GB2195050B - Semiconductor devices and methods of manufacture - Google Patents
Semiconductor devices and methods of manufactureInfo
- Publication number
- GB2195050B GB2195050B GB8719817A GB8719817A GB2195050B GB 2195050 B GB2195050 B GB 2195050B GB 8719817 A GB8719817 A GB 8719817A GB 8719817 A GB8719817 A GB 8719817A GB 2195050 B GB2195050 B GB 2195050B
- Authority
- GB
- United Kingdom
- Prior art keywords
- manufacture
- methods
- semiconductor devices
- semiconductor
- devices
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 238000004519 manufacturing process Methods 0.000 title 1
- 238000000034 method Methods 0.000 title 1
- 239000004065 semiconductor Substances 0.000 title 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
- H01L29/68—Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
- H01L29/76—Unipolar devices, e.g. field effect transistors
- H01L29/772—Field effect transistors
- H01L29/778—Field effect transistors with two-dimensional charge carrier gas channel, e.g. HEMT ; with two-dimensional charge-carrier layer formed at a heterojunction interface
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
- H01L29/68—Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
- H01L29/76—Unipolar devices, e.g. field effect transistors
- H01L29/772—Field effect transistors
- H01L29/778—Field effect transistors with two-dimensional charge carrier gas channel, e.g. HEMT ; with two-dimensional charge-carrier layer formed at a heterojunction interface
- H01L29/7786—Field effect transistors with two-dimensional charge carrier gas channel, e.g. HEMT ; with two-dimensional charge-carrier layer formed at a heterojunction interface with direct single heterostructure, i.e. with wide bandgap layer formed on top of active layer, e.g. direct single heterostructure MIS-like HEMT
- H01L29/7787—Field effect transistors with two-dimensional charge carrier gas channel, e.g. HEMT ; with two-dimensional charge-carrier layer formed at a heterojunction interface with direct single heterostructure, i.e. with wide bandgap layer formed on top of active layer, e.g. direct single heterostructure MIS-like HEMT with wide bandgap charge-carrier supplying layer, e.g. direct single heterostructure MODFET
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/02—Semiconductor bodies ; Multistep manufacturing processes therefor
- H01L29/04—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their crystalline structure, e.g. polycrystalline, cubic or particular orientation of crystalline planes
- H01L29/045—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their crystalline structure, e.g. polycrystalline, cubic or particular orientation of crystalline planes by their particular orientation of crystalline planes
Landscapes
- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Physics & Mathematics (AREA)
- Ceramic Engineering (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Chemical & Material Sciences (AREA)
- Crystallography & Structural Chemistry (AREA)
- Junction Field-Effect Transistors (AREA)
- Recrystallisation Techniques (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP61202110A JPH0783109B2 (en) | 1986-08-28 | 1986-08-28 | High-speed semiconductor device |
Publications (3)
Publication Number | Publication Date |
---|---|
GB8719817D0 GB8719817D0 (en) | 1987-09-30 |
GB2195050A GB2195050A (en) | 1988-03-23 |
GB2195050B true GB2195050B (en) | 1990-05-30 |
Family
ID=16452126
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
GB8719817A Expired - Lifetime GB2195050B (en) | 1986-08-28 | 1987-08-21 | Semiconductor devices and methods of manufacture |
Country Status (5)
Country | Link |
---|---|
JP (1) | JPH0783109B2 (en) |
KR (1) | KR950014278B1 (en) |
DE (1) | DE3728524C2 (en) |
FR (1) | FR2611313A1 (en) |
GB (1) | GB2195050B (en) |
Families Citing this family (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR910007414B1 (en) * | 1989-03-18 | 1991-09-25 | 재단법인 한국전자통신연구소 | Hetero structure compound semiconductor device with improving doping effect |
JPH03278542A (en) * | 1990-03-28 | 1991-12-10 | Hitachi Ltd | Semiconductor device |
EP0535293A1 (en) * | 1991-01-29 | 1993-04-07 | Max-Planck-Gesellschaft zur Förderung der Wissenschaften e.V. | A method of fabricating a compositional semiconductor device |
JP3360105B2 (en) * | 1994-03-04 | 2002-12-24 | 富士通株式会社 | Method for manufacturing semiconductor device |
WO2008063704A2 (en) | 2006-05-03 | 2008-05-29 | Rochester Institute Of Technology | Nanostructured quantum dots or dashes in photovoltaic devices and methods thereof |
JP2010225981A (en) | 2009-03-25 | 2010-10-07 | Fujitsu Ltd | Optical semiconductor device, integrated element and method of manufacturing optical semiconductor device |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB1198559A (en) * | 1967-12-28 | 1970-07-15 | Tokyo Shibaura Electric Co | Semiconductor Device. |
US3721583A (en) * | 1970-12-08 | 1973-03-20 | Ibm | Vapor phase epitaxial deposition process for forming superlattice structure |
GB1570407A (en) * | 1976-04-06 | 1980-07-02 | Ibm | Semiconductor device and process for preparation |
Family Cites Families (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS52101698A (en) * | 1976-02-23 | 1977-08-25 | Toshiba Corp | Vapor phase growth of gallium arsenide |
-
1986
- 1986-08-28 JP JP61202110A patent/JPH0783109B2/en not_active Expired - Lifetime
-
1987
- 1987-08-21 GB GB8719817A patent/GB2195050B/en not_active Expired - Lifetime
- 1987-08-24 KR KR1019870009226A patent/KR950014278B1/en not_active IP Right Cessation
- 1987-08-26 DE DE3728524A patent/DE3728524C2/en not_active Expired - Lifetime
- 1987-08-26 FR FR8711943A patent/FR2611313A1/en active Pending
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB1198559A (en) * | 1967-12-28 | 1970-07-15 | Tokyo Shibaura Electric Co | Semiconductor Device. |
US3636421A (en) * | 1967-12-28 | 1972-01-18 | Tokyo Shibaura Electric Co | Oxide coated semiconductor device having (311) planar face |
US3721583A (en) * | 1970-12-08 | 1973-03-20 | Ibm | Vapor phase epitaxial deposition process for forming superlattice structure |
GB1570407A (en) * | 1976-04-06 | 1980-07-02 | Ibm | Semiconductor device and process for preparation |
Also Published As
Publication number | Publication date |
---|---|
KR880003401A (en) | 1988-05-16 |
FR2611313A1 (en) | 1988-08-26 |
KR950014278B1 (en) | 1995-11-24 |
GB8719817D0 (en) | 1987-09-30 |
JPH0783109B2 (en) | 1995-09-06 |
DE3728524A1 (en) | 1988-03-10 |
GB2195050A (en) | 1988-03-23 |
JPS6356960A (en) | 1988-03-11 |
DE3728524C2 (en) | 1996-05-09 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
PE20 | Patent expired after termination of 20 years |
Effective date: 20070820 |