DE3672282D1 - Vorrichtung zur ausbildung einer im vakuum abgeschiedenen legierung oder zusammensetzung und anwendung dieser vorrichtung. - Google Patents
Vorrichtung zur ausbildung einer im vakuum abgeschiedenen legierung oder zusammensetzung und anwendung dieser vorrichtung.Info
- Publication number
- DE3672282D1 DE3672282D1 DE8686118001T DE3672282T DE3672282D1 DE 3672282 D1 DE3672282 D1 DE 3672282D1 DE 8686118001 T DE8686118001 T DE 8686118001T DE 3672282 T DE3672282 T DE 3672282T DE 3672282 D1 DE3672282 D1 DE 3672282D1
- Authority
- DE
- Germany
- Prior art keywords
- training
- alloy
- vacuum
- composition
- application
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/225—Oblique incidence of vaporised material on substrate
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/0605—Carbon
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/3464—Sputtering using more than one target
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/35—Sputtering by application of a magnetic field, e.g. magnetron sputtering
- C23C14/352—Sputtering by application of a magnetic field, e.g. magnetron sputtering using more than one target
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
- H01J37/3464—Operating strategies
- H01J37/3473—Composition uniformity or desired gradient
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- Plasma & Fusion (AREA)
- Analytical Chemistry (AREA)
- Physical Vapour Deposition (AREA)
- Electrodes Of Semiconductors (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US81481385A | 1985-12-30 | 1985-12-30 |
Publications (1)
Publication Number | Publication Date |
---|---|
DE3672282D1 true DE3672282D1 (de) | 1990-08-02 |
Family
ID=25216064
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE8686118001T Expired - Fee Related DE3672282D1 (de) | 1985-12-30 | 1986-12-23 | Vorrichtung zur ausbildung einer im vakuum abgeschiedenen legierung oder zusammensetzung und anwendung dieser vorrichtung. |
Country Status (3)
Country | Link |
---|---|
EP (1) | EP0230652B1 (de) |
JP (1) | JPS62158863A (de) |
DE (1) | DE3672282D1 (de) |
Families Citing this family (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB9225270D0 (en) * | 1992-12-03 | 1993-01-27 | Gec Ferranti Defence Syst | Depositing different materials on a substrate |
EP0686211A4 (de) * | 1993-02-19 | 1997-09-17 | Conner Peripherals Inc | System zum sputtern von zusammensetzungen auf substrate |
WO1996039547A2 (en) * | 1995-06-01 | 1996-12-12 | The Regents Of The University Of California | Multiple source deposition of shape-memory alloy thin films |
US6267851B1 (en) * | 1999-10-28 | 2001-07-31 | Applied Komatsu Technology, Inc. | Tilted sputtering target with shield to block contaminants |
DE10145050C1 (de) * | 2001-09-13 | 2002-11-21 | Fraunhofer Ges Forschung | Einrichtung zum Beschichten von Substraten mit gekrümmter Oberfläche durch Pulsmagnetron- Zerstäuben |
US7172681B2 (en) * | 2003-02-05 | 2007-02-06 | Bridgestone Corporation | Process for producing rubber-based composite material |
DE10341717A1 (de) * | 2003-09-10 | 2005-05-25 | Applied Films Gmbh & Co. Kg | Anordnung für n Verbraucher elektrischer Energie, von denen m Verbraucher gleichzeitig mit Energie versorgt werden |
JP2015110814A (ja) * | 2013-12-06 | 2015-06-18 | 信越化学工業株式会社 | スパッタ成膜方法、スパッタ装置、フォトマスクブランクの製造方法及びフォトマスクブランク |
JP2017214657A (ja) * | 2017-06-26 | 2017-12-07 | 信越化学工業株式会社 | スパッタ成膜方法、フォトマスクブランクの製造方法 |
EP3575437B1 (de) * | 2018-04-20 | 2023-09-06 | Shincron Co., Ltd. | Reaktive sputtervorrichtung und filmbildungsverfahren für zusammengesetzte metallverbundffolie oder mischfolie damit |
JP2022513448A (ja) * | 2018-12-17 | 2022-02-08 | アプライド マテリアルズ インコーポレイテッド | 封入のためのpvd指向性堆積 |
Family Cites Families (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4335266A (en) * | 1980-12-31 | 1982-06-15 | The Boeing Company | Methods for forming thin-film heterojunction solar cells from I-III-VI.sub.2 |
JPS57158374A (en) * | 1981-03-24 | 1982-09-30 | Mitsubishi Heavy Ind Ltd | Plated steel strip by vapor deposition of pb-zn binary alloy and producing device thereof |
JPS6013066A (ja) * | 1983-07-01 | 1985-01-23 | Nippon Telegr & Teleph Corp <Ntt> | マグネトロンスパツタリング電極 |
DD221475A1 (de) * | 1983-11-04 | 1985-04-24 | Mikroelektronik Zt Forsch Tech | Vorrichtung zur analyse der charakteristischen lichtemission bei plasmaprozessen |
GB8334369D0 (en) * | 1983-12-23 | 1984-02-01 | Ion Tech Ltd | Sputter deposition of alloys & c |
-
1986
- 1986-11-18 JP JP27310486A patent/JPS62158863A/ja active Pending
- 1986-12-23 DE DE8686118001T patent/DE3672282D1/de not_active Expired - Fee Related
- 1986-12-23 EP EP19860118001 patent/EP0230652B1/de not_active Expired
Also Published As
Publication number | Publication date |
---|---|
EP0230652B1 (de) | 1990-06-27 |
JPS62158863A (ja) | 1987-07-14 |
EP0230652A1 (de) | 1987-08-05 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
GB2227375B (en) | Neodymium-boron-iron magnet assembly and method of making same | |
AT374502B (de) | Verfahren und vorrichtung zur herstellung legierter oder unlegierter reaktiver metalle | |
KR860002503A (ko) | 트랜스-6-[2-알킬]-피란-2-온 및 그 제조방법 | |
DE3854276D1 (de) | Kathodenzerstäubungsverfahren und Vorrichtung zur Durchführung desselben. | |
DE3688356D1 (de) | Elektronische keramische vorrichtung und zugehoeriges herstellungsverfahren. | |
DE3364825D1 (en) | An improvement in a sucking instruments or the like and a method of manufacturing the same | |
SG22385G (en) | Permanent magnet and method of making the same | |
DE3580752D1 (de) | Groessenvariables intrauterinpessar und empfaengnisverhuetende vorrichtung. | |
DE3672282D1 (de) | Vorrichtung zur ausbildung einer im vakuum abgeschiedenen legierung oder zusammensetzung und anwendung dieser vorrichtung. | |
DE3587927D1 (de) | Verfahren und Vorrichtung zur automatischen Untersuchung von Tabletten. | |
GB2055401B (en) | Electroplating device and method | |
EP0405423A3 (en) | Method and device to determine the position of an object | |
DE3578520D1 (de) | Verfahren zur zerstoerungsfreien pruefung von werkstuecken oder bauteilen mit ultraschall und vorrichtung zur durchfuehrung des verfahrens. | |
DE3582132D1 (de) | Verfahren und vorrichtung zur herstellung von keramischen pulvern auf basis von ein- und/oder mehrkomponentigen metalloxiden sowie deren gemischen. | |
ZA904844B (en) | Masking composition and method | |
EP0347950A3 (en) | Synergistic herbicide combinations and method of application | |
JPS5462812A (en) | Method of fabricating member having magnetically and visually detectable construction | |
DE3571311D1 (en) | Poster and its making method | |
DE3678194D1 (de) | Verfahren und vorrichtung zur herstellung eines duennen gegenstandes. | |
DE3577785D1 (de) | Vorrichtung zur regelung eines leistungsumformers und verfahren zur regelung eines leistungsumformers. | |
PH24021A (en) | Pesticide composition and method | |
DE3584722D1 (de) | Verfahren und vorrichtung zur untersuchung in einem bohrloch mit akustischen dipolscherwellen. | |
JPS5499224A (en) | Butterfly valve and making method thereof | |
DE3680253D1 (de) | Verdampfungsverfahren und vorrichtung. | |
DE3679039D1 (de) | Verfahren und vorrichtung zur bestueckung von substraten mit mikropacks. |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
8364 | No opposition during term of opposition | ||
8339 | Ceased/non-payment of the annual fee |