DE3560654D1 - Photosensitive recording material - Google Patents

Photosensitive recording material

Info

Publication number
DE3560654D1
DE3560654D1 DE8585101429T DE3560654T DE3560654D1 DE 3560654 D1 DE3560654 D1 DE 3560654D1 DE 8585101429 T DE8585101429 T DE 8585101429T DE 3560654 T DE3560654 T DE 3560654T DE 3560654 D1 DE3560654 D1 DE 3560654D1
Authority
DE
Germany
Prior art keywords
recording material
photosensitive recording
photosensitive
recording
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
DE8585101429T
Other languages
German (de)
English (en)
Inventor
Gerhard Dr Hoffmann
Reiner Dr Hofmann
Albert Dr Elzer
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
BASF SE
Original Assignee
BASF SE
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by BASF SE filed Critical BASF SE
Priority to DE8585101429T priority Critical patent/DE3560654D1/de
Application granted granted Critical
Publication of DE3560654D1 publication Critical patent/DE3560654D1/de
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03G—ELECTROGRAPHY; ELECTROPHOTOGRAPHY; MAGNETOGRAPHY
    • G03G5/00—Recording members for original recording by exposure, e.g. to light, to heat, to electrons; Manufacture thereof; Selection of materials therefor
    • G03G5/02—Charge-receiving layers
    • G03G5/04—Photoconductive layers; Charge-generation layers or charge-transporting layers; Additives therefor; Binders therefor
    • G03G5/05—Organic bonding materials; Methods for coating a substrate with a photoconductive layer; Inert supplements for use in photoconductive layers
    • G03G5/0528—Macromolecular bonding materials
    • G03G5/0532—Macromolecular bonding materials obtained by reactions only involving carbon-to-carbon unsatured bonds
    • G03G5/0546—Polymers comprising at least one carboxyl radical, e.g. polyacrylic acid, polycrotonic acid, polymaleic acid; Derivatives thereof, e.g. their esters, salts, anhydrides, nitriles, amides
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/106—Binder containing
    • Y10S430/111—Polymer of unsaturated acid or ester

Landscapes

  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
DE8585101429T 1984-02-18 1985-02-11 Photosensitive recording material Expired DE3560654D1 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
DE8585101429T DE3560654D1 (en) 1984-02-18 1985-02-11 Photosensitive recording material

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE3405959 1984-02-18
DE8585101429T DE3560654D1 (en) 1984-02-18 1985-02-11 Photosensitive recording material

Publications (1)

Publication Number Publication Date
DE3560654D1 true DE3560654D1 (en) 1987-10-22

Family

ID=6228189

Family Applications (1)

Application Number Title Priority Date Filing Date
DE8585101429T Expired DE3560654D1 (en) 1984-02-18 1985-02-11 Photosensitive recording material

Country Status (4)

Country Link
US (1) US4710446A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
EP (1) EP0152889B1 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
JP (1) JPS60247638A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
DE (1) DE3560654D1 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)

Families Citing this family (24)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3619130A1 (de) * 1986-06-06 1987-12-10 Basf Ag Lichtempfindliches aufzeichnungselement
DE3619129A1 (de) * 1986-06-06 1987-12-10 Basf Ag Lichtempfindliches aufzeichnungselement
DE3619698A1 (de) * 1986-06-16 1987-12-17 Basf Ag Lichtempfindliches aufzeichnungselement
DE3706561A1 (de) * 1987-02-28 1988-09-08 Basf Ag Lichtempfindliches aufzeichnungsmaterial mit erhoehter flexibilitaet
DE3740421A1 (de) * 1987-11-28 1989-06-08 Basf Ag Mehrschichtiges, elektrophotographisches aufzeichnungsmaterial
JP2640109B2 (ja) * 1988-01-27 1997-08-13 富士写真フイルム株式会社 電子写真式平版印刷用原版
EP0326169B1 (en) * 1988-01-28 1994-04-20 Fuji Photo Film Co., Ltd. Electrophotographic lithographic printing plate precursor
JPH0247661A (ja) * 1988-08-09 1990-02-16 Fuji Photo Film Co Ltd 電子写真感光体
US5045435A (en) * 1988-11-25 1991-09-03 Armstrong World Industries, Inc. Water-borne, alkali-developable, photoresist coating compositions and their preparation
FR2660662B1 (fr) * 1990-04-09 1993-05-28 Norsolor Sa Nouveaux copolymeres acryliques et leur application au revetement de materiaux bitumineux.
WO1991000881A1 (fr) * 1989-07-06 1991-01-24 Norsolor Nouveaux copolymeres acryliques et leur application au revetement de materiaux bitumineux
US5071730A (en) * 1990-04-24 1991-12-10 International Business Machines Corporation Liquid apply, aqueous processable photoresist compositions
US5045431A (en) * 1990-04-24 1991-09-03 International Business Machines Corporation Dry film, aqueous processable photoresist compositions
JP2847321B2 (ja) * 1990-08-14 1999-01-20 日本石油株式会社 ポジ型フォトレジスト組成物
US5275914A (en) * 1992-07-31 1994-01-04 Polaroid Corporation Laminar thermal imaging medium comprising an image-forming layer and two adhesive layers
DE4317093A1 (de) * 1993-05-21 1994-11-24 Basf Ag Niedermolekulare und polymere flüssigkristalline Benztriazole und deren Verwendung
US5552259A (en) * 1993-09-23 1996-09-03 Polaroid Corporation Adhesive composition, and imaging medium comprising this adhesive composition
DE19510526A1 (de) * 1995-03-23 1996-09-26 Hoechst Ag Elektrophotographisches Aufzeichnungsmaterial für die Herstellung von Druckplatten
US5698318A (en) * 1995-05-23 1997-12-16 The Dow Chemical Company Process for resin transfer molding and formulations useful to practice it
US5663259A (en) * 1995-05-31 1997-09-02 The Dow Chemical Company Curable compositions which contain network polymers
MY120763A (en) * 1997-09-19 2005-11-30 Hitachi Chemical Co Ltd Photosensitive film, process for laminating photosensitive resin layer, photosensitive resin layer-laminated substrate and process for curing photosensitive resin layer
JP2002030116A (ja) * 2000-07-14 2002-01-31 Tokyo Ohka Kogyo Co Ltd 新規コポリマー、ホトレジスト組成物、および高アスペクト比のレジストパターン形成方法
US6855480B2 (en) * 2001-04-19 2005-02-15 Shipley Company, L.L.C. Photoresist composition
JP4505242B2 (ja) * 2004-03-17 2010-07-21 富士フイルム株式会社 平版印刷方法

Family Cites Families (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE1117391B (de) * 1959-03-18 1961-11-16 Kalle Ag Elektrophotographisches Verfahren zur Herstellung von Druckformen
US3551357A (en) * 1967-06-14 1970-12-29 Bayer Ag Process for the production of crosslinked acrylated copolymers
DE2027467C3 (de) * 1970-06-04 1974-08-15 Kalle Ag, 6202 Wiesbaden-Biebrich Photopolymerisierbare Kopiermasse
DE2064080C3 (de) * 1970-12-28 1983-11-03 Hoechst Ag, 6230 Frankfurt Lichtempfindliches Gemisch
ZA72345B (en) * 1971-02-04 1973-03-28 Dynachem Corp Polymerization compositions and processes
US3887450A (en) * 1971-02-04 1975-06-03 Dynachem Corp Photopolymerizable compositions containing polymeric binding agents
US3862265A (en) * 1971-04-09 1975-01-21 Exxon Research Engineering Co Polymers with improved properties and process therefor
US3953309A (en) * 1972-12-14 1976-04-27 Dynachem Corporation Polymerization compositions and processes having polymeric binding agents
NL7408500A (nl) * 1974-06-25 1975-12-30 Lely Nv C Van Der Trekker.
JPS5180402A (ja) * 1974-12-30 1976-07-14 Somar Mfg Kankoseisoseibutsu
JPS6049892B2 (ja) * 1976-04-26 1985-11-05 富士写真フイルム株式会社 光重合性組成物
DE2817428A1 (de) * 1978-04-21 1979-10-31 Hoechst Ag Material fuer elektrophotographische reproduktion
US4298678A (en) * 1980-08-14 1981-11-03 E. I. Du Pont De Nemours And Company Photosensitive compositions and elements containing substituted hydroxylamine
CA1170887A (en) * 1980-10-06 1984-07-17 Gary C. Briney Aqueous developable photopolymerizable elements
DE3120052A1 (de) * 1981-05-20 1982-12-09 Hoechst Ag, 6000 Frankfurt Durch strahlung polymerisierbares gemisch und damit hergestelltes kopiermaterial
JPS58162960A (ja) * 1982-03-24 1983-09-27 Fuji Photo Film Co Ltd 平版印刷版の製造方法および平版印刷版用感光材料
DE3215968A1 (de) * 1982-04-29 1983-11-03 Basf Ag, 6700 Ludwigshafen Elektrographische aufzeichnungsmaterialien mit speziellen ladungstraeger transportierenden verbindungen
US4454218A (en) * 1982-09-13 1984-06-12 E. I. Du Pont De Nemours And Company N-Alkylindolylidene and N-alkylbenzo-thiazolylidene alkanones as sensitizers for photopolymer compositions
JPS5993443A (ja) * 1982-11-19 1984-05-29 Sekisui Chem Co Ltd 感光性組成物

Also Published As

Publication number Publication date
EP0152889A3 (en) 1986-08-06
EP0152889B1 (de) 1987-09-16
EP0152889A2 (de) 1985-08-28
US4710446A (en) 1987-12-01
JPS60247638A (ja) 1985-12-07
JPH0550738B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) 1993-07-29

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Legal Events

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8330 Complete disclaimer