DE3584191D1 - Verfahren zum herstellen von durchgangsleitungen in einer planaren struktur. - Google Patents

Verfahren zum herstellen von durchgangsleitungen in einer planaren struktur.

Info

Publication number
DE3584191D1
DE3584191D1 DE8585107402T DE3584191T DE3584191D1 DE 3584191 D1 DE3584191 D1 DE 3584191D1 DE 8585107402 T DE8585107402 T DE 8585107402T DE 3584191 T DE3584191 T DE 3584191T DE 3584191 D1 DE3584191 D1 DE 3584191D1
Authority
DE
Germany
Prior art keywords
throughpipes
producing
planar structure
planar
producing throughpipes
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE8585107402T
Other languages
English (en)
Inventor
Pamela Anne Leary-Renick
Rangaswamy Strinivasan
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
International Business Machines Corp
Original Assignee
International Business Machines Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by International Business Machines Corp filed Critical International Business Machines Corp
Application granted granted Critical
Publication of DE3584191D1 publication Critical patent/DE3584191D1/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/52Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames
    • H01L23/538Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames the interconnection structure between a plurality of semiconductor chips being formed on, or in, insulating substrates
    • H01L23/5383Multilayer substrates
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/48Manufacture or treatment of parts, e.g. containers, prior to assembly of the devices, using processes not provided for in a single one of the subgroups H01L21/06 - H01L21/326
    • H01L21/4814Conductive parts
    • H01L21/4846Leads on or in insulating or insulated substrates, e.g. metallisation
    • H01L21/486Via connections through the substrate with or without pins
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/0011Working of insulating substrates or insulating layers
    • H05K3/0017Etching of the substrate by chemical or physical means
    • H05K3/0026Etching of the substrate by chemical or physical means by laser ablation
    • H05K3/0029Etching of the substrate by chemical or physical means by laser ablation of inorganic insulating material
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/10Bump connectors; Manufacturing methods related thereto
    • H01L2224/15Structure, shape, material or disposition of the bump connectors after the connecting process
    • H01L2224/16Structure, shape, material or disposition of the bump connectors after the connecting process of an individual bump connector
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/01Chemical elements
    • H01L2924/01014Silicon [Si]
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/01Chemical elements
    • H01L2924/01079Gold [Au]
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/095Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00 with a principal constituent of the material being a combination of two or more materials provided in the groups H01L2924/013 - H01L2924/0715
    • H01L2924/097Glass-ceramics, e.g. devitrified glass
    • H01L2924/09701Low temperature co-fired ceramic [LTCC]
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/10Details of semiconductor or other solid state devices to be connected
    • H01L2924/11Device type
    • H01L2924/12Passive devices, e.g. 2 terminal devices
    • H01L2924/1204Optical Diode
    • H01L2924/12044OLED
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/15Details of package parts other than the semiconductor or other solid state devices to be connected
    • H01L2924/151Die mounting substrate
    • H01L2924/153Connection portion
    • H01L2924/1531Connection portion the connection portion being formed only on the surface of the substrate opposite to the die mounting surface
    • H01L2924/15312Connection portion the connection portion being formed only on the surface of the substrate opposite to the die mounting surface being a pin array, e.g. PGA
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/30Technical effects
    • H01L2924/301Electrical effects
    • H01L2924/3011Impedance
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K1/00Printed circuits
    • H05K1/02Details
    • H05K1/03Use of materials for the substrate
    • H05K1/0306Inorganic insulating substrates, e.g. ceramic, glass
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K1/00Printed circuits
    • H05K1/02Details
    • H05K1/11Printed elements for providing electric connections to or between printed circuits
    • H05K1/115Via connections; Lands around holes or via connections
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2201/00Indexing scheme relating to printed circuits covered by H05K1/00
    • H05K2201/09Shape and layout
    • H05K2201/09209Shape and layout details of conductors
    • H05K2201/095Conductive through-holes or vias
    • H05K2201/096Vertically aligned vias, holes or stacked vias
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2201/00Indexing scheme relating to printed circuits covered by H05K1/00
    • H05K2201/09Shape and layout
    • H05K2201/09818Shape or layout details not covered by a single group of H05K2201/09009 - H05K2201/09809
    • H05K2201/09845Stepped hole, via, edge, bump or conductor
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2203/00Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
    • H05K2203/05Patterning and lithography; Masks; Details of resist
    • H05K2203/0548Masks
    • H05K2203/0557Non-printed masks
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/46Manufacturing multilayer circuits
    • H05K3/4644Manufacturing multilayer circuits by building the multilayer layer by layer, i.e. build-up multilayer circuits
    • H05K3/4664Adding a circuit layer by thick film methods, e.g. printing techniques or by other techniques for making conductive patterns by using pastes, inks or powders
    • H05K3/4667Adding a circuit layer by thick film methods, e.g. printing techniques or by other techniques for making conductive patterns by using pastes, inks or powders characterized by using an inorganic intermediate insulating layer

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Computer Hardware Design (AREA)
  • General Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Chemical & Material Sciences (AREA)
  • Inorganic Chemistry (AREA)
  • Optics & Photonics (AREA)
  • Ceramic Engineering (AREA)
  • Production Of Multi-Layered Print Wiring Board (AREA)
DE8585107402T 1984-06-22 1985-06-15 Verfahren zum herstellen von durchgangsleitungen in einer planaren struktur. Expired - Fee Related DE3584191D1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US62358484A 1984-06-22 1984-06-22

Publications (1)

Publication Number Publication Date
DE3584191D1 true DE3584191D1 (de) 1991-10-31

Family

ID=24498630

Family Applications (1)

Application Number Title Priority Date Filing Date
DE8585107402T Expired - Fee Related DE3584191D1 (de) 1984-06-22 1985-06-15 Verfahren zum herstellen von durchgangsleitungen in einer planaren struktur.

Country Status (3)

Country Link
EP (1) EP0165575B1 (de)
JP (1) JPS6112054A (de)
DE (1) DE3584191D1 (de)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62213147A (ja) * 1986-03-13 1987-09-19 Fujitsu Ltd 積層回路基板の製造方法
US5038252A (en) * 1989-01-26 1991-08-06 Teradyne, Inc. Printed circuit boards with improved electrical current control
JPH05190356A (ja) * 1992-01-10 1993-07-30 Toshiba Corp 高電圧導体を有する電気機器
KR0127666B1 (ko) * 1992-11-25 1997-12-30 모리시다 요이찌 세라믹전자부품 및 그 제조방법
US5904499A (en) * 1994-12-22 1999-05-18 Pace; Benedict G Package for power semiconductor chips
JP2001523390A (ja) * 1994-12-22 2001-11-20 ベネディクト・ジー・ペース 反転型のチップが接合された高い実装効率を有するモジュール
US6614110B1 (en) 1994-12-22 2003-09-02 Benedict G Pace Module with bumps for connection and support
US5868950A (en) * 1996-11-08 1999-02-09 W. L. Gore & Associates, Inc. Method to correct astigmatism of fourth yag to enable formation of sub 25 micron micro-vias using masking techniques
US6181219B1 (en) 1998-12-02 2001-01-30 Teradyne, Inc. Printed circuit board and method for fabricating such board
US7608789B2 (en) * 2004-08-12 2009-10-27 Epcos Ag Component arrangement provided with a carrier substrate
US7999192B2 (en) 2007-03-14 2011-08-16 Amphenol Corporation Adjacent plated through holes with staggered couplings for crosstalk reduction in high speed printed circuit boards
DE102009029485A1 (de) 2009-09-15 2011-03-24 Robert Bosch Gmbh Verfahren zur Herstellung eines Keramikbauteils, Keramikbauteil und Bauteilanordnung

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3410979A (en) * 1964-05-28 1968-11-12 Burroughs Corp Method and apparatus for drilling holes by means of a focused laser beam
US3726002A (en) * 1971-08-27 1973-04-10 Ibm Process for forming a multi-layer glass-metal module adaptable for integral mounting to a dissimilar refractory substrate
JPS4985557A (de) * 1972-12-22 1974-08-16
JPS50130370A (de) * 1974-04-01 1975-10-15
FR2296988A1 (fr) * 1974-12-31 1976-07-30 Ibm France Perfectionnement aux procedes de fabrication d'un module de circuits multicouches en ceramique
JPS545796A (en) * 1977-06-15 1979-01-17 Hitachi Ltd Automatic depositing apparatus
JPS55162296A (en) * 1979-06-01 1980-12-17 Matsushita Electric Ind Co Ltd Through hole printing method
US4430365A (en) * 1982-07-22 1984-02-07 International Business Machines Corporation Method for forming conductive lines and vias

Also Published As

Publication number Publication date
EP0165575A3 (en) 1987-01-14
JPS6112054A (ja) 1986-01-20
JPH0516185B2 (de) 1993-03-03
EP0165575B1 (de) 1991-09-25
EP0165575A2 (de) 1985-12-27

Similar Documents

Publication Publication Date Title
DE3780369D1 (de) Verfahren zum herstellen einer halbleiterstruktur.
DE3686600D1 (de) Verfahren zum herstellen einer harzumhuellten halbleiteranordnung.
DE3586109D1 (de) Verfahren zum herstellen einer verbindungsstruktur von einer halbleiteranordnung.
DE3583934D1 (de) Verfahren zum herstellen einer halbleiterverbundanordnung.
DE3586732D1 (de) Verfahren zum herstellen einer dreidimentionaler halbleiteranordung.
DE3881860D1 (de) Verfahren zum herstellen von profilelementen.
DE3583472D1 (de) Verfahren zum herstellen einer halbleiteranordnung mit gateelektrode.
DE3483579D1 (de) Verfahren zum herstellen einer leiterbahn.
DE3584757D1 (de) Verfahren zum herstellen einer zwei-wannen-cmos-halbleiterstruktur.
DE3587231D1 (de) Verfahren zum herstellen einer dmos-halbleiteranordnung.
DE3686453D1 (de) Verfahren zum herstellen einer duennen halbleiterschicht.
DE3578614D1 (de) Verfahren zum herstellen von chip-einfuegungsschichten.
DE3784836D1 (de) Verfahren zum herstellen von schichtstoffteilen.
DE3579174D1 (de) Verfahren zum herstellen einer halbleiterspeicherstruktur und halbleiterspeicherstruktur.
DE3777786D1 (de) Verfahren zum herstellen von bauart-modellen.
DE3483258D1 (de) Verfahren zum herstellen von polster-artikeln.
DE3771670D1 (de) Verfahren zum entschleimen von triglyceridoelen.
DE3777522D1 (de) Verfahren zum herstellen einer gemischten struktur fuer halbleiteranordnung.
DE3671324D1 (de) Verfahren zum herstellen einer halbleiteranordnung.
DE3579770D1 (de) Verfahren zum herstellen eines eines verstaerkungsbauteils.
DE68906034D1 (de) Verfahren zum herstellen einer halbleiteranordnung.
DE3584191D1 (de) Verfahren zum herstellen von durchgangsleitungen in einer planaren struktur.
DE3684202D1 (de) Verfahren zum herstellen einer passivierungsschicht.
DE3675038D1 (de) Verfahren zum herstellen eines einzelchip-mikrocomputers.
DE3580335D1 (de) Verfahren zum herstellen einer halbleiterstruktur.

Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee