DE3585225D1 - Planare halbleitervorrichtung mit einer feldplatte. - Google Patents
Planare halbleitervorrichtung mit einer feldplatte.Info
- Publication number
- DE3585225D1 DE3585225D1 DE8585115145T DE3585225T DE3585225D1 DE 3585225 D1 DE3585225 D1 DE 3585225D1 DE 8585115145 T DE8585115145 T DE 8585115145T DE 3585225 T DE3585225 T DE 3585225T DE 3585225 D1 DE3585225 D1 DE 3585225D1
- Authority
- DE
- Germany
- Prior art keywords
- semiconductor device
- field plate
- planar semiconductor
- planar
- plate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 239000004065 semiconductor Substances 0.000 title 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/02—Semiconductor bodies ; Multistep manufacturing processes therefor
- H01L29/06—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/40—Electrodes ; Multistep manufacturing processes therefor
- H01L29/402—Field plates
- H01L29/404—Multiple field plate structures
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/40—Electrodes ; Multistep manufacturing processes therefor
- H01L29/402—Field plates
- H01L29/405—Resistive arrangements, e.g. resistive or semi-insulating field plates
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
- H01L29/68—Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
- H01L29/70—Bipolar devices
- H01L29/72—Transistor-type devices, i.e. able to continuously respond to applied control signals
- H01L29/73—Bipolar junction transistors
- H01L29/7302—Bipolar junction transistors structurally associated with other devices
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
- H01L29/68—Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
- H01L29/70—Bipolar devices
- H01L29/72—Transistor-type devices, i.e. able to continuously respond to applied control signals
- H01L29/73—Bipolar junction transistors
- H01L29/732—Vertical transistors
- H01L29/7322—Vertical transistors having emitter-base and base-collector junctions leaving at the same surface of the body, e.g. planar transistor
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
- H01L29/68—Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
- H01L29/76—Unipolar devices, e.g. field effect transistors
- H01L29/772—Field effect transistors
- H01L29/78—Field effect transistors with field effect produced by an insulated gate
- H01L29/7801—DMOS transistors, i.e. MISFETs with a channel accommodating body or base region adjoining a drain drift region
- H01L29/7802—Vertical DMOS transistors, i.e. VDMOS transistors
- H01L29/7803—Vertical DMOS transistors, i.e. VDMOS transistors structurally associated with at least one other device
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
- H01L29/68—Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
- H01L29/76—Unipolar devices, e.g. field effect transistors
- H01L29/772—Field effect transistors
- H01L29/78—Field effect transistors with field effect produced by an insulated gate
- H01L29/7801—DMOS transistors, i.e. MISFETs with a channel accommodating body or base region adjoining a drain drift region
- H01L29/7802—Vertical DMOS transistors, i.e. VDMOS transistors
- H01L29/7803—Vertical DMOS transistors, i.e. VDMOS transistors structurally associated with at least one other device
- H01L29/7804—Vertical DMOS transistors, i.e. VDMOS transistors structurally associated with at least one other device the other device being a pn-junction diode
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
- H01L29/68—Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
- H01L29/76—Unipolar devices, e.g. field effect transistors
- H01L29/772—Field effect transistors
- H01L29/78—Field effect transistors with field effect produced by an insulated gate
- H01L29/7801—DMOS transistors, i.e. MISFETs with a channel accommodating body or base region adjoining a drain drift region
- H01L29/7802—Vertical DMOS transistors, i.e. VDMOS transistors
- H01L29/7809—Vertical DMOS transistors, i.e. VDMOS transistors having both source and drain contacts on the same surface, i.e. Up-Drain VDMOS transistors
Landscapes
- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Physics & Mathematics (AREA)
- Ceramic Engineering (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Bipolar Transistors (AREA)
- Electrodes Of Semiconductors (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP59252319A JPS61129867A (ja) | 1984-11-29 | 1984-11-29 | 半導体装置 |
JP59252326A JPS61129868A (ja) | 1984-11-29 | 1984-11-29 | 半導体装置 |
Publications (1)
Publication Number | Publication Date |
---|---|
DE3585225D1 true DE3585225D1 (de) | 1992-02-27 |
Family
ID=26540659
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE8585115145T Expired - Lifetime DE3585225D1 (de) | 1984-11-29 | 1985-11-29 | Planare halbleitervorrichtung mit einer feldplatte. |
Country Status (4)
Country | Link |
---|---|
US (1) | US4707720A (de) |
EP (1) | EP0190423B1 (de) |
KR (1) | KR890004495B1 (de) |
DE (1) | DE3585225D1 (de) |
Families Citing this family (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2649359B2 (ja) * | 1986-10-08 | 1997-09-03 | 日本電装株式会社 | 半導体装置の製造方法 |
US5136348A (en) * | 1986-10-08 | 1992-08-04 | Nippondenso Co., Ltd. | Structure and manufacturing method for thin-film semiconductor diode device |
KR900005123B1 (ko) * | 1987-09-26 | 1990-07-19 | 삼성전자 주식회사 | 바이폴라 트랜지스터의 제조방법 |
US4864379A (en) * | 1988-05-20 | 1989-09-05 | General Electric Company | Bipolar transistor with field shields |
US5266831A (en) * | 1991-11-12 | 1993-11-30 | Motorola, Inc. | Edge termination structure |
GB9207860D0 (en) * | 1992-04-09 | 1992-05-27 | Philips Electronics Uk Ltd | A semiconductor component |
JP3207615B2 (ja) * | 1992-06-24 | 2001-09-10 | 株式会社東芝 | 半導体装置 |
JP2956434B2 (ja) * | 1992-10-30 | 1999-10-04 | 株式会社デンソー | 絶縁分離形半導体装置 |
US5382825A (en) * | 1993-01-07 | 1995-01-17 | Harris Corporation | Spiral edge passivation structure for semiconductor devices |
JPH07326743A (ja) * | 1994-05-31 | 1995-12-12 | Fuji Electric Co Ltd | プレーナ型半導体素子 |
US5606195A (en) * | 1995-12-26 | 1997-02-25 | Hughes Electronics | High-voltage bipolar transistor utilizing field-terminated bond-pad electrodes |
GB9818182D0 (en) * | 1998-08-21 | 1998-10-14 | Zetex Plc | Gated semiconductor device |
JP4326835B2 (ja) * | 2003-05-20 | 2009-09-09 | 三菱電機株式会社 | 半導体装置、半導体装置の製造方法及び半導体装置の製造プロセス評価方法 |
Family Cites Families (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3911473A (en) * | 1968-10-12 | 1975-10-07 | Philips Corp | Improved surface breakdown protection for semiconductor devices |
GB1348697A (en) * | 1970-07-31 | 1974-03-20 | Fairchild Camera Instr Co | Semiconductors |
US4157563A (en) * | 1971-07-02 | 1979-06-05 | U.S. Philips Corporation | Semiconductor device |
US3728591A (en) * | 1971-09-03 | 1973-04-17 | Rca Corp | Gate protective device for insulated gate field-effect transistors |
JPS4979782A (de) * | 1972-12-08 | 1974-08-01 | ||
CH581904A5 (de) * | 1974-08-29 | 1976-11-15 | Centre Electron Horloger | |
NL190710C (nl) * | 1978-02-10 | 1994-07-01 | Nec Corp | Geintegreerde halfgeleiderketen. |
JPS56135969A (en) * | 1980-03-27 | 1981-10-23 | Fujitsu Ltd | Manufacture of semiconductor device |
DE3012430A1 (de) * | 1980-03-31 | 1981-10-08 | Siemens AG, 1000 Berlin und 8000 München | Planare halbleiteranordnung mit erhoehter durchbruchsspannung |
FR2488046A1 (fr) * | 1980-07-31 | 1982-02-05 | Silicium Semiconducteur Ssc | Dispositif de puissance a commande par transistor dmos |
US4622575A (en) * | 1981-10-27 | 1986-11-11 | Fairchild Semiconductor Corporation | Integrated circuit bipolar memory cell |
NL8203870A (nl) * | 1982-10-06 | 1984-05-01 | Philips Nv | Halfgeleiderinrichting. |
JPS59124161A (ja) * | 1982-12-29 | 1984-07-18 | Fujitsu Ltd | Mis型電界効果半導体装置 |
-
1985
- 1985-11-22 KR KR1019850008747A patent/KR890004495B1/ko not_active IP Right Cessation
- 1985-11-27 US US06/802,372 patent/US4707720A/en not_active Expired - Lifetime
- 1985-11-29 EP EP85115145A patent/EP0190423B1/de not_active Expired - Lifetime
- 1985-11-29 DE DE8585115145T patent/DE3585225D1/de not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
EP0190423B1 (de) | 1992-01-15 |
KR860004470A (ko) | 1986-06-23 |
KR890004495B1 (ko) | 1989-11-06 |
EP0190423A2 (de) | 1986-08-13 |
EP0190423A3 (en) | 1988-01-27 |
US4707720A (en) | 1987-11-17 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8364 | No opposition during term of opposition | ||
8339 | Ceased/non-payment of the annual fee |