ja) * 2011-01-28 2012-08-22 レーザーテック株式会社 検査装置、及び検査方法
EP2857810A1 (de) * 2013-10-02 2015-04-08 Nederlandse Organisatie voor toegepast -natuurwetenschappelijk onderzoek TNO Monolithisches Spektrometer
DE102021111728A1 (de) 2021-05-05 2022-11-10 General Atomics Synopta GmbH Sphärisches Spiegelsystem für eine Freiraumkommunikation mit Satelliten mit beugungsbegrenzter Abbildungsqualität und hoher Transmission

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Also Published As

Publication number Publication date
EP0271737A2 (de) 1988-06-22
DE3786648T2 (de) 1993-11-04
KR880008049A (ko) 1988-08-30
CA1304613C (en) 1992-07-07
JPS63163319A (ja) 1988-07-06
EP0271737B1 (de) 1993-07-21
EP0271737A3 (en) 1988-10-12
KR960013806B1 (ko) 1996-10-10
US4747678A (en) 1988-05-31

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee