DE3469110D1 - Fabrication of inp containing semiconductor devices having high and low resistivity regions - Google Patents
Fabrication of inp containing semiconductor devices having high and low resistivity regionsInfo
- Publication number
- DE3469110D1 DE3469110D1 DE8484903874T DE3469110T DE3469110D1 DE 3469110 D1 DE3469110 D1 DE 3469110D1 DE 8484903874 T DE8484903874 T DE 8484903874T DE 3469110 T DE3469110 T DE 3469110T DE 3469110 D1 DE3469110 D1 DE 3469110D1
- Authority
- DE
- Germany
- Prior art keywords
- fabrication
- semiconductor devices
- low resistivity
- containing semiconductor
- resistivity regions
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 238000004519 manufacturing process Methods 0.000 title 1
- 239000004065 semiconductor Substances 0.000 title 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/26—Bombardment with radiation
- H01L21/263—Bombardment with radiation with high-energy radiation
- H01L21/265—Bombardment with radiation with high-energy radiation producing ion implantation
- H01L21/2654—Bombardment with radiation with high-energy radiation producing ion implantation in AIIIBV compounds
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/26—Bombardment with radiation
- H01L21/263—Bombardment with radiation with high-energy radiation
- H01L21/265—Bombardment with radiation with high-energy radiation producing ion implantation
- H01L21/266—Bombardment with radiation with high-energy radiation producing ion implantation using masks
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/324—Thermal treatment for modifying the properties of semiconductor bodies, e.g. annealing, sintering
- H01L21/3245—Thermal treatment for modifying the properties of semiconductor bodies, e.g. annealing, sintering of AIIIBV compounds
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
- H01L21/71—Manufacture of specific parts of devices defined in group H01L21/70
- H01L21/74—Making of localized buried regions, e.g. buried collector layers, internal connections substrate contacts
- H01L21/743—Making of internal connections, substrate contacts
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
- H01L21/71—Manufacture of specific parts of devices defined in group H01L21/70
- H01L21/76—Making of isolation regions between components
- H01L21/7605—Making of isolation regions between components between components manufactured in an active substrate comprising AIII BV compounds
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
- H01L21/77—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate
- H01L21/78—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices
- H01L21/82—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices to produce devices, e.g. integrated circuits, each consisting of a plurality of components
- H01L21/8252—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices to produce devices, e.g. integrated circuits, each consisting of a plurality of components the substrate being a semiconductor, using III-V technology
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S148/00—Metal treatment
- Y10S148/084—Ion implantation of compound devices
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- High Energy & Nuclear Physics (AREA)
- Toxicology (AREA)
- Health & Medical Sciences (AREA)
- Junction Field-Effect Transistors (AREA)
- Semiconductor Memories (AREA)
- Metal-Oxide And Bipolar Metal-Oxide Semiconductor Integrated Circuits (AREA)
- Bipolar Transistors (AREA)
- Semiconductor Integrated Circuits (AREA)
- Recrystallisation Techniques (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US06/555,671 US4597165A (en) | 1983-11-28 | 1983-11-28 | Method of making integrated circuits employing ion-bombarded InP layers |
PCT/US1984/001676 WO1985002493A1 (en) | 1983-11-28 | 1984-10-18 | FABRICATION OF InP CONTAINING SEMICONDUCTOR DEVICES HAVING HIGH AND LOW RESISTIVITY REGIONS |
Publications (1)
Publication Number | Publication Date |
---|---|
DE3469110D1 true DE3469110D1 (en) | 1988-03-03 |
Family
ID=24218179
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE8484903874T Expired DE3469110D1 (en) | 1983-11-28 | 1984-10-18 | Fabrication of inp containing semiconductor devices having high and low resistivity regions |
Country Status (7)
Country | Link |
---|---|
US (1) | US4597165A (de) |
EP (1) | EP0162860B1 (de) |
JP (1) | JPH0658894B2 (de) |
KR (1) | KR920008124B1 (de) |
CA (1) | CA1217878A (de) |
DE (1) | DE3469110D1 (de) |
WO (1) | WO1985002493A1 (de) |
Families Citing this family (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4871690A (en) * | 1986-01-21 | 1989-10-03 | Xerox Corporation | Semiconductor structures utilizing semiconductor support means selectively pretreated with migratory defects |
FR2635611B1 (fr) * | 1988-08-18 | 1990-10-19 | Centre Nat Rech Scient | Procede de neutralisation des atomes accepteurs dans inp de type p |
US6077791A (en) * | 1996-12-16 | 2000-06-20 | Motorola Inc. | Method of forming passivation layers using deuterium containing reaction gases |
US5707879A (en) * | 1997-01-08 | 1998-01-13 | Reinitz; Karl | Neutron detector based on semiconductor materials |
US6100168A (en) * | 1998-11-16 | 2000-08-08 | Industrial Technology Research Institute | Location selective transmutation doping on silicon wafers using high energy deuterons |
US6861320B1 (en) * | 2003-04-04 | 2005-03-01 | Silicon Wafer Technologies, Inc. | Method of making starting material for chip fabrication comprising a buried silicon nitride layer |
Family Cites Families (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
BE791929A (fr) * | 1971-12-02 | 1973-03-16 | Western Electric Co | Procede de fabrication de regions isolantes dans un corps de semi-conducteur |
JPS54114988A (en) * | 1978-02-28 | 1979-09-07 | Kokusai Denshin Denwa Co Ltd | Semiconductor laser |
DE2832012A1 (de) * | 1978-07-20 | 1980-01-31 | Siemens Ag | Verfahren zum herstellen einer dreidimensionalen integrierten schaltung |
US4233090A (en) * | 1979-06-28 | 1980-11-11 | Rca Corporation | Method of making a laser diode |
JPS56162893A (en) * | 1980-05-21 | 1981-12-15 | Fujitsu Ltd | Forming method for electrode of semiconductor device |
-
1983
- 1983-11-28 US US06/555,671 patent/US4597165A/en not_active Expired - Lifetime
-
1984
- 1984-10-18 KR KR1019850700133A patent/KR920008124B1/ko not_active IP Right Cessation
- 1984-10-18 EP EP84903874A patent/EP0162860B1/de not_active Expired
- 1984-10-18 JP JP59503882A patent/JPH0658894B2/ja not_active Expired - Fee Related
- 1984-10-18 WO PCT/US1984/001676 patent/WO1985002493A1/en active IP Right Grant
- 1984-10-18 DE DE8484903874T patent/DE3469110D1/de not_active Expired
- 1984-10-29 CA CA000466521A patent/CA1217878A/en not_active Expired
Also Published As
Publication number | Publication date |
---|---|
CA1217878A (en) | 1987-02-10 |
US4597165A (en) | 1986-07-01 |
EP0162860B1 (de) | 1988-01-27 |
KR920008124B1 (ko) | 1992-09-22 |
JPS61500520A (ja) | 1986-03-20 |
EP0162860A1 (de) | 1985-12-04 |
JPH0658894B2 (ja) | 1994-08-03 |
WO1985002493A1 (en) | 1985-06-06 |
KR850700181A (ko) | 1985-10-25 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8364 | No opposition during term of opposition | ||
8328 | Change in the person/name/address of the agent |
Free format text: BLUMBACH, KRAMER & PARTNER, 65193 WIESBADEN |
|
8339 | Ceased/non-payment of the annual fee |