DE3439688C2 - - Google Patents

Info

Publication number
DE3439688C2
DE3439688C2 DE19843439688 DE3439688A DE3439688C2 DE 3439688 C2 DE3439688 C2 DE 3439688C2 DE 19843439688 DE19843439688 DE 19843439688 DE 3439688 A DE3439688 A DE 3439688A DE 3439688 C2 DE3439688 C2 DE 3439688C2
Authority
DE
Germany
Prior art keywords
layers
layer
contact layers
contact
electrodes
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
DE19843439688
Other languages
German (de)
English (en)
Other versions
DE3439688A1 (de
Inventor
Reinhard 8000 Muenchen De Behn
Hartmut Dr. 7920 Heidenheim De Michel
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Siemens AG
Original Assignee
Siemens AG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Siemens AG filed Critical Siemens AG
Priority to DE19843439688 priority Critical patent/DE3439688A1/de
Publication of DE3439688A1 publication Critical patent/DE3439688A1/de
Application granted granted Critical
Publication of DE3439688C2 publication Critical patent/DE3439688C2/de
Granted legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01GCAPACITORS; CAPACITORS, RECTIFIERS, DETECTORS, SWITCHING DEVICES, LIGHT-SENSITIVE OR TEMPERATURE-SENSITIVE DEVICES OF THE ELECTROLYTIC TYPE
    • H01G4/00Fixed capacitors; Processes of their manufacture
    • H01G4/30Stacked capacitors
    • H01G4/306Stacked capacitors made by thin film techniques

Landscapes

  • Engineering & Computer Science (AREA)
  • Power Engineering (AREA)
  • Manufacturing & Machinery (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Fixed Capacitors And Capacitor Manufacturing Machines (AREA)
DE19843439688 1984-10-30 1984-10-30 Verfahren zum herstellen elektrischer plasmapolymerer vielschichtkondensatoren Granted DE3439688A1 (de)

Priority Applications (1)

Application Number Priority Date Filing Date Title
DE19843439688 DE3439688A1 (de) 1984-10-30 1984-10-30 Verfahren zum herstellen elektrischer plasmapolymerer vielschichtkondensatoren

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE19843439688 DE3439688A1 (de) 1984-10-30 1984-10-30 Verfahren zum herstellen elektrischer plasmapolymerer vielschichtkondensatoren

Publications (2)

Publication Number Publication Date
DE3439688A1 DE3439688A1 (de) 1986-04-30
DE3439688C2 true DE3439688C2 (fr) 1989-07-06

Family

ID=6249105

Family Applications (1)

Application Number Title Priority Date Filing Date
DE19843439688 Granted DE3439688A1 (de) 1984-10-30 1984-10-30 Verfahren zum herstellen elektrischer plasmapolymerer vielschichtkondensatoren

Country Status (1)

Country Link
DE (1) DE3439688A1 (fr)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0339844A3 (fr) * 1988-04-29 1991-01-16 SPECTRUM CONTROL, INC. (a Delaware corporation) Structure multicouche et son procédé de fabrication

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3021786A1 (de) * 1980-06-10 1981-12-17 Siemens AG, 1000 Berlin und 8000 München Verfahren zur herstelung von elektrishen bauelementen, insbesondere schichtkondensatoren
DE3209041A1 (de) * 1982-03-12 1983-09-15 Siemens AG, 1000 Berlin und 8000 München Verfahren zur herstellung eines regenerierfaehigen elektrischen schichtkondensators

Also Published As

Publication number Publication date
DE3439688A1 (de) 1986-04-30

Similar Documents

Publication Publication Date Title
DE69005785T2 (de) Elektrischer Widerstand in Chip-Bauweise für Oberflächenbestückung und Verfahren zu seiner Herstellung.
DE2843581C2 (de) Elektrischer Schichtkondensator und Verfahren zu seiner Herstellung
DE404295T1 (de) Kondensatoren fuer integrierte schaltungen.
DE3913221A1 (de) Halbleiteranordnung
DE3414808A1 (de) Verfahren zur herstellung eines preiswerten duennfilmkondensators und danach hergestellter kondensator
DE3107943C2 (fr)
DE2509912C3 (de) Elektronische Dünnfilmschaltung
DE102019208188A1 (de) Spulenkomponente
DE1521256B2 (de) Elektrische verbindung zwischen der metallbelegung eines elektrischen kondensators und ihrer drahtfoermigen stromzufuehrung
WO2000068994A1 (fr) Porte-puce pour module puce, et procede de production du module puce
DE3640248A1 (de) Halbleitervorrichtung
EP0181555B1 (fr) Procédé de fabrication de condensateurs électriques multicouches à films polymérisés par plasma
DE3148778C2 (fr)
DE3686882T2 (de) Monolitischer elektrischer miniatur-kondensator.
DE3439688C2 (fr)
DE3235772A1 (de) Mehrschichtkondensator
DE3343367A1 (de) Halbleiterbauelement mit hoeckerartigen, metallischen anschlusskontakten und mehrlagenverdrahtung
DE4425943B4 (de) Verfahren zur Herstellung eines mehrschichtigen Leiter- bzw. Anschlusselements und Leiter- bzw. Anschlusselement
DE3235493C2 (fr)
DE3704200A1 (de) Verfahren zur herstellung einer verbindung zwischen einem bonddraht und einer kontaktflaeche bei hybriden dickschicht-schaltkreisen
DE2513509A1 (de) Duennschicht-chipkondensator
DE19708363C1 (de) Verfahren zum Herstellen eines Metall-Keramik-Substrats und Metall-Keramik-Substrat
DE4328353C2 (de) Mehrschicht-Substrat
DE3343250C2 (fr)
DE3439731C2 (fr)

Legal Events

Date Code Title Description
8110 Request for examination paragraph 44
8120 Willingness to grant licenses paragraph 23
D2 Grant after examination
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee