DE3688518D1 - Halbleiteranordnungen mit leitfaehigkeitsmodulation. - Google Patents

Halbleiteranordnungen mit leitfaehigkeitsmodulation.

Info

Publication number
DE3688518D1
DE3688518D1 DE8686200461T DE3688518T DE3688518D1 DE 3688518 D1 DE3688518 D1 DE 3688518D1 DE 8686200461 T DE8686200461 T DE 8686200461T DE 3688518 T DE3688518 T DE 3688518T DE 3688518 D1 DE3688518 D1 DE 3688518D1
Authority
DE
Germany
Prior art keywords
conductivity modulation
semiconductor arrangements
arrangements
semiconductor
modulation
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE8686200461T
Other languages
English (en)
Other versions
DE3688518T2 (de
Inventor
John Martin Shannon
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Koninklijke Philips NV
Original Assignee
Philips Gloeilampenfabrieken NV
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Philips Gloeilampenfabrieken NV filed Critical Philips Gloeilampenfabrieken NV
Application granted granted Critical
Publication of DE3688518D1 publication Critical patent/DE3688518D1/de
Publication of DE3688518T2 publication Critical patent/DE3688518T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
    • H01L29/02—Semiconductor bodies ; Multistep manufacturing processes therefor
    • H01L29/06—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions
    • H01L29/0603—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions characterised by particular constructional design considerations, e.g. for preventing surface leakage, for controlling electric field concentration or for internal isolations regions
    • H01L29/0607—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions characterised by particular constructional design considerations, e.g. for preventing surface leakage, for controlling electric field concentration or for internal isolations regions for preventing surface leakage or controlling electric field concentration
    • H01L29/0611—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions characterised by particular constructional design considerations, e.g. for preventing surface leakage, for controlling electric field concentration or for internal isolations regions for preventing surface leakage or controlling electric field concentration for increasing or controlling the breakdown voltage of reverse biased devices
    • H01L29/0615—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions characterised by particular constructional design considerations, e.g. for preventing surface leakage, for controlling electric field concentration or for internal isolations regions for preventing surface leakage or controlling electric field concentration for increasing or controlling the breakdown voltage of reverse biased devices by the doping profile or the shape or the arrangement of the PN junction, or with supplementary regions, e.g. junction termination extension [JTE]
    • H01L29/0619—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions characterised by particular constructional design considerations, e.g. for preventing surface leakage, for controlling electric field concentration or for internal isolations regions for preventing surface leakage or controlling electric field concentration for increasing or controlling the breakdown voltage of reverse biased devices by the doping profile or the shape or the arrangement of the PN junction, or with supplementary regions, e.g. junction termination extension [JTE] with a supplementary region doped oppositely to or in rectifying contact with the semiconductor containing or contacting region, e.g. guard rings with PN or Schottky junction
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
    • H01L29/02—Semiconductor bodies ; Multistep manufacturing processes therefor
    • H01L29/06—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions
    • H01L29/0684—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions characterised by the shape, relative sizes or dispositions of the semiconductor regions or junctions between the regions
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
    • H01L29/02—Semiconductor bodies ; Multistep manufacturing processes therefor
    • H01L29/06—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions
    • H01L29/08—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions with semiconductor regions connected to an electrode carrying current to be rectified, amplified or switched and such electrode being part of a semiconductor device which comprises three or more electrodes
    • H01L29/0821—Collector regions of bipolar transistors
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
    • H01L29/02—Semiconductor bodies ; Multistep manufacturing processes therefor
    • H01L29/06—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions
    • H01L29/10—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions with semiconductor regions connected to an electrode not carrying current to be rectified, amplified or switched and such electrode being part of a semiconductor device which comprises three or more electrodes
    • H01L29/1012—Base regions of thyristors
    • H01L29/1016—Anode base regions of thyristors
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
    • H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
    • H01L29/68—Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
    • H01L29/70—Bipolar devices
    • H01L29/72—Transistor-type devices, i.e. able to continuously respond to applied control signals
    • H01L29/739—Transistor-type devices, i.e. able to continuously respond to applied control signals controlled by field-effect, e.g. bipolar static induction transistors [BSIT]
    • H01L29/7393—Insulated gate bipolar mode transistors, i.e. IGBT; IGT; COMFET

Landscapes

  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Ceramic Engineering (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Insulated Gate Type Field-Effect Transistor (AREA)
  • Bipolar Transistors (AREA)
DE86200461T 1985-03-29 1986-03-20 Halbleiteranordnungen mit Leitfähigkeitsmodulation. Expired - Fee Related DE3688518T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
GB08508203A GB2173037A (en) 1985-03-29 1985-03-29 Semiconductor devices employing conductivity modulation

Publications (2)

Publication Number Publication Date
DE3688518D1 true DE3688518D1 (de) 1993-07-08
DE3688518T2 DE3688518T2 (de) 1993-12-09

Family

ID=10576875

Family Applications (1)

Application Number Title Priority Date Filing Date
DE86200461T Expired - Fee Related DE3688518T2 (de) 1985-03-29 1986-03-20 Halbleiteranordnungen mit Leitfähigkeitsmodulation.

