DE3783381D1 - Diamantartige kohlenstoffschichten und verfahren zu ihrer herstellung. - Google Patents

Diamantartige kohlenstoffschichten und verfahren zu ihrer herstellung.

Info

Publication number
DE3783381D1
DE3783381D1 DE8787104037T DE3783381T DE3783381D1 DE 3783381 D1 DE3783381 D1 DE 3783381D1 DE 8787104037 T DE8787104037 T DE 8787104037T DE 3783381 T DE3783381 T DE 3783381T DE 3783381 D1 DE3783381 D1 DE 3783381D1
Authority
DE
Germany
Prior art keywords
diamond
production
carbon layers
layers
carbon
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE8787104037T
Other languages
English (en)
Other versions
DE3783381T2 (de
Inventor
N Venkataramanan
Charles B Zarowin
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Applied Biosystems Inc
Original Assignee
Perkin Elmer Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Perkin Elmer Corp filed Critical Perkin Elmer Corp
Application granted granted Critical
Publication of DE3783381D1 publication Critical patent/DE3783381D1/de
Publication of DE3783381T2 publication Critical patent/DE3783381T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/26—Deposition of carbon only

Landscapes

  • Chemical & Material Sciences (AREA)
  • Inorganic Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
  • Chemical Vapour Deposition (AREA)
DE8787104037T 1986-03-20 1987-03-19 Diamantartige kohlenstoffschichten und verfahren zu ihrer herstellung. Expired - Fee Related DE3783381T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US06/841,917 US4647512A (en) 1986-03-20 1986-03-20 Diamond-like carbon films and process for production thereof

Publications (2)

Publication Number Publication Date
DE3783381D1 true DE3783381D1 (de) 1993-02-18
DE3783381T2 DE3783381T2 (de) 1993-05-06

Family

ID=25286039

Family Applications (1)

Application Number Title Priority Date Filing Date
DE8787104037T Expired - Fee Related DE3783381T2 (de) 1986-03-20 1987-03-19 Diamantartige kohlenstoffschichten und verfahren zu ihrer herstellung.

Country Status (4)

Country Link
US (1) US4647512A (de)
EP (1) EP0238085B1 (de)
JP (1) JPS62278264A (de)
DE (1) DE3783381T2 (de)

Families Citing this family (22)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63140083A (ja) * 1986-05-29 1988-06-11 Nippon Steel Corp 黒色透明外観のステンレス鋼およびその製造方法
WO1990007586A1 (en) * 1989-01-06 1990-07-12 Celestech, Inc. Improved diamond deposition cell
US5182093A (en) * 1990-01-08 1993-01-26 Celestech, Inc. Diamond deposition cell
GB8912470D0 (en) * 1989-05-31 1989-07-19 Stc Plc Carbon coating of optical fibres
DE3927133A1 (de) * 1989-08-17 1991-02-21 Philips Patentverwaltung Verfahren zur abscheidung mikrokristalliner festkoerperpartikel aus der gasphase mittels chemical vapour deposition
GB2240114B (en) * 1990-01-18 1993-03-24 Stc Plc Film nucleation process
US5783335A (en) * 1992-04-07 1998-07-21 The Regents Of The University Of California, Office Of Technology Transfer Fluidized bed deposition of diamond
US5294518A (en) * 1992-05-01 1994-03-15 International Business Machines Corporation Amorphous write-read optical storage memory
US7264850B1 (en) * 1992-12-28 2007-09-04 Semiconductor Energy Laboratory Co., Ltd. Process for treating a substrate with a plasma
US5441013A (en) * 1993-03-23 1995-08-15 At&T Bell Laboratories Method for growing continuous diamond films
US5811021A (en) * 1995-02-28 1998-09-22 Hughes Electronics Corporation Plasma assisted chemical transport method and apparatus
US5652061A (en) * 1995-05-22 1997-07-29 Lucent Technologies Inc. Devices comprising films of β-C3 N4
US6746565B1 (en) * 1995-08-17 2004-06-08 Semitool, Inc. Semiconductor processor with wafer face protection
JP3801730B2 (ja) * 1997-05-09 2006-07-26 株式会社半導体エネルギー研究所 プラズマｃｖｄ装置及びそれを用いた薄膜形成方法
US6569580B2 (en) 2001-03-13 2003-05-27 Diverging Technologies, Inc. Binary and phase-shift photomasks
JP3818255B2 (ja) * 2002-12-16 2006-09-06 住友電気工業株式会社 端部に回折光学膜を有する光ファイバとその製造方法
DE10353388A1 (de) * 2003-11-14 2005-06-16 Holger Westphal Diamantartige Kohlenstoffstruktur, Trägermatrix mit diamantartigen Kohlenstoffstrukturen, Verfahren zur Herstellung einer Trägermatrix und Verwendung einer Trägermatrix
JP4629421B2 (ja) * 2004-12-06 2011-02-09 パナソニック株式会社 ドライエッチング方法及びドライエッチング装置
US7993457B1 (en) * 2007-01-23 2011-08-09 Novellus Systems, Inc. Deposition sub-chamber with variable flow
US8895116B2 (en) 2010-11-04 2014-11-25 Semiconductor Energy Laboratory Co., Ltd. Manufacturing method of crystalline semiconductor film and manufacturing method of semiconductor device
US9353439B2 (en) 2013-04-05 2016-05-31 Lam Research Corporation Cascade design showerhead for transient uniformity
US10023959B2 (en) 2015-05-26 2018-07-17 Lam Research Corporation Anti-transient showerhead

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE843787C (de) * 1949-01-27 1952-07-14 Sueddeutsche App Fabrik G M B Verfahren und Einrichtung zur Erzeugung von UEberzuegen durch Aufdampfen oder kathodische Bestaeubung
US4486286A (en) * 1982-09-28 1984-12-04 Nerken Research Corp. Method of depositing a carbon film on a substrate and products obtained thereby
JPS59174508A (ja) * 1983-03-18 1984-10-03 Yoshitoshi Nanba 超硬質カ−ボン膜の製造法
JPS60171294A (ja) * 1984-02-13 1985-09-04 Mitsubishi Metal Corp 人工ダイヤモンドを蒸着生成する方法
CA1232228A (en) * 1984-03-13 1988-02-02 Tatsuro Miyasato Coating film and method and apparatus for producing the same
JPS60254610A (ja) * 1984-05-31 1985-12-16 Fujitsu Ltd 半導体製造装置

Also Published As

Publication number Publication date
EP0238085A3 (en) 1989-03-08
EP0238085A2 (de) 1987-09-23
JPS62278264A (ja) 1987-12-03
US4647512A (en) 1987-03-03
EP0238085B1 (de) 1993-01-07
DE3783381T2 (de) 1993-05-06

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee