GB9014723D0 - Crystallisation process - Google Patents

Crystallisation process

Info

Publication number
GB9014723D0
GB9014723D0 GB909014723A GB9014723A GB9014723D0 GB 9014723 D0 GB9014723 D0 GB 9014723D0 GB 909014723 A GB909014723 A GB 909014723A GB 9014723 A GB9014723 A GB 9014723A GB 9014723 D0 GB9014723 D0 GB 9014723D0
Authority
GB
United Kingdom
Prior art keywords
crystallisation process
crystallisation
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
GB909014723A
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
BAE Systems Electronics Ltd
Original Assignee
GEC Marconi Ltd
Marconi Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by GEC Marconi Ltd, Marconi Co Ltd filed Critical GEC Marconi Ltd
Priority to GB909014723A priority Critical patent/GB9014723D0/en
Publication of GB9014723D0 publication Critical patent/GB9014723D0/en
Priority to PCT/GB1991/001086 priority patent/WO1992001089A1/en
Priority to GB9114398A priority patent/GB2245552A/en
Priority to EP91912797A priority patent/EP0489900A1/en
Priority to JP3512016A priority patent/JPH05501701A/en
Pending legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02104—Forming layers
    • H01L21/02365—Forming inorganic semiconducting materials on a substrate
    • H01L21/02518—Deposited layers
    • H01L21/02521—Materials
    • H01L21/02524—Group 14 semiconducting materials
    • H01L21/02532—Silicon, silicon germanium, germanium
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02104—Forming layers
    • H01L21/02365—Forming inorganic semiconducting materials on a substrate
    • H01L21/02656—Special treatments
    • H01L21/02664—Aftertreatments
    • H01L21/02667—Crystallisation or recrystallisation of non-monocrystalline semiconductor materials, e.g. regrowth
    • H01L21/02672—Crystallisation or recrystallisation of non-monocrystalline semiconductor materials, e.g. regrowth using crystallisation enhancing elements
    • C—CHEMISTRY; METALLURGY
    • C30—CRYSTAL GROWTH
    • C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B1/00—Single-crystal growth directly from the solid state
    • C30B1/02—Single-crystal growth directly from the solid state by thermal treatment, e.g. strain annealing
    • C30B1/023—Single-crystal growth directly from the solid state by thermal treatment, e.g. strain annealing from solids with amorphous structure
    • C—CHEMISTRY; METALLURGY
    • C30—CRYSTAL GROWTH
    • C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B29/00—Single crystals or homogeneous polycrystalline material with defined structure characterised by the material or by their shape
    • C30B29/02—Elements
    • C30B29/06—Silicon
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02104—Forming layers
    • H01L21/02365—Forming inorganic semiconducting materials on a substrate
    • H01L21/02367—Substrates
    • H01L21/0237—Materials
    • H01L21/02373—Group 14 semiconducting materials
    • H01L21/02381—Silicon, silicon germanium, germanium
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02104—Forming layers
    • H01L21/02365—Forming inorganic semiconducting materials on a substrate
    • H01L21/02518—Deposited layers
    • H01L21/02587—Structure
    • H01L21/0259—Microstructure
    • H01L21/02595—Microstructure polycrystalline

Landscapes

  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • General Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Thermal Sciences (AREA)
  • Recrystallisation Techniques (AREA)
GB909014723A 1990-07-03 1990-07-03 Crystallisation process Pending GB9014723D0 (en)

Priority Applications (5)

Application Number Priority Date Filing Date Title
GB909014723A GB9014723D0 (en) 1990-07-03 1990-07-03 Crystallisation process
PCT/GB1991/001086 WO1992001089A1 (en) 1990-07-03 1991-07-03 Crystallisation process
GB9114398A GB2245552A (en) 1990-07-03 1991-07-03 Crystallising amorphous silicon
EP91912797A EP0489900A1 (en) 1990-07-03 1991-07-03 Crystallisation process
JP3512016A JPH05501701A (en) 1990-07-03 1991-07-03 Crystallization method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
GB909014723A GB9014723D0 (en) 1990-07-03 1990-07-03 Crystallisation process

Publications (1)

Publication Number Publication Date
GB9014723D0 true GB9014723D0 (en) 1990-08-22

Family

ID=10678581

Family Applications (2)

Application Number Title Priority Date Filing Date
GB909014723A Pending GB9014723D0 (en) 1990-07-03 1990-07-03 Crystallisation process
GB9114398A Withdrawn GB2245552A (en) 1990-07-03 1991-07-03 Crystallising amorphous silicon

Family Applications After (1)

Application Number Title Priority Date Filing Date
GB9114398A Withdrawn GB2245552A (en) 1990-07-03 1991-07-03 Crystallising amorphous silicon

Country Status (4)

Country Link
EP (1) EP0489900A1 (en)
JP (1) JPH05501701A (en)
GB (2) GB9014723D0 (en)
WO (1) WO1992001089A1 (en)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3497198B2 (en) * 1993-02-03 2004-02-16 株式会社半導体エネルギー研究所 Method for manufacturing semiconductor device and thin film transistor
US6997985B1 (en) 1993-02-15 2006-02-14 Semiconductor Energy Laboratory Co., Ltd. Semiconductor, semiconductor device, and method for fabricating the same
DE69428387T2 (en) * 1993-02-15 2002-07-04 Semiconductor Energy Lab Manufacturing process for a crystallized semiconductor layer
US6730549B1 (en) 1993-06-25 2004-05-04 Semiconductor Energy Laboratory Co., Ltd. Semiconductor device and method for its preparation
TW264575B (en) 1993-10-29 1995-12-01 Handotai Energy Kenkyusho Kk
JP2860869B2 (en) * 1993-12-02 1999-02-24 株式会社半導体エネルギー研究所 Semiconductor device and manufacturing method thereof

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63503345A (en) * 1985-12-19 1988-12-02 アライド・コ−ポレ−ション Method of forming single crystal silicon using SPE seeds and laser crystallization
AU616739B2 (en) * 1988-03-11 1991-11-07 Unisearch Limited Improved solution growth of silicon films
EP0334110B1 (en) * 1988-03-24 1993-09-15 Siemens Aktiengesellschaft Process for producing polycristalline layers with large crystals for thin film semiconductor devices, like solar cells

Also Published As

Publication number Publication date
JPH05501701A (en) 1993-04-02
EP0489900A1 (en) 1992-06-17
WO1992001089A1 (en) 1992-01-23
GB2245552A (en) 1992-01-08
GB9114398D0 (en) 1991-08-21

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