DE3751127T2 - Herstellung von permeabelen polymeren Filmen oder Schichten durch Auslaugung. - Google Patents

Herstellung von permeabelen polymeren Filmen oder Schichten durch Auslaugung.

Info

Publication number
DE3751127T2
DE3751127T2 DE3751127T DE3751127T DE3751127T2 DE 3751127 T2 DE3751127 T2 DE 3751127T2 DE 3751127 T DE3751127 T DE 3751127T DE 3751127 T DE3751127 T DE 3751127T DE 3751127 T2 DE3751127 T2 DE 3751127T2
Authority
DE
Germany
Prior art keywords
resist
film
extractable
resist film
polymeric
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE3751127T
Other languages
German (de)
English (en)
Other versions
DE3751127D1 (de
Inventor
Stephen Edward Greco
Christopher Francis Lyons
Jer-Ming Yang
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
International Business Machines Corp
Original Assignee
International Business Machines Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by International Business Machines Corp filed Critical International Business Machines Corp
Publication of DE3751127D1 publication Critical patent/DE3751127D1/de
Application granted granted Critical
Publication of DE3751127T2 publication Critical patent/DE3751127T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J9/00—Working-up of macromolecular substances to porous or cellular articles or materials; After-treatment thereof
    • C08J9/26—Working-up of macromolecular substances to porous or cellular articles or materials; After-treatment thereof by elimination of a solid phase from a macromolecular composition or article, e.g. leaching out
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means

Landscapes

  • Chemical & Material Sciences (AREA)
  • Polymers & Plastics (AREA)
  • Materials Engineering (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Materials For Photolithography (AREA)
DE3751127T 1986-06-23 1987-04-28 Herstellung von permeabelen polymeren Filmen oder Schichten durch Auslaugung. Expired - Fee Related DE3751127T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US87760686A 1986-06-23 1986-06-23

Publications (2)

Publication Number Publication Date
DE3751127D1 DE3751127D1 (de) 1995-04-13
DE3751127T2 true DE3751127T2 (de) 1995-09-14

Family

ID=25370314

Family Applications (1)

Application Number Title Priority Date Filing Date
DE3751127T Expired - Fee Related DE3751127T2 (de) 1986-06-23 1987-04-28 Herstellung von permeabelen polymeren Filmen oder Schichten durch Auslaugung.

Country Status (3)

Country Link
EP (1) EP0250762B1 (enExample)
JP (1) JPS638643A (enExample)
DE (1) DE3751127T2 (enExample)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0269746A (ja) * 1988-08-01 1990-03-08 Internatl Business Mach Corp <Ibm> ホトレジストの形成方法、ポリマー構造体、ホトレジスト
JPH02161432A (ja) * 1988-12-14 1990-06-21 Nec Corp 微細パターン形成方法

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4198236A (en) * 1974-01-21 1980-04-15 E. I. Du Pont De Nemours And Company Method for preparation of lithographic printing plate having addition polymerized areas and binder areas
EP0014943A1 (en) * 1979-02-16 1980-09-03 Ardyth Dale Lakes Process for producing self-metering liquid retentive pad and other porous articles of manufacture
US4552833A (en) * 1984-05-14 1985-11-12 International Business Machines Corporation Radiation sensitive and oxygen plasma developable resist
GB8427149D0 (en) * 1984-10-26 1984-12-05 Ucb Sa Resist materials
US4613398A (en) * 1985-06-06 1986-09-23 International Business Machines Corporation Formation of etch-resistant resists through preferential permeation
DE3764702D1 (de) * 1986-04-24 1990-10-11 Ibm Zwei-schichten-photolack-verfahren mit deckschicht.

Also Published As

Publication number Publication date
JPH0462661B2 (enExample) 1992-10-07
DE3751127D1 (de) 1995-04-13
EP0250762B1 (en) 1995-03-08
EP0250762A3 (en) 1988-10-05
EP0250762A2 (en) 1988-01-07
JPS638643A (ja) 1988-01-14

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee