DE3484059D1 - Verfahren und vorrichtung zum beschichten eines substrats. - Google Patents
Verfahren und vorrichtung zum beschichten eines substrats.Info
- Publication number
- DE3484059D1 DE3484059D1 DE8484903521T DE3484059T DE3484059D1 DE 3484059 D1 DE3484059 D1 DE 3484059D1 DE 8484903521 T DE8484903521 T DE 8484903521T DE 3484059 T DE3484059 T DE 3484059T DE 3484059 D1 DE3484059 D1 DE 3484059D1
- Authority
- DE
- Germany
- Prior art keywords
- coating
- substrate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
- C23C16/45502—Flow conditions in reaction chamber
- C23C16/45504—Laminar flow
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/001—General methods for coating; Devices therefor
- C03C17/002—General methods for coating; Devices therefor for flat glass, e.g. float glass
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
- C23C16/45582—Expansion of gas before it reaches the substrate
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
- C23C16/45585—Compression of gas before it reaches the substrate
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
- C23C16/45587—Mechanical means for changing the gas flow
- C23C16/45591—Fixed means, e.g. wings, baffles
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
- C23C16/45595—Atmospheric CVD gas inlets with no enclosed reaction chamber
Landscapes
- Chemical & Material Sciences (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Life Sciences & Earth Sciences (AREA)
- Geochemistry & Mineralogy (AREA)
- Physics & Mathematics (AREA)
- Fluid Mechanics (AREA)
- Chemical Vapour Deposition (AREA)
- Non-Metallic Protective Coatings For Printed Circuits (AREA)
- Surface Treatment Of Glass (AREA)
- Chemically Coating (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US06/535,798 US4504526A (en) | 1983-09-26 | 1983-09-26 | Apparatus and method for producing a laminar flow of constant velocity fluid along a substrate |
PCT/US1984/001460 WO1985001522A1 (en) | 1983-09-26 | 1984-09-17 | Method and apparatus for coating a substrate |
Publications (1)
Publication Number | Publication Date |
---|---|
DE3484059D1 true DE3484059D1 (de) | 1991-03-07 |
Family
ID=24135810
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE8484903521T Expired - Lifetime DE3484059D1 (de) | 1983-09-26 | 1984-09-17 | Verfahren und vorrichtung zum beschichten eines substrats. |
Country Status (11)
Families Citing this family (19)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4994301A (en) * | 1986-06-30 | 1991-02-19 | Nihon Sinku Gijutsu Kabusiki Kaisha | ACVD (chemical vapor deposition) method for selectively depositing metal on a substrate |
DE3751756T2 (de) * | 1986-06-30 | 1996-08-01 | Ulvac Corp | Verfahren zum Abscheiden aus der Gasphase |
US4793282A (en) * | 1987-05-18 | 1988-12-27 | Libbey-Owens-Ford Co. | Distributor beam for chemical vapor deposition on glass |
GB9511841D0 (en) * | 1995-06-10 | 1995-08-09 | Pilkington Glass Ltd | Mirrors and their production |
US6103015A (en) * | 1998-01-19 | 2000-08-15 | Libbey-Owens-Ford Co. | Symmetrical CVD coater with lower upstream exhaust toe |
JP3806537B2 (ja) * | 1999-03-10 | 2006-08-09 | 株式会社カイジョー | 超音波洗浄機及びそれを具備するウエット処理ノズル |
US6521295B1 (en) | 2001-04-17 | 2003-02-18 | Pilkington North America, Inc. | Chemical vapor deposition of antimony-doped metal oxide and the coated article made thereby |
ES2467161T3 (es) * | 2004-08-18 | 2014-06-12 | Calyxo Gmbh | Deposición química en fase vapor a presión atmosférica |
JP5270345B2 (ja) * | 2005-08-30 | 2013-08-21 | ピルキントン グループ リミテッド | 太陽電池に用いられる光線透過率を最適化する被覆されたガラス物品及びその製造方法 |
MY152036A (en) * | 2008-12-08 | 2014-08-15 | Calyxo Gmbh | Thin-film deposition and recirculation of a semi-conductor material |
JP5599823B2 (ja) | 2009-02-02 | 2014-10-01 | ピルキントン グループ リミテッド | 導電性酸化チタンコーティングの堆積方法 |
FI9160U1 (fi) * | 2010-01-04 | 2011-04-14 | Beneq Oy | Pinnoituslaite |
US20110207301A1 (en) * | 2010-02-19 | 2011-08-25 | Kormanyos Kenneth R | Atmospheric pressure chemical vapor deposition with saturation control |
DE102010028277B4 (de) | 2010-04-27 | 2013-04-18 | Calyxo Gmbh | Verfahren und Vorrichtung zur Herstellung einer mit einem Halbleitermaterial beschichteten Glasscheibe und nach dem Verfahren erhältliche Solarzelle oder Solarmodul |
WO2012158443A2 (en) | 2011-05-13 | 2012-11-22 | Sheperak Thomas J | Plasma directed electron beam wound care system apparatus and method |
US20150122319A1 (en) | 2011-07-28 | 2015-05-07 | David A. Strickler | Apcvd of doped titanium oxide and the coated article made thereby |
WO2015121632A1 (en) | 2014-02-11 | 2015-08-20 | Pilkington Group Limited | Coated glass article and display assembly made therewith |
CN104451601B (zh) * | 2014-12-02 | 2017-02-22 | 浙江大学 | 一种常压化学气相沉积镀膜反应器 |
CN104561938B (zh) * | 2015-01-09 | 2017-04-19 | 浙江大学 | 一种浮法在线常压化学气相沉积镀膜反应器 |
Family Cites Families (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3805736A (en) * | 1971-12-27 | 1974-04-23 | Ibm | Apparatus for diffusion limited mass transport |
US3790404A (en) * | 1972-06-19 | 1974-02-05 | Ibm | Continuous vapor processing apparatus and method |
GB1524326A (en) * | 1976-04-13 | 1978-09-13 | Bfg Glassgroup | Coating of glass |
JPS5843508A (ja) * | 1981-09-09 | 1983-03-14 | Fuji Electric Corp Res & Dev Ltd | 量産型成膜装置 |
US4462333A (en) * | 1982-10-27 | 1984-07-31 | Energy Conversion Devices, Inc. | Process gas introduction, confinement and evacuation system for glow discharge deposition apparatus |
-
1983
- 1983-09-26 US US06/535,798 patent/US4504526A/en not_active Expired - Lifetime
-
1984
- 1984-09-14 CA CA000463186A patent/CA1252369A/en not_active Expired
- 1984-09-17 EP EP84903521A patent/EP0156857B1/en not_active Expired
- 1984-09-17 WO PCT/US1984/001460 patent/WO1985001522A1/en active IP Right Grant
- 1984-09-17 BR BR8407050A patent/BR8407050A/pt not_active IP Right Cessation
- 1984-09-17 AU AU34348/84A patent/AU575349B2/en not_active Ceased
- 1984-09-17 JP JP59503497A patent/JPS60502259A/ja active Granted
- 1984-09-17 DE DE8484903521T patent/DE3484059D1/de not_active Expired - Lifetime
- 1984-09-25 MX MX202824A patent/MX163477B/es unknown
- 1984-09-25 IT IT48896/84A patent/IT1178436B/it active
- 1984-09-25 ES ES536212A patent/ES8606910A1/es not_active Expired
Also Published As
Publication number | Publication date |
---|---|
AU575349B2 (en) | 1988-07-28 |
WO1985001522A1 (en) | 1985-04-11 |
EP0156857A1 (en) | 1985-10-09 |
EP0156857A4 (en) | 1986-07-30 |
MX163477B (es) | 1992-05-19 |
BR8407050A (pt) | 1985-08-13 |
IT8448896A0 (it) | 1984-09-25 |
CA1252369A (en) | 1989-04-11 |
ES536212A0 (es) | 1986-05-16 |
US4504526A (en) | 1985-03-12 |
JPS60502259A (ja) | 1985-12-26 |
ES8606910A1 (es) | 1986-05-16 |
EP0156857B1 (en) | 1991-01-30 |
JPH0582475B2 (US06168776-20010102-C00041.png) | 1993-11-19 |
IT1178436B (it) | 1987-09-09 |
AU3434884A (en) | 1985-04-23 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8364 | No opposition during term of opposition | ||
8339 | Ceased/non-payment of the annual fee |