DE3751162D1 - Verfahren zur Herstellung von Feinststrukturen in konjugierten Polymeren. - Google Patents

Verfahren zur Herstellung von Feinststrukturen in konjugierten Polymeren.

Info

Publication number
DE3751162D1
DE3751162D1 DE3751162T DE3751162T DE3751162D1 DE 3751162 D1 DE3751162 D1 DE 3751162D1 DE 3751162 T DE3751162 T DE 3751162T DE 3751162 T DE3751162 T DE 3751162T DE 3751162 D1 DE3751162 D1 DE 3751162D1
Authority
DE
Germany
Prior art keywords
production
conjugated polymers
fine structures
fine
structures
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE3751162T
Other languages
English (en)
Other versions
DE3751162T2 (de
Inventor
Satoshi Taguchi
Toshihiko Tanaka
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sumitomo Chemical Co Ltd
Original Assignee
Sumitomo Chemical Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sumitomo Chemical Co Ltd filed Critical Sumitomo Chemical Co Ltd
Application granted granted Critical
Publication of DE3751162D1 publication Critical patent/DE3751162D1/de
Publication of DE3751162T2 publication Critical patent/DE3751162T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/114—Initiator containing
    • Y10S430/115—Cationic or anionic

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Polyoxymethylene Polymers And Polymers With Carbon-To-Carbon Bonds (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Materials For Photolithography (AREA)
DE3751162T 1986-09-26 1987-09-28 Verfahren zur Herstellung von Feinststrukturen in konjugierten Polymeren. Expired - Lifetime DE3751162T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP61228962A JPH0766189B2 (ja) 1986-09-26 1986-09-26 レジスト材料

Publications (2)

Publication Number Publication Date
DE3751162D1 true DE3751162D1 (de) 1995-04-20
DE3751162T2 DE3751162T2 (de) 1995-07-27

Family

ID=16884591

Family Applications (1)

Application Number Title Priority Date Filing Date
DE3751162T Expired - Lifetime DE3751162T2 (de) 1986-09-26 1987-09-28 Verfahren zur Herstellung von Feinststrukturen in konjugierten Polymeren.

Country Status (4)

Country Link
US (1) US4816383A (de)
EP (1) EP0261991B1 (de)
JP (1) JPH0766189B2 (de)
DE (1) DE3751162T2 (de)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH02101461A (ja) * 1988-10-11 1990-04-13 Matsushita Electric Ind Co Ltd 微細パターン形成材料およびパターン形成方法
JPH02103547A (ja) * 1988-10-13 1990-04-16 Fujitsu Ltd 導電性層の形成方法
JP2712413B2 (ja) * 1988-11-07 1998-02-10 住友化学工業株式会社 レジストおよび微細パターンの形成方法
DE3902115A1 (de) * 1989-01-25 1990-08-02 Basf Ag Strahlungsempfindliche polymere
US5453341A (en) * 1989-04-29 1995-09-26 Schwalm; Reinhold Radiation-sensitive polymers and positive-working recording materials
GB9018698D0 (en) * 1990-08-24 1990-10-10 Lynxvale Ltd Semiconductive copolymers for use in electroluminescent devices
EP0506368B1 (de) * 1991-03-26 2002-09-04 Fujitsu Limited Organische, funktionnelle, dünne Schicht, Herstellung und Verwendung
US5965280A (en) * 1997-03-03 1999-10-12 Hewlett-Packard Company Patterned polymer electroluminescent devices based on microlithographic processes
EP2254727A2 (de) * 2008-02-18 2010-12-01 The Technical University of Denmark (DTU) Verfahren zum thermospalten einer polymerschicht
JP6261285B2 (ja) * 2013-10-31 2018-01-17 富士フイルム株式会社 積層体、有機半導体製造用キットおよび有機半導体製造用レジスト組成物

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL96545C (de) * 1954-03-12 1900-01-01
US3532643A (en) * 1967-02-23 1970-10-06 Dow Chemical Co Polyxylylidenes and method of preparation
JPS5642229A (en) * 1979-06-25 1981-04-20 University Patents Inc New photooresist composition
US4258118A (en) * 1979-12-26 1981-03-24 Polaroid Corporation Novel xanthene compounds and photographic products and processes employing the same
US4339526A (en) * 1981-06-24 1982-07-13 International Business Machines Corporation Acetylene terminated, branched polyphenylene resist and protective coating for integrated circuit devices
US4528118A (en) * 1983-04-28 1985-07-09 Agency Of Industrial Science And Technology Highly electroconductive conjugated polymer composition and process for producing the same
JPH0685079B2 (ja) * 1986-01-29 1994-10-26 旭化成工業株式会社 スルホン酸基を有する感光材料
JPS62232647A (ja) * 1986-04-03 1987-10-13 Canon Inc パタ−ン形成方法

Also Published As

Publication number Publication date
DE3751162T2 (de) 1995-07-27
EP0261991A2 (de) 1988-03-30
JPS6381424A (ja) 1988-04-12
EP0261991A3 (en) 1990-03-07
EP0261991B1 (de) 1995-03-15
JPH0766189B2 (ja) 1995-07-19
US4816383A (en) 1989-03-28

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8327 Change in the person/name/address of the patent owner

Owner name: SUMITOMO CHEMICAL CO. LTD., TOKIO/TOKYO, JP