DE69314567T2 - Verkleinerndes katadioptrisches Projektionssystem - Google Patents
Verkleinerndes katadioptrisches ProjektionssystemInfo
- Publication number
- DE69314567T2 DE69314567T2 DE69314567T DE69314567T DE69314567T2 DE 69314567 T2 DE69314567 T2 DE 69314567T2 DE 69314567 T DE69314567 T DE 69314567T DE 69314567 T DE69314567 T DE 69314567T DE 69314567 T2 DE69314567 T2 DE 69314567T2
- Authority
- DE
- Germany
- Prior art keywords
- downsizing
- projection system
- catadioptric projection
- catadioptric
- projection
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B17/00—Systems with reflecting surfaces, with or without refracting elements
- G02B17/08—Catadioptric systems
- G02B17/0804—Catadioptric systems using two curved mirrors
- G02B17/0812—Catadioptric systems using two curved mirrors off-axis or unobscured systems in which all of the mirrors share a common axis of rotational symmetry
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B17/00—Systems with reflecting surfaces, with or without refracting elements
- G02B17/08—Catadioptric systems
- G02B17/0892—Catadioptric systems specially adapted for the UV
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70225—Optical aspects of catadioptric systems, i.e. comprising reflective and refractive elements
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Lenses (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP4202359A JPH05188298A (ja) | 1991-08-05 | 1992-07-29 | 反射屈折縮小投影光学系 |
Publications (2)
Publication Number | Publication Date |
---|---|
DE69314567D1 DE69314567D1 (de) | 1997-11-20 |
DE69314567T2 true DE69314567T2 (de) | 1998-02-26 |
Family
ID=16456206
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE69314567T Expired - Fee Related DE69314567T2 (de) | 1992-07-29 | 1993-07-28 | Verkleinerndes katadioptrisches Projektionssystem |
Country Status (2)
Country | Link |
---|---|
EP (1) | EP0581585B1 (de) |
DE (1) | DE69314567T2 (de) |
Families Citing this family (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP3819048B2 (ja) * | 1995-03-15 | 2006-09-06 | 株式会社ニコン | 投影光学系及びそれを備えた露光装置並びに露光方法 |
DE19639586A1 (de) * | 1996-09-26 | 1998-04-02 | Zeiss Carl Fa | Katadioptrisches Mikrolithographie-Reduktionsobjektiv |
US6631036B2 (en) | 1996-09-26 | 2003-10-07 | Carl-Zeiss-Stiftung | Catadioptric objective |
USRE42570E1 (en) | 1996-09-26 | 2011-07-26 | Carl Zeiss Smt Gmbh | Catadioptric objective |
US6169627B1 (en) | 1996-09-26 | 2001-01-02 | Carl-Zeiss-Stiftung | Catadioptric microlithographic reduction objective |
CN116699827B (zh) * | 2023-07-19 | 2023-10-03 | 清华大学 | 用于中大口径光谱巡天望远镜的光学系统 |
Family Cites Families (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE1199515B (de) * | 1961-12-23 | 1965-08-26 | Rodenstock Optik G | Spiegelobjektiv |
US4812028A (en) * | 1984-07-23 | 1989-03-14 | Nikon Corporation | Reflection type reduction projection optical system |
JPS61156737A (ja) * | 1984-12-27 | 1986-07-16 | Canon Inc | 回路の製造方法及び露光装置 |
US4747678A (en) * | 1986-12-17 | 1988-05-31 | The Perkin-Elmer Corporation | Optical relay system with magnification |
EP0527043B1 (de) * | 1991-08-05 | 1997-01-22 | Nikon Corporation | Verkleinerndes katadioptrisches Projektionssystem |
-
1993
- 1993-07-28 DE DE69314567T patent/DE69314567T2/de not_active Expired - Fee Related
- 1993-07-28 EP EP19930305960 patent/EP0581585B1/de not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
DE69314567D1 (de) | 1997-11-20 |
EP0581585B1 (de) | 1997-10-15 |
EP0581585A1 (de) | 1994-02-02 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8364 | No opposition during term of opposition | ||
8328 | Change in the person/name/address of the agent |
Free format text: WESER & KOLLEGEN, 81245 MUENCHEN |
|
8339 | Ceased/non-payment of the annual fee |