DE3565010D1 - Manufacture of diffraction gratings - Google Patents

Manufacture of diffraction gratings

Info

Publication number
DE3565010D1
DE3565010D1 DE8585305292T DE3565010T DE3565010D1 DE 3565010 D1 DE3565010 D1 DE 3565010D1 DE 8585305292 T DE8585305292 T DE 8585305292T DE 3565010 T DE3565010 T DE 3565010T DE 3565010 D1 DE3565010 D1 DE 3565010D1
Authority
DE
Germany
Prior art keywords
grating
substrate
resin
master
liquid resin
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
DE8585305292T
Other languages
English (en)
Inventor
Robert Martin Pettigrew
Robert James Longman
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Dr Johannes Heidenhain GmbH
Original Assignee
Dr Johannes Heidenhain GmbH
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Dr Johannes Heidenhain GmbH filed Critical Dr Johannes Heidenhain GmbH
Application granted granted Critical
Publication of DE3565010D1 publication Critical patent/DE3565010D1/de
Expired legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/001Phase modulating patterns, e.g. refractive index patterns
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00Optical elements other than lenses
    • G02B5/18Diffraction gratings
    • G02B5/1847Manufacturing methods
    • G02B5/1857Manufacturing methods using exposure or etching means, e.g. holography, photolithography, exposure to electron or ion beams

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Optics & Photonics (AREA)
  • Diffracting Gratings Or Hologram Optical Elements (AREA)
  • Optical Integrated Circuits (AREA)
DE8585305292T 1984-08-08 1985-07-25 Manufacture of diffraction gratings Expired DE3565010D1 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
GB848420182A GB8420182D0 (en) 1984-08-08 1984-08-08 Diffraction gratings

Publications (1)

Publication Number Publication Date
DE3565010D1 true DE3565010D1 (en) 1988-10-20

Family

ID=10565070

Family Applications (1)

Application Number Title Priority Date Filing Date
DE8585305292T Expired DE3565010D1 (en) 1984-08-08 1985-07-25 Manufacture of diffraction gratings

Country Status (6)

Country Link
US (1) US4657780A (de)
EP (1) EP0175460B1 (de)
JP (1) JPS6147902A (de)
AT (1) ATE37240T1 (de)
DE (1) DE3565010D1 (de)
GB (1) GB8420182D0 (de)

Families Citing this family (21)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2927608C2 (de) * 1979-07-07 1982-12-30 Ymos-Metallwerke Wolf & Becker Gmbh & Co, 6053 Obertshausen Türverschluß, insbesondere für Haushaltsgeräte
JPH0682460B2 (ja) * 1985-10-14 1994-10-19 富士写真フイルム株式会社 磁気記録媒体用支持体の製造方法
EP0287746B1 (de) * 1987-04-22 1990-10-24 W. Blösch AG Verfahren zur Herstellung einer dekorativen Oberflächenstruktur mit einem Hologramm oder einem Beugungsmuster
US4840757A (en) * 1987-05-19 1989-06-20 S. D. Warren Company Replicating process for interference patterns
FR2616269B1 (fr) * 1987-06-04 1990-11-09 Labo Electronique Physique Dispositif de test pour la mise en oeuvre d'un procede de realisation de dispositifs semiconducteurs
EP0297437B1 (de) * 1987-06-27 1993-09-01 Shimadzu Corporation Flexibles Replika-Gitter und optischer Multiplexer/Demultiplexer mit Anwendung eines solchen Gitters
US5104209A (en) * 1991-02-19 1992-04-14 Her Majesty The Queen In Right Of Canada, As Represented By The Minister Of Communications Method of creating an index grating in an optical fiber and a mode converter using the index grating
US5367588A (en) * 1992-10-29 1994-11-22 Her Majesty The Queen In Right Of Canada, As Represented By The Minister Of Communications Method of fabricating Bragg gratings using a silica glass phase grating mask and mask used by same
GB9207627D0 (en) * 1992-04-08 1992-05-27 Northern Telecom Ltd Manufacture of optical grating structures
US6096155A (en) 1996-09-27 2000-08-01 Digital Optics Corporation Method of dicing wafer level integrated multiple optical elements
US8153957B2 (en) 1996-09-27 2012-04-10 Digitaloptics Corporation East Integrated optical imaging systems including an interior space between opposing substrates and associated methods
DE69827604T2 (de) * 1997-01-17 2005-04-28 Cymer, Inc., San Diego Reflektierender überzug für wiederholtes beugungsgitter
US6162495A (en) * 1997-09-29 2000-12-19 Cymer, Inc. Protective overcoat for replicated diffraction gratings
US6027595A (en) * 1998-07-02 2000-02-22 Samsung Electronics Co., Ltd. Method of making optical replicas by stamping in photoresist and replicas formed thereby
JP2000294818A (ja) 1999-04-05 2000-10-20 Sony Corp 薄膜半導体素子およびその製造方法
US6998196B2 (en) * 2001-12-28 2006-02-14 Wavefront Technology Diffractive optical element and method of manufacture
EP1362682A1 (de) * 2002-05-13 2003-11-19 ZBD Displays Ltd, Verfahren und Vorrichtung zum Ausrichten von Flüssigkristallen
KR100895148B1 (ko) * 2002-11-20 2009-05-04 엘지전자 주식회사 고분자 광도파관 그레이팅 제조방법
US7887722B1 (en) 2008-05-22 2011-02-15 Inx International Ink Co. Method for transferring holographic and other microstructure or refractive images onto a web-carried resin coating in registration with printing on the web
WO2010027253A2 (en) * 2008-09-03 2010-03-11 Moser Baer Photo Voltaic Ltd. Method for producing a light trapping layer on a transparent substrate for use in a photovoltaic device, a method for producing a photovoltaic device as well as such a photovoltaic device
CN116603700A (zh) * 2022-02-08 2023-08-18 成都拓米双都光电有限公司 一种支撑栅板的制备方法

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB817051A (en) * 1954-10-14 1959-07-22 Nat Res Dev Improvements in and relating to production of diffraction gratings
US818966A (en) * 1905-09-29 1906-04-24 Frederic E Ives Diffraction-grating replica.
NL164688C (nl) * 1973-10-15 1981-01-15 Mca Disco Vision Werkwijze voor de vervaardiging van een videoschijf waarbij uitgaande van een moedermatrijs eerst een vorm wordt vervaardigd.
JPS5284752A (en) * 1976-01-07 1977-07-14 Hitachi Ltd Preparation of optical part which uses as matrix cured adhesives
DE2800476A1 (de) * 1977-01-07 1978-07-13 Instruments Sa Verfahren zur duplizierung einer optischen flaeche sowie so hergestelltes beugungsgitter
JPS53119061A (en) * 1977-03-26 1978-10-18 Nippon Chemical Ind Light and shade scale drawing method
NL7804036A (nl) * 1978-04-17 1979-10-19 Philips Nv Optisch uitleesbare informatieschijf.
JPS5727222A (en) * 1980-07-25 1982-02-13 Canon Inc Optical separator

Also Published As

Publication number Publication date
JPS6147902A (ja) 1986-03-08
US4657780A (en) 1987-04-14
EP0175460A1 (de) 1986-03-26
GB8420182D0 (en) 1984-09-12
ATE37240T1 (de) 1988-09-15
JPH0449921B2 (de) 1992-08-12
EP0175460B1 (de) 1988-09-14

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee