GB2240114B - Film nucleation process - Google Patents
Film nucleation processInfo
- Publication number
- GB2240114B GB2240114B GB9001166A GB9001166A GB2240114B GB 2240114 B GB2240114 B GB 2240114B GB 9001166 A GB9001166 A GB 9001166A GB 9001166 A GB9001166 A GB 9001166A GB 2240114 B GB2240114 B GB 2240114B
- Authority
- GB
- United Kingdom
- Prior art keywords
- nucleation process
- film nucleation
- film
- nucleation
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/26—Deposition of carbon only
- C23C16/27—Diamond only
- C23C16/272—Diamond only using DC, AC or RF discharges
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/02—Pretreatment of the material to be coated
- C23C16/0227—Pretreatment of the material to be coated by cleaning or etching
- C23C16/0236—Pretreatment of the material to be coated by cleaning or etching by etching with a reactive gas
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/02—Pretreatment of the material to be coated
- C23C16/0272—Deposition of sub-layers, e.g. to promote the adhesion of the main coating
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/26—Deposition of carbon only
- C23C16/27—Diamond only
- C23C16/277—Diamond only using other elements in the gas phase besides carbon and hydrogen; using other elements besides carbon, hydrogen and oxygen in case of use of combustion torches; using other elements besides carbon, hydrogen and inert gas in case of use of plasma jets
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
- C23C16/515—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using pulsed discharges
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
GB9001166A GB2240114B (en) | 1990-01-18 | 1990-01-18 | Film nucleation process |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
GB9001166A GB2240114B (en) | 1990-01-18 | 1990-01-18 | Film nucleation process |
Publications (3)
Publication Number | Publication Date |
---|---|
GB9001166D0 GB9001166D0 (en) | 1990-06-13 |
GB2240114A GB2240114A (en) | 1991-07-24 |
GB2240114B true GB2240114B (en) | 1993-03-24 |
Family
ID=10669519
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
GB9001166A Expired - Fee Related GB2240114B (en) | 1990-01-18 | 1990-01-18 | Film nucleation process |
Country Status (1)
Country | Link |
---|---|
GB (1) | GB2240114B (en) |
Families Citing this family (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB9019219D0 (en) * | 1990-09-01 | 1990-10-17 | Atomic Energy Authority Uk | Diamond-like carbon coatings |
WO1993005207A1 (en) * | 1991-09-03 | 1993-03-18 | Chang R P H | Method of nucleating diamond and article produced thereby |
US5397428A (en) * | 1991-12-20 | 1995-03-14 | The University Of North Carolina At Chapel Hill | Nucleation enhancement for chemical vapor deposition of diamond |
JP2924989B2 (en) * | 1992-01-28 | 1999-07-26 | 日本特殊陶業株式会社 | Diamond film-coated silicon nitride base member and method of manufacturing the same |
CA2120175A1 (en) * | 1993-04-29 | 1994-10-30 | Louis K. Bigelow | Method for making a diamond coated structure |
GB9309346D0 (en) * | 1993-05-06 | 1993-06-16 | Kobe Steel Europ Ltd | Preparation of nucleated silicon surfaces |
US6794301B2 (en) | 1995-10-13 | 2004-09-21 | Mattson Technology, Inc. | Pulsed plasma processing of semiconductor substrates |
US6253704B1 (en) | 1995-10-13 | 2001-07-03 | Mattson Technology, Inc. | Apparatus and method for pulsed plasma processing of a semiconductor substrate |
JP4013271B2 (en) * | 1997-01-16 | 2007-11-28 | 日新電機株式会社 | Article surface treatment method and apparatus |
DE19844538C2 (en) * | 1998-09-29 | 2002-04-11 | Fraunhofer Ges Forschung | Process for diamond coating of surfaces |
CN114934264A (en) * | 2022-05-27 | 2022-08-23 | 南方科技大学 | High-transmittance wear-resistant light-transmitting material and preparation method and application thereof |
Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB2109012A (en) * | 1981-10-21 | 1983-05-25 | Rca Corp | Novel and improved diamond like film and process for producing same |
GB2128637A (en) * | 1982-09-28 | 1984-05-02 | Technion Res & Dev Foundation | Depositing a carbon film on a substrate |
EP0183254A2 (en) * | 1984-11-29 | 1986-06-04 | Matsushita Electric Industrial Co., Ltd. | Plasma CVD apparatus and method for forming a diamond-like carbon film |
EP0238085A2 (en) * | 1986-03-20 | 1987-09-23 | The Perkin-Elmer Corporation | Improved diamond-like carbon films and process for production thereof |
EP0272418A2 (en) * | 1986-12-22 | 1988-06-29 | General Electric Company | Apparatus and process to condensate diamond |
US4756794A (en) * | 1987-08-31 | 1988-07-12 | The United States Of America As Represented By The Secretary Of The Navy | Atomic layer etching |
-
1990
- 1990-01-18 GB GB9001166A patent/GB2240114B/en not_active Expired - Fee Related
Patent Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB2109012A (en) * | 1981-10-21 | 1983-05-25 | Rca Corp | Novel and improved diamond like film and process for producing same |
GB2128637A (en) * | 1982-09-28 | 1984-05-02 | Technion Res & Dev Foundation | Depositing a carbon film on a substrate |
EP0183254A2 (en) * | 1984-11-29 | 1986-06-04 | Matsushita Electric Industrial Co., Ltd. | Plasma CVD apparatus and method for forming a diamond-like carbon film |
EP0238085A2 (en) * | 1986-03-20 | 1987-09-23 | The Perkin-Elmer Corporation | Improved diamond-like carbon films and process for production thereof |
EP0272418A2 (en) * | 1986-12-22 | 1988-06-29 | General Electric Company | Apparatus and process to condensate diamond |
US4756794A (en) * | 1987-08-31 | 1988-07-12 | The United States Of America As Represented By The Secretary Of The Navy | Atomic layer etching |
Also Published As
Publication number | Publication date |
---|---|
GB2240114A (en) | 1991-07-24 |
GB9001166D0 (en) | 1990-06-13 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
732E | Amendments to the register in respect of changes of name or changes affecting rights (sect. 32/1977) | ||
732E | Amendments to the register in respect of changes of name or changes affecting rights (sect. 32/1977) | ||
PCNP | Patent ceased through non-payment of renewal fee |
Effective date: 20000118 |