DE3785706D1 - Strahlzentrierungsverfahren. - Google Patents

Strahlzentrierungsverfahren.

Info

Publication number
DE3785706D1
DE3785706D1 DE8787201431T DE3785706T DE3785706D1 DE 3785706 D1 DE3785706 D1 DE 3785706D1 DE 8787201431 T DE8787201431 T DE 8787201431T DE 3785706 T DE3785706 T DE 3785706T DE 3785706 D1 DE3785706 D1 DE 3785706D1
Authority
DE
Germany
Prior art keywords
centering method
beam centering
centering
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE8787201431T
Other languages
English (en)
Other versions
DE3785706T2 (de
Inventor
Johan Gustaaf Bakker
Der Mast Karel Diederick Van
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Koninklijke Philips NV
Original Assignee
Philips Gloeilampenfabrieken NV
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Philips Gloeilampenfabrieken NV filed Critical Philips Gloeilampenfabrieken NV
Application granted granted Critical
Publication of DE3785706D1 publication Critical patent/DE3785706D1/de
Publication of DE3785706T2 publication Critical patent/DE3785706T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02Details
    • H01J37/04Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement
    • H01J37/147Arrangements for directing or deflecting the discharge along a desired path
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/26Electron or ion microscopes; Electron or ion diffraction tubes
    • H01J37/261Details
    • H01J37/265Controlling the tube; circuit arrangements adapted to a particular application not otherwise provided, e.g. bright-field-dark-field illumination

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Electron Sources, Ion Sources (AREA)
  • Mounting And Adjusting Of Optical Elements (AREA)
DE87201431T 1986-08-27 1987-07-24 Strahlzentrierungsverfahren. Expired - Fee Related DE3785706T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
NL8602175A NL8602175A (nl) 1986-08-27 1986-08-27 Werkwijze voor bundelcentrering.

Publications (2)

Publication Number Publication Date
DE3785706D1 true DE3785706D1 (de) 1993-06-09
DE3785706T2 DE3785706T2 (de) 1993-11-18

Family

ID=19848461

Family Applications (1)

Application Number Title Priority Date Filing Date
DE87201431T Expired - Fee Related DE3785706T2 (de) 1986-08-27 1987-07-24 Strahlzentrierungsverfahren.

Country Status (6)

Country Link
US (1) US4820921A (de)
EP (1) EP0257679B1 (de)
JP (1) JPS63114035A (de)
KR (1) KR880003389A (de)
DE (1) DE3785706T2 (de)
NL (1) NL8602175A (de)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0245734A (ja) * 1988-08-05 1990-02-15 Mitsubishi Heavy Ind Ltd 自動組織解析処理装置
US5300776A (en) * 1992-09-16 1994-04-05 Gatan, Inc. Autoadjusting electron microscope
JP5188846B2 (ja) * 2008-03-10 2013-04-24 日本電子株式会社 走査型透過電子顕微鏡の収差補正装置及び収差補正方法
JP7208212B2 (ja) * 2020-11-30 2023-01-18 日本電子株式会社 透過電子顕微鏡および光学系の調整方法

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4095104A (en) * 1975-09-01 1978-06-13 U.S. Philips Corporation Electron microscope
JPS6091540A (ja) * 1983-10-25 1985-05-22 Jeol Ltd 透過電子顕微鏡における軸合せ方法
NL8304217A (nl) * 1983-12-07 1985-07-01 Philips Nv Automatisch instelbare electronenmicroscoop.
US4680469A (en) * 1984-08-17 1987-07-14 Hitachi, Ltd. Focusing device for a television electron microscope
JPS61168852A (ja) * 1985-01-23 1986-07-30 Hitachi Ltd 透過形電子顕微鏡の焦点合せ装置
JPH0691540A (ja) * 1992-09-16 1994-04-05 Osaka Diamond Ind Co Ltd 総形研削砥石

Also Published As

Publication number Publication date
EP0257679B1 (de) 1993-05-05
DE3785706T2 (de) 1993-11-18
NL8602175A (nl) 1988-03-16
KR880003389A (ko) 1988-05-16
EP0257679A1 (de) 1988-03-02
JPS63114035A (ja) 1988-05-18
US4820921A (en) 1989-04-11

Similar Documents

Publication Publication Date Title
DE3676906D1 (de) Laserbearbeitungsverfahren.
DE3783160D1 (de) Hartloetverfahren.
NO871593L (no) Laser-sveising.
DE3889843D1 (de) Spannvorrichtung.
DE3785617D1 (de) Immunassay-prozess.
KR880701612A (ko) 레이저 가공방법
DE3764783D1 (de) Laserapparat.
DE3889831D1 (de) Laser-Apparat.
DE3772619D1 (de) Mischverfahren.
DE3789121D1 (de) Entwicklungsverfahren.
DE3879547T2 (de) Laser-apparat.
DE3781146T2 (de) Hf-entladungsangeregter laser.
IT8619255A0 (it) Disposizione di centraggio.
DE3783435D1 (de) Automatisches fokussierungsverfahren.
DE3854236T2 (de) Laser-Apparat.
DE3775781D1 (de) Plattenspieler.
NO853376L (no) Broenn-testemetode.
DE3784957T2 (de) Plattenspieler.
DE3779158D1 (de) Chrom-dotierter scandium-borat-laser.
DE3776896D1 (de) Laseranordnung.
DE3763628D1 (de) Mehrfachstrahl-lasertron.
DE3784351D1 (de) Laserabtastvorrichtung.
FI884766A0 (fi) Syrakatalyserad process.
NO863756D0 (no) Metode for fremstilling av celleplast.
DE3762474D1 (de) Abgeschlossener gaslaser.

Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8327 Change in the person/name/address of the patent owner

Owner name: PHILIPS ELECTRONICS N.V., EINDHOVEN, NL

8327 Change in the person/name/address of the patent owner

Owner name: KONINKLIJKE PHILIPS ELECTRONICS N.V., EINDHOVEN, N

8339 Ceased/non-payment of the annual fee