Country Status (6)

Country Link
US (1) US4831423A (de)
EP (1) EP0201945B1 (de)
JP (1) JPS61230375A (de)
CA (1) CA1251578A (de)
DE (1) DE3688518T2 (de)
GB (1) GB2173037A (de)

Families Citing this family (30)

* Cited by examiner, † Cited by third party
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CA1252225A (en) * 1985-11-27 1989-04-04 Sel Colak Lateral insulated gate transistors with coupled anode and gate regions
JPS63173365A (ja) * 1986-11-26 1988-07-16 ゼネラル・エレクトリック・カンパニイ ラテラル形絶縁ゲート半導体装置とその製法
FR2618021B1 (fr) * 1987-07-07 1990-01-05 Thomson Semiconducteurs Structure et procede de test pour circuit integre permettant la determination des effets de surface de couches
US4952992A (en) * 1987-08-18 1990-08-28 Siliconix Incorporated Method and apparatus for improving the on-voltage characteristics of a semiconductor device
US5034790A (en) * 1989-05-23 1991-07-23 U.S. Philips Corp. MOS transistor with semi-insulating field plate and surface-adjoining top layer
FR2649830B1 (fr) * 1989-07-13 1994-05-27 Sgs Thomson Microelectronics Structure de circuit integre cmos protege contre les decharges electrostatiques
US5477077A (en) * 1992-04-17 1995-12-19 Fuji Electric Co., Ltd. Semiconductor device and a method for the manufacture thereof
TW218424B (de) * 1992-05-21 1994-01-01 Philips Nv
EP0571027A1 (de) * 1992-05-21 1993-11-24 Koninklijke Philips Electronics N.V. Halbleiteranordnung, die einen lateralen DMOS-Transistor mit die Durchbruchspannung anhebenden Zonen und Vorkehrungen für den Ladungsaustausch mit dem Backgate-Gebiet enthält
EP0580256B1 (de) * 1992-07-20 1997-10-08 Koninklijke Philips Electronics N.V. Halbleiteranordnung für hohe Spannungen
DE4244272A1 (de) * 1992-12-28 1994-06-30 Daimler Benz Ag Feldeffektgesteuertes Halbleiterbauelement
FR2708145B1 (fr) * 1993-07-21 1995-10-06 Sgs Thomson Microelectronics Composant monolithique comprenant une diode de protection en parallèle avec une pluralité de paires de diodes en série.
BE1007657A3 (nl) * 1993-10-14 1995-09-05 Philips Electronics Nv Halfgeleiderinrichting met een snelle laterale dmost voorzien van een hoogspanningsaanvoerelektrode.
GB2286484A (en) * 1994-02-11 1995-08-16 Fuji Electric Co Ltd Conductivity modulated semiconductor device
US5665988A (en) * 1995-02-09 1997-09-09 Fuji Electric Co., Ltd. Conductivity-modulation semiconductor
JP3581447B2 (ja) * 1995-08-22 2004-10-27 三菱電機株式会社 高耐圧半導体装置
EP0841702A1 (de) * 1996-11-11 1998-05-13 STMicroelectronics S.r.l. Lateraler oder vertikaler DMOSFET mit hoher Durchbruchspannung
JP4357127B2 (ja) 2000-03-03 2009-11-04 株式会社東芝 半導体装置
US6369426B2 (en) * 2000-04-27 2002-04-09 Infineon Technologies North America Corp. Transistor with integrated photodetector for conductivity modulation
KR100393201B1 (ko) * 2001-04-16 2003-07-31 페어차일드코리아반도체 주식회사 낮은 온 저항과 높은 브레이크다운 전압을 갖는 고전압수평형 디모스 트랜지스터
FR2828767B1 (fr) * 2001-08-14 2003-12-12 Thales Sa Transistor bipolaire a tension de claquage elevee
DE10145723A1 (de) * 2001-09-17 2003-04-10 Infineon Technologies Ag Halbleiterstruktur
US6873011B1 (en) * 2004-02-24 2005-03-29 System General Corp. High voltage and low on-resistance LDMOS transistor having equalized capacitance
DE102005012217B4 (de) * 2005-03-15 2007-02-22 Infineon Technologies Austria Ag Lateraler MISFET und Verfahren zur Herstellung desselben
WO2008035134A1 (en) * 2006-09-22 2008-03-27 Freescale Semiconductor, Inc. Semiconductor device and method of forming a semiconductor device
DE102007020657B4 (de) 2007-04-30 2012-10-04 Infineon Technologies Austria Ag Halbleiterbauelement mit einem Halbleiterkörper und Verfahren zur Herstellung desselben
TWI484635B (zh) * 2012-11-12 2015-05-11 Richtek Technology Corp 雙擴散金屬氧化物半導體元件及其製造方法
US8928078B2 (en) 2012-12-25 2015-01-06 Richtek Technology Corporation, R.O.C. Double diffused metal oxide semiconductor device and manufacturing method thereof
EP3518418A1 (de) 2018-01-30 2019-07-31 Vrije Universiteit Brussel Elektronischer mischer
TWI659539B (zh) * 2018-06-28 2019-05-11 立錡科技股份有限公司 高壓元件及其製造方法

Family Cites Families (21)

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Publication number Priority date Publication date Assignee Title
NL293447A (de) * 1962-05-31
US4003072A (en) * 1972-04-20 1977-01-11 Sony Corporation Semiconductor device with high voltage breakdown resistance
US3903542A (en) * 1974-03-11 1975-09-02 Westinghouse Electric Corp Surface gate-induced conductivity modulated negative resistance semiconductor device
JPS5936832B2 (ja) * 1978-03-14 1984-09-06 株式会社日立製作所 半導体スイッチング素子
US4199774A (en) * 1978-09-18 1980-04-22 The Board Of Trustees Of The Leland Stanford Junior University Monolithic semiconductor switching device
EP0020164B1 (de) * 1979-05-30 1983-05-11 Xerox Corporation Monolithische Matrix mit Hochspannungs-MOS-Transistoren
JPS5645074A (en) * 1979-09-20 1981-04-24 Nippon Telegr & Teleph Corp <Ntt> High-pressure-resistance mos type semiconductor device
US4365208A (en) * 1980-04-23 1982-12-21 Rca Corporation Gain-controlled amplifier using a controllable alternating-current resistance
US4414560A (en) * 1980-11-17 1983-11-08 International Rectifier Corporation Floating guard region and process of manufacture for semiconductor reverse conducting switching device using spaced MOS transistors having a common drain region
JPS57160159A (en) * 1981-03-28 1982-10-02 Toshiba Corp High breakdown voltage planar type semiconductor device
US4443931A (en) * 1982-06-28 1984-04-24 General Electric Company Method of fabricating a semiconductor device with a base region having a deep portion
DE3224642A1 (de) * 1982-07-01 1984-01-05 Siemens AG, 1000 Berlin und 8000 München Igfet mit injektorzone
DE3239917A1 (de) * 1982-10-28 1984-05-03 Roman Efimovi&ccaron; Tomilino Moskovskaja oblast' Smoljanskij Bipolares halbleiterbauelement
GB2131603B (en) * 1982-12-03 1985-12-18 Philips Electronic Associated Semiconductor devices
EP0111803B1 (de) * 1982-12-13 1989-03-01 General Electric Company Laterale Gleichrichter mit isoliertem Gate
EP0115098B1 (de) * 1982-12-27 1987-03-18 Koninklijke Philips Electronics N.V. Laterale DMOS-Transistoranordnung mit einer Injektionszone
GB2134705B (en) * 1983-01-28 1985-12-24 Philips Electronic Associated Semiconductor devices
DE3327803C1 (de) * 1983-08-02 1985-03-14 Messerschmitt-Bölkow-Blohm GmbH, 8012 Ottobrunn Gegenstand mit einem durch eine Endschlaufe befestigten Anschlusselement
US4639761A (en) * 1983-12-16 1987-01-27 North American Philips Corporation Combined bipolar-field effect transistor resurf devices
JP2880004B2 (ja) * 1991-08-15 1999-04-05 松下電器産業株式会社 車載用地図表示装置
JP3172778B2 (ja) * 1992-06-17 2001-06-04 明治機械株式会社 半導体ウエハの全自動ポリッシング装置

Also Published As

Publication number Publication date
US4831423A (en) 1989-05-16
EP0201945B1 (de) 1993-06-02
CA1251578A (en) 1989-03-21
GB8508203D0 (en) 1985-05-09
EP0201945A3 (en) 1988-12-07
JPS61230375A (ja) 1986-10-14
JPH0579190B2 (de) 1993-11-01
DE3688518T2 (de) 1993-12-09
EP0201945A2 (de) 1986-11-20
GB2173037A (en) 1986-10-01

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8327 Change in the person/name/address of the patent owner

Owner name: PHILIPS ELECTRONICS N.V., EINDHOVEN, NL

8339 Ceased/non-payment of the annual fee