DE3676565D1 - Entwickelverfahren fuer lichtempfindliches material. - Google Patents

Entwickelverfahren fuer lichtempfindliches material.

Info

Publication number
DE3676565D1
DE3676565D1 DE8686108559T DE3676565T DE3676565D1 DE 3676565 D1 DE3676565 D1 DE 3676565D1 DE 8686108559 T DE8686108559 T DE 8686108559T DE 3676565 T DE3676565 T DE 3676565T DE 3676565 D1 DE3676565 D1 DE 3676565D1
Authority
DE
Germany
Prior art keywords
light
sensitive material
development process
development
sensitive
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE8686108559T
Other languages
English (en)
Inventor
Kesanao Fuji Photo F Kobayashi
Hisao Fuji Photo Film Co Ohba
Tadao Fuji Photo Film C Toyama
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujifilm Holdings Corp
Original Assignee
Fuji Photo Film Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fuji Photo Film Co Ltd filed Critical Fuji Photo Film Co Ltd
Application granted granted Critical
Publication of DE3676565D1 publication Critical patent/DE3676565D1/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • G03F7/3042—Imagewise removal using liquid means from printing plates transported horizontally through the processing stations

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Silver Salt Photography Or Processing Solution Therefor (AREA)
DE8686108559T 1985-06-27 1986-06-23 Entwickelverfahren fuer lichtempfindliches material. Expired - Fee Related DE3676565D1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP60141339A JPS622254A (ja) 1985-06-27 1985-06-27 感光材料の現像方法

Publications (1)

Publication Number Publication Date
DE3676565D1 true DE3676565D1 (de) 1991-02-07

Family

ID=15289654

Family Applications (1)

Application Number Title Priority Date Filing Date
DE8686108559T Expired - Fee Related DE3676565D1 (de) 1985-06-27 1986-06-23 Entwickelverfahren fuer lichtempfindliches material.

Country Status (4)

Country Link
US (1) US4837131A (de)
EP (1) EP0206308B1 (de)
JP (1) JPS622254A (de)
DE (1) DE3676565D1 (de)

Families Citing this family (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0778631B2 (ja) * 1986-05-27 1995-08-23 コニカ株式会社 残膜が改良される感光性平版印刷版の現像方法および装置
JPS63158552A (ja) * 1986-12-23 1988-07-01 Fuji Photo Film Co Ltd 平版印刷版の製造方法
JPS63186247A (ja) * 1987-01-28 1988-08-01 Konica Corp 感光材料の処理方法
JPS63197950A (ja) * 1987-02-12 1988-08-16 Konica Corp 感光性平版印刷版の現像処理方法
JP2732850B2 (ja) * 1988-03-31 1998-03-30 株式会社芝浦製作所 現像装置
US4969002A (en) * 1988-05-09 1990-11-06 Fuji Photo Film Co., Ltd. Photo-sensitive printing plate processing apparatus
JP2626992B2 (ja) * 1988-05-10 1997-07-02 富士写真フイルム株式会社 感光性平版印刷版用現像液組成物及び現像方法
JPH03107167A (ja) * 1989-09-20 1991-05-07 Fuji Photo Film Co Ltd 感光材料処理装置
EP0482479B1 (de) * 1990-10-23 1998-03-18 Dainippon Screen Mfg. Co., Ltd. Verfahren und Vorrichtung zur Behandlung von fotoempfindlichen Materialien
US5059996A (en) * 1990-11-15 1991-10-22 E. I. Du Pont De Nemours And Company Apparatus for processing a photosensitive element
JP2769645B2 (ja) * 1990-11-27 1998-06-25 大日本スクリーン製造株式会社 感材処理装置
EP1099981B1 (de) 1999-11-09 2012-10-03 FUJIFILM Corporation Entwicklungsvorrichtung für lichtempfindliches Material
JP2004125877A (ja) * 2002-09-30 2004-04-22 Fuji Photo Film Co Ltd 平版印刷版の現像処理方法
US6720131B1 (en) * 2003-05-28 2004-04-13 Anocoil Corporation Method and apparatus for applying a film of developer fluid onto a lithographic printing plate in a developing station

Family Cites Families (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE116856C (de) *
BE655388A (de) * 1963-11-07 1965-05-06
BE786790A (fr) * 1971-07-27 1973-01-26 Hoechst Co American Dispositif servant a traiter une plaque d'impression a plat sensible a la lumiere et exposee
CA985088A (en) * 1971-10-21 1976-03-09 Eugene J. Gaisser Opening and closing means for printing plate processor
US3937175A (en) * 1973-12-26 1976-02-10 American Hoechst Corporation Pulsed spray of fluids
US3961101A (en) * 1974-09-16 1976-06-01 Rca Corporation Process for improved development of electron-beam-sensitive resist films
US3995343A (en) * 1975-01-29 1976-12-07 American Hoechst Corporation Apparatus for processing a printing plate
US4310616A (en) * 1977-04-19 1982-01-12 Fuji Photo Film Co., Ltd. Method and apparatus for developing and treating PS plates
US4259434A (en) * 1977-10-24 1981-03-31 Fuji Photo Film Co., Ltd. Method for developing positive acting light-sensitive planographic printing plate
US4212935A (en) * 1978-02-24 1980-07-15 International Business Machines Corporation Method of modifying the development profile of photoresists
JPS55115045A (en) * 1979-02-27 1980-09-04 Fuji Photo Film Co Ltd Printing plate preparation
US4215927A (en) * 1979-04-13 1980-08-05 Scott Paper Company Lithographic plate processing apparatus
JPS55140843A (en) * 1979-04-19 1980-11-04 Fuji Photo Film Co Ltd Method and apparatus for developing ps plate
DE3147002A1 (de) * 1981-11-27 1983-06-01 Hoechst Ag, 6230 Frankfurt Verarbeitungsgeraet fuer bildmaessig belichtete fotoempfindliche materialien
JPS58190952A (ja) * 1982-04-30 1983-11-08 Fuji Photo Film Co Ltd 感光性印刷版の現像液
US4613561A (en) * 1984-10-17 1986-09-23 James Marvin Lewis Method of high contrast positive O-quinone diazide photoresist developing using pretreatment solution

Also Published As

Publication number Publication date
EP0206308A1 (de) 1986-12-30
US4837131A (en) 1989-06-06
JPS622254A (ja) 1987-01-08
EP0206308B1 (de) 1990-12-27

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee