DE3680602D1 - Verfahren zur behandlung einer lichtempfindlichen druckplatte. - Google Patents

Verfahren zur behandlung einer lichtempfindlichen druckplatte.

Info

Publication number
DE3680602D1
DE3680602D1 DE8686110628T DE3680602T DE3680602D1 DE 3680602 D1 DE3680602 D1 DE 3680602D1 DE 8686110628 T DE8686110628 T DE 8686110628T DE 3680602 T DE3680602 T DE 3680602T DE 3680602 D1 DE3680602 D1 DE 3680602D1
Authority
DE
Germany
Prior art keywords
treating
light
print plate
sensitive print
sensitive
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE8686110628T
Other languages
English (en)
Inventor
Hiroshi Fuji Photo F Matsumoto
Hitoshi Fuji Photo Fi Hagiwara
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujifilm Holdings Corp
Original Assignee
Fuji Photo Film Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fuji Photo Film Co Ltd filed Critical Fuji Photo Film Co Ltd
Application granted granted Critical
Publication of DE3680602D1 publication Critical patent/DE3680602D1/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/40—Treatment after imagewise removal, e.g. baking

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Printing Plates And Materials Therefor (AREA)
DE8686110628T 1985-08-01 1986-07-31 Verfahren zur behandlung einer lichtempfindlichen druckplatte. Expired - Fee Related DE3680602D1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP60170465A JPS6231859A (ja) 1985-08-01 1985-08-01 製版方法

Publications (1)

Publication Number Publication Date
DE3680602D1 true DE3680602D1 (de) 1991-09-05

Family

ID=15905440

Family Applications (1)

Application Number Title Priority Date Filing Date
DE8686110628T Expired - Fee Related DE3680602D1 (de) 1985-08-01 1986-07-31 Verfahren zur behandlung einer lichtempfindlichen druckplatte.

Country Status (4)

Country Link
US (1) US4762771A (de)
EP (1) EP0212387B1 (de)
JP (1) JPS6231859A (de)
DE (1) DE3680602D1 (de)

Families Citing this family (30)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CA1329719C (en) * 1987-07-31 1994-05-24 Tadao Toyama Lithographic printing plate and method of treating the same
GB8822956D0 (en) * 1988-09-30 1988-11-09 Cookson Graphics Plc Baking treatment of lithographic printing plate
US4925761A (en) * 1989-06-15 1990-05-15 A. B. Dick Conversion solutions for lithographic printing plates containing phytic acid
JPH0727691Y2 (ja) * 1989-07-07 1995-06-21 株式会社村田製作所 複合共振部品
US5213950A (en) * 1991-01-30 1993-05-25 Sun Chemical Corporation Pre-bake printing plate composition
US5565290A (en) * 1991-07-30 1996-10-15 Fuji Photo Film Co., Ltd. Desensitizing solution for offset printing
JP2944296B2 (ja) 1992-04-06 1999-08-30 富士写真フイルム株式会社 感光性平版印刷版の製造方法
US5543268A (en) * 1992-05-14 1996-08-06 Tokyo Ohka Kogyo Co., Ltd. Developer solution for actinic ray-sensitive resist
DE60042764D1 (de) 1999-05-21 2009-09-24 Fujifilm Corp Lichtempfindliche Zusammensetzung und Flachdruckplattenbasis damit
ATE497882T1 (de) 2000-11-30 2011-02-15 Fujifilm Corp Flachdruckplattenvorläufer
US20040067435A1 (en) 2002-09-17 2004-04-08 Fuji Photo Film Co., Ltd. Image forming material
JP4150261B2 (ja) 2003-01-14 2008-09-17 富士フイルム株式会社 平版印刷版原版の製版方法
KR101020164B1 (ko) 2003-07-17 2011-03-08 허니웰 인터내셔날 인코포레이티드 진보된 마이크로전자적 응용을 위한 평탄화 막, 및 이를제조하기 위한 장치 및 방법
JP4471101B2 (ja) 2004-07-30 2010-06-02 富士フイルム株式会社 平版印刷版原版
JP2006058430A (ja) 2004-08-18 2006-03-02 Fuji Photo Film Co Ltd 平版印刷版原版
JP4404734B2 (ja) 2004-09-27 2010-01-27 富士フイルム株式会社 平版印刷版原版
JP4474296B2 (ja) 2005-02-09 2010-06-02 富士フイルム株式会社 平版印刷版原版
JP4404792B2 (ja) 2005-03-22 2010-01-27 富士フイルム株式会社 平版印刷版原版
JP4890403B2 (ja) 2007-09-27 2012-03-07 富士フイルム株式会社 平版印刷版原版
JP2009085984A (ja) 2007-09-27 2009-04-23 Fujifilm Corp 平版印刷版原版
JP4790682B2 (ja) 2007-09-28 2011-10-12 富士フイルム株式会社 平版印刷版原版
JP5164640B2 (ja) 2008-04-02 2013-03-21 富士フイルム株式会社 平版印刷版原版
JP5183380B2 (ja) 2008-09-09 2013-04-17 富士フイルム株式会社 赤外線レーザ用感光性平版印刷版原版
JP2010237435A (ja) 2009-03-31 2010-10-21 Fujifilm Corp 平版印刷版原版
EP2481603A4 (de) 2009-09-24 2015-11-18 Fujifilm Corp Lithografische originaldruckplatte
US8828648B2 (en) 2010-02-17 2014-09-09 Fujifilm Corporation Method for producing a planographic printing plate
JP5253433B2 (ja) 2010-02-19 2013-07-31 富士フイルム株式会社 平版印刷版の作製方法
US20130130508A1 (en) * 2011-09-02 2013-05-23 Air Products And Chemicals, Inc. Compositions and Methods for Texturing of Silicon Wafers
JP5490168B2 (ja) 2012-03-23 2014-05-14 富士フイルム株式会社 平版印刷版原版及び平版印刷版の作製方法
JP5512730B2 (ja) 2012-03-30 2014-06-04 富士フイルム株式会社 平版印刷版の作製方法

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3307951A (en) * 1963-02-01 1967-03-07 Lithoplate Inc Lithographic plate
GB1513368A (en) * 1974-07-08 1978-06-07 Vickers Ltd Processing of radiation-sensitive members
CH613059A5 (en) * 1975-06-30 1979-08-31 Hoechst Ag Method for producing a flat-bed printing forme
US4150996A (en) * 1977-08-05 1979-04-24 Minnesota Mining And Manufacturing Company Lithographic fountain concentrate
US4230492A (en) * 1978-01-17 1980-10-28 The Richardson Company Aryl sulfonic acid based stabilizers for presensitized planographic plates
WO1979000593A1 (en) * 1978-02-06 1979-08-23 Napp Systems Inc Desensitizing solution and process for treating a diazo photosensitive printing plate
US4355096A (en) * 1980-07-11 1982-10-19 American Hoechst Corporation Process for heating exposed and developed light-sensitive lithographic printing plates with carboxylic acid and amine moiety containing compounds on surface thereof
JPS6023099A (ja) * 1983-07-19 1985-02-05 Tomoegawa Paper Co Ltd オフセツト印刷用不感脂化処理液
JPS60138552A (ja) * 1983-12-26 1985-07-23 Fuji Photo Film Co Ltd 製版方法
JPS60138551A (ja) * 1983-12-26 1985-07-23 Fuji Photo Film Co Ltd 製版方法

Also Published As

Publication number Publication date
JPS6231859A (ja) 1987-02-10
EP0212387B1 (de) 1991-07-31
US4762771A (en) 1988-08-09
EP0212387A2 (de) 1987-03-04
EP0212387A3 (en) 1988-07-06
JPH0567029B2 (de) 1993-09-24

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee