DE3430941C2 - Chemisch empfindlicher Feldeffekttransistor-Sensor - Google Patents
Chemisch empfindlicher Feldeffekttransistor-SensorInfo
- Publication number
- DE3430941C2 DE3430941C2 DE19843430941 DE3430941A DE3430941C2 DE 3430941 C2 DE3430941 C2 DE 3430941C2 DE 19843430941 DE19843430941 DE 19843430941 DE 3430941 A DE3430941 A DE 3430941A DE 3430941 C2 DE3430941 C2 DE 3430941C2
- Authority
- DE
- Germany
- Prior art keywords
- chemfet
- thin film
- chemically sensitive
- insulator substrate
- silicon thin
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 230000005669 field effect Effects 0.000 title claims abstract description 11
- 239000000758 substrate Substances 0.000 claims abstract description 43
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims abstract description 32
- 239000012212 insulator Substances 0.000 claims abstract description 32
- 229910052710 silicon Inorganic materials 0.000 claims abstract description 31
- 239000010703 silicon Substances 0.000 claims abstract description 31
- 239000010409 thin film Substances 0.000 claims abstract description 26
- 229910021421 monocrystalline silicon Inorganic materials 0.000 claims abstract description 19
- 238000009413 insulation Methods 0.000 claims description 22
- 239000012528 membrane Substances 0.000 claims description 15
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 13
- 239000010453 quartz Substances 0.000 claims description 7
- 229910052681 coesite Inorganic materials 0.000 claims description 3
- 229910052906 cristobalite Inorganic materials 0.000 claims description 3
- 229910052682 stishovite Inorganic materials 0.000 claims description 3
- 229910052905 tridymite Inorganic materials 0.000 claims description 3
- 239000013078 crystal Substances 0.000 claims description 2
- 239000012488 sample solution Substances 0.000 abstract description 10
- 239000012535 impurity Substances 0.000 abstract description 3
- 229910001415 sodium ion Inorganic materials 0.000 description 11
- 229910052751 metal Inorganic materials 0.000 description 10
- 239000002184 metal Substances 0.000 description 10
- 229910001414 potassium ion Inorganic materials 0.000 description 9
- 230000007797 corrosion Effects 0.000 description 8
- 238000005260 corrosion Methods 0.000 description 8
- 239000010408 film Substances 0.000 description 8
- 235000012239 silicon dioxide Nutrition 0.000 description 8
- 150000002500 ions Chemical class 0.000 description 7
- 239000004800 polyvinyl chloride Substances 0.000 description 7
- 238000000034 method Methods 0.000 description 6
- 229920000915 polyvinyl chloride Polymers 0.000 description 6
- 230000006866 deterioration Effects 0.000 description 5
- 238000004519 manufacturing process Methods 0.000 description 5
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 description 4
- 229910052581 Si3N4 Inorganic materials 0.000 description 4
- 229910052594 sapphire Inorganic materials 0.000 description 4
- 239000010980 sapphire Substances 0.000 description 4
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 4
- 108010067973 Valinomycin Proteins 0.000 description 3
- 230000000903 blocking effect Effects 0.000 description 3
- FCFNRCROJUBPLU-UHFFFAOYSA-N compound M126 Natural products CC(C)C1NC(=O)C(C)OC(=O)C(C(C)C)NC(=O)C(C(C)C)OC(=O)C(C(C)C)NC(=O)C(C)OC(=O)C(C(C)C)NC(=O)C(C(C)C)OC(=O)C(C(C)C)NC(=O)C(C)OC(=O)C(C(C)C)NC(=O)C(C(C)C)OC1=O FCFNRCROJUBPLU-UHFFFAOYSA-N 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 239000000126 substance Substances 0.000 description 3
- 238000012360 testing method Methods 0.000 description 3
- FCFNRCROJUBPLU-DNDCDFAISA-N valinomycin Chemical compound CC(C)[C@@H]1NC(=O)[C@H](C)OC(=O)[C@@H](C(C)C)NC(=O)[C@@H](C(C)C)OC(=O)[C@H](C(C)C)NC(=O)[C@H](C)OC(=O)[C@@H](C(C)C)NC(=O)[C@@H](C(C)C)OC(=O)[C@H](C(C)C)NC(=O)[C@H](C)OC(=O)[C@@H](C(C)C)NC(=O)[C@@H](C(C)C)OC1=O FCFNRCROJUBPLU-DNDCDFAISA-N 0.000 description 3
- NLXLAEXVIDQMFP-UHFFFAOYSA-N Ammonia chloride Chemical compound [NH4+].[Cl-] NLXLAEXVIDQMFP-UHFFFAOYSA-N 0.000 description 2
- 239000004793 Polystyrene Substances 0.000 description 2
- 229910004298 SiO 2 Inorganic materials 0.000 description 2
- 239000000969 carrier Substances 0.000 description 2
- 238000003486 chemical etching Methods 0.000 description 2
- 238000005229 chemical vapour deposition Methods 0.000 description 2
- 238000013461 design Methods 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 238000009792 diffusion process Methods 0.000 description 2
- 238000002474 experimental method Methods 0.000 description 2
- 238000005468 ion implantation Methods 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- 230000007935 neutral effect Effects 0.000 description 2
- 230000003647 oxidation Effects 0.000 description 2
- 238000007254 oxidation reaction Methods 0.000 description 2
- BPUBBGLMJRNUCC-UHFFFAOYSA-N oxygen(2-);tantalum(5+) Chemical compound [O-2].[O-2].[O-2].[O-2].[O-2].[Ta+5].[Ta+5] BPUBBGLMJRNUCC-UHFFFAOYSA-N 0.000 description 2
- 229920002223 polystyrene Polymers 0.000 description 2
- 230000002035 prolonged effect Effects 0.000 description 2
- 230000035945 sensitivity Effects 0.000 description 2
- 239000000377 silicon dioxide Substances 0.000 description 2
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- ZFMQKOWCDKKBIF-UHFFFAOYSA-N bis(3,5-difluorophenyl)phosphane Chemical compound FC1=CC(F)=CC(PC=2C=C(F)C=C(F)C=2)=C1 ZFMQKOWCDKKBIF-UHFFFAOYSA-N 0.000 description 1
- 238000003618 dip coating Methods 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 230000008014 freezing Effects 0.000 description 1
- 238000007710 freezing Methods 0.000 description 1
- 229910052736 halogen Inorganic materials 0.000 description 1
- -1 halogen ions Chemical class 0.000 description 1
- 238000002955 isolation Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 229910021645 metal ion Inorganic materials 0.000 description 1
- 239000007769 metal material Substances 0.000 description 1
- 229910044991 metal oxide Inorganic materials 0.000 description 1
- 150000004706 metal oxides Chemical class 0.000 description 1
- 229910021420 polycrystalline silicon Inorganic materials 0.000 description 1
- 229920005591 polysilicon Polymers 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 238000004904 shortening Methods 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 229910001936 tantalum oxide Inorganic materials 0.000 description 1
- 238000012546 transfer Methods 0.000 description 1
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N27/00—Investigating or analysing materials by the use of electric, electrochemical, or magnetic means
- G01N27/26—Investigating or analysing materials by the use of electric, electrochemical, or magnetic means by investigating electrochemical variables; by using electrolysis or electrophoresis
- G01N27/403—Cells and electrode assemblies
- G01N27/414—Ion-sensitive or chemical field-effect transistors, i.e. ISFETS or CHEMFETS
Landscapes
- Life Sciences & Earth Sciences (AREA)
- Chemical & Material Sciences (AREA)
- Health & Medical Sciences (AREA)
- Physics & Mathematics (AREA)
- Molecular Biology (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Engineering & Computer Science (AREA)
- Analytical Chemistry (AREA)
- Biochemistry (AREA)
- General Health & Medical Sciences (AREA)
- General Physics & Mathematics (AREA)
- Immunology (AREA)
- Pathology (AREA)
- Investigating Or Analyzing Materials By The Use Of Electric Means (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP58156388A JPS6049255A (ja) | 1983-08-29 | 1983-08-29 | 化学物質感応電界効果トランジスタ型センサ |
| JP58157825A JPS6050447A (ja) | 1983-08-31 | 1983-08-31 | 化学物質感応電界効果トランジスタ型センサ |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| DE3430941A1 DE3430941A1 (de) | 1985-03-14 |
| DE3430941C2 true DE3430941C2 (de) | 1987-04-09 |
Family
ID=26484155
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| DE19843430941 Expired DE3430941C2 (de) | 1983-08-29 | 1984-08-22 | Chemisch empfindlicher Feldeffekttransistor-Sensor |
Country Status (1)
| Country | Link |
|---|---|
| DE (1) | DE3430941C2 (US20030204162A1-20031030-M00001.png) |
Families Citing this family (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CA1251514A (en) * | 1985-02-20 | 1989-03-21 | Tadashi Sakai | Ion selective field effect transistor sensor |
| DE3519397A1 (de) * | 1985-05-30 | 1986-12-04 | Siemens AG, 1000 Berlin und 8000 München | Sensor fuer gasanalyse bzw. -detektion |
| DE3827314C1 (US20030204162A1-20031030-M00001.png) * | 1988-08-11 | 1989-10-19 | Christoff Prof. Dr. Braeuchle | |
| IT1224606B (it) * | 1988-10-10 | 1990-10-04 | Eniricerche Spa | Sensore chimico monolitico a membrana ione selettiva di tipo chemfet eprocedimento per la sua realizzazione |
| EP1353170A3 (en) * | 2002-03-28 | 2004-02-04 | Interuniversitair Micro-Elektronica Centrum (IMEC) | Field effect transistor for sensing applications |
| DE10221799A1 (de) * | 2002-05-15 | 2003-11-27 | Fujitsu Ltd | Silicon-on-Insulator-Biosensor |
| DE10330610B4 (de) * | 2003-07-07 | 2018-06-07 | Robert Bosch Gmbh | Elektronisches Sensorbauteil und Verfahren zu dessen Herstellung |
| US7361946B2 (en) | 2004-06-28 | 2008-04-22 | Nitronex Corporation | Semiconductor device-based sensors |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4322680A (en) * | 1980-03-03 | 1982-03-30 | University Of Utah Research Foundation | Chemically sensitive JFET transducer devices utilizing a blocking interface |
-
1984
- 1984-08-22 DE DE19843430941 patent/DE3430941C2/de not_active Expired
Also Published As
| Publication number | Publication date |
|---|---|
| DE3430941A1 (de) | 1985-03-14 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| OP8 | Request for examination as to paragraph 44 patent law | ||
| D2 | Grant after examination | ||
| 8364 | No opposition during term of opposition | ||
| 8339 | Ceased/non-payment of the annual fee |