DE3680602D1 - Verfahren zur behandlung einer lichtempfindlichen druckplatte. - Google Patents
Verfahren zur behandlung einer lichtempfindlichen druckplatte.Info
- Publication number
- DE3680602D1 DE3680602D1 DE8686110628T DE3680602T DE3680602D1 DE 3680602 D1 DE3680602 D1 DE 3680602D1 DE 8686110628 T DE8686110628 T DE 8686110628T DE 3680602 T DE3680602 T DE 3680602T DE 3680602 D1 DE3680602 D1 DE 3680602D1
- Authority
- DE
- Germany
- Prior art keywords
- treating
- light
- print plate
- sensitive print
- sensitive
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/40—Treatment after imagewise removal, e.g. baking
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Printing Plates And Materials Therefor (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP60170465A JPS6231859A (ja) | 1985-08-01 | 1985-08-01 | 製版方法 |
Publications (1)
Publication Number | Publication Date |
---|---|
DE3680602D1 true DE3680602D1 (de) | 1991-09-05 |
Family
ID=15905440
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE8686110628T Expired - Fee Related DE3680602D1 (de) | 1985-08-01 | 1986-07-31 | Verfahren zur behandlung einer lichtempfindlichen druckplatte. |
Country Status (4)
Country | Link |
---|---|
US (1) | US4762771A (de) |
EP (1) | EP0212387B1 (de) |
JP (1) | JPS6231859A (de) |
DE (1) | DE3680602D1 (de) |
Families Citing this family (30)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CA1329719C (en) * | 1987-07-31 | 1994-05-24 | Tadao Toyama | Lithographic printing plate and method of treating the same |
GB8822956D0 (en) * | 1988-09-30 | 1988-11-09 | Cookson Graphics Plc | Baking treatment of lithographic printing plate |
US4925761A (en) * | 1989-06-15 | 1990-05-15 | A. B. Dick | Conversion solutions for lithographic printing plates containing phytic acid |
JPH0727691Y2 (ja) * | 1989-07-07 | 1995-06-21 | 株式会社村田製作所 | 複合共振部品 |
US5213950A (en) * | 1991-01-30 | 1993-05-25 | Sun Chemical Corporation | Pre-bake printing plate composition |
US5565290A (en) * | 1991-07-30 | 1996-10-15 | Fuji Photo Film Co., Ltd. | Desensitizing solution for offset printing |
JP2944296B2 (ja) | 1992-04-06 | 1999-08-30 | 富士写真フイルム株式会社 | 感光性平版印刷版の製造方法 |
US5543268A (en) * | 1992-05-14 | 1996-08-06 | Tokyo Ohka Kogyo Co., Ltd. | Developer solution for actinic ray-sensitive resist |
DE60042764D1 (de) | 1999-05-21 | 2009-09-24 | Fujifilm Corp | Lichtempfindliche Zusammensetzung und Flachdruckplattenbasis damit |
ATE497882T1 (de) | 2000-11-30 | 2011-02-15 | Fujifilm Corp | Flachdruckplattenvorläufer |
US20040067435A1 (en) | 2002-09-17 | 2004-04-08 | Fuji Photo Film Co., Ltd. | Image forming material |
JP4150261B2 (ja) | 2003-01-14 | 2008-09-17 | 富士フイルム株式会社 | 平版印刷版原版の製版方法 |
KR101020164B1 (ko) | 2003-07-17 | 2011-03-08 | 허니웰 인터내셔날 인코포레이티드 | 진보된 마이크로전자적 응용을 위한 평탄화 막, 및 이를제조하기 위한 장치 및 방법 |
JP4471101B2 (ja) | 2004-07-30 | 2010-06-02 | 富士フイルム株式会社 | 平版印刷版原版 |
JP2006058430A (ja) | 2004-08-18 | 2006-03-02 | Fuji Photo Film Co Ltd | 平版印刷版原版 |
JP4404734B2 (ja) | 2004-09-27 | 2010-01-27 | 富士フイルム株式会社 | 平版印刷版原版 |
JP4474296B2 (ja) | 2005-02-09 | 2010-06-02 | 富士フイルム株式会社 | 平版印刷版原版 |
JP4404792B2 (ja) | 2005-03-22 | 2010-01-27 | 富士フイルム株式会社 | 平版印刷版原版 |
JP4890403B2 (ja) | 2007-09-27 | 2012-03-07 | 富士フイルム株式会社 | 平版印刷版原版 |
JP2009085984A (ja) | 2007-09-27 | 2009-04-23 | Fujifilm Corp | 平版印刷版原版 |
JP4790682B2 (ja) | 2007-09-28 | 2011-10-12 | 富士フイルム株式会社 | 平版印刷版原版 |
JP5164640B2 (ja) | 2008-04-02 | 2013-03-21 | 富士フイルム株式会社 | 平版印刷版原版 |
JP5183380B2 (ja) | 2008-09-09 | 2013-04-17 | 富士フイルム株式会社 | 赤外線レーザ用感光性平版印刷版原版 |
JP2010237435A (ja) | 2009-03-31 | 2010-10-21 | Fujifilm Corp | 平版印刷版原版 |
EP2481603A4 (de) | 2009-09-24 | 2015-11-18 | Fujifilm Corp | Lithografische originaldruckplatte |
US8828648B2 (en) | 2010-02-17 | 2014-09-09 | Fujifilm Corporation | Method for producing a planographic printing plate |
JP5253433B2 (ja) | 2010-02-19 | 2013-07-31 | 富士フイルム株式会社 | 平版印刷版の作製方法 |
US20130130508A1 (en) * | 2011-09-02 | 2013-05-23 | Air Products And Chemicals, Inc. | Compositions and Methods for Texturing of Silicon Wafers |
JP5490168B2 (ja) | 2012-03-23 | 2014-05-14 | 富士フイルム株式会社 | 平版印刷版原版及び平版印刷版の作製方法 |
JP5512730B2 (ja) | 2012-03-30 | 2014-06-04 | 富士フイルム株式会社 | 平版印刷版の作製方法 |
Family Cites Families (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3307951A (en) * | 1963-02-01 | 1967-03-07 | Lithoplate Inc | Lithographic plate |
GB1513368A (en) * | 1974-07-08 | 1978-06-07 | Vickers Ltd | Processing of radiation-sensitive members |
CH613059A5 (en) * | 1975-06-30 | 1979-08-31 | Hoechst Ag | Method for producing a flat-bed printing forme |
US4150996A (en) * | 1977-08-05 | 1979-04-24 | Minnesota Mining And Manufacturing Company | Lithographic fountain concentrate |
US4230492A (en) * | 1978-01-17 | 1980-10-28 | The Richardson Company | Aryl sulfonic acid based stabilizers for presensitized planographic plates |
WO1979000593A1 (en) * | 1978-02-06 | 1979-08-23 | Napp Systems Inc | Desensitizing solution and process for treating a diazo photosensitive printing plate |
US4355096A (en) * | 1980-07-11 | 1982-10-19 | American Hoechst Corporation | Process for heating exposed and developed light-sensitive lithographic printing plates with carboxylic acid and amine moiety containing compounds on surface thereof |
JPS6023099A (ja) * | 1983-07-19 | 1985-02-05 | Tomoegawa Paper Co Ltd | オフセツト印刷用不感脂化処理液 |
JPS60138552A (ja) * | 1983-12-26 | 1985-07-23 | Fuji Photo Film Co Ltd | 製版方法 |
JPS60138551A (ja) * | 1983-12-26 | 1985-07-23 | Fuji Photo Film Co Ltd | 製版方法 |
-
1985
- 1985-08-01 JP JP60170465A patent/JPS6231859A/ja active Granted
-
1986
- 1986-07-30 US US06/890,737 patent/US4762771A/en not_active Expired - Lifetime
- 1986-07-31 EP EP86110628A patent/EP0212387B1/de not_active Expired
- 1986-07-31 DE DE8686110628T patent/DE3680602D1/de not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
JPS6231859A (ja) | 1987-02-10 |
EP0212387B1 (de) | 1991-07-31 |
US4762771A (en) | 1988-08-09 |
EP0212387A2 (de) | 1987-03-04 |
EP0212387A3 (en) | 1988-07-06 |
JPH0567029B2 (de) | 1993-09-24 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
DE3680602D1 (de) | Verfahren zur behandlung einer lichtempfindlichen druckplatte. | |
DE3686600D1 (de) | Verfahren zum herstellen einer harzumhuellten halbleiteranordnung. | |
DE3874867D1 (de) | Verfahren zur behandlung einer kupferoberflaeche. | |
DE3882238D1 (de) | Verfahren zur behandlung von durch ein netzwerk uebertragenen langsamen anforderungen. | |
DE3750515D1 (de) | Verfahren zur Zugriffssteuerung einer Datenbasis. | |
DE3584071D1 (de) | Verfahren zum aufrauhen einer flaeche. | |
DE3684759D1 (de) | Verfahren zur herstellungeiner halbleitervorrichtung. | |
DE3581626D1 (de) | Photochemisches verfahren zum behandeln einer substratoberflaeche. | |
DE3776536D1 (de) | Verfahren zum entwickeln lithographischer platten. | |
DE3767589D1 (de) | Verfahren zur kristallzucht von kti0p04 aus einer loesung. | |
DE3582627D1 (de) | Verfahren zum herstellen einer waermeschrumpfenden polypropylenfolie. | |
DE3671324D1 (de) | Verfahren zum herstellen einer halbleiteranordnung. | |
DE3687361D1 (de) | Verfahren zur behandlung radioaktiver abfaelle. | |
DE3780593D1 (de) | Verfahren zur verhinderung von ablagerungen. | |
DE3582143D1 (de) | Verfahren zur herstellung einer halbleitervorrichtung. | |
DE3867171D1 (de) | Verfahren zur behandlung einer fluessigkeit. | |
DE68908701D1 (de) | Verfahren zur behandlung einer retrovirusinfektion. | |
DE3767582D1 (de) | Verfahren zur entfernung von photolack. | |
DE3576580D1 (de) | Verfahren zur behandlung farbphotographischer elemente. | |
DE3684202D1 (de) | Verfahren zum herstellen einer passivierungsschicht. | |
KR870009861A (ko) | 수지에 대한 인쇄방법 | |
DE68906562D1 (de) | Verfahren zur kristallisierung von bisphenol-a-phenol-addukt. | |
DE3578101D1 (de) | Geraet und verfahren zur beschichtung einer magnetplatte. | |
AT373731B (de) | Verfahren zur aufarbeitung von galvanischen elementen | |
DE3586470D1 (de) | Verfahren zum modulieren einer traegerwelle. |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
8364 | No opposition during term of opposition | ||
8339 | Ceased/non-payment of the annual fee |