DE3776536D1 - Verfahren zum entwickeln lithographischer platten. - Google Patents

Verfahren zum entwickeln lithographischer platten.

Info

Publication number
DE3776536D1
DE3776536D1 DE8787117386T DE3776536T DE3776536D1 DE 3776536 D1 DE3776536 D1 DE 3776536D1 DE 8787117386 T DE8787117386 T DE 8787117386T DE 3776536 T DE3776536 T DE 3776536T DE 3776536 D1 DE3776536 D1 DE 3776536D1
Authority
DE
Germany
Prior art keywords
lithographic plates
developing lithographic
developing
plates
lithographic
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE8787117386T
Other languages
English (en)
Inventor
David S Riley
Gregory P Turner
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Horsell Graphic Industries Ltd
Original Assignee
Horsell Graphic Industries Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Horsell Graphic Industries Ltd filed Critical Horsell Graphic Industries Ltd
Application granted granted Critical
Publication of DE3776536D1 publication Critical patent/DE3776536D1/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • G03F7/32—Liquid compositions therefor, e.g. developers
    • G03F7/322—Aqueous alkaline compositions

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Printing Plates And Materials Therefor (AREA)
DE8787117386T 1986-11-29 1987-11-25 Verfahren zum entwickeln lithographischer platten. Expired - Lifetime DE3776536D1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
GB868628613A GB8628613D0 (en) 1986-11-29 1986-11-29 Developing fluid for lithographic plates

Publications (1)

Publication Number Publication Date
DE3776536D1 true DE3776536D1 (de) 1992-03-12

Family

ID=10608204

Family Applications (1)

Application Number Title Priority Date Filing Date
DE8787117386T Expired - Lifetime DE3776536D1 (de) 1986-11-29 1987-11-25 Verfahren zum entwickeln lithographischer platten.

Country Status (8)

Country Link
US (1) US4945030A (de)
EP (1) EP0274044B1 (de)
DE (1) DE3776536D1 (de)
DK (1) DK625487D0 (de)
ES (1) ES2028034T3 (de)
FI (1) FI875247A0 (de)
GB (1) GB8628613D0 (de)
NO (1) NO874953D0 (de)

Families Citing this family (25)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE4027299A1 (de) * 1990-08-29 1992-03-05 Hoechst Ag Entwicklerzusammensetzung fuer bestrahlte, strahlungsempfindliche, positiv und negativ arbeitende sowie umkehrbare reprographische schichten und verfahren zur entwicklung solcher schichten
US6007970A (en) * 1992-02-07 1999-12-28 Canon Kabushiki Kaisha Lithographic developer containing surfactant
ATE180583T1 (de) * 1992-02-07 1999-06-15 Tadahiro Ohmi Lithographischer entwickler und lithographisches verfahren
US6107007A (en) * 1992-02-10 2000-08-22 Canon Kabushiki Kaisha Lithography process
SK68996A3 (en) * 1993-12-03 1997-06-04 Buckman Labor Inc Enzyme stabilization by block-copolymers
EP0732628A1 (de) 1995-03-07 1996-09-18 Minnesota Mining And Manufacturing Company Wässrig-alkalische Lösung zum Entwickeln von Flachdruckplatten
US5897985A (en) * 1996-10-11 1999-04-27 Kodak Polychrome Graphics, Llc Potassium silicate developing composition and method of use to process lithographic printing plates
US5766826A (en) * 1996-10-11 1998-06-16 Eastman Kodak Company Alkaline developing composition and method of use to process lithographic printing plates
US5811221A (en) * 1997-05-30 1998-09-22 Kodak Polychrome Graphics, Llc Alkaline developing composition and method of use to process lithographic printing plates
US6083662A (en) * 1997-05-30 2000-07-04 Kodak Polychrome Graphics Llc Methods of imaging and printing with a positive-working infrared radiation sensitive printing plate
DE19811331A1 (de) * 1998-03-16 1999-09-23 Du Pont Deutschland Entwickler und Verfahren zur Herstellung von flexographischen Druckformen
DE19845605A1 (de) 1998-10-05 2000-04-06 Agfa Gevaert Ag Konzentrat und daraus hergestellter wäßriger Entwickler für bildmäßig bestrahlte Aufzeichnungsmaterialien
US6143479A (en) * 1999-08-31 2000-11-07 Kodak Polychrome Graphics Llc Developing system for alkaline-developable lithographic printing plates
JP4689804B2 (ja) * 1999-12-21 2011-05-25 コダック株式会社 ポジ画像形成方法及びそれに用いる現像液
US6649324B1 (en) 2000-08-14 2003-11-18 Kodak Polychrome Graphics Llc Aqueous developer for lithographic printing plates
US6562555B2 (en) 2001-08-01 2003-05-13 Kodak Polychrome Graphics Llc Method for developing lithographic printing plate precursors using a coating attack-suppressing agent
GB0226101D0 (en) * 2002-11-08 2002-12-18 Rhodia Cons Spec Ltd White rust corrosion inhibitors
ITMI20040162A1 (it) * 2004-02-02 2004-05-02 Bozzetto Giovanni Spa Uso di polliaaminometilenfosfonati quali agenti disperdenti
JP4166167B2 (ja) * 2004-02-05 2008-10-15 富士フイルム株式会社 感光性平版印刷版用現像液及び平版印刷版の製版方法
US20060257798A1 (en) * 2004-05-10 2006-11-16 Agfa-Gevaert Alkaline developer for radiation sensitive compositions
US20060154187A1 (en) * 2004-12-17 2006-07-13 John Wilson Development of radiation-sensitive elements
EP1722275B1 (de) 2005-05-10 2010-10-27 Agfa Graphics N.V. Verfahren zur Verarbeitung von Flachdruckplatten
US20060257789A1 (en) * 2005-05-10 2006-11-16 Agfa-Gevaert Method for processing lithographic printing plates
US20080299491A1 (en) * 2007-05-31 2008-12-04 Miller Gary R Highly alkaline developer composition and methods of use
US7883833B2 (en) 2007-06-20 2011-02-08 Eastman Kodak Company Use of highly alkaline developer regenerator composition

Family Cites Families (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NO121968C (de) * 1966-06-23 1977-06-13 Mo Och Domsjoe Ab
BE755617A (fr) * 1969-09-03 1971-03-02 Henkel & Cie Gmbh Detergents contenant des additifs inhibiteurs de mousse
US3518201A (en) * 1969-09-04 1970-06-30 Grace W R & Co Chlorine release detergent composition with improved defoamer stability
US3705856A (en) * 1970-09-01 1972-12-12 Basf Wyandotte Corp Additives for alkali cleaning systems
DE2700938A1 (de) * 1977-01-12 1978-07-13 Agfa Gevaert Ag Photographische farbentwicklerzusammensetzung
US4340509A (en) * 1978-03-24 1982-07-20 Michael A. Canale Composition, concentrate and fountain solution for lithographic printing operations
US4244832A (en) * 1979-07-27 1981-01-13 Basf Wyandotte Corporation Phosphate-free machine dishwashing detergents useful at low temperatures
DE3100259A1 (de) * 1981-01-08 1982-08-05 Hoechst Ag, 6000 Frankfurt Verfahren und entwicklergemisch zum entwickeln von belichteten negativ arbeitenden diazoniumsalzschichten
US4374920A (en) * 1981-07-27 1983-02-22 American Hoechst Corporation Positive developer containing non-ionic surfactants
US4374076A (en) * 1981-10-09 1983-02-15 Coors Porcelain Company Method for making cast epoxy resin bodies and epoxy formulation therefor
US4436807A (en) * 1982-07-15 1984-03-13 American Hoechst Corporation Developer composition with sodium, lithium and/or potassium salts for developing negative working imaged photographic material
JPS5917552A (ja) * 1982-07-21 1984-01-28 Toray Ind Inc 画像形成用積層体の処理方法
US4540444A (en) * 1982-08-12 1985-09-10 Amchem Products, Inc. Aluminum cleaner and system
DE3346979A1 (de) * 1983-12-24 1985-07-04 Merck Patent Gmbh, 6100 Darmstadt Entwickler fuer positivfotoresists
US4680251A (en) * 1984-04-21 1987-07-14 E. I. Du Pont De Nemours And Company Process for the ozone protection of photopolymer flexographic printing plates by treatment with liquid polyethers
DE3427556C1 (de) * 1984-07-26 1986-01-02 Merck Patent Gmbh, 6100 Darmstadt Verfahren zur Herstellung von Fotoresist-Reliefstrukturen mit UEberhangcharakter
DE3501675A1 (de) * 1985-01-19 1986-07-24 Merck Patent Gmbh, 6100 Darmstadt Mittel und verfahren zur entfernung von fotoresist- und stripperresten von halbleitersubstraten
US4592992A (en) * 1985-04-11 1986-06-03 American Hoechst Corporation Developer compositions for lithographic plates

Also Published As

Publication number Publication date
FI875247A0 (fi) 1987-11-27
US4945030A (en) 1990-07-31
GB8628613D0 (en) 1987-01-07
DK625487D0 (da) 1987-11-27
EP0274044B1 (de) 1992-01-29
NO874953D0 (no) 1987-11-27
ES2028034T3 (es) 1992-07-01
EP0274044A1 (de) 1988-07-13

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee