DE3661143D1 - Coating and crystallisation process of an organic-material film by the use of a beam of energy - Google Patents

Coating and crystallisation process of an organic-material film by the use of a beam of energy

Info

Publication number
DE3661143D1
DE3661143D1 DE8686400043T DE3661143T DE3661143D1 DE 3661143 D1 DE3661143 D1 DE 3661143D1 DE 8686400043 T DE8686400043 T DE 8686400043T DE 3661143 T DE3661143 T DE 3661143T DE 3661143 D1 DE3661143 D1 DE 3661143D1
Authority
DE
Germany
Prior art keywords
coating
organic
energy
material film
crystallisation process
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
DE8686400043T
Other languages
English (en)
Inventor
Jean Flicstein
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Individual
Original Assignee
Individual
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Individual filed Critical Individual
Application granted granted Critical
Publication of DE3661143D1 publication Critical patent/DE3661143D1/de
Expired legal-status Critical Current

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D1/00—Processes for applying liquids or other fluent materials
    • B05D1/60—Deposition of organic layers from vapour phase
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/28—Surface treatment of glass, not in the form of fibres or filaments, by coating with organic material
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/12—Organic material
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/28—Vacuum evaporation by wave energy or particle radiation
    • C—CHEMISTRY; METALLURGY
    • C30—CRYSTAL GROWTH
    • C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B23/00—Single-crystal growth by condensing evaporated or sublimed materials
    • C30B23/02—Epitaxial-layer growth
    • C—CHEMISTRY; METALLURGY
    • C30—CRYSTAL GROWTH
    • C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B29/00—Single crystals or homogeneous polycrystalline material with defined structure characterised by the material or by their shape
    • C30B29/54—Organic compounds
    • C30B29/58—Macromolecular compounds
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
    • G02B6/10—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
    • G02B6/12—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
    • G02B6/13—Integrated optical circuits characterised by the manufacturing method
    • G02B6/132—Integrated optical circuits characterised by the manufacturing method by deposition of thin films
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S260/00—Chemistry of carbon compounds
    • Y10S260/35—Crystallization

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Metallurgy (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Mechanical Engineering (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Health & Medical Sciences (AREA)
  • Toxicology (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Optical Integrated Circuits (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
DE8686400043T 1985-01-17 1986-01-09 Coating and crystallisation process of an organic-material film by the use of a beam of energy Expired DE3661143D1 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
FR8500654A FR2576147B1 (fr) 1985-01-17 1985-01-17 Procede de depot et de cristallisation d'une couche mince de materiau organique au moyen d'un faisceau d'energie

Publications (1)

Publication Number Publication Date
DE3661143D1 true DE3661143D1 (en) 1988-12-15

Family

ID=9315375

Family Applications (1)

Application Number Title Priority Date Filing Date
DE8686400043T Expired DE3661143D1 (en) 1985-01-17 1986-01-09 Coating and crystallisation process of an organic-material film by the use of a beam of energy

Country Status (5)

Country Link
US (1) US4737232A (de)
EP (1) EP0191661B1 (de)
JP (1) JPS61169803A (de)
DE (1) DE3661143D1 (de)
FR (1) FR2576147B1 (de)

Families Citing this family (23)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4959477A (en) * 1987-11-24 1990-09-25 Regents Of The University Of Minnesota Optically nonlinear pyridine-N-oxide complexes
US5176786A (en) * 1988-07-13 1993-01-05 Minnesota Mining And Manufacturing Company Organic thin film controlled molecular epitaxy
US5139998A (en) * 1988-08-31 1992-08-18 Superconductor Technologies, Inc. Controlled thallous oxide evaporation for thallium superconductor films and reactor design
US5306699A (en) * 1988-08-31 1994-04-26 Superconductor Technologies, Inc. Reactor vessel for manufacture of superconducting films
US4948216A (en) * 1988-11-21 1990-08-14 Eastman Kodak Company Optical devices having layers of low molecular weight organic materials and methods for making
US5284779A (en) * 1989-11-24 1994-02-08 Semiconductor Energy Laboratory Co., Ltd. Method of forming organic charge-transfer thin films
EP0561016A1 (de) * 1992-03-17 1993-09-22 Tetsusaburo Taira Mehrlagige Beschichtung durch Vakuum-Aufdampfen
FI103396B (fi) 1994-03-24 1999-06-30 Laserplus Oy Menetelmä ja laite merkkausten tekemiseksi lasipintaan
US5725659A (en) * 1994-10-03 1998-03-10 Sepehry-Fard; Fareed Solid phase epitaxy reactor, the most cost effective GaAs epitaxial growth technology
JP3844016B2 (ja) * 1995-10-27 2006-11-08 日産化学工業株式会社 新規重合体及びその製造法と利用法
JP2002146516A (ja) * 2000-11-07 2002-05-22 Sony Corp 有機薄膜の蒸着方法
US6596077B2 (en) 2001-07-31 2003-07-22 Illinois Institute Of Technology Controlled nucleation of protein crystals
US6733586B2 (en) 2001-07-31 2004-05-11 Illinois Institute Of Technology High throughput non-photochemical laser induced nucleation
EP1664398A4 (de) * 2003-09-03 2009-08-26 Shmuel Bukshpan Verfahren und vorrichtung zur schnellen kristallisation von biomolekülen
EP1569263B1 (de) * 2004-02-27 2011-11-23 OSRAM Opto Semiconductors GmbH Verfahren zum Verbinden zweier Wafer
ES2325894B1 (es) * 2006-02-24 2010-10-28 Universidad De Cadiz Metodo y aparato para la fabricacion de elementos opticos difractivos.
ES2299335B2 (es) * 2006-03-09 2010-10-13 Universidad De Cadiz Metodo para la fabricacion de estructuras opticas con funcionalidad puramente refractivas.
US7608308B2 (en) * 2006-04-17 2009-10-27 Imra America, Inc. P-type semiconductor zinc oxide films process for preparation thereof, and pulsed laser deposition method using transparent substrates
JP5262203B2 (ja) * 2008-03-11 2013-08-14 住友電気工業株式会社 化合物半導体単結晶の製造装置および製造方法
US8380027B2 (en) * 2010-05-10 2013-02-19 Intel Corporation Erasable ion implanted optical couplers
JP6377334B2 (ja) * 2013-10-25 2018-08-22 東洋鋼鈑株式会社 非線形光学色素、フォトリフラクティブ材料組成物、フォトリフラクティブ基材およびホログラム記録媒体
CN106396426A (zh) * 2016-11-02 2017-02-15 佛山市梦唐装饰材料有限公司 一种5d动感微晶复合陶瓷的产品及其制作方法
EP4153797A1 (de) * 2020-05-20 2023-03-29 Hrl Laboratories, Llc Verfahren zum züchten kristalliner optischer filme auf si-substraten mit extrem geringem optischen verlust im infrarotspektrum mit hydrierung der kristallinen optischen filme

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB684677A (en) * 1949-06-30 1952-12-24 Gen Electric Co Ltd Improvements in methods of settling organic films on concave surfaces, especially for cathode ray tubes
US3822134A (en) * 1972-01-17 1974-07-02 Eastman Kodak Co Vacuum deposited radiation-sensitive elements
DE2642102C3 (de) * 1976-09-18 1984-10-04 Bühler-Miag GmbH, 3300 Braunschweig Vorrichtung zum Kristallisieren von Kunststoffgranulat
US4415650A (en) * 1977-06-14 1983-11-15 Fuji Photo Film Co., Ltd. Recording material
CA1105093A (en) * 1977-12-21 1981-07-14 Roland F. Drew Laser deposition of metal upon transparent materials
US4291244A (en) * 1979-09-04 1981-09-22 Union Carbide Corporation Electrets
US4427723A (en) * 1982-02-10 1984-01-24 Rockwell International Corporation Method and apparatus for laser-stimulated vacuum deposition and annealing technique
EP0140240B1 (de) * 1983-10-14 1988-07-06 Hitachi, Ltd. Verfahren zur Ausbildung eines dünnen organischen Filmes
JPS60124609A (ja) * 1983-12-12 1985-07-03 Agency Of Ind Science & Technol 単結晶ポリアセチレンの製造方法
EP0155823B1 (de) * 1984-03-21 1989-07-26 Nihon Shinku Gijutsu Kabushiki Kaisha Beschichtung von Gegenständen mit Kunststoffilmen

Also Published As

Publication number Publication date
JPS61169803A (ja) 1986-07-31
US4737232A (en) 1988-04-12
FR2576147A1 (fr) 1986-07-18
FR2576147B1 (fr) 1987-11-27
EP0191661A1 (de) 1986-08-20
EP0191661B1 (de) 1988-11-09

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Legal Events

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8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee