DE3785292D1 - Hochleistungslasermaske und herstellungsverfahren. - Google Patents

Hochleistungslasermaske und herstellungsverfahren.

Info

Publication number
DE3785292D1
DE3785292D1 DE8787113673T DE3785292T DE3785292D1 DE 3785292 D1 DE3785292 D1 DE 3785292D1 DE 8787113673 T DE8787113673 T DE 8787113673T DE 3785292 T DE3785292 T DE 3785292T DE 3785292 D1 DE3785292 D1 DE 3785292D1
Authority
DE
Germany
Prior art keywords
manufacturing
high performance
laser mask
performance laser
mask
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE8787113673T
Other languages
English (en)
Other versions
DE3785292T2 (de
Inventor
Steven James Kirch
John Robert Lankard
John Hames Ritsko
Kurt Alan Smith
James Louis Speidell
James Tien-Cheng Yeh
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
International Business Machines Corp
Original Assignee
International Business Machines Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by International Business Machines Corp filed Critical International Business Machines Corp
Application granted granted Critical
Publication of DE3785292D1 publication Critical patent/DE3785292D1/de
Publication of DE3785292T2 publication Critical patent/DE3785292T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/54—Absorbers, e.g. of opaque materials
    • G03F1/58—Absorbers, e.g. of opaque materials having two or more different absorber layers, e.g. stacked multilayer absorbers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/22—Masks or mask blanks for imaging by radiation of 100nm or shorter wavelength, e.g. X-ray masks, extreme ultraviolet [EUV] masks; Preparation thereof
    • G03F1/24—Reflection masks; Preparation thereof
DE19873785292 1986-10-29 1987-09-18 Hochleistungslasermaske und Herstellungsverfahren. Expired - Fee Related DE3785292T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US92448086A 1986-10-29 1986-10-29

Publications (2)

Publication Number Publication Date
DE3785292D1 true DE3785292D1 (de) 1993-05-13
DE3785292T2 DE3785292T2 (de) 1993-10-28

Family

ID=25450254

Family Applications (1)

Application Number Title Priority Date Filing Date
DE19873785292 Expired - Fee Related DE3785292T2 (de) 1986-10-29 1987-09-18 Hochleistungslasermaske und Herstellungsverfahren.

Country Status (3)

Country Link
EP (1) EP0265658B1 (de)
JP (1) JPH0797216B2 (de)
DE (1) DE3785292T2 (de)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
ATE199046T1 (de) * 1990-05-09 2001-02-15 Canon Kk Erzeugung von mustern und herstellungsverfahren für halbleiteranordnungen mit diesem muster
GB9105870D0 (en) * 1991-03-20 1991-05-08 Xaar Ltd Fluid cooled contact mask
CH686461A5 (de) * 1992-07-21 1996-03-29 Balzers Hochvakuum Verfahren zur Herstellung eines Bauelementes, optisches Bauelement und Anlage zur Durchfuehrung des Verfahrens.
FR2694131B1 (fr) * 1992-07-21 1996-09-27 Balzers Hochvakuum Procede et installation pour la fabrication d'un composant, notamment d'un composant optique, et composant optique ainsi obtenu.
US6627355B2 (en) * 1999-07-20 2003-09-30 Advanced Micro Devices, Inc. Method of and system for improving stability of photomasks
US6107598A (en) * 1999-08-10 2000-08-22 Chromalloy Gas Turbine Corporation Maskant for use during laser welding or drilling
US6444372B1 (en) * 1999-10-25 2002-09-03 Svg Lithography Systems, Inc. Non absorbing reticle and method of making same
DE10017614B4 (de) * 2000-03-31 2005-02-24 Laser-Laboratorium Göttingen eV Verfahren zur Herstellung einer dielektrischen Reflexionsmaske
KR102462030B1 (ko) * 2018-06-14 2022-11-01 인테벡, 인코포레이티드 멀티 칼라 절연 코팅 및 uv 잉크젯 프린팅
JP7443337B2 (ja) * 2018-08-27 2024-03-05 マテリオン コーポレイション ディスプレイ製造用のｕｖ反射ミラー

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3147985C2 (de) * 1981-12-04 1986-03-13 Dr. Johannes Heidenhain Gmbh, 8225 Traunreut Verfahren zur Herstellung eines Aufzeichnungsträgers mit einer mehrfarbigen Feinstruktur
DE3224736A1 (de) * 1982-07-02 1984-01-05 Bodenseewerk Perkin-Elmer & Co GmbH, 7770 Überlingen Gitterspektrometer
DE3856054T2 (de) * 1987-02-18 1998-03-19 Canon Kk Reflexionsmaske

Also Published As

Publication number Publication date
EP0265658A3 (en) 1989-03-15
JPH0797216B2 (ja) 1995-10-18
JPH01118134A (ja) 1989-05-10
DE3785292T2 (de) 1993-10-28
EP0265658A2 (de) 1988-05-04
EP0265658B1 (de) 1993-04-07

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee