DE3687845D1 - Raeumliche phasenmodulationsmasken, verfahren zu deren herstellung und verfahren zur bildung von phasenverschobenen beugungsgittern. - Google Patents

Raeumliche phasenmodulationsmasken, verfahren zu deren herstellung und verfahren zur bildung von phasenverschobenen beugungsgittern.

Info

Publication number
DE3687845D1
DE3687845D1 DE8686400592T DE3687845T DE3687845D1 DE 3687845 D1 DE3687845 D1 DE 3687845D1 DE 8686400592 T DE8686400592 T DE 8686400592T DE 3687845 T DE3687845 T DE 3687845T DE 3687845 D1 DE3687845 D1 DE 3687845D1
Authority
DE
Germany
Prior art keywords
grades
shifted
formation
production
phase
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE8686400592T
Other languages
English (en)
Other versions
DE3687845T2 (de
Inventor
Masataka Shirasaki
Hirochika Nakajima
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP5745585A external-priority patent/JPS61246701A/ja
Priority claimed from JP60158743A external-priority patent/JPS6218559A/ja
Priority claimed from JP60158744A external-priority patent/JPS6218561A/ja
Priority claimed from JP60158746A external-priority patent/JP2537596B2/ja
Priority claimed from JP60158745A external-priority patent/JPH0685081B2/ja
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Publication of DE3687845D1 publication Critical patent/DE3687845D1/de
Application granted granted Critical
Publication of DE3687845T2 publication Critical patent/DE3687845T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/001—Phase modulating patterns, e.g. refractive index patterns
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S359/00—Optical: systems and elements
    • Y10S359/90—Methods

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Diffracting Gratings Or Hologram Optical Elements (AREA)
  • Semiconductor Lasers (AREA)
DE8686400592T 1985-03-20 1986-03-20 Raeumliche phasenmodulationsmasken, verfahren zu deren herstellung und verfahren zur bildung von phasenverschobenen beugungsgittern. Expired - Lifetime DE3687845T2 (de)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
JP5745585A JPS61246701A (ja) 1985-03-20 1985-03-20 回折格子の形成方法
JP60158743A JPS6218559A (ja) 1985-07-17 1985-07-17 露光用マスク
JP60158744A JPS6218561A (ja) 1985-07-17 1985-07-17 凹凸面形成方法
JP60158746A JP2537596B2 (ja) 1985-07-17 1985-07-17 回折格子の製造方法
JP60158745A JPH0685081B2 (ja) 1985-07-17 1985-07-17 露光方法

Publications (2)

Publication Number Publication Date
DE3687845D1 true DE3687845D1 (de) 1993-04-08
DE3687845T2 DE3687845T2 (de) 1993-06-17

Family

ID=27523363

Family Applications (1)

Application Number Title Priority Date Filing Date
DE8686400592T Expired - Lifetime DE3687845T2 (de) 1985-03-20 1986-03-20 Raeumliche phasenmodulationsmasken, verfahren zu deren herstellung und verfahren zur bildung von phasenverschobenen beugungsgittern.

Country Status (4)

Country Link
US (1) US4806442A (de)
EP (1) EP0195724B1 (de)
CA (1) CA1270934A (de)
DE (1) DE3687845T2 (de)

Families Citing this family (34)

