DE3770569D1 - Verfahren zur herstellung einer p+nn+-diode und eines diese diode umfassenden bipolaren transistors unter verwendung des neutralisierungseffektes von atomarem wasserstoff auf donatoratomen. - Google Patents
Verfahren zur herstellung einer p+nn+-diode und eines diese diode umfassenden bipolaren transistors unter verwendung des neutralisierungseffektes von atomarem wasserstoff auf donatoratomen.Info
- Publication number
- DE3770569D1 DE3770569D1 DE8787402202T DE3770569T DE3770569D1 DE 3770569 D1 DE3770569 D1 DE 3770569D1 DE 8787402202 T DE8787402202 T DE 8787402202T DE 3770569 T DE3770569 T DE 3770569T DE 3770569 D1 DE3770569 D1 DE 3770569D1
- Authority
- DE
- Germany
- Prior art keywords
- diode
- donator
- atoms
- producing
- bipolar transistor
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- YZCKVEUIGOORGS-UHFFFAOYSA-N Hydrogen atom Chemical compound [H] YZCKVEUIGOORGS-UHFFFAOYSA-N 0.000 title 1
- 238000004519 manufacturing process Methods 0.000 title 1
- 238000006386 neutralization reaction Methods 0.000 title 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
- H01L29/68—Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
- H01L29/70—Bipolar devices
- H01L29/72—Transistor-type devices, i.e. able to continuously respond to applied control signals
- H01L29/73—Bipolar junction transistors
- H01L29/737—Hetero-junction transistors
- H01L29/7371—Vertical transistors
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
- H01L29/86—Types of semiconductor device ; Multistep manufacturing processes therefor controllable only by variation of the electric current supplied, or only the electric potential applied, to one or more of the electrodes carrying the current to be rectified, amplified, oscillated or switched
- H01L29/861—Diodes
- H01L29/868—PIN diodes
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S438/00—Semiconductor device manufacturing: process
- Y10S438/914—Doping
- Y10S438/919—Compensation doping
Landscapes
- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Physics & Mathematics (AREA)
- Ceramic Engineering (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Bipolar Transistors (AREA)
- Bipolar Integrated Circuits (AREA)
- Electrodes Of Semiconductors (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
FR8613885A FR2604828B1 (fr) | 1986-10-06 | 1986-10-06 | Procede de fabrication d'une diode p+nn+ et d'un transistor bipolaire comportant cette diode, utilisant l'effet de neutralisation des atomes donneurs par l'hydrogene atomique |
Publications (1)
Publication Number | Publication Date |
---|---|
DE3770569D1 true DE3770569D1 (de) | 1991-07-11 |
Family
ID=9339576
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE8787402202T Expired - Lifetime DE3770569D1 (de) | 1986-10-06 | 1987-10-05 | Verfahren zur herstellung einer p+nn+-diode und eines diese diode umfassenden bipolaren transistors unter verwendung des neutralisierungseffektes von atomarem wasserstoff auf donatoratomen. |
Country Status (5)
Country | Link |
---|---|
US (1) | US4936781A (de) |
EP (1) | EP0263755B1 (de) |
JP (1) | JPS63148624A (de) |
DE (1) | DE3770569D1 (de) |
FR (1) | FR2604828B1 (de) |
Families Citing this family (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5093280A (en) * | 1987-10-13 | 1992-03-03 | Northrop Corporation | Refractory metal ohmic contacts and method |
FR2635611B1 (fr) * | 1988-08-18 | 1990-10-19 | Centre Nat Rech Scient | Procede de neutralisation des atomes accepteurs dans inp de type p |
US5179029A (en) * | 1990-02-07 | 1993-01-12 | At&T Bell Laboratories | Hydrogen plasma passivation of GaAs |
JPH06151801A (ja) * | 1992-11-13 | 1994-05-31 | Canon Inc | 光電変換装置及び光電変換装置の製造方法 |
US5362657A (en) * | 1992-11-25 | 1994-11-08 | Texas Instruments Incorporated | Lateral complementary heterojunction bipolar transistor and processing procedure |
US5872387A (en) * | 1996-01-16 | 1999-02-16 | The Board Of Trustees Of The University Of Illinois | Deuterium-treated semiconductor devices |
US5744202A (en) * | 1996-09-30 | 1998-04-28 | Xerox Corporation | Enhancement of hydrogenation of materials encapsulated by an oxide |
Family Cites Families (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4315782A (en) * | 1980-07-21 | 1982-02-16 | Rca Corporation | Method of making semiconductor device with passivated rectifying junctions having hydrogenated amorphous regions |
DE3047870A1 (de) * | 1980-12-18 | 1982-07-15 | Siemens AG, 1000 Berlin und 8000 München | "pn-diode und verfahren zu deren herstellung" |
FR2517883A1 (fr) * | 1981-12-09 | 1983-06-10 | Thomson Csf | Dispositif semi-conducteur a faible capacite parasite muni de connexions externes prises au moyen de poutres |
US4728616A (en) * | 1982-09-17 | 1988-03-01 | Cornell Research Foundation, Inc. | Ballistic heterojunction bipolar transistor |
US4584028A (en) * | 1984-09-24 | 1986-04-22 | Rca Corporation | Neutralization of acceptor levels in silicon by atomic hydrogen |
JPH0744182B2 (ja) * | 1984-11-09 | 1995-05-15 | 株式会社日立製作所 | ヘテロ接合バイポ−ラ・トランジスタ |
US4610731A (en) * | 1985-04-03 | 1986-09-09 | At&T Bell Laboratories | Shallow impurity neutralization |
JPH0797589B2 (ja) * | 1986-06-26 | 1995-10-18 | ソニー株式会社 | ヘテロ接合型バイポ−ラトランジスタの製造方法 |
-
1986
- 1986-10-06 FR FR8613885A patent/FR2604828B1/fr not_active Expired
-
1987
- 1987-10-05 DE DE8787402202T patent/DE3770569D1/de not_active Expired - Lifetime
- 1987-10-05 EP EP87402202A patent/EP0263755B1/de not_active Expired - Lifetime
- 1987-10-05 JP JP62250046A patent/JPS63148624A/ja active Pending
-
1989
- 1989-08-14 US US07/393,344 patent/US4936781A/en not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
US4936781A (en) | 1990-06-26 |
FR2604828A1 (fr) | 1988-04-08 |
EP0263755A1 (de) | 1988-04-13 |
JPS63148624A (ja) | 1988-06-21 |
FR2604828B1 (fr) | 1988-12-23 |
EP0263755B1 (de) | 1991-06-05 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8364 | No opposition during term of opposition | ||
8339 | Ceased/non-payment of the annual fee |