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JPS61156003A (ja) * 1984-12-27 1986-07-15 Sharp Corp 回折格子の製造方法
US5340637A (en) * 1986-09-16 1994-08-23 Hitachi, Ltd. Optical device diffraction gratings and a photomask for use in the same
DE3789858T2 (de) * 1986-12-18 1994-09-01 Nippon Sheet Glass Co Ltd Platten für Lichtkontrolle.
US5300190A (en) * 1987-06-24 1994-04-05 Mitsubishi Denki Kabushiki Kaisha Process of producing diffraction grating
US5007708A (en) * 1988-07-26 1991-04-16 Georgia Tech Research Corporation Technique for producing antireflection grating surfaces on dielectrics, semiconductors and metals
JPH02224386A (ja) * 1989-02-27 1990-09-06 Mitsubishi Electric Corp λ／４シフト型回折格子の製造方法
US5279924A (en) * 1989-04-04 1994-01-18 Sharp Kabushiki Kaisha Manufacturing method of optical diffraction grating element with serrated gratings having uniformly etched grooves
JP2801270B2 (ja) * 1989-07-13 1998-09-21 キヤノン株式会社 マスク作成方法
US5262257A (en) * 1989-07-13 1993-11-16 Canon Kabushiki Kaisha Mask for lithography
US5104209A (en) * 1991-02-19 1992-04-14 Her Majesty The Queen In Right Of Canada, As Represented By The Minister Of Communications Method of creating an index grating in an optical fiber and a mode converter using the index grating
US5367588A (en) * 1992-10-29 1994-11-22 Her Majesty The Queen In Right Of Canada, As Represented By The Minister Of Communications Method of fabricating Bragg gratings using a silica glass phase grating mask and mask used by same
US5229255A (en) * 1991-03-22 1993-07-20 At&T Bell Laboratories Sub-micron device fabrication with a phase shift mask having multiple values of phase delay
JPH05281698A (ja) * 1992-03-31 1993-10-29 Mitsubishi Electric Corp フォトマスク及びパターン転写方法
US5292625A (en) * 1992-04-03 1994-03-08 Minnesota Mining And Manufacturing Company Method for selectively exposing an uneven substrate surface
JPH06105682B2 (ja) * 1992-04-07 1994-12-21 東京工業大学長 Ｘ線露光マスクの作製法
DE4233500A1 (de) * 1992-10-06 1994-04-07 Ant Nachrichtentech Lichtwellenleiter zur kontinuierlichen Phasenverschiebung der DFB-Gitterperiode für auf DFB-Gitterfeldern mit konstanter Gitterperiode basierende optoelektronische Komponenten
US5418095A (en) * 1993-01-21 1995-05-23 Sematech, Inc. Method of fabricating phase shifters with absorbing/attenuating sidewalls using an additive process
US5411824A (en) * 1993-01-21 1995-05-02 Sematech, Inc. Phase shifting mask structure with absorbing/attenuating sidewalls for improved imaging
AU5681194A (en) * 1993-01-21 1994-08-15 Sematech, Inc. Phase shifting mask structure with multilayer optical coating for improved transmission
KR0151427B1 (ko) * 1994-03-04 1999-02-18 문정환 위상 반전마스크 및 그의 제조방법
US5565286A (en) * 1994-11-17 1996-10-15 International Business Machines Corporation Combined attenuated-alternating phase shifting mask structure and fabrication methods therefor
WO1997027519A1 (en) * 1996-01-29 1997-07-31 Foster-Miller, Inc. Optical components containing complex diffraction gratings and methods for the fabrication thereof
GB2311144B (en) * 1996-03-12 2000-05-24 Holtronic Technologies Ltd Method and apparatus for holographically recording an essentially periodic pattern
US6569580B2 (en) * 2001-03-13 2003-05-27 Diverging Technologies, Inc. Binary and phase-shift photomasks
JP2003023210A (ja) * 2001-07-06 2003-01-24 Furukawa Electric Co Ltd:The 半導体レーザ素子の製造方法
US6998196B2 (en) * 2001-12-28 2006-02-14 Wavefront Technology Diffractive optical element and method of manufacture
JP4278940B2 (ja) * 2002-09-09 2009-06-17 株式会社 液晶先端技術開発センター 結晶化装置および結晶化方法
US7190387B2 (en) * 2003-09-11 2007-03-13 Bright View Technologies, Inc. Systems for fabricating optical microstructures using a cylindrical platform and a rastered radiation beam
US7867695B2 (en) * 2003-09-11 2011-01-11 Bright View Technologies Corporation Methods for mastering microstructures through a substrate using negative photoresist
US7192692B2 (en) 2003-09-11 2007-03-20 Bright View Technologies, Inc. Methods for fabricating microstructures by imaging a radiation sensitive layer sandwiched between outer layers
JP4629022B2 (ja) * 2005-12-27 2011-02-09 住友電工デバイス・イノベーション株式会社 レーザ装置、レーザモジュール、および、半導体レーザ
US7935459B2 (en) * 2006-06-22 2011-05-03 Georgia Tech Research Corporation Photo-masks and methods of fabricating surface-relief grating diffractive devices
TW200933223A (en) * 2008-01-31 2009-08-01 Univ Nat Taiwan Method for preparing photonic crystal slab waveguides
CN102955365B (zh) * 2011-08-22 2014-12-17 上海微电子装备有限公司 一种干涉曝光装置及方法

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DE1060717B (de) * 1956-04-13 1959-07-02 Franz Wagner Verfahren zur Herstellung von Rastern, Zeichnungen u. a. auf Filmen, Glaesern und anderen Traegern
DE2116713B2 (de) * 1971-04-06 1974-03-28 Ibm Deutschland Gmbh, 7000 Stuttgart Belichtungsverfahren zum Abbilden sehr fein strukturierter Lichtmuster auf Photolackschichten und dazu geeignete Belichtungsvorrichtung
US3883232A (en) * 1973-12-03 1975-05-13 Hitachi Ltd Random phase plate and optical system incorporating said plate
US3940274A (en) * 1973-12-26 1976-02-24 California Institute Of Technology Single emulsion phase and amplitude transparency
DE2411926A1 (de) * 1974-03-13 1975-09-25 Ibm Deutschland Vorrichtung zum belichten lichtempfindlicher schichten durch masken
DE2446042C3 (de) * 1974-09-26 1982-03-18 Siemens AG, 1000 Berlin und 8000 München Verfahren zum Herstellen von Masken für verkleinernde elektronenoptische Projektion
GB1537703A (en) * 1976-01-27 1979-01-04 Rca Corp Fabrication of rectangular relief profiles in photoresist
US4155627A (en) * 1976-02-02 1979-05-22 Rca Corporation Color diffractive subtractive filter master recording comprising a plurality of superposed two-level relief patterns on the surface of a substrate
JPS6034742B2 (ja) * 1976-02-20 1985-08-10 ミノルタ株式会社 光学的ロ−パスフイルタ−
US4026743A (en) * 1976-06-24 1977-05-31 Gennady Nikolaevich Berezin Method of preparing transparent artworks
DE2658400A1 (de) * 1976-12-23 1978-06-29 Ibm Deutschland Verfahren zur herstellung einer negativen maske auf einem substrat
US4241109A (en) * 1979-04-30 1980-12-23 Bell Telephone Laboratories, Incorporated Technique for altering the profile of grating relief patterns
US4360586A (en) * 1979-05-29 1982-11-23 Massachusetts Institute Of Technology Spatial period division exposing
JPS6057217B2 (ja) * 1980-11-18 1985-12-13 セイコーエプソン株式会社 Ｘ線露光用マスク
EP0090924B1 (de) * 1982-04-05 1987-11-11 International Business Machines Corporation Verfahren zur Erhöhung der Bildauflösung einer Photomaske und Photomaske zur Dürchführung dieses Verfahrens
CA1211868A (en) * 1982-04-16 1986-09-23 Yoshikazu Nishiwaki Method of forming diffraction gratings and optical branching filter elements produced thereby
AT382040B (de) * 1983-03-01 1986-12-29 Guenther Stangl Verfahren zur herstellung von optisch strukturierten filtern fuer elektromagnetische strahlung und optisch strukturierter filter
JPS60247927A (ja) * 1984-05-23 1985-12-07 Toshiba Corp パタ−ン形成方法
JPS61156003A (ja) * 1984-12-27 1986-07-15 Sharp Corp 回折格子の製造方法

Also Published As

Publication number Publication date
CA1270934C (en) 1990-06-26
US4806442A (en) 1989-02-21
DE3687845T2 (de) 1993-06-17
EP0195724A2 (de) 1986-09-24
EP0195724A3 (en) 1990-05-16
EP0195724B1 (de) 1993-03-03
CA1270934A (en) 1990-06-26